• Title/Summary/Keyword: Dicing machine

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Performance Evaluation of Dicing Sawing of High-densified Al2O3 Bulk using Diamond Electroplated Band-saw Machine (다이아몬드전착 밴드쏘우장비를 이용한 고치밀도 알루미나소결체의 다이싱가공 성능평가)

  • Lee, Yong-Moon;Park, Young-Chan;Kim, Dong-Hyun;Lee, Man-Young;Kang, Myung Chang
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.16 no.6
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    • pp.1-6
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    • 2017
  • Recently, the brittle materials such as ceramics, glass, sapphire and textile material have been widely used in semiconductors, aerospace and automobile owing to high functional characteristics. On the other hand, it has the characteristics of difficult-to-cut material relative to all materials. In this study, diamond electro-deposited band-saw machine was developed to operate stably using water-coolant type through relative motion between band-saw tool and $Al_2O_3$ material. High densified $Al_2O_3$ material was manufactured by spark plasma sintering method. The bulk density was observed by the Archimedes law and the theoretical density was estimated to be $3.88g/cm^3$ and its hardness 14.7 MPa. From the dicing sawing test of $Al_2O_3$ specimen, behavior of surface roughness and band-saw wear are dominantly affected by the increase of the band-saw linear velocity. Additionally, an continuous pattern type of diamond band-saw was a very effective due to entry impact as a one-off for brittle material.

A Study on a Laser Dicing and Drilling Machine for Si Thin-Wafer (UV 레이저를 이용한 Si Thin 웨이퍼 다이싱 및 드릴링 머신)

  • Lee, Young-Hyun;Choi, Kyung-Jin
    • Proceedings of the KIEE Conference
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    • 2004.11c
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    • pp.478-480
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    • 2004
  • 다이아몬드 톱날을 이용한 얇은 Si 웨이퍼의 기계적인 다이싱은 chipping, crack 등의 문제점을 발생시킨다. 또한 stacked die 나 multi-chip등과 같은 3D-WLP(wafer level package)에서 via를 생성하기 위해 현재 사용되는 화학적 etching은 공정속도가 느리고 제어가 힘들며, 공정이 복잡하다는 문제점을 가지고 있다. 이러한 문제점을 해결하기 위해 현재 연구되고 있는 분야가 레이저를 이용한 웨이퍼 다이싱 및 드릴링이다. 본 논문에서는 UV 레이저를 이용한 얇은 Si 웨이퍼 다이싱 및 드릴링 시스템에 대해 소개하고, 웨이퍼 다이싱 및 드릴링 실험결과를 바탕으로 적절한 레이저 및 공정 매개변수에 대해 설명한다.

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A Point of Production System for Semiconductor Wafer Dicing Process (반도체 웨이퍼 다이싱 공정을 위한 생산시점 정보관리시스템)

  • Kim, In-Ho
    • Journal of the Korea Society of Computer and Information
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    • v.14 no.10
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    • pp.55-61
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    • 2009
  • This paper describes a point of production(POP) system which collects and manages real-time shop floor machining information in a wafer dicing process. The system are composed of POP terminal, line controller and network. In the configuration of the system, LAN and RS485 network are used for connection with the upper management system and down stratum respectively. As a bridge between POP terminal and server, a line controller is used. The real-time information which is the base of production management are collected from information resources such as machine, product and worker. The collected information are used for the calculation of optimal cutting condition. The collection of the information includes cutting speed, spout of pure water, accumulated count of cut in process for blade and wafer defect. In order to manage machining information in wafer dicing process, production planning information is delivered to the shop floor, and production result information is collected from the shop floor, delivered to the server and used for managing production plan. From the result of the system application, production progress status, work and non-working hour analysis for each machine, and wafer defect analysis are available, and they are used for quality and productivity improvements in wafer dicing process. A case study is implemented to evaluate the performance of the system.

Efficient Mechanism for QFN Solder Defect Detection (QFN 납땜 불량 검출을 위한 효율적인 검사 기법)

  • Kim, Ho-Joong;Cho, Tai-Hoon
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2016.05a
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    • pp.367-370
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    • 2016
  • QFN(Quad Flat No-leads package) is one of the SMD(Surface Mount Device). Since there is no lead in QFN, there are many defects on solder. Therefore, we propose an efficient mechanism for QFN solder defect detection at this paper. For this, we employ Convolutional Neural Network(CNN) of the Machine Learning algorithm. QFN solder's color multi-layer images are used to train CNN. Since these images are 3-channel color images, they have a problem with applying to CNN. To solve this problem, we used each 1-channel grayscale image(Red, Blue, Green) that was separated from 3-channel color images. We were able to detect QFN solder defects by using this CNN. Later, further research is needed to detect other QFN.

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QFN Solder Defect Detection Using Convolutional Neural Networks with Color Input Images (컬러 입력 영상을 갖는 Convolutional Neural Networks를 이용한 QFN 납땜 불량 검출)

  • Kim, Ho-Joong;Cho, Tai-Hoon
    • Journal of the Semiconductor & Display Technology
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    • v.15 no.3
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    • pp.18-23
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    • 2016
  • QFN (Quad Flat No-leads Package) is one of the SMD (Surface Mount Device). Since there is no lead in QFN, there are many defects on solder. Therefore, we propose an efficient mechanism for QFN solder defect detection at this paper. For this, we employ Convolutional Neural Network (CNN) of the Machine Learning algorithm. QFN solder's color multi-layer images are used to train CNN. Since these images are 3-channel color images, they have a problem with applying to CNN. To solve this problem, we used each 1-channel grayscale image (Red, Green, Blue) that was separated from 3-channel color images. We were able to detect QFN solder defects by using this CNN. In this paper, it is shown that the CNN is superior to the conventional multi-layer neural networks in detecting QFN solder defects. Later, further research is needed to detect other QFN.

Analysis of Research Trends on Electrochemical-Mechanical Planarization (전기화학-기계적 평탄화에 관한 연구 동향 분석)

  • Lee, Hyunseop;Kim, Jihun;Park, Seongmin;Chu, Dongyeop
    • Tribology and Lubricants
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    • v.37 no.6
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    • pp.213-223
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    • 2021
  • Electrochemical mechanical planarization (ECMP) was developed to overcome the shortcomings of conventional chemical mechanical planarization (CMP). Because ECMP technology utilizes electrochemical reactions, it can have a higher efficiency than CMP even under low pressure conditions. Therefore, there is an advantage in that it is possible to reduce dicing and erosions, which are physical defects in semiconductor CMP. This paper summarizes the papers on ECMP published from 2003 to 2021 and analyzes research trends in ECMP technology. First, the material removal mechanisms and the configuration of the ECMP machine are dealt with, and then ECMP research trends are reviewed. For ECMP research trends, electrolyte, processing variables and pads, tribology, modeling, and application studies are investigated. In the past, research on ECMP was focused on basic research for the development of electrolytes, but it has recently developed into research on tribology and process variables and on new processing systems and applications. However, there is still a need to increase the processing efficiency, and to this end, the development of a hybrid ECMP processing method using another energy source is required. In addition, ECMP systems that can respond to the developing metal 3D printing technology must be researched, and ECMP equipment technology using CNC and robot technology must be developed.

Study on Vibrated Cutting Blade with Hinge Mechanism (힌지구조 진동절단장치에 관한 연구)

  • Kang, Dong-Bae;Ahn, Joong-Hwan;Son, Seong-Min
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.11 no.2
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    • pp.443-448
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    • 2010
  • Rapid advance in information technology requires high performance devices with compact size. Integrated multi-layer electronic element with different functions enables those compact devices to possess various performances and powerful capabilities. In mass production, the multi-layer electronic element is manufactured as a bulk type with a large number of parts for productivity. However, this may cause the electronic part to be damaged in the cutting process of the bulk elements to separate into each part. Therefore the cutting performance of multi-layer element bulk is playing an important role in the view of production efficiency. This study focuses on the cutting characteristics of multi-layer electronic elements. In order to increase the efficiency, the vibration cutting method was applied to the blade cutting machine. Flexure hinge structure, which is an physical amplifier of increasing displacement, was attached to the vibration cutting device for machining efficiency. The behaviors of flexure hinge were modeled with Lagrange equation and simulated with finite element method (FEM). Performance of hinge structure was verified by experimental modal analysis (EMA) for hinge structure to be tuned to the specific mode of vibrations. Cutting experiments of multi-layer elements were conducted with the proposed vibrating cutting module, and the characteristics was analyzed.

Effect of Saw-Damage Etching Conditions on Flexural Strength in Si Wafers for Silicon Solar Cells (태양전지용 실리콘 기판의 절삭손상 식각 조건에 의한 곡강도 변화)

  • Kang, Byung-Jun;Park, Sung-Eun;Lee, Seung-Hun;Kim, Hyun-Ho;Shin, Bong-Gul;Kwon, Soon-Woo;Byeon, Jai-Won;Yoon, Se-Wang;Kim, Dong-Hwan
    • Korean Journal of Materials Research
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    • v.20 no.11
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    • pp.617-622
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    • 2010
  • We have studied methods to save Si source during the fabrication process of crystalline Si solar cells. One way is to use a thin silicon wafer substrate. As the thickness of the wafers is reduced, mechanical fractures of the substrate increase with the mechanical handling of the thin wafers. It is expected that the mechanical fractures lead to a dropping of yield in the solar cell process. In this study, the mechanical properties of 220-micrometer-solar grade Cz p-type monocrystalline Si wafers were investigated by varying saw-damage etching conditions in order to improve the flexural strength of ultra-thin monocrystalline Si solar cells. Potassium hydroxide (KOH) solution and tetramethyl ammonium hydroxide (TMAH) solution were used as etching solutions. Etching processes were operated with a varying of the ratio of KOH and TMAH solutions in different temperature conditions. After saw-damage etching, wafers were cleaned with a modified RCA cleaning method for ten minutes. Each sample was divided into 42 pieces using an automatic dicing saw machine. The surface morphologies were investigated by scanning electron microscopy and 3D optical microscopy. The thickness distribution was measured by micrometer. The strength distribution was measured with a 4-point-bending tester. As a result, TMAH solution at $90^{\circ}C$ showed the best performance for flexural strength.