• Composites Research
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• 제35권3호
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• pp.201-215
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• 2022

본 연구에서는 초고온 환경에서 내화학성 및 열적 안정성이 우수한 지오폴리머 기반의 알루미노실리케이트 레진과 세라믹 섬유를 활용한, 목표주파수 X-band(8.2 GHz to 12.4 GHz)에서 전자파를 흡수하는 세라믹 복합재(Radar-absorbing ceramic composite, RACC)를 구현하였다. 주 성분이 FeSi인 판형 구조의 샌더스트 자성 입자를 분산시킨 알루미노실리케이트 레진은 목표 주파수 대역에서 자성 및 유전손실 특성을 발휘하였고, 입도와 무게분율별 유전특성을 Cole-Cole Plot으로 표현하였다. 샌더스트가 분산된 알루미노실리케이트 레진의 미세구조, 화학적 성분 및 결정, 자기 및 열적 특성 등을 분석하기 위해 SEM, EDS, VSM 및 TGA를 측정하였다. 샌더스트의 입도 크기 35 ㎛, 무게분율 40 wt.%를 분산시킨 레진의 유전손실 특성을 활용하여, X-band에서 약 1.51 GHz 대역폭에 대해 -10 dB 이하의 반사손실 성능을 발휘하는 단층형(t = 1.585 mm) RACC를 설계 및 제작하였다. 제작된 RACC의 초고온(25℃ to 1,000℃)에서 전자파 흡수 거동을 살피기 위해 개발된 초고온 환경 자유공간측정 장비를 활용하여 X-band 대역에서 그 성능을 검증하였다.

• Advances in nano research
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• 제9권1호
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• pp.1-13
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• 2020

In this work, the electrical potential (EP) technique with an artificial neural networks (ANNs) for monitoring of nanostructures are used for the first time. This study employs an expert system to identify size and localize hidden nano-delamination (N.Del) inside layers of nano-pipe (N.P) manufactured from Basalt Fiber Reinforced Polymer (BFRP) laminate composite by using low-cost monitoring method of electrical potential (EP) technique with an artificial neural networks (ANNs), which are combined to decrease detection effort to discern N.Del location/size inside the N.P layers, with high accuracy, simple and low-cost. The dielectric properties of the N.P material are measured before and after N.Del introduced using arrays of electrical contacts and the variation in capacitance values, capacitance change and node potential distribution are analyzed. Using these changes in electrical potential due to N.Del, a finite element (FE) simulation model for N.Del location/size detection is generated by ANSYS and MATLAB, which are combined to simulate sensor characteristic, therefore, FE analyses are employed to make sets of data for the learning of the ANNs. The method is applied for the N.Del monitoring, to minimize the number of FE analysis in order to keep the cost and save the time of the assessment to a minimum. The FE results are in excellent agreement with an ANN and the experimental results available in the literature, thus validating the accuracy and reliability of the proposed technique.

• 한국도로학회논문집
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• 제17권6호
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• pp.1-9
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• 2015

PURPOSES : The objective of this study is to propose a quality control and quality assurance method for use during asphalt pavement construction using non-destructive methods, such as ground penetrating radar (GPR) and an infrared (IR) camera. METHODS : A 1.0 GHz air-coupled GPR system was used to measure the thickness and in situ density of asphalt concrete overlay during the placement and compaction of the asphalt layer in two test construction sections. The in situ density of the asphalt layer was estimated based on the dielectric constant of the asphalt concrete, which was measured as the ratio of the amplitude of the surface reflection of the asphalt mat to that of a metal plate. In addition, an IR camera was used to monitor the surface temperature of the asphalt mat to ensure its uniformity, for both conventional asphalt concrete and fiber-reinforced asphalt (FRA) concrete. RESULTS : From the GPR test, the measured in situ air void of the asphalt concrete overlay gradually decreased from 12.6% at placement to 8.1% after five roller passes for conventional asphalt concrete, and from 10.7% to 5.9% for the FRA concrete. The thickness of the asphalt concrete overlay was reduced from 7.0 cm to 6.0 cm for the conventional material, and from 9.2 cm to 6.4 cm for the FRA concrete. From the IR camera measurements, the temperature differences in the asphalt mat ranged from $10^{\circ}C$ to $30^{\circ}C$ in the two test sections. CONCLUSIONS : During asphalt concrete construction, GPR and IR tests can be applicable for monitoring the changes in in situ density, thickness, and temperature differences of the overlay, which are the most important factors for quality control. For easier and more reliable quality control of asphalt overlay construction, it is better to use the thickness measurement from the GPR.

• Advances in aircraft and spacecraft science
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• 제4권5호
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• pp.515-528
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• 2017

Since composite structures are widely used in structural engineering, delamination in such structures is an important issue of research. Delamination is one of a principal cause of failure in composites. In This study the electrical potential (EP) technique is applied to detect and locate delamination in basalt fiber reinforced polymer (FRP) laminate composite pipe by using electrical capacitance sensor (ECS). The proposed EP method is able to identify and localize hidden delamination inside composite layers without overlapping with other method data accumulated to achieve an overall identification of the delamination location/size in a composite, with high accuracy, easy and low-cost. Twelve electrodes are mounted on the outer surface of the pipe. Afterwards, the delamination is introduced into between the three layers (0º/90º/0º)s laminates pipe, split into twelve scenarios. The dielectric properties change in basalt FRP pipe is measured before and after delamination occurred using arrays of electrical contacts and the variation in capacitance values, capacitance change and node potential distribution are analyzed. Using these changes in electrical potential due to delamination, a finite element simulation model for delamination location/size detection is generated by ANSYS and MATLAB, which are combined to simulate sensor characteristic. Response surfaces method (RSM) are adopted as a tool for solving inverse problems to estimate delamination location/size from the measured electrical potential changes of all segments between electrodes. The results show good convergence between the finite element model (FEM) and estimated results. Also the results indicate that the proposed method successfully assesses the delamination location/size for basalt FRP laminate composite pipes. The illustrated results are in excellent agreement with the experimental results available in the literature, thus validating the accuracy and reliability of the proposed technique.

• 한국광학회지
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• 제19권1호
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• pp.73-79
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• 2008

금속선 도파로 면과 금속 평면이 수직으로 적층된 장거리 표면-플라즈몬 도파로 구조를 제안하였으며, 표면-플라즈몬 모드의 특성을 유전체의 굴절율과 두께 변화에 대하여 이론적으로 분석하고 실험적으로 검증하였다. 위층의 금속선 도파로를 S-곡선과 Y-분기 형태로 변형시킨 이중-금속 도파로를 제작하여, 제안된 이중-금속 도파로 구조의 광 소자 응용 가능성을 살펴보았다. 제안된 이중금속 구조에서는 도파로 코어에 해당하는 두 금속 박막 사이의 유전체 굴절률을 임의로 선택하여도 장거리 표면 플라즈몬 모드가 존재할 수 있으며, 표면-플라즈몬 모드의 전파거리는 두 금속 박막 사이의 유전체 두께를 조절함으로써 증가시킬 수 있다. 또한, 이중-금속 도파로는 표면-플라즈몬을 전달할 뿐만 아니라, 삽입된 코어 유전체에 전압 및 전류를 인가하기에도 매우 적합한 구조로서, 표면-플라즈몬 능동소자 및 비선형 소자 구현에 많은 가능성을 열어줄 것으로 기대된다.

• International Journal of Industrial Entomology and Biomaterials
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• 제38권2호
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• pp.25-30
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• 2019

Atmospheric-pressure plasma technique is a technology for sterilizing agricultural product. In this study, dielectric barrier discharge plasma was applied to silkworm powder for 1 to 5 h with less than 2 ppm of $O_3$ and $NO_2$. Quantitative compositions including proximate contents, mineral and heavy metal contents, fatty acids, vitamins, and DNJ contents were measured. Proximate contents of silkworm powder were protein (57.2%), fat (9.9%), fiber (4.6%), ash (10.1%), and moisture (5.7%). These compositions were not affected by the treatment of plasma. Silkworm powder has 5 abundant minerals potassium (K), phosphorus (P), sulfur (S), calcium (Ca), and magnesium (Mg). Among these minerals, plasma treatment decreased the contents of P and S sharply from 732.3 to 176.8, and 492.7 to 185.2 mg/100g, respectively. Heavy metal contents including lead (Pb), cadmium (Cd), arsenic (As), and mercury (Hg) were not detected in the silkworm powder. Five vitamins such as ascorbic acid (13.6 mg/100g), riboflavin (5.4 mg/100g), ${\beta}$-carotene (1.8 mg/100g), niacin (0.6 mg/100g), and thiamine (0.4 mg/100g) were not significantly changed by plasma treatment. Silkworm powder is composed of 30 parts saturated fatty acids and 70 parts unsaturated ones. The fatty acid composition was not significantly changed by plasma treatment. The DNJ content of silkworm powder (3.72 mg/g) was also nearly constant within the experimental condition of plasma treatment.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.93-93
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• 2016

Large scale integrated circuits (LSIs) has been improved by the shrinkage of the circuit dimensions. The smaller chip sizes and increase in circuit density require the miniaturization of the line-width and space between metal interconnections. Therefore, an extreme precise control of the critical dimension and pattern profile is necessary to fabricate next generation nano-electronics devices. The pattern profile control of plasma etching with an accuracy of sub-nanometer must be achieved. To realize the etching process which achieves the problem, understanding of the etching mechanism and precise control of the process based on the real-time monitoring of internal plasma parameters such as etching species density, surface temperature of substrate, etc. are very important. For instance, it is known that the etched profiles of organic low dielectric (low-k) films are sensitive to the substrate temperature and density ratio of H and N atoms in the H2/N2 plasma [1]. In this study, we introduced a feedback control of actual substrate temperature and radical density ratio monitored in real time. And then the dependence of etch rates and profiles of organic films have been evaluated based on the substrate temperatures. In this study, organic low-k films were etched by a dual frequency capacitively coupled plasma employing the mixture of H2/N2 gases. A 100-MHz power was supplied to an upper electrode for plasma generation. The Si substrate was electrostatically chucked to a lower electrode biased by supplying a 2-MHz power. To investigate the effects of H and N radical on the etching profile of organic low-k films, absolute H and N atom densities were measured by vacuum ultraviolet absorption spectroscopy [2]. Moreover, using the optical fiber-type low-coherence interferometer [3], substrate temperature has been measured in real time during etching process. From the measurement results, the temperature raised rapidly just after plasma ignition and was gradually saturated. The temporal change of substrate temperature is a crucial issue to control of surface reactions of reactive species. Therefore, by the intervals of on-off of the plasma discharge, the substrate temperature was maintained within ${\pm}1.5^{\circ}C$ from the set value. As a result, the temperatures were kept within $3^{\circ}C$ during the etching process. Then, we etched organic films with line-and-space pattern using this system. The cross-sections of the organic films etched for 50 s with the substrate temperatures at $20^{\circ}C$ and $100^{\circ}C$ were observed by SEM. From the results, they were different in the sidewall profile. It suggests that the reactions on the sidewalls changed according to the substrate temperature. The precise substrate temperature control method with real-time temperature monitoring and intermittent plasma generation was suggested to contribute on realization of fine pattern etching.

• 마이크로전자및패키징학회지
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• 제8권1호
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• pp.27-32
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• 2001

($Zr_{0.8}, Sn_{0.2})TiO_4$의 소결온도를 저하시키고 품질계수 향상의 목적으로 첨가한 $V_2O_5$가 다른 donor형태의 화합물과 달리 품질계수의 저하를 가져오는 원인을 $Ta_2O_5$가 첨가된 ($Zr_{0.8}, Sn_{0.2})TiO_4$와 미세 구조변화, 전기전도도, 산화상태의 관점에서 비교 분석하였다. 일반적으로 donor형태의 화합물의 첨가는 ($Zr_{0.8}, Sn_{0.2})TiO_4$의 산소공공의 농도를 감소시켜 품질계수의 증가를 가져오는 것으로 알려져 있다. $V_2O_5$의 첨가의 경우는 액상소결에 의한 결정입계상 존재, 섬유상 형태의 $V_2O_5-TiO_2$rich 이차상 형성 및 Vanadium 이온의 산화상태 불안정에서 기인된 산소공공의 농도 증가가 복합적으로 ($Zr_{0.8}, Sn_{0.2})TiO_4$의 품질계수 저하 요인으로 작용하였다.