• Journal of Biosystems Engineering
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• v.26 no.2
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• pp.163-168
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• 2001

A manipulator for test-cup attachment modules, which was a part of a robot milking system, was developed to reduce cost and labor for cow milking processing. A Cartesian coordinate manipulator was designed for the milking process, because it was quite flexible and can be constructed more economically than any other configuration. The manipulator was made use of DC motors, screws for power transmission, a RS422 interface system for the transmission of coordinate values and a one-chip microprocessor, 89C52. Performance tests of the manipulator were conducted to measure experimentally the precision of all axes. Some of the results are as follows. 1. The Cartesian coordinate manipulator was designed and built. Dimension of the three perpendicular axes (X, Y, and Z) and one arm’s axis(W) to pick up and transfer the modules were 700㎜$\times$450㎜$\times$550㎜$\times$650㎜. The arm’s axis moved the teat-cup attachment module, which attached four teat-cup to four teats, detached four teat-cup from four teats, was designed and manufactured by using CAD, CAM and CNC. 3. After 10 replications of exercising the manipulator, mean precision values(positioning error) of X, Y, Z axes wee 0.48㎜, 0.20㎜, 0.19㎜, respectively. Therefore, we conclude the axes to have a precision better than 0.5㎜, had no problem to operate correctly the milking manipulator.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.25 no.2
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• pp.147-152
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• 2012

This paper dealt with the frequency component analysis of acoustic signals produced by corona and series-arc discharges as a diagnostic technique for closed-switchboards. Corona and series-arc discharge were simulated by a needle-plane electrode and an arc generator specified in UL1699, respectively. Acoustic signal was detected by a wideband acoustic sensor with a frequency bandwidth of 4 Hz~100 kHz (-3 dB). We analyzed frequency spectrums of the acoustic signals detected in various discharge conditions. The results showed that acoustic signals mainly exist in ranges from 30 kHz to 60 kHz. From the experimental results, an acoustic detection system which consists of a constant current power supply (CCP), a low noise amplifier (LNA) and a band pass filter was designed and fabricated. The CCP separates the signal component from the DC source of acoustic sensor, and the LNA has a gain of 40 dB in ranges of 280 Hz~320 kHz. The high and the low cut-off frequency are 30 kHz and 60 kHz, respectively. We could detect corona and series-arc discharges without any interference by the acoustic detection system, and the best frequency is considered in ranges of 30 kHz~60 kHz.

• Journal of IKEEE
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• v.18 no.1
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• pp.119-127
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• 2014

This paper presents a CMOS readout circuit for MEMS(Micro Electro Mechanical System) acceleration sensors. It consists of a MEMS accelerometer, a capacitance to voltage converter(CVC) and a second-order switched-capacitor ${\Sigma}{\Delta}$ modulator. Correlated-double-sampling(CDS) and chopper-stabilization(CHS) techniques are used in the CVC and ${\Sigma}{\Delta}$ modulator to reduce the low-frequency noise and DC offset. The sensitivity of the designed CVC is 150mV/g and its non-linearity is 0.15%. The duty cycle of the designed ${\Sigma}{\Delta}$ modulator output increases about 10% when the input voltage amplitude increases by 100mV, and the modulator's non-linearity is 0.45%. The total sensitivity is 150mV/g and the power consumption is 5.6mW. The proposed circuit is designed in a 0.35um CMOS process with a supply voltage of 3.3V and a operating frequency of 2MHz. The size of the designed chip including PADs is $0.96mm{\times}0.85mm$.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.333-333
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• 2011

We have investigated the breakdown properties in liquids by high voltage pulse system. High voltage pulse power system is consisted of the Marx-generator with two capacitors (0.5 ${\mu}F$, withstanding voltage is 40 kV), to which the charging voltage can be applied to maximum 30 kV DC, spark gap switch and charging resistor of 20 $M{\Omega}$. We have made use of tungsten pin electrodes of anode-cathode (A-K), which are immersed into the liquids. The breakdown voltage and current signals are measured by high voltage probe (Tektronix P6015A) and current monitor (IPC CM-1.S). Especially the high speed breakdown or plasma propagation characteristics in the pulsed A-K gap have been investigated by using the high speed ICCD camera. We have measured the electron temperature through the Boltzmann plot method from the breakdown spectrums. Here the A-K gap has been changed by 1 mm, 2 mm, and 3 mm. The used liquids are distilled water and solution of salt (0.9 %). The output voltage and current signals at breakdown in distilled water are shown to be bigger than those in saline solution. The breakdown voltage and current characteristics in liquids will be discussed in accordance with A-K gap distances. It is also found that the electron temperatures and plasma densities in liquids are decreased in conformity with A-K gap.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.380-381
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• 2007

This paper reports on the deposition conditions and properties of ITO films used as electrode layer in a organic light emitting diodes on a PET substrate. The deposition technique employed was specially designed roll-to-roll sputtering. The oxide was deposited at room temperature in an argon and oxygen plasma on a transparent conducting ITO layer on a PET film. The influence of deposition parameters such as DC power, working pressure and oxygen partial pressure has been investigated, in order to obtain the best compromise between a high deposition rate and adequate electro-optical properties. Electrical and optical properties of ITO films were analyzed by Hall measurement examinations with van der pauw geometry at room temperature and UV/Vis spectrometer analysis, respectively. In addition, the structural properties and surface smoothness were measured by x-ray diffraction and scaning electron microscopy, respectively. From optimized ITO films grown by roll-to-roll sputter system, good electrical$(6.44{\times}10^{-4}\;{\Omega}-cm)$ and optical(above 86 % at 550 nm) properties were obtained. Also, the ITO films exhibited amorphous structure and very flat surface beacause of low deposition temperature.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.24 no.6
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• pp.229-236
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• 2014

A stoichiometric mixture of evaporating materials for $MnAl_2S_4$ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films, $MnAl_2S_4$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperatures were $630^{\circ}C$ and $410^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The temperature dependence of the energy band gap of the $MnAl_2S_4$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=3.7920eV-5.2729{\times}10^{-4}eV/K)T^2/(T+786 K)$. In order to explore the applicability as a photoconductive cell, we measured the sensitivity (${\gamma}$), the ratio of photocurrent to dark current (pc/dc), maximum allowable power dissipation (MAPD) and response time. The results indicated that the photoconductive characteristic were the best for the samples annealed in S vapour compare with in Mn, Al, air and vacuum vapour. Then we obtained the sensitivity of 0.93, the value of pc/dc of $1.10{\times}10^7$, the MAPD of 316 mW, and the rise and decay time of 14.8 ms and 12.1 ms, respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.252-252
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• 2016

최근 학계나 산업계에서 indium tin oxide (ITO)의 높은 전기 전도도 및 광투과율을 이용하여 줄 발열을 기초로 하는 투명 면상 발열체에 대한 연구가 활발히 진행 되고 있다. 하지만 단일 ITO 박막으로 제작한 투명 면상 발열체는 온도가 상승함에 따라 균일하게 발열 되지 않으며, 글라스의 곡면 부분에서 유연성이 부족하여 크랙이 발생하는 다양한 문제점들을 가지고 있다. 이를 해결하기 위해 ITO의 결정화 온도 $160^{\circ}C$ 이상의 고온공정 또는 증착 후 열처리가 필요 하는 추가적인 공정이 필요하다. 따라서 본 연구에서는 단일 ITO 박막의 단점을 개선하는 ITO/Ag/ITO 하이브리드 구조의 투명 면상 발열체를 제작하여 전기적, 광학적 특성을 비교하고 발열량, 온도 균일성, 발열 유지 안정도를 조사하였다. 본 연구에서는 $50{\times}50mm$ 크기의 non-alkali glass (Corning E-2000) 기판 상에 마그네트론 스퍼터링 공정으로 상온에서 ITO/Ag/ITO 박막을 연속적으로 증착 하여 다층구조의 하이브리드 형 투명 면상 발열체를 제조하였다. 박막 증착 파워는 DC (Ag) power 100 W, RF (ITO) power 200 W로 하였으며 ITO박막두께는 40 nm로 고정 시키고 Ag박막 두께는 10 ~ 20 nm로 변화를 주었다. 증착원은 3인치 ITO 단일 타깃(SnO2, 10 wt.%)과 Ag 금속 타깃 (순도 99.99%)을 사용하였으며, 고순도 Ar을 이용하여 방전하였으며 총 주입량은 20 sccm, working pressure는 1.0 Pa을 유지하였다. 증착전 타깃 표면의 불순물 제거와 방전의 안정성을 유지하기 위해 10분간 pre-sputtering을 진행하고 증착하였다. 증착한 박막의 전기적, 광학적 특성은 각각 Hall-effect measurements system (ECOPIA, HMS3000), UV-Vis spectrophotometer (UV-1800, SHIMADZU)으로 측정하였으며, 하이브리드 표면의 구조 및 형상은 field emission-scanning electron microscopy (FE-SEM, Hitachi S-4800)으로 관찰하였다. 또한 투명 면상 발열체의 성능은 0.5 ~ 3 V/cm의 다양한 전압을 power supply (Keithly 2400, USA)를 통해서 시편 양 끝단에 인가한 후 시간에 따른 투명면상 발열체의 표면 온도변화를 infrared thermal imager (IR camera, Nikon)를 이용하여 관찰하였다. 하이브리드 구조를 가진 ITO박막의 두께는 40 nm로 고정 시키고 Ag박막의 두께는 10, 15, 20 nm로 변화를 주었다. 이들 박막의 면저항 값은 각각 5.3, 3.2, $2.1{\Omega}/{\Box}$였으며, 투과도는 각각 86.9, 81.7, 66.5 %였다. 이에 비해 두께 95 nm의 단일 ITO박막의 면저항 값은 $59.5{\Omega}/{\Box}$였으며, 투과도는 89.1 %였다. 하이브리드 구조의 전기적특성은 금속층의 두께가 증가할수록 캐리어 농도 값이 증가함에 따라 비저항 값이 감소되어 면저항 값도 감소된 것이며, 금속 삽입층의 전도특성이 비저항에 큰 영향을 주고 있음을 보여준다. 하지만 금속 층의 두께가 증가할수록 Ag층이 연속적인 막을 형성하여 반사율이 증가함에 따라 투과도가 감소하였다. 따라서 하이브리드 구조를 가진 투명 면상 발열체에 금속 삽입층의 두께 조절은 매우 중요한 인자임을 확인 할 수 있었다. 또한 발열성능을 평가 하기 위해 시편 양 끝단에 3 V전압을 인가한 결과, 금속 삽입층의 두께가 10 nm에서 5 nm씩 증가한 하이브리드 구조를 가진 투명면상 발열체의 최고 온도는 각각 98, 150, $167^{\circ}C$ 였으며, 단일 ITO의 최고 온도는 $32^{\circ}C$였다. 이 것은 동일한 두께 (95 nm)의 단일 ITO 박막과 비교하여 면저항이 낮은 하이브리드 박막의 발열량은 약 $120^{\circ}C$로 발열효율이 매우 우수한 것을 확인 할 수 있었다.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.5 no.1
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• pp.89-101
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• 2001

The conventional pattern-methods for discrimination of acupoint, meridian line which is the basic object of diagnosis and medical treatment in oriental medicine is discriminated the conduction point by the stimulation in body skin with DC. But, it is not sufficient to truth in discrimination ratio, coincident ratio, body effect, reproductivity. Therefore, this paper is extracting the optimal parameter of frequency and waveform in order to improve the conventional pattern, and proposing the SPAC(Single Power Alternative Current) stimulus pattern applying that. Also, this algorithm proposes to be able to discriminate with low pressure of the electrode by displaying in the level meter both the absolution and relation value of the skin current. It is able to decrease pain and body effect by electrode pressure and discriminate acupoint regardless of skin current in difficult discrimination spot. It is compared the performance of system applying the extracted optimal parameter and algorithm, and it is confirmed that there is difference in discrimination parameter of acupoint reacted to the individual and the meridian. It is compared that discrimination, coincident ratio of the traditional acupoints as the acupoint stimulation pattern. It is confirmed truth of optimal parameter and discrimination algorithm. Keyword: Meridian, Discrimination, Coincident, Body effect, Reproductivity, SPAC, Optimal parameter.

• Journal of the Korean Society of Marine Environment & Safety
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• v.21 no.6
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• pp.759-769
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• 2015

Diode rectifiers are very popular in industry. However, they include large low-order harmonics in the input current and do not satisfy harmonic current content restrictions. To reduce the harmonics to the power system, several methods have been introduced. It is heavy and expensive solution to use passive filters as the solution for high power application. Another solution for the harmonic filter is utilization of active filter, but it is too expensive solution. Diode rectifiers with configurations using switching device have been introduced, but they are very complicated. The combined 12-pulse diode rectifier with the square auxiliary voltage supply has been introduced. It has the advantages that auxiliary circuit is simple and inexpensive compared to other strategies. The advanced auxiliary voltage supply in this thesis is presented as a new solution. When the square auxiliary voltage supply applied, the improvement of THD is 6~60[%] in whole load range. But when the advanced auxiliary voltage supply applied, it shows stable and excellent reduction effect of THD as 57~71[%]. Especially, for the case with 10[%] load factor, reduction effect of THD has little effect as 6[%] in the case of inserting a square auxiliary voltage supply. But when the proposed new solution applied, reduction effect has excellent effect as 71[%]. Theoretical analysis of the combined 12-pulse diode rectifier with the advanced auxiliary voltage supply is presented and control methods of the auxiliary supply is proposed. The reduction in the input current harmonics is verified by simulation using software PSIM.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.155.2-155.2
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• 2013

Strain-relaxed SiGe layer on Si substrate has numerous potential applications for electronic and opto- electronic devices. SiGe layer must have a high degree of strain relaxation and a low dislocation density. Conventionally, strain-relaxed SiGe on Si has been manufactured using compositionally graded buffers, in which very thick SiGe buffers of several micrometers are grown on a Si substrate with Ge composition increasing from the Si substrate to the surface. In this study, a new plasma process, i.e., the combination of PIII&D and HiPIMS, was adopted to implant Ge ions into Si wafer for direct formation of SiGe layer on Si substrate. Due to the high peak power density applied the Ge sputtering target during HiPIMS operation, a large fraction of sputtered Ge atoms is ionized. If the negative high voltage pulse applied to the sample stage in PIII&D system is synchronized with the pulsed Ge plasma, the ion implantation of Ge ions can be successfully accomplished. The PIII&D system for Ge ion implantation on Si (100) substrate was equipped with 3'-magnetron sputtering guns with Ge and Si target, which were operated with a HiPIMS pulsed-DC power supply. The sample stage with Si substrate was pulse-biased using a separate hard-tube pulser. During the implantation operation, HiPIMS pulse and substrate's negative bias pulse were synchronized at the same frequency of 50 Hz. The pulse voltage applied to the Ge sputtering target was -1200 V and the pulse width was 80 usec. While operating the Ge sputtering gun in HiPIMS mode, a pulse bias of -50 kV was applied to the Si substrate. The pulse width was 50 usec with a 30 usec delay time with respect to the HiPIMS pulse. Ge ion implantation process was performed for 30 min. to achieve approximately 20 % of Ge concentration in Si substrate. Right after Ge ion implantation, ~50 nm thick Si capping layer was deposited to prevent oxidation during subsequent RTA process at $1000^{\circ}C$ in N2 environment. The Ge-implanted Si samples were analyzed using Auger electron spectroscopy, High-resolution X-ray diffractometer, Raman spectroscopy, and Transmission electron microscopy to investigate the depth distribution, the degree of strain relaxation, and the crystalline structure, respectively. The analysis results showed that a strain-relaxed SiGe layer of ~100 nm thickness could be effectively formed on Si substrate by direct Ge ion implantation using the newly-developed PIII&D process for non-gaseous elements.