• 제목/요약/키워드: Electroless nickel

검색결과 213건 처리시간 0.025초

Influence of MWCNTs on Fracture Toughness of MWCNTs/Nickel-Pitch Fiber/Epoxy Composites

  • Yim, Yoon-Ji;Park, Soo-Jin
    • Composites Research
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    • 제28권6호
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    • pp.361-365
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    • 2015
  • The influence of MWCNTs on fracture toughness properties of MWCNTs/Nickel-Pitch Fibers/epoxy composites (MWCNTs/Ni-PFs/epoxy) was investigated according to MWCNTs content. Nickel-Pitch-based carbon fibers (Ni-PFs) were prepared by electroless nickel-plating. The surface properties of Ni-PFs were determined by scanning electron microscopy (SEM) and X-ray photoelectron spectrometry (XPS). The fracture toughness of MWCNTs/Ni-PFs/epoxy was assessed by critical stress intensity factor ($K_{IC}$) and critical strain energy release rate ($G_{IC}$). From the results, it was found that the fracture toughness properties of MWCNTs/Ni-PFs/epoxy were enhanced with increasing MWCNTs content, whereas the value decreased above 5 wt.%. MWCNTs content. This was probably considered that the MWCNTs entangled with each other in epoxy due to an excess of MWCNTs.

無電解 Ni-Cu-P 廢 도금액의 재사용에 관한 연구 (A Study on Reusing of Electroless Ni-Cu-P Waste Solution)

  • 오이식
    • 자원리싸이클링
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    • 제10권2호
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    • pp.27-33
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    • 2001
  • 무전해 Ni-Cu-P폐 도금액의 재사용에 대해 소정의 조건에서 조사하였다. 아연화처리한 후 니켈 촉매의 처리는 니켈 촉매처리를 하지 않았을 때 보다 도금시간이 연장되었다 Batch type에서 새로 제조한 도금액에 폐 도금액을 50% 첨가하여도 무전해 Ni-Cu-P 폐 도금액의 재사용이 가능하였다. 새로 제조한 도금액에 소모된 도금액의 성분을 연속적으로 보충하여 도금하면(Continuous type), 보충하지 않았을 경우(B기ch type)보다 도금시간이 10배 연장되었다. 새로 제조한 도금액에 폐 도금액 50%를 첨가하여 소모된 도금액의 성분을 연속적으로 보충할 경우(Continuous type)의 도금시간은 보충하지 않았을 경우(Batch type)의 도금시간 보다 3.7배 연장되었다. 도금층의 불량과 급격한 도금속도의 감소는 도금층의 Ni과 Cu의 성분 변화에 큰 영향을 미쳤다.

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An Environment-Friendly Surface Pretreatment of ABS Plastic for Electroless Plating Using Chemical Foaming Agents

  • Kang, Dong-Ho;Choi, Jin-Chul;Choi, Jin-Moon;Kim, Tae-Wan
    • Transactions on Electrical and Electronic Materials
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    • 제11권4호
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    • pp.174-177
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    • 2010
  • We have developed an environment-friendly etching process, an alternative to the dichromic acid etching process, as a pretreatment of acrylonitrile-butadiene-styrene (ABS) plastic for electroless plating. In order to plate ABS plastic in an electroless way, there should be fine holes on the surface of the ABS plastic to enhance mechanically the adhesion strength between the plastic surface and the plate. To make these holes, the surface was coated uniformly with dispersed chemical foaming agents in a mixture of environmentally friendly dispersant and solvent by the methods of dipping or direct application. The solvent seeps into just below the surface and distributes the chemical foaming agents uniformly beneath the surface. After drying off the surface, the surface was heated at a temperature well below the glass transition temperature of ABS plastic. By pyrolysis, the chemical foaming agents made fine holes on the surface. In order to discover optimum conditions for the formation of fine holes, the mixing ratio of the solvent, the dispersant and the chemical foaming agent were controlled. After the etching process, the surface was plated with nickel. We tested the adhesion strength between the ABS plastic and nickel plate by the cross-cutting method. The surface morphologies of the ABS plastic before and after the etching process were observed by means of a scanning electron microscope.

무전해 Ni-Cu-B 폐 도금액의 재사용에 관한 연구 (A Study on Reusing of Electroless Ni-Cu-B Waste Solution)

  • 오이식;배영한
    • 자원리싸이클링
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    • 제12권1호
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    • pp.18-24
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    • 2003
  • 무전해 Ni-Cu-B 폐 도금액의 재사용에 대해 소정의 조건에서 조사하였다. 아연화처리한 후 니켈 촉매의 처리는 니켈 촉매처리를 하지 않았을 때 보다 도금시간이 연장되었다. Batch type에서 새로 제조한 도금액에 폐 도금액을 40% 첨가하여도 무전해 Ni-Cu-B 폐 도금액의 재사용이 가능하였다. 새로 제조한 도금액에 소모된 도금액의 성분을 연속적으로 보충하여 도금하면(continuous type), 보충하지 않았을 경우(batch type) 보다 도금시간이 6배 연장되었다. 새로 제조한 도금액에 폐 도금액 40%를 첨가하여 소모된 도금 액의 성분을 연속적으로 보충할 경우(continuous type)의 도금시간은 보충하지 않았을 경우(continuous type)의 도금시간 보다 2배 연장되었다. 도금층의 불량과 급격한 도금속도의 감소는 도금층의 Ni과 Cu의 성분 변화에 큰 영향을 미쳤다.

무전해 Co-Cu-P 도금속도에 미치는 도금 조건과 표면상태의 영향 (Effect of Plating Condition and Surface on Electroless Co-Cu-P Alloy Plating Rate)

  • 오이식
    • 동력기계공학회지
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    • 제4권2호
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    • pp.31-39
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    • 2000
  • Relationships between the plating condition and the plating rate of the deposition film for the electroless plating of Co-Cu-P alloy were discussed in this report. The result obtained from this experiment were summarized as follow ; The optimum bath composition was consisted of 0.8 ppm thiourea as a stabilizing agent. Composition of the deposit was found to be uniform after two hours of electroless plating. Plating rates of nickel-catalytic surface and zincate-catalytic surface were found to be very closely equal, but the plating time of nickel-catalytic surface took longer than that of the zincated-catalytic surface.

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MCFC anode 대체 전극 개발을 위한 분말 알루미나 상의 무전해 Ni 도금 연구 (Electoless Ni Plating on Alumina Powder to Application of MCFC Anode Material)

  • 김기현;조계현
    • 한국표면공학회지
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    • 제40권3호
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    • pp.131-137
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    • 2007
  • The typical MCFC (molten carbonate fuel cell) anode is made of Ni-10%Cr alloy. The work of this paper is focused concerning long life of anode because Ni-10% Cr anode is suffering from sintering and creep behavior during cell operation. Therefore, Ni-coated Alumina powder($20{\mu}m$) was developed by electroless nickel plating. Optimum condition of electroless nickel coation on $20{\mu}m$ alumina is as follows: pH 11.7, temperature $65{\sim}80^{\circ}C$, powder amount $100cm^2/l$. The deposition rate for Ni-electroless plating was as a function of temperature and activation energy was evaluated by Arrhenius Equation thereby activation energy calculated slope of experimental data as 117.6 kJ/mol, frequency factor(A) was $6.28{\times}10^{18}hr^{-1}$, respectively.

트리에탄올아민을 錯化劑로 사용한 無電解니켈鍍金浴의 析出速度에 관한 硏究 (Depositing Rate of Electroless Nickel Plating Bath Contained Triethanolamine as a Complexing Agent)

  • 여운관
    • 한국표면공학회지
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    • 제18권4호
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    • pp.153-163
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    • 1985
  • In the electroless nickel plating bath which contained nickel sulfate, sodium hypophosphite, boric acid and triethanolamine, effect of their concentration on the rate of deposition was tested by gravimetric method and polarization method. The polarization method that polarize small range of voltage anodicaly and cathodicaly at the mixed potential in the electroless plating bath can calculate mixed current (depositing rate) from $i_{mp}=\frac {i}{\eta}\;\frac{RT}{nF}\;or\;i_{mp}=\frac{i}{\eta}\;\frac{1}{2.3}(\frac{b_a\;\;b_c}{b_c+b_a})$ Where $i_{mp}$ is the depositing current, i is the polarized current, ${\eta}$ is the polarized voltage, $b_a\;and\;b_c$ are the Tafel slop of anodic and cathodic polarization curves respectively. The calculated mixed current ($i_{mp}$) is proportional to the depositing rate obtained by gravimetric method and corresponded mostly to the real depositing rate by multifying supplementary constant. The polarization method can be used for founding inclination of reaction on various concentration of each composition. Decreasing or increasing concentration of triethanolaminc as a complexing agent , the depositing rate is decreased and when the bath contained 25-50mL/L of triethanoloamine, the depositing rate is increased. The depositing rate is increased with increasing the concentration of boric acid, and when the bath contained 0.5M of boric acid, the depositing rate is increased abruptly. The optimum composition of the electroless nickel bath was estimated 0.1M of nickel sulfate, 0.25M of sodium hypophosphite, 0.5M of boric acid, and 25-50mL/L of triethanalamine.

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PCB 표면처리 및 공정 약품 기술 동향

  • 김익범
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2014년도 추계학술대회 논문집
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    • pp.77-77
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    • 2014
  • 솔더링과 와이어본딩이 가능한 ENEPIG (Electroless Nickel/Electroless Palladium/Immersion Gold) 를 중심으로 미세회로 기판에 적용할 수 있는 표면처리 및 공정 약품을 소개하고자 한다.

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무전해 니켈·팔라듐·금도금 표면처리 공정의 도금 번짐 불량 및 개선 (Prevention of Running Blots between the Patterns during the Electroless Nickel Electroless Palladium Immersion Gold (ENEPIG) Surface Finish)

  • 엄기헌;서정욱;원용선
    • 청정기술
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    • 제19권2호
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    • pp.84-89
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    • 2013
  • 무전해 니켈 팔라듐 금 표면처리 공정의 도금 번짐 불량의 근본적인 원인을 이해하고 이를 해결하기 위한 방법을 제시하였다. 이에 계산화학을 이용하여 공정을 정성적으로 설명하고 이를 바탕으로 가정을 검증하기 위한 실험을 계획하였다. 도금 번짐으로 발전되는 고분자 레진 위의 팔라듐 시드의 핵 생성을 막는 것에 초점을 맞추어 고분자 레진과 화학적으로 결합력이 약한 $PdCl_2$ 팔라듐 촉매를 도입하였으며 이 촉매가 수용액 중에서 추가적인 가수분해 반응으로 더 안정한 $Pd(OH)_2$를 형성함으로써 고분자 레진 위에 팔라듐 시드의 원천으로 작용하지 않도록 염산(HCl)의 농도를 높이거나 팔라듐 활성화 공정의 온도를 낮추어 보았다. 계산화학은 매 단계 실험의 이론적인 근거를 제시해 주었으며 실험 결과를 해석하는 데 큰 도움을 주었다. 이와 같이 실험과 이론을 접목시킨 본 연구의 접근법은 관련 공정에서 매우 유용하게 활용될 수 있을 것으로 기대된다.

Analysis of Ni/Cu Metallization to Investigate an Adhesive Front Contact for Crystalline-Silicon Solar Cells

  • Lee, Sang Hee;Rehman, Atteq ur;Shin, Eun Gu;Lee, Doo Won;Lee, Soo Hong
    • Journal of the Optical Society of Korea
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    • 제19권3호
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    • pp.217-221
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    • 2015
  • Developing a metallization that has low cost and high efficiency is essential in solar-cell industries, to replace expensive silver-based metallization. Ni/Cu two-step metallization is one way to reduce the cost of solar cells, because the price of copper is about 100 times less than that of silver. Alkaline electroless plating was used for depositing nickel seed layers on the front electrode area. Prior to the nickel deposition process, 2% HF solution was used to remove native oxide, which disturbs uniform nickel plating. In the subsequent step, a nickel sintering process was carried out in $N_2$ gas atmosphere; however, copper was plated by light-induced plating (LIP). Plated nickel has different properties under different bath conditions because nickel electroless plating is a completely chemical process. In this paper, plating bath conditions such as pH and temperature were varied, and the metal layer's structure was analyzed to investigate the adhesion of Ni/Cu metallization. Average adhesion values in the range of 0.2-0.49 N/mm were achieved for samples with no nickel sintering process.