• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.246-246
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• 2012

Smart catalyst design though novel catalyst preparation methods can improve catalytic activity of transition metals on reducible oxide supports such as titania by enhancement of metal oxide interface effects. In this work, we investigated Pt nanoparticles/titania catalysts under CO oxidation reaction by using novel preparation methods in order to enhance its catalytic activity by optimizing metal oxide interface. Arc plasma deposition (APD) and metal impregnation techniques are employed to achieve Pt metal deposition on titania supports which are prepared by multi-target sputtering and Sol-gel techniques. In order to tailor metal-support interface for catalytic CO oxidation reaction, Pt nanoparticles and thin films are deposited in varying surface coverages on sputtered titania films using APD. To assess the role of oxide support at the interface, APD-Pt is deposited on sputtered and Sol-gel prepared titania films. Lastly, characteristics of APD-Pt process are compared with Pt impregnation technique. Our results show that activity of Pt nanoparticles is improved when supported over Sol-Gel prepared titania than sputtered titania film. It is suggested that this enhanced activity can be partly ascribed to a very rough titania surface with the higher free metal surface area and higher number of sites at the interface between the metal and the support. Also, APD-Pt shows superior catalytic activity under CO oxidation as compared to Pt impregnation on sputtered titania support. XPS results show that bulk oxide is formed on Pt when deposited through impregnation and has higher proportion of oxidized Pt in the form of $Pt^{2+/4+}$ oxidation states than Pt metal. APD-Pt shows, however, mild oxidation with large proportion of active Pt metal. APD-Pt also shows trend of increasing CO oxidation activity with number of shots. The activity continues to increase with surface coverage beyond 100%, thus suggesting a very rough and porous Pt films with higher active surface metal sites due to an increased surface area available for the reactant CO and $O_2$ molecules. The results suggest a novel approach for systematic investigation into metal oxide interface by rational catalysts design which can be extended to other metal-support systems in the future.

• Transactions on Electrical and Electronic Materials
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• 제10권5호
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• pp.147-151
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• 2009

For integrated passive device (IPD) applications, we have successfully developed and characterized metalinsulator-metal (MIM) capacitors with 2000 $\AA$ plasma-enhanced chemical vapor deposition (PECVD) silicon nitride which are deposited with the $SiH_4/NH_3$ gas mixing rate, working pressure, and RF power of PECVD at $250^{\circ}C$. Five PECVD process parameters are designed to lower the refractive index and lower the deposition rate of $Si_3N_4$ films for the high breakdown electric field. For the PECVD process condition of gas mixing rate (0.957), working pressure (0.9 Torr), and RF power (60 W), the atomic force microscopy (AFM) root mean square (RMS) value of about 2000 $\AA$ $Si_3N_4$ on the bottom metal is lowest at 0.862 nm and the breakdown electric field is highest at about 8.0 MV/cm with a capacitance density of 326.5 pF/$mm^2$. A pretreatment of metal electrodes is proposed, which can reduce the peeling of nitride in the harsh test environment of heat, pressure, and humidity.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.9-10
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• 2007

In this paper, Thin films of $HfO_2$/Hf were deposited on p-type wafer by Atomic Layer Deposition(ALD). And we studied the electrical characterization of $HfO_2$/Hf/Si MOS capacitor depending on thickness of Hf metal layer. $HfO_2$ films were deposited using TEMAH and $O_3\;at\;350^{\circ}C$. Samples were then annealed using furnace heating to $500^{\circ}C$. The MOS capacitor of round-type was fabricated on Si substrates. Through TEM(Transmission Electron Microscope), XRD(X-ray Diffraction), capacitance-voltage(C-V) and current-voltage(I-V) analysis, the role of thin Hf metal layer for the better $HfO_2$/Si interface property was investigated.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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• pp.655-656
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• 2005

In the future, plastic based system will play a crucial role in modem life, for examples, transparent display or disposable electronics and so on. In this paper, we introduced a new method to fabricate the metal line on the plastic substrate. Metal lines were fabricated by hot embossing and CMP process on PMMA (polymethylmethacrylate) substrates. A Si mold was made by wet etching process and a PMMA wafer was cut off from I mm thick PMMA sheet. A 100 nm thick Al was deposited on PMMA wafers. The Al deposited PMMA wafer and the Si mold carefully sandwiched which was directly imprinted by hot embossing. After imprinting process, a residual Al layer was removed by CMP process. Finally, we found the entire process may be very useful to fabricate the metal line on plastic substrates.

• 융복합기술연구소 논문집
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• 제5권2호
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• pp.21-25
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• 2015

This paper proposes a fabrication process of deposited layer with micro patterns that uses a combination of a pulsed laser beam machining and an electrodeposition. This process consists of the electrodeposition and the laser beam machining. The deposited layer on metal can be selectively eliminated by laser ablation. As a result, the deposited layer with micro patterns can be fabricated without a mask. The characteristics of the deposited layer on stainless steel were investigated according to the average power and marking speed in the pulsed laser beam machining. The optimal laser beam conditions for precise micro patterning of the deposited layer were determined. Finally, the deposited copper layer with micro text was successfully fabricated by the pulsed laser beam machining.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1998년도 춘계학술대회 논문집
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• pp.387-390
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• 1998

New Ag-deposited graphite anodes were developed using wet chemical reduction methods for depositing Ag metal onto graphite particles. In this paper, we investigated X-ray diffraction pattern and charge-discharge behavior for Ag-deposited graphite anode. The Lithium ion cello using Ag-deposited graphite anode showed a high average discharge voltage of 3.6∼3.W and a excellent cycle ability than that of conventional graphite. Little capacity loss in this battery may be due to the highly durable Ag-deposited graphite anodes.

• 한국전기전자재료학회논문지
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• 제11권9호
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• pp.727-732
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• 1998

Ag-deposited graphite powder was prepared by a chemical reduction method of metal particles onto graphite powder. X-ray diffraction observation of Ag-deposited graphite powder revealed that silver existed in a metallic state, but not in an oxidized one. From SEM measurement, ultrafine silver particles were highly dispersed on the surface of graphite particles. Cylindrical lithium ion secondary battery was manufactured using Ag-deposited graphite anodes and $LiCoO_2$ cathodes. The cycleability of lithium ion secondary battery using Ag-deposited graphite anodes was superior to that of original graphite powder. The improved cycleability may be due to both the reduction of electric resistance between electrodes and the highly durable Ag-graphite anode.

• 공업화학
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• 제17권2호
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• pp.194-200
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• 2006

금속 산화막 공정에 응용하기 위하여 노즐형태 HCP (hollow cathode plasma) RT-MOCVD에 의해 티타늄 산화막을 증착하였다. TTNB (titanium n-butoxide)를 사용하였을 경우 막을 증착한 후 열처리하여야 하지만 titanium ethoxide에 의해 막을 증착하면 일반적으로 수반되는 열처리 공정을 생략하여도 티타늄 산화막이 직접적으로 형성되었다. RF-power 240 watt, 전극과 기판과의 거리가 3 cm, 반응시간 20 min, Ar와 $O_2$의 유량비 1 : 1에서 티타늄과 산소의 조성비가 1 : 2임을 확인할 수 있었다. 따라서 노즐형태 HCP RT-MOCVD에 의해 티타늄 산화막을 열처리 공정 없이 증착되었으며, 저온에서 다양한 금속 산화막 증착 공정에 응용할 수 있었다.

• 전기화학회지
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• 제16권4호
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• pp.211-216
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• 2013

At Pt(111), Pt(100), Pt, and Rh interfaces, the Frumkin adsorption isotherm of underpotentially deposited hydrogen (UPD H) and related electrode kinetic data are determined using the standard Gibbs energy of adsorption. The Temkin adsorption isotherm of UPD H correlating with the Frumkin adsorption isotherm of UPD H is readily determined using the correlation constants between the Temkin and Frumkin or Langmuir adsorption isotherms. At the Pt(111), Pt(100), Pt, and Rh interfaces, the lateral repulsive interaction between the UPD H species is interpreted using the interaction parameter for the Frumkin adsorption isotherm. The lateral repulsive interaction between the UPD H species at the Pt(111), Pt(100), Pt, and Rh interfaces is significantly different from the lateral attractive interaction between the overpotentially deposited hydrogen (OPD H) species at Pt, Ir, and Pt-Ir alloy interfaces.

• 한국산업보건학회지
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• 제30권1호
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• pp.10-17
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• 2020

Objectives: This study was performed to evaluate the total dust, size-selective dust, and heavy metal concentrations generated inside and outside toll booths on an expressway and to identify the source through analysis of the components of the deposited dust. Methods: A total of 32 samples were collected from eight expressway toll booths. Each total dust sample was collected using a 37 mm PVC filter attached to a personal air sampler. Heavy metal samples were collected according to NIOSH method 7300. The size-selective dust concentrations were identified using a DustMate, and deposited dust was analyzed by WD-XRF and UHR-FE-SEM. Results: The geometric mean concentrations of the total dust inside and outside the toll booths were 337.5 ㎍/㎥ and 342.7 ㎍/㎥, respectively. The overall concentrations of TSP, PM₁₀, PM_2.5, and PM1 were higher on the outside of the toll booths, as the particle size of dust was larger, and higher in the underground passage as the dust size was smaller. The real-time analysis of the dust concentrations of TSP, PM₁₀, PM_2.5, and PM1 revealed to be higher at morning and evening times than other times because of heavy traffic. The element components of deposited dust in the toll booth were related to natural sources rather than artificial sources. Among the chemical components in the deposited dust analyzed by WD-XRF, SiO₂ was the highest. For the elements analyzed by UHR-FE-SEM, C was the highest, followed by O, and Si. Conclusions: In order to reduce the dust concentrations around toll booths on an expressway, it is necessary to periodically clean surrounding areas such as underground passages, and it is also necessary to remove deposited dust inside the toll booth from time to time.