Muller matrix ellipsometry 제작 및 응용

  • 방경윤 (한양대학교 과학기술대학 응용물리학과) ;
  • 경재선 (한양대학교 과학기술대학 응용물리학과) ;
  • 오혜근 (한양대학교 과학기술대학 응용물리학과) ;
  • 김옥경 (한양대학교 과학기술대학 응용물리학과) ;
  • 안일신 (한양대학교 과학기술대학 응용물리학과)
  • 발행 : 2003.12.01

초록

We develop Mueller-matrix spectroscopic ellipsometry based on dual compensator configuration. This technique is very powerful for measuring surface anisotropy in nano-scale, especially when materials show depolarization. Dual-rotating compensator configuration is adopted with the rotational ratio of 5:3 originally developed by Collins et al [1]. The instrument can provide 250-point spectra over the wavelength range from 230 nm to 820 nm in one irradiance waveform with minimum acquisition time of $Tc{\approx}10 s$. In this work, the results obtained in transmission modes are presented for the initial attempt. We present calibration procedures to diagnose the system from the utilize data collected in transmission mode without sample. We expect that the instrument will have important applications in thin films and surfaces that have anisotropy and inhomogeneity.

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