• Journal of the Korean Society for Precision Engineering
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• v.20 no.12
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• pp.42-47
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• 2003

The laser direct writing method has some advantages of being maskless, allowing rapid and inexpensive prototyping in comparison to conventional mask-based photolithography. In general, there are two kinds of laser direct writing methods such as the laser ablation method and the laser polymerization method. The laser polymerization method was studied fur manufacturing waveguide in this paper. It is important to reduce line width for image mode waveguides, so some investigations will be carried out in various conditions of process parameters such as laser power, writing speed, focusing height and optical properties of polymer. Experimentally, the optical waveguide was manufactured trapezoid shape. Through SEM the waveguide was 20 ${\mu}{\textrm}{m}$ width and 7.4 ${\mu}{\textrm}{m}$ height.

• Proceedings of the Materials Research Society of Korea Conference
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• 2012.05a
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• pp.58.1-58.1
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• 2012

Direct write technologies provide flexible and economic means to manufacture low-cost large-area electronics. In this regard inkjet printing has frequently been used for the fabrication of electronic devices. Full advantage of this method, which is capable of reliable direct patterning with line and space dimensions in the 10 to 100 um regime, is only made with all-solution based processing. Among these printable electronic materials, silver and copper nanoparticles have been used as interconnecting materials. Specially, solutions of organic-encapsulated silver and copper nanoparticles may be printed and subsequently annealed to form low-resistance conductor patterns. In this talk, we describe novel processes for forming silver nanoplates and copper ion complex which have unique properties, and discuss the optimization of the printing/annealing processes to demonstrate plastic-compatible low-resistance conductors. By optimizing both the interconnecting materials and the surface treatments of substrate, it is possible to produce particles that anneal at low-temperatures (< $200^{\circ}C$) to form continuous films having low resistivity and appropriate work function for formation of rectifying contacts.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.266.1-266.1
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• 2013

Large-scale single-crystal organic nanowire arrays were generated using a direct printing method (liquidbridge- mediated nanotransfer molding) that enables the simultaneous synthesis, alignment and patterning of nanowires from molecular ink solutions. Using this method, single-crystal organic nanowires can easily be synthesized by self-assembly and crystallization of organic molecules within the nanoscale channels of molds, and these nanowires can then be directly transferred to specific positions on substrates to generate nanowire arrays by a direct printing process. Repeated application of the direct printing process can be used to produce organic nanowire-integrated electronics with two- or three-dimensional complex structures on large-area flexible substrates. This efficient manufacturing method is used to fabricate all-organic nanowire field-effect transistors that are integrated into device arrays and inverters on flexible plastic substrates.

• Proceedings of the Korean Society of Machine Tool Engineers Conference
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• 2004.04a
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• pp.472-477
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• 2004

Miniaturization is the central theme in modern fabrication technology. Many of the components used in modem products are becoming smaller and smaller. The direct write FIB technology has several advantages over contemporary micromachining technology, including better feature resolution with low lateral scattering and capability of mastless fabrication. Therefore, the application of focused ion beam(FIB) technology in micro fabrication has become increasingly popular. In recent model of FIB, however the feeding system has been a very coarse resolution of about a few ${\mu}{\textrm}{m}$. It is not unsuitable to the sputtering and the deposition to make the high-precision structure in micro or macro scale. Our research is the development of nano stage of 200mm strokes and l0nm resolutions. Also, this stage should be effectively operating in ultra high vacuum of about 1$\times$10$^{-5}$ pa. This paper presents the concept of nano stages and the discussion of the material treatment for ultra tush vacuum.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.1
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• pp.46-50
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• 2004

The curing characteristics of a liquid photopolymer during microstereolithography and the shape accuracy of thereby fabricated microstructures were investigated experimentally. A He-Cd laser with a wavelength of 442nm and a photopolymer consisted of a commercial resin from SK chemical and a photoinitiat or were used for the experiment. By varying the laser beam power and scanning speed of the focused laser beam, minimum curing thickness of 50 ${\mu}ㅡ$ was obtained. The distortion of solidified structure due to adhesion force was measured and the optimum fabrication conditions were determined. Also, the feasibility of direct fabrication of three-dimensional microstructures by Super IH process was examined.

• Proceedings of the KSME Conference
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• 2007.05a
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• pp.1249-1253
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• 2007

Experimental studies on the fabrication of sub-30 nm nanofibers using weakly two-photon induced photopolymerized region have been carried out. For the generation of nanofibers inside or outside microstructures, an over-polymerizing method involving a long exposure technique (LET) was proposed. Such nanofibers can find meaningful applications as bio-filters, mixers, and many other uses in diverse research field. A multitude of nanofibers with a notably high resolution (about 22 nm) in two-photon polymerization was achieved using the LET. Furthermore, it was demonstrated that the LET can be employed for the direct fabrication of various embossing patterns by controlling the exposure duration and the interval between voxels. Thin interconnecting networks are formed regularly in the boundary of the over-polymerized region, which allows for the creation of various pattern shapes. Overall of this work, some patterns including nanofibers are fabricated by the LET.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2000.05a
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• pp.1047-1050
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• 2000

As the progress of new industrial products or parts technology, the precise and fine machining technologies are needed more and more. Micro fabrication technology of these products are usally consisted of mechanical machining or MEMS technology. Direct machining by mechanical method is not applicable to mass production. MEMS technology also has several problems such as low mechanical strength, bad surface roughness and difficulty of 3 dimensional machining. In this study, we introduce several micro fabrication technology to make micro molds and dies and our project to develop these machining technology.

• Proceedings of the IEEK Conference
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• 2002.07c
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• pp.1740-1743
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• 2002

This paper presents the basic concept of a Solid Freeform Fabrication System using a rapid prototyping procedure. The system can fabricate a ceramic model by laser cutting, accumulating, laminating and sintering of each slice. The system is mainly equipped with a laser apparatus, an x-y table, a material transfer system, and an electric oven. The system could fabricate a small object with smooth surface within comparatively short period of time. The system has also shown its effectiveness in terms of the direct application of the object without the secondary mechanical process. The fabricated sample could directly be applied and used to fairly wide practical areas.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2004.05a
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• pp.223-228
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• 2004

Miniaturization is the central theme in modern fabrication technology. Many of the components used in modern products are becoming smaller and smaller. The direct write FIB technology has several advantages over contemporary micromachining technology, including better feature resolution with low lateral scattering and capability of maskless fabrication. Therefore, the application of FIB technology in micro fabrication has become increasingly popular. In recent model of FIB, however the feeding system has been a very coarse resolution of about a few $\mu\;\textrm{m}$. It is not unsuitable to the sputtering and the deposition to make the high-precision structure in micro or macro scale. Our research is the development of nano stage of 200mm strokes and 10nm resolutions. Also, this stage should be effectively operating in ultra high vacuum of about $1\times10^{-7}$ torr. This paper presents the concept of nano stages and the discussion of the material treatment for ultra high vacuum.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2008.11a
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• pp.121-122
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• 2008