• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 춘계학술대회 논문집
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• pp.91-94
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• 1997

$\alpha$-sexithienyl($\alpha$-6T) thin films were deposited by Organic Molecular Beam Deposition(OMBD) technique, where the $\alpha$-6T was synthesized and purified by the sublimation method. The thin films of the $\alpha$-6T were deposited under various deposition conditions. The effects of deposition rate, substrate temperature. and vacuum pressure an the formation of these films have been studied. The molecular orientations of $\alpha$-6T films were investigated with the polarized electronic absorption spectroscopy. The molecules in the $\alpha$-6T film deposited at a low deposition rate under a high vacuum were aligned almost perpendicular to the substrate. The film deposited at an elevated substrate temperature (~9 $O^{\circ}C$) showed higher conductivity than the film deposited at room temperature.

• Journal of Electrical Engineering and Technology
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• 제1권1호
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• pp.98-100
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• 2006

ZnO thin films were deposited at different repetition rates of 5 Hz and 10 Hz by pulsed laser deposition. X-ray diffraction (XRD) full widths at half maximum (FWHMs) of (002) ZnO peak in ZnO thin film deposited at 5 Hz and 10 Hz was 0.22 and $0.26^{\circ}$, respectively. The grain size of ZnO thin film deposited at 5 Hz was larger than that of 10 Hz. The variation of repetition rates did not have an effect on the optical property of ZnO thin films. The degradation of the crystalline quality and surface morphology in ZnO thin film deposited at 10 Hz resulted from supersaturation effect by decrease of time interval between a ZnO particle arriving on a substrate by laser shot and a ZnO particle arriving on a substrate by next laser shot.

• 한국세라믹학회지
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• 제23권4호
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• pp.55-61
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• 1986

Phosphosilicate glass(PSG) films have been used as fusable deposited dielectrics in silicon gate MOS integrated circuits. But in this experiment BPSG(borophosphosilicate glass) will be optimized for more efficient utilization of the reactants. The BPSG films were deposited on silicon wafers by the oxidation of the hydrides at 430$^{\circ}$C in conventional atmospheric-pressure chemical-vapor-deposition (CVD) systems. Physical and chemical properties of CVD BPSG films have been characterized both for as-deposited and for fused films The. relationship between deposited BPSG film composition and infra-red absorption solution etch rate and fusion temperature is discussed and examples of BPSG composition that can be fused at 900~95$0^{\circ}C$ and 800~85$0^{\circ}C$ are given. In addition to having lower fusion temperature than PSG films BPSG films have lower as-deposited intrinsic tensile stress and low aqueous chemical etch rate they have been considered for applications where these characteristics are advantageous.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.1568-1570
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• 2009

Nanocrystalline silicon thin films were deposited using an internal-type inductively coupled plasma-chemical vapor deposition at room temperature by varying the bias power to the substrate and the structural characteristics of the deposited thin film were investigated. The result showed that the crystalline volume fraction was decreased with the increase of bias power. At the low bias power range of 0~60 W, the compress stress in the deposited thin film was in the range of -34 ~ -77 Mpa which is generally lower than the residual stress observed for the nanocrystalline silicon thin films deposited by capacitively coupled plasma.

• Journal of Korean Vacuum Science & Technology
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• 제2권2호
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• pp.92-96
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• 1998

Ferroelectric Bi-layered oxides SrBi2Ta2O9 (SBT) thin films have been deposited on Pt/Ti/SiO2/Si substrates using multi-target sputtering. Structure, composition, and electrical properties have been investigated on films. The SBT films were deposited with the various bismuth sputtering powers. The SBT films deposited with the bismuth sputtering power of 20 W have the most dense microstructure and the remanent polarization (Pr) of 9.2 ${\mu}$C/cm and the coercive field (Ec) of 43.8 kV/cm at an applied voltage of 5V. The SBT films deposited with the bismuth sputtering power of 20W showed a fatigue-free characteristics up to 1.0${\times}$1010 cycles under 5V bipolar pulse and a leakage current density of 2.0${\times}$10-8 A/$\textrm{cm}^2$ at 200 kV/cm.

• 한국표면공학회지
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• 제29권3호
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• pp.157-162
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• 1996

The effects of microstructural change on the adhesion strength between Cu/Cr film and polyimide have been studied. Cr films (50 nm thick) and Cu films (500 or 1000 nm thick) were deposited on polyimide by DC magnetron sputtering. During Cu deposition the Ar pressure was 5 or 100 mtorr. The microstructure was observed by SEM and the adhesion was measured by T-peel test. Plastic deformation of peeled metal strips was characterized quantitatively by using XRD technique. The film in which Cu is deposited at 100 mtorr has higher adhesion strength than the film in which Cu is deposited at 5 mtorr. And in the film with same deposition pressure of 100 mtorr, the adhesion strength is increased as the deposited thickness increases from 500 to 1000 nm. The adhesion change of Cu/Cr can be interpreted as the difference in plastic deformation.

• 한국환경과학회지
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• 제30권3호
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• pp.279-287
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• 2021

In this study, the composition and morphology of deposited dust particles with size ranging from a few to tens ㎛ were investigated using SEM/EDX (scanning electron microscopy with energy dispersive x-ray spectrometer). Then deposited dust particles were classified into 8 groups: quartz, aluminosilicates, ca-rich, Fe/Ti oxide, carbon-rich, industrial particle, Fe-rich, and biogenic particle. The sources of deposited dust were high in the order of aluminosilicates 41% > biogenic 18% > Fe-rich 11% > quartz and C-rich 8% > industrial 7% > Fe/Ti oxide 5% > Ca-rich 1%. In particular, the ratio of biogenic particles was relatively high due to influence of pollen. The ratio of carbon-rich was 11% at YM site, 10% at MD site, and 4% at MO site, and the site close to the large emission source was high.

• 한국재료학회지
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• 제12권8호
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• pp.661-668
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• 2002

A study was made to examine the electrical, compositional, structural and morphological properties of Ag thin films deposited by DC magnetron sputtering in $O_2$ atmosphere with deposition temperature from room temperature to 15$0^{\circ}C$ using in-line sputter system. The Ag films deposited at temperature above $100^{\circ}C$ in oxygen atmosphere gave a similar specific resistivity to and even lower oxygen content than those deposited using pure Ar sputter gas The Ag films deposited with pure Ar gas was mainly composed of crystallites with [111] preferred orientation, while, for those deposited in oxygen atmosphere, more than 50% of the volume was composed of crystallites with [100] orientation. The difference in the micro structure did not cause any difference in the specific resistivity of Ag films. The results showed that the transparent conducting oxide films and the Ag films could be processed sequentially in the same deposition chamber with careful control of deposition temperature, which might result in a cost reduction for constructing the large scale in-line deposition system.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1988년도 춘계학술대회 논문집
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• pp.27-30
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• 1988

This paper is investigated on the sublimation in obliguely deposited a-$Se_{75}Ge_{25}$ films. With varying the treatment conditions, the transmittance in each of $0^{\circ}$, $60^{\circ}$, and $80^{\circ}$-deposited films and the absorbance in $80^{\circ}$-deposited film were measured. By increasing the angle of deposition, the variation of transmittance in post-exposure annealing film showed the characteristic different from that in only exposed film or annealed film. And the changes of thickness in $80^{\circ}$-deposited film were measured. The results showed that the changing rate of thickness was 1.4% in exposed film and 9.4% in post-exposure annealing film. Therefore, in $80^{\circ}$-deposited film, the possibility for sublimatin due to physical and chemical change by post-exposure annealing can be suggested.

• 대한화장품학회지
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• 제22권2호
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• pp.52-69
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• 1996

Nano-Sized TiO$_2$ particles with diameter between 2 and 5 nm are synthesized in Water/Triton X-100/n-Hexane microemulsion. Particles show the amorphous structure and partially hydroxide form. The optical absorbance of particles appears at 250nm and band edge at 340nm. Gold metal is deposited on the surface of TiO$_2$ particles by reduction reaction of Au(III) ion with sodium hypophosphite. The size of gold-deposited particles is 20nm, and the optical absorbance appears at 270nm and at 550nm. So particles show the red color. The dense precipitation is formed by aggregation in the TiO$_2$ nano-sized particles of about 5nm size. But the bulky precipitation is formed by agglomeration phenomena in the gold-deposited particles of 20nm size. And also gold-deposited particles is easily dispersed by being re-dispersed in PEG/Water solution. This study has compared those things measuring the SPF characteristics of the cosmetics made of the synthesized particles. If the particle size is controlled appropriately, then the SPF value will be higher, or more colorless cosmetics will be made.