• 제목/요약/키워드: Density variation rate

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The Effect of Some Physical Parameters on Saturation and Velocity Profiles in a Porous Medium

  • Ghyym S. H.
    • 한국전산유체공학회:학술대회논문집
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    • 한국전산유체공학회 1997년도 추계 학술대회논문집
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    • pp.120-125
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    • 1997
  • In the present work the influence of various physical parameters on the two-phase flow behavior in a self-heated porous medium has been studied using a numerical model, that is, the effects of heat generation rate, of porosity, of particle size, and of system pressure on the dryout process. To analyze the effect of these parameters, the variation of both liquid volumetric fraction (i.e., liquid saturation) and liquid axial velocity is evaluated at the steady state or at the onset of a first boiled-out region. The analysis of computational results indicate that a qualitative tendency exists between the parameters such as heat generation rate, porosity, effective particle diameter and the temporal development of the liquid volumetric fraction field up to dryout. In addition to these parameters, a variation of fluid properties such as phase density, phase viscosity due to a change of system pressure can be used for gaining insight into the nature of two-phase flow behavior up to dryout.

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Comparative study of microstructure and mechanical properties for films with various deposition rate by magnetron sputtering

  • Nam, Kyung H.;Jung, Yun M.;Han, Jeon G.
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2000년도 추계학술발표회 초록집
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    • pp.12-12
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    • 2000
  • This paper investigated the effect of the film deposition rate for $CrN_x$ microstructure and mechanical properties. For these purpose, pure Cr an stoichiometric CrN films were deposited with various target power density on Si hardened M2 tool steel. The variation of ni trogen concentration in $CrN_x$ f analyzed by AES and deposition rate was calculated by measuring of thickness using ${\alpha}-step$ profilometer. The microstructure was analyzed by X-Ray Diffract and Scanning Electron Microscopy(SEM), and mechanical properties were evalua residual stress, microhardness and adhesion tests. Deposition rate of Cr and CrN increased as an almost linear function of target power density from $0.25\mu\textrm{m}/min$ and $0.15\mu\textrm{m}/min$ to $0.43\mu\textrm{m}/min$. Residual stresses of Cr and CrN films were from tensi Ie to compressive stress with an increase of deposi tion rate a compressive stresses were increased as more augmentation of deposition r maximum hardness value of $2300kg/\textrm{mm}^2$ and the best adhesion strength correspond HF 1 were obtained for CrN film synthesized at the highest target densitY($13.2W/\textrm{mm}^2$) owing to high residual compressive stress and increasing mobility.

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3D패키지용 Via 구리충전 시 전류밀도와 유기첨가제의 영향 (Effects of Current Density and Organic Additives on via Copper Electroplating for 3D Packaging)

  • 최은혜;이연승;나사균
    • 한국재료학회지
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    • 제22권7호
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    • pp.374-378
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    • 2012
  • In an effort to overcome the problems which arise when fabricating high-aspect-ratio TSV(through silicon via), we performed experiments involving the void-free Cu filling of a TSV(10~20 ${\mu}m$ in diameter with an aspect ratio of 5~7) by controlling the plating DC current density and the additive SPS concentration. Initially, the copper deposit growth mode in and around the trench and the TSV was estimated by the change in the plating DC current density. According to the variation of the plating current density, the deposition rate during Cu electroplating differed at the top and the bottom of the trench. Specifically, at a current density 2.5 mA/$cm^2$, the deposition rate in the corner of the trench was lower than that at the top and on the bottom sides. From this result, we confirmed that a plating current density 2.5 mA/$cm^2$ is very useful for void-free Cu filling of a TSV. In order to reduce the plating time, we attempted TSV Cu filling by controlling the accelerator SPS concentration at a plating current density of 2.5 mA/$cm^2$. A TSV with a diameter 10 ${\mu}m$ and an aspect ratio of 7 was filled completely with Cu plating material in 90 min at a current density 2.5 mA/$cm^2$ with an addition of SPS at 50 mg/L. Finally, we found that TSV can be filled rapidly with plated Cu without voids by controlling the SPS concentration at the optimized plating current density.

대도시와 농어촌에서 치과의료기관 의료수익 분포의 지역 간 차이 : 경쟁 지표에 대한 실증적 검증 (Regional difference between the distributions of dental revenues in metropolitan areas and rural areas: Empirical validation of the competition index)

  • 최형길
    • 대한치과의사협회지
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    • 제54권12호
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    • pp.971-984
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    • 2016
  • The increase rate of dentists' competition is very fast at metropolitan areas in South Korea. We compare metropolitan and rural parameters to investigate the relation between competition and revenue variation. The competition and revenue variables of 73 metropolitan and 75 rural areas were calculated from 2010 Census of Service Industry microdata which include non-insurance revenues of dental clinics. Independent sample t-test results showed that the level of competition among dental clinics in metropolitan areas is higher. The lowest and the low ranked revenues are higher in rural areas. The highest and the average revenues are higher in metropolitan areas. But, 25 percentile and median revenues has no significant difference between two areas. Simple log linear regression results showed that the number of clinics could explain the distribution of revenues in both areas better than the density of active dentists and Herfindahl-Hirschman index. In the areas with many clinics have high maximum and average revenues and low minimum revenues. The increasing rate of maximum revenues is higher in metropolitan areas though the decreasing rate of minimum revenues is higher in rural areas. Metropolitan areas have higher Gini coefficients than rural areas, but the increasing rate of Gini coefficients is lower than rural areas. Findings from this study are useful reference when the dentists select the opening areas. One is that the median revenues between metropolitan and rural areas have no significant difference. The other is that the rural areas ensure the more stable and uniform revenues. The results would help to relieve the consumptive competition among dentists and to achieve the distributional efficiency of dental human resources.

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PE/$N_2O$ 하이브리드 로켓에서의 산화제 상 변화에 따른 연소특성 연구 (A Study on Combustion Characteristic with the Variation of Oxidizer phase in Hybrid Rocket Motor using PE/$N_2O$)

  • 이정표;김기훈;김수종;김학철;문희장;성홍계;김진곤
    • 한국추진공학회지
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    • 제14권2호
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    • pp.46-53
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    • 2010
  • 본 연구에서는 하이브리드 추진 연소에서 산화제의 상(Phase)에 따른 연소특성 변화를 연구하였다. 산화제는 $GN_2O$$LN_2O$를 사용하고 고체연료는 HDPE(High Density PolyEthlene)를 적용하여 연소실험을 수행하였고, 상에 따른 고체연료의 후퇴율과 압력선도, 연소효율의 변화 등을 조사하였다. $LN_2O$를 적용할 경우 액체 산화제의 기화에 필요한 잠열이 화염에서 발생되는 연소에너지에 비해 무시할 정도로 작아 $GN_2O$를 산화제로 사용했을 때의 고체연료 후퇴율과는 큰 차이가 없었지만, 추진 성능효율이 낮아짐을 확인하였고, 액체 산화제의 유량이 증가할수록 산화제의 기화에 필요한 열전달 증가로 인 해 연소 불안정성이 커짐을 확인하였다.

남부지방에 있어서 수도수량구성요소 및 수량해석 제 3 보 재식밀도에 따른 주요형질 및 수량의 변이 (Analytical Studies on the Rice Yield Components and Yield in South Region of Korea III. Variation in the Rice Yield Component and Yield under the Different Planting Density)

  • 김용재
    • 한국작물학회지
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    • 제31권1호
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    • pp.104-111
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    • 1986
  • 남부 난지 다모작지대의 도작 증수재배의 기초자료를 얻고자 재식밀도를 3.3$m^2$당 50, 70, 90, 110주로 하고 이앙시기를 5월 20일부터 7월 5일까지 15일 간격, 4시기로 하여 수량형질의 변이 및 수량을 검토한 결과를 요약하면 다음과 같다. 1. 줄기의 중기는 밀식보다 소식에서 컸고 이앙기가 빠를수록 가늘었다. 2. 이앙기 이동에 따른 적정 재식밀도는 서광벼의 경우 5월 20일 및 6월 5일 이앙구에서는 3.3$m^2$당 90주였으며 만식구인 6월 20일 및 7월 5일 이앙에서는 110주였고 동진벼는 5월 20일, 6월 5일, 6월 20일 이앙까지 90주였으며 7월 5일 이앙에서는 110주였다. 3. 등숙율은 재식밀도증가에 따른 변이가 크지 않았으나 다만 만식에서 그 효과가 인정되었다. 4. 재식밀도에 따른 1, 2차 지경 및 영화의 퇴화는 밀식할수록 적어지며 서광벼가 동진벼보다 뚜렷한 경향을 보였다. 5. 단위면적당 수수는 재식밀도 증가에 따라 직선적인 증가현상을 보였고 이앙기의 조만에 따른 변이폭은 동진벼보다 서광벼에서 더 컸다.

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TT Mutant Homozygote of Kruppel-like Factor 5 Is a Key Factor for Increasing Basal Metabolic Rate and Resting Metabolic Rate in Korean Elementary School Children

  • Choi, Jung Ran;Kwon, In-Su;Kwon, Dae Young;Kim, Myung-Sunny;Lee, Myoungsook
    • Genomics & Informatics
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    • 제11권4호
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    • pp.263-271
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    • 2013
  • We investigated the contribution of genetic variations of KLF5 to basal metabolic rate (BMR) and resting metabolic rate (RMR) and the inhibition of obesity in Korean children. A variation of KLF5 (rs3782933) was genotyped in 62 Korean children. Using multiple linear regression analysis, we developed a model to predict BMR in children. We divided them into several groups; normal versus overweight by body mass index (BMI) and low BMR versus high BMR by BMR. There were no differences in the distributions of alleles and genotypes between each group. The genetic variation of KLF5 gene showed a significant correlation with several clinical factors, such as BMR, muscle, low-density lipoprotein cholesterol, and insulin. Children with the TT had significantly higher BMR than those with CC (p=0.030). The highest muscle was observed in the children with TT compared with CC (p=0.032). The insulin and C-peptide values were higher in children with TT than those with CC (p=0.029 vs. p=0.004, respectively). In linear regression analysis, BMI and muscle mass were correlated with BMR, whereas insulin and C-peptide were not associated with BMR. In the high-BMR group, we observed that higher muscle, fat mass, and C-peptide affect the increase of BMR in children with TT (p < 0.001, p < 0.001, and p=0.018, respectively), while Rohrer's index could explain the usual decrease in BMR (adjust $r^2$=1.000, p < 0.001, respectively). We identified a novel association between TT of KLF5 rs3782933 and BMR in Korean children. We could make better use of the variation within KLF5 in a future clinical intervention study of obesity.

질소산화물 제거를 위한 무성 방전 공정의 전기 및 NO 전환 특성 (Electrical and NO Conversion Characteristics of Dielectric Barrier Discharge Process)

  • 이용환;정재우;조무현
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제51권1호
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    • pp.15-21
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    • 2002
  • We investigated effects of electrical, physical, and chemical parameters on energy transfer, NO conversion, and light emission in the dielectric barrier discharge (DBD) process. As gap distance between electrodes increased, discharge onset voltage increased. However, as gap distance between electrodes increased, electric field which initiates discharge showed approximately the same value, 30kV/cm. The discharge onset voltage of the coarse surface electrode was lower than that of the smooth surface electrode. And, energy transfer was slightly enhanced in the coarse electrode condition. However, NO conversion rate decreased with the coarse surface electrode because more uniform discharge can be obtained on the smooth surface electrode. The NO conversion rate increased with decreasing the initial concentration, so the DBD process is more feasible in the lower concentration condition. The variation of gas residence time tested at the same energy density in the experiment did not affect on the NO conversion. The result shows that the NO conversion rate mainly depends on the energy density. The DBD process is able to adjust on plasma-photocatalyst process because it emits the short wavelength light in the range of ultraviolet. The intensity of light emission increased with the increase of the energy transfer to the reactor and the gas flow rate.

Change the Properties of Amorphous Carbon Hardmask Film Prepared with the Variation of Process Parameters in Plasma Enhanced Chemical Vapor Depostion Systems

  • Kim, Seok Hwan;Yeo, Sanghak;Yang, Jaeyoung;Park, Keunoh;Hur, Gieung;Lee, Jaeho;Lee, Jaichan
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.381.2-381.2
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    • 2014
  • In this study the amorphous carbon films were deposited by PECVD at the substrate temperature range of 250 to $600^{\circ}C$, and the process conditions of higher and lower precursor flow rate, respectively. The temperature was a main parameter to control the density and mirco-structures of carbon films, and their's properties depended with the process temperatrue are changed by controlling precursor flow rate. The precursor feeding rate affect on the plasma ion density and a deposition reactivity. This change of film properties was obtained the instrinsic stress, FT-IR & Raman analysis, refractive index (RI) and ext. coef. (k) measured by ellipsometer. In the process conditions of lower and higher flow rate of precursor it had a different intrinsic stress as a function of the substrate temperature.

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The Characteristics of Plasma Polymerized Carbon Hardmask Film Prepared by Plasma Deposition Systems with the Variation of Temperature

  • Yang, J.;Ban, W.;Kim, S.;Kim, J.;Park, K.;Hur, G.;Jung, D.;Lee, J.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.381.1-381.1
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    • 2014
  • In this study, we investigated the deposition behavior and the etch resistivity of plasma polymerized carbon hardmask (ppCHM) film with the variation of process temperature. The etch resistivity of deposited ppCHM film was analyzed by thickness measurement before and after direct contact reactive ion etching process. The physical and chemical properties of films were characterized on the Fourier transform infrared (FT-IR) spectroscope, Raman spectroscope, stress gauge, and ellipsometry. The deposition behavior of ppCHM process with the variation of temperature was correlated refractive index (n), extinction coefficient (k), intrinsic stress (MPa), and deposition rate (A/s) with the hydrocarbon concentration, graphite (G) and disordered (D) peak by analyzing the Raman and FT-IR spectrum. From this experiment we knew an optimal deposition condition for structure of carbon hardmask with the higher etch selectivity to oxide. It was shown the density of ppCHM film had 1.6~1.9 g/cm3 and its refractive index was 1.8~1.9 at process temperature, $300{\sim}600^{\circ}C$. The etch selectivity of ppCHM film was shown about 1:4~1:8 to undoped siliconoxide (USG) film (etch rate, 1300 A/min).

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