• Journal of Environmental Science International
• /
• v.28 no.5
• /
• pp.495-502
• /
• 2019

This study was conducted to investigated the possibility of inactivating wilt germs (Fusarium oxysporum f. sp. radicis lycopersici) using Dielectric Barrier Discharge (DBD) plasma in a hydroponic system. Recirculating hydroponic cultivation system for inactivation was consisted of planting port, LED lamp, water tank, and circulating pump for hydroponic and DBD plasma reactor. Two experiments were conducted: batch and intermittent continuous process. The effect of plasma treatment on Total Residual Oxidants (TRO) concentration change, Fusarium inactivation and growth of lettuce were investigated. In the batch experiment, most of the Fusarium was inactivated at a TRO concentration of 0.15 mg/L or more at four-day intervals. There was no change in lettuce growth after two times of plasma treatment for one week. The intermittent continuous experiment consisted of 30-minute, 60-minute, and 90-minute plasma treatment in 2 day intervals and 30-minute treatment a one-day; most of the Fusarium was inactivated only by treatment for 30-minute every two days. However, if inactivation under $10^1CFU/mL$ is required, it will be necessary to treat for 60 minutes in 2 day intervals. The plasma treatment caused no damage to the lettuce, except the 30 min plasma treatment ay the one-day interval. It was considered that the residual TRO concentration was higher than that of the other treatments.

• Journal of the Semiconductor & Display Technology
• /
• v.8 no.2
• /
• pp.15-21
• /
• 2009

Atmospheric pressure plasma equipment was successfully applied to the flip chip BGA manufacturing process to improve the uniformity of flux printing process. The problem was characterized as shrinkage of the printed flux layer due to insufficient surface energy of the flip chip BGA substrate. To improve the hydrophilic characteristics of the flip chip BGA substrate, remote DBD type atmospheric pressure plasma equipment was developed and adapted to the flux print process. The equipment enhanced the surface energy of the substrate to reasonable level and made the flux be distributed over the entire flip chip BGA substrate uniformly. This research was the first adaptation of the atmospheric pressure plasma equipment to the flip chip BGA manufacturing process and a lot of possible applications are supposed to be extended to other PCB manufacturing processes such as organic cleaning, etc.

• Proceedings of the Korea Air Pollution Research Association Conference
• /
• 2000.11a
• /
• pp.415-416
• /
• 2000

플라즈마 화학공정을 이용한 유해대기오염물질(HAP$_{s}$ 또는 VOC$_{s}$ ) 처리기술은 기존의 촉매연소, 소각 및 흡착기술등에 비하여 낮은 초기 투자비, 여러가스의 동시처리, 소형화 또는 이동 배출원에 대한 적용이 가능하며, 대상가스의 종류나 발생량등에 따라 여러 전원(AC, Pulse, DC)을 이용한 기술개발이 가능하여 많은 연구가 진행되고 있다.$^{(1-4)}$ (중략)

• Journal of the Semiconductor & Display Technology
• /
• v.15 no.2
• /
• pp.26-31
• /
• 2016

The Townsend to glow discharge mode transition was investigated in the dielectric barrier discharge (DBD) helium plasma source which was powered by 20 kHz / $4.5 kV_{rms}$ high voltage at atmospheric pressure. The spatial profile of the electric field strength at each modes was measured by using the intensity ratio method of two helium emission lines (667.8 nm ($3^1D{\rightarrow}2^1P$) and 728.1 nm ($3^1S{\rightarrow}2^1P$)) and the Stark effect. ICCD images were analyzed with consideration for the electric field property. The Townsend discharge (TD) mode at the initial stage of breakdown has the light emission region located in the vicinity of the anode. The electric field of the light emitting region is close to the applied field in the system. Immediately, the light emitting region moves to the cathode and the discharge transits to the glow discharge (GD) mode. This mode transition can be understood with the ionization wave propagation. The electric field of the emitting region of GD near cathode is higher than that of TD near anode because of the cathode fall formation. This observation may apply to designing a DBD process system and to analysis of the process treatment results.

• Journal of the Korean Institute of Gas
• /
• v.22 no.1
• /
• pp.26-36
• /
• 2018

Conventional nickel-based catalyst processes used for dry reforming reactions have high activation temperatures and problems such as carbon deposition and metal sintering on the active sites of the catalyst surface. In this study, the characteristics of butane dry reforming reaction were investigated by using DBD plasma combined with catalytic process and compared with existing catalyst alone process. The physical and chemical properties of the catalysts were investigated using a surface area & pore size analyzer, XRD, SEM and TEM. Using $10%Ni/{\gamma}-Al_2O_3$ at $580^{\circ}C$, in the case of the catalyst+plasma process, the conversion of carbon dioxide and butane were improved by about 30% than catalyst alone process. When the catalyst+plasma process, the conversion of carbon dioxide and butane and the hydrogen production concentration are enhanced by the influence of various active species generated by the plasma. In addition, it was found that the particle size of the catalyst is decreased by the plasma in the reaction process, and the degree of dispersion of the catalyst is increased to improve the efficiency.

• Journal of Korean Society of Environmental Engineers
• /
• v.34 no.7
• /
• pp.459-466
• /
• 2012

In order to improved treatment performance of dielectric barrier discharge (DBD) plasma, plasm + UV process and gas-liquid mixing method has been investigated. This study investigated the degradation of N, N-Dimethyl-4-nitrosoaniline (RNO, indicator of the generation of OH radical). The basic DBD plasma reactor of this study consisted of a plasma reactor (consist of quartz dielectric tube, titanium discharge (inner) and ground (outer) electrode), air and power supply system. Improvement of plasma reactor was done by the combined basic plasma reactor with the UV process, adapt of gas-liquid mixer. The effect of UV power of plasma + UV process (0~10 W), gas-liquid mixing existence and type of mixer, air flow rate (1~6 L/min), range of diffuser pore size (16~$160{\mu}m$), water circulation rate (2.8~9.4 L/min) and UV power of improved plasma + UV process (0~10 W) were evaluated. The experimental results showed that RNO degradation of optimum plasma + UV process was 7.36% higher than that of the basic plasma reactor. It was observed that the RNO decomposition of gas-liquid mixing method was higher than that of the plasma + UV process. Performance for RNO degradation with gas-liquid mixing method lie in: gas-liquid mixing type > pump type > basic reactor. RNO degradation of improved reactor which is adapted gas-liquid mixer of diffuser type showed increase of 17.42% removal efficiency. The optimum air flow rate, range of diffuser pore size and water circulation rate for the RNO degradation at improved reactor system were 4 L/min, 40~$100{\mu}m$ and 6.9 L/min, respectively. Synergistic effect of gas-liquid mixing plasma + UV process was found to be insignificant.

• Journal of Environmental Science International
• /
• v.23 no.3
• /
• pp.369-378
• /
• 2014

Effect of improvement of the dielectric barrier discharge (DBD) plasma system on the inactivation performance of bacteria were investigated. The improvement of plasma reactor was performed by combination with the basic plasma reactor and UV process or combination with the basic plasma reactor and circulation system which was equipped with gas-liquid mixer. Experimental results showed that tailing effect was appeared after the exponential decrease in basic plasma reactor. There was no enhancement effect on the Ralstonia Solanacearum inactivation with combination of basic plasma process and UV process. The application of gas-liquid mixing device on the basic plasma reactor reduced inactivation time and led to complete sterilization. The effect existence of gas-liquid mixing device, voltage, air flow rate (1 ~ 5 L/min), water circulation rate (2.8 ~ 9.4 L/min) in gas-liquid mixing plasma, plasma voltage and UV power of gas-liquid mixing plasma+UV process were evaluated. The optimum air flow rate, water circulation rate, voltage of gas-liquid mixing system were 3 L/min, 3.5 L/min and 60 V, respectively. There was no enhancement effect on the Ralstonia Solanacearum inactivation with combination of gas-liquid mixing plasma and UV process.

• 한국정보디스플레이학회:학술대회논문집
• /
• 2008.10a
• /
• pp.1272-1275
• /
• 2008

We present the development of dry etch process for the liquid crystal display (LCD) fabrication using a dielectric barrier discharge (DBD) system at atmospheric pressure. In this experimental work, the dry etch characteristics and the electrical properties of thin film transistor are evaluated by using the scanning electron microscopy and electric probe, and TFT-LCD panel ($300\;mm\;{\times}\;400\;mm$) is manufactured with the application of the amorphous silicon etch step in the 4 mask and 5 mask processes.

• Journal of the Semiconductor & Display Technology
• /
• v.7 no.2
• /
• pp.35-38
• /
• 2008

This study shows the improvement of PR-Ashing rates in semi-conductor process using Atmospheric Plasma. Taguchi method is used to improve Ashing rates of photo-resist that is spread on the surface of a wafer. Improvement of Ashing rates is acquired through the decision of the effective factors and suitable combination of the factors. The results show the contribution rate of each factor and the effectiveness of Plasma for PR-Ashing process in this system.

• Journal of Environmental Health Sciences
• /
• v.38 no.3
• /
• pp.251-260
• /
• 2012

Objectives: The purpose of this study was evaluating the applicability of the circulation dielectric barrier plasma process (DBD) for efficiently treating non-biodegradable wastewater, such as phenol. Methods: The DBD plasma reactor system in this study consisted of a plasma reactor (discharge, ground electrode and quartz dielectric tube, external tube), high voltage source, air supply and reservoir. Effects of the operating parameters on the degradation of phenol and $UV_{254}$ absorbance such as first voltage (60-180 V), oxygen supply rate (0.5-3 l/min), liquid circulation rate (1.5-7 l/min), pH (3.02-11.06) and initial phenol concentration (12.5-100 mg/l) were investigated. Results: Experimental results showed that optimum first voltage, oxygen supply rate, and liquid circulation rate on phenol degradation were 160 V, 1 l/min, and 4.5 l/min, respectively. The removal efficiency of phenol increased with the increase in the initial pH of the phenol solution. To obtain a removal efficiency of phenol and COD of phenol of over 97% (initial phenol concentration, 50.0 mg/l), 15 min and 180 minutes was needed, respectively. Conclusions: It was considered that the absorbance of $UV_{254}$ for phenol degradation can be used as an indirect indicator of change in non-biodegradable organic compounds. Mineralization of the phenol solution may take a relatively longer time than that required for phenol degradation.