• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2004.05a
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• pp.169-173
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• 2004

Rotating Compensator Ellipsometry에 회전하는 시편 홀더를 갖추었을 때 uniaxial한 시편의 광축과 retardance를 측정하는 것이 매우 간단해진다. 이것은 Dual Rotating Compensator Transmission Ellipsometry의 self-calibration과정과 흡사하기 때문이다. 기존의 ellipsometry가 광학 부품들의 입사면에 대한 방위각을 찾는 복잡한 calibration과정과 비등방성 시편의 고속축의 방향을 찾아야 하는 수고를 필요로 하지만 rotating sample and compensator ellipsometry는 self-calibration과 자동으로 고속축의 방향을 찾기 때문에 매우 편리하다. 우리는 이 기술를 정렬된 액정display panel에 적용하여 ~$0.4^{\circ}$ 의 작은 retardance 간을 측정할 수 있었다.

• Journal of the Semiconductor & Display Technology
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• v.3 no.1
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• pp.31-34
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• 2004

We develop Mueller-matrix spectroscopic ellipsometry based on dual compensator configuration. This technique is very powerful for measuring surface anisotropy in nano-scale, especially when materials show depolarization. Dual-rotating compensator configuration is adopted with the rotational ratio of 5:3 originally developed by Collins et al[1]. The instrument can provide 250-point spectra over the wavelength range from 230 nm to 820 nm in one irradiance waveform with minimum acquisition time of Tc=10 s. In this work, the results obtained in transmission modes are presented for the initial attempt. We present calibration procedures to diagnose the system from the utilized data collected in transmission mode without sample. We expect that the instrument will have important applications in thin films and surfaces that have anisotropy and inhomogeneity.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2003.12a
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• pp.12-17
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• 2003

We develop Mueller-matrix spectroscopic ellipsometry based on dual compensator configuration. This technique is very powerful for measuring surface anisotropy in nano-scale, especially when materials show depolarization. Dual-rotating compensator configuration is adopted with the rotational ratio of 5:3 originally developed by Collins et al [1]. The instrument can provide 250-point spectra over the wavelength range from 230 nm to 820 nm in one irradiance waveform with minimum acquisition time of $Tc{\approx}10 s$. In this work, the results obtained in transmission modes are presented for the initial attempt. We present calibration procedures to diagnose the system from the utilize data collected in transmission mode without sample. We expect that the instrument will have important applications in thin films and surfaces that have anisotropy and inhomogeneity.

• Current Optics and Photonics
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• v.7 no.4
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• pp.428-434
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• 2023

The compensators used in spectroscopic ellipsometers are usually assumed to be ideal linear waveplates. In reality, however, they are elliptical waveplates, because they are usually made by bonding two or more linear waveplates of different materials with slight misalignment. This induces systematic error when they are modeled as linear waveplates. We propose an improved calibration method based on an optical model that regards an elliptical waveplate as a combination of a circular waveplate (rotator) and a linear waveplate. The method allows elimination of the systematic error, and the residual error of optic axis measurement is reduced to 0.025 degrees in the spectral range of 450-800 nm.