Effects of $H_2$ vs. $O_2$ Plasma Pretreatment of Gate Oxide on the Degradation Phenomenon of Low-Temperature Polysilicon Thin-Film Transistors
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- 한국정보디스플레이학회:학술대회논문집
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- 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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- pp.1254-1257
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- 2004