• 한국환경과학회지
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• 제17권9호
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• pp.1023-1032
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• 2008

The feasibility study of the application of the photoelectrocatalytic and electrolytic/UV decolorization of Rhodamine B (RhB) was investigated in the photoelectrocatalytic and electrolytic/UV process with $TiO_2$ photoelectrode and DSA (dimensionally stable anode) electrode. Three types of $TiO_2$ photoelectrode were used. Thermal oxidation electrode (Th-$TiO_2$) was made by oxidation of titanium metal sheet; sol-gel electrode (5G-$TiO_2$) and powder electrode (P-$TiO_2$) were made by coating and then heating a layer of titania sol-gel and slurry $TiO_2$ on titanium sheet. DSA electrodes were Ti and Ru/Ti electrode. The relative performance for RhB decolorization of each of the photoelecoodes and DSA electrodes is: Ru/Ti > Ti > SG-$TiO_2$ > Th-$TiO_2$. It was observed that photoelectrocatalytic decolorization of RhB is similar to the sum of the photocatalytic and electrolytic decolorization. Therefore the synergetic effect was not showed in pthotoelectrocatalytic reaction. $Na_{2}SO_{4}$ and NaCl showed different decolorization effect between pthotoelectrocatalytic and electrolytic/UV reaction. In the presence of the NaCl, RhB decolorization of Ru/Ti DSA electrode was higher than that of the other photoelectrode and Ti electrode. Optimum current, NaCl dosage and UV lamp power of the electrolytic/UV process (using Ru/Ti electrode) were 0.75 A, 0.5 g/L and 16 W, respectively.

• 한국환경보건학회지
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• 제34권6호
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• pp.439-445
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• 2008

The feasibility study for the application of the removal and mineralization of Rhodamine B (RhB) was performed in a batch electrochemical reactor. The electro/UV process was consisted of DSA (dimensionally stable anode) electrode and UV-C or ozone lamp. The experimental results showed that RhB removal by the ozone lamp was higher than that of the UV-C lamp. Optimum current of the electro/UV process was 1 A. The electrochemical, UV and electro/UV process could completely degrade RhB, while a prolonged treatment was necessary to reach a high level RhB mineralization. It was observed that RhB removal in electro/UV process is similar to the sum of the UV and electrolytic decolorization. However, it was found that the COD of RhB could be degraded more efficiently by the electro/UV process (90.2 %) than the sum of the two individual oxidation processes [UV (19.7%) and electrolytic process (50.8%)]. A synergetic effect was demonstrated between the UV and electrolysis.

• 해양환경안전학회지
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• 제8권2호
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• pp.23-27
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• 2002

Reballasting at sea, as recommended by the IMO guidelines, currently provides the best-available measure to reduce the risk of transfer of harmful aquatic organisms, but is subject to serious ship-safety limits. It is therefore extremely important that alternative, effective ballast water management and treatment methods are developed as soon as possible, to replace reballasting at sea. Filtration-Ultraviolet radiation-Electrolytic process (FUE) was evaluated for disinfection of seawater used In ballast water Optimal current density and UV light intensity were 2.0A/dm$^2$ and, 220㎼/$\textrm{cm}^2$/m with which 100% reduction time was 2sec in a Ultraviolet radiation-Electrolytic process. This study showed that FUE process was effective for the disinfection of commonly isolated bacteria and bacillus from ballast water.

• Tribology and Lubricants
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• 제37권6호
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• pp.208-212
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• 2021

Chemical mechanical polishing (CMP) is a key technology used for the global planarization of thin films in semiconductor production and smoothing the surface of substrate materials. CMP is a type of hybrid process using a material removal mechanism that forms a chemically reacted layer on the surface of a material owing to chemical elements included in a slurry and mechanically removes the chemically reacted layer using abrasive particles. Sapphire is known as a material that requires considerable time to remove materials through CMP owing to its high hardness and chemical stability. This study introduces a technology using electrolytic ionization and ultraviolet (UV) light in sapphire CMP and compares it with the existing CMP method from the perspective of the material removal rate (MRR). The technology proposed in the study experimentally confirms that the MRR of sapphire CMP can be increased by approximately 29.9, which is judged as a result of the generation of hydroxyl radicals (·OH) in the slurry. In the future, studies from various perspectives, such as the material removal mechanism and surface chemical reaction analysis of CMP technology using electrolytic ionization and UV, are required, and a tribological approach is also required to understand the mechanical removal of chemically reacted layers.

• 대한환경공학회지
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• 제30권8호
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• pp.823-830
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• 2008

Rhodamine B(RhB) 탈색에 대한 광전기촉매 공정의 적용가능성을 분말 TiO$_2$를 충전한 슬러리 광전기촉매 반응기에서 연구하였다. 광전기촉매 공정의 반응기 시스템은 분말 TiO$_2$, Pt 전극 및 3개의 8 W UV-C 등으로 구성되어 있다. 전류, 전해질, 공기 유량 및 전극 재질과 같은 운전 인자의 영향을 고찰하였다. 광전기촉매 공정의 최적 광촉매 량과 전류는 각각 0.4 g/L과 0.02A이었다. 광촉매 공정과 전기분해 단독 공정에 의해 분해되는 RhB의 합보다 광전기촉매 공정에 의해 더 빨리 분해되었는데, 광촉매 공정과 전기분해 공정의 결합에 의한 시너지 효과를 나타내는 것으로 사료되었다. 광전기촉매 공정은 공기 유량에 의해 영향을 받는 것으로 나타났고 최적 공기 유량은 2 L/min이었다. RhB 탈색에 대한 전극 재질과 NaCl 효과는 본 실험범위에서는 크지 않은 것으로 나타났다.

• 공업화학
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• 제24권5호
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• pp.562-565
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• 2013

고순도의 알루미늄 호일은 전기화학적 에칭을 통해 표면적을 증가시킨 후 전해 커패시터의 양극으로 사용된다. 그러나 산화 피막의 결함 및 에치 피트의 불규칙 생성에 의해 성장된 에치 피트의 분포는 불균일하며 이러한 불균일 형태는 알루미늄 넓은 표면적 분포에도 불구하고 여러 형태의 적용을 어렵게 만든다. 본 연구에서는 알루미늄의 선택적 에칭을 위해 포토리소그래피 방법으로 제작된 패턴 마스크를 사용하여 알루미늄 표면에 균일성을 갖는 보호층을 형성시켰다. 균일한 패턴을 갖는 알루미늄을 용액의 온도 및 전류밀도 등의 조건을 변경하여 실험하였고, 알루미늄 표면에 다양한 크기($2{\sim}5{\mu}m$)의 균일성을 갖는 에치 피트의 형성을 확인할 수 있었다.