• Title/Summary/Keyword: Czochralski Single Crystal Growth

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GSMAC-FEM Analysis of Single-Crystal Growth by CUSP MCZ Method

  • Jung, Chung-Hyo;Takahiko Tanahashi;Yuji Ogawa
    • Journal of Mechanical Science and Technology
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    • v.15 no.12
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    • pp.1876-1881
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    • 2001
  • We present the numerical analysis of the growth of a silicon (Si) single crystal. In the MCZ (Magnetic-field-applied Czochralski) method, two magnetic fields that stand opposite to each other generate a cusp magnetic field. In this work, the three cusp magnetic fields used for the analysis are an extern magnetic field, a surface magnetic field and an internal magnetic field. Each case was evaluated mainly as to the degree of stirring, shaft symmetry and the stability of the flow. As a result, the cusp magnetic field that yielded to best conditions was the internal magneic field.

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Crystal Growth of Nd;YCOB and Fabrication of RGB Laser Device (Nd:YCOB 단결정 성장과 RGB 레이저 소자 제조)

  • 김충렬;석상일;장원권;김도진;유영문
    • Korean Journal of Crystallography
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    • v.12 no.1
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    • pp.5-9
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    • 2001
  • Nd/sub 0.05/Y/sub 0.95/Ca₄O(BO₃)₃(Nd:YCOB) single crystals were grown by the Czochralski method using a iridium crucible under N₂ atmosphere. Optimum growth parameters to get high quality of single crystals were 1.5∼2 mm/hr of growth rate and 10∼20 rpm of rotation rate. The grown crystals were transparent with light purple color and well-developed in cleavage planes. The crystal structure of Nd;YCOB were identified to monoclinic by XRD method. Crystal defects acting as light scattering centers, such as micro-pores, secondary phases, inclusions and cracks were not observed under the He-Ne laser illuminations. Three red, green, blue laser devices for the RGB laser oscillations were designed and then fabricated from the grown Nd:YCOB crystals according to the phase-matching angles of negative type-I which were φ=16.40°, 33.95° and θ=22.59° with the flatness of λ/6 at least, respectively.

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Effect of oxygen concentration and oxygen precipitation of the single crystalline wafer on solar cell efficiency (단결정 실리콘에서 산소농도에 따른 산소석출결함 변화와 태양전지 효율에 미치는 영향)

  • Lee, Song Hee;Kim, Sungtae;Oh, Byoung Jin;Cho, Yongrae;Baek, Sungsun;Yook, Youngjin
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.24 no.6
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    • pp.246-251
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    • 2014
  • Recent studies have shown methods of improving solar cell efficiency. Especially on single crystalline silicon wafer which is high-efficiency solar cell material that has been widely studied. Interstitial oxygen (Oi) is the main impurity in the Czochralski (Cz) growing method, and excess of this can form precipitates during cell fabrication. We have demonstrated the effect of Oi impurity and oxygen precipitation concentration of the wafer on Cz-silicon solar cell efficiency. The result showed a decrease in cell efficiency as Oi and oxygen precipitation increase. Moreover, we have found that the critical point of [Oi] to bring higher cell efficiency is at 14.5 ppma in non-existent Bulk Micro Defect (BMD).

Defect analysis of calcium fluoride single crystal substrates with (100) and (111) orientation ((100) 및 (111) 배향을 갖는 CaF2 단결정 기판의 결함 분석)

  • Ye-Jin Choi;Min-Gyu Kang;Gi-Uk Lee;Mi-Seon Park;Kwang-Hee Jung;Hea-Kyun Jung;Doo-Gun Kim;Won-Jae Lee
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.34 no.1
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    • pp.8-15
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    • 2024
  • The CaF2 single crystal has notable characteristics such as a large band gap (12 eV), excellent transparency over a wide wavelength range, low refractive index and dispersion. Due to these outstanding properties, CaF2 single crystal has considered as a promising material for short-wavelength light sources in recent lithography processes. However, there is an inherent birefringence of the material at 157 nm and the resulting aberration can be compensated for through the combination of the (100) plane and the (111) plane. Therefore, it is necessary to investigate the characteristics according to the plane. In this study, we analyzed crystallinity, optical properties of commercial CaF2 single crystal wafers grown by the Czochralski method. In particular, through chemical etching under various conditions, it was confirmed that the shape of etch pits appears differently depending on the plane and the shape and array of specific etch pits affected by dislocations and defects were examined.

Numerical analysis of CZ growth process for sapphire crystal of 300 mm length: Part I. Influence of hot zone structure modification on crystal temperature (300 mm 길이의 사파이어 단결정 대한 CZ성장공정의 수치해석: Part I. 핫존 구조 변경이 결정 온도에 미치는 영향)

  • Shin, Ho Yong;Hong, Su Min;Kim, Jong Ho;Jeong, Dae Yong;Im, Jong In
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.23 no.6
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    • pp.265-271
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    • 2013
  • Czochralski (CZ) growth process is one of the most important techniques for growing high quality sapphire single crystal for LED application. In this study, the inductively-heated CZ growth processes for the sapphire crystal of 300 mm length have been analyzed numerically using finite element method. The hot zone structures were modified with the crucible geometry change and the additional insulation layer installed above the crucible. The results show that the solid-liquid interface height decreased from about 80 mm at initial stage to 40 mm after mid-stage due to achieve the growth speed balance. Also the optimal input power of the modified system was similar with the original one due to the compensation effects of the crucible geometry and additional insulation. The crystal temperature grown by the modified CZ grower was increased about 10 K than the original one. Therefore the sapphire crystal of 300 mm height was grown successfully.

Crystal Growth of $YCa_4O(BO_3)_3$ and Preparation of Device for Second Harmonic Generation ($YCa_4O(BO_3)_3$ 비선형광학 단결정 성장 및 Second Harmonic Generation 소자 제조에 관한 연구)

  • ;A.Y. Ageyev
    • Korean Journal of Crystallography
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    • v.11 no.1
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    • pp.16-21
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    • 2000
  • (Yb/sub x/Y/sub 1-x/)Ca₄O(BO₃)₃ single crystals where x=0.3,8,15,20% were grown by Czochralski Method. The crystals grown under the optimum conditions were transparent and colorless with good crystal form. Using polarizing microscope, crystal defects such as parasite crystals and bubbles were detected depending on the composition of melts and pulling rates. The optimum growth parameters for high quality of single crystals were 15∼20 rpm of rotation rate and 2mm/h of pulling rate at the flow rate of 2 l/min of Nitrogen gas. The relationship between crystal axes and optical axes was investigated by optical crystallographic method, polarization technique and single crystal X-ray method. From the spectroscopic measurements, it was confirmed that there were strong absorption bands at 900 and 976.4 nm and strong emission band at 976.4 nm in Yb/sup 3+/ ion doped YCa₄O(BO₃)₃ crystal. For the application of second harmonic generation of 1.064 ㎛ laser, non-linear optical devices with θ=32.32° and Ψ=0°, λ/10 of flatness and the size of 6x8x5.73 mm were fabricated from the grown YCa₄O(BO₃)₃ crystal.

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The removal of saw marks on diamond wire-sawn single crystalline silicon wafers

  • Lee, Kyoung Hee
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.26 no.5
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    • pp.171-174
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    • 2016
  • The diamond wire sawing method to produce silicon wafers for the photovoltaic application is still a new and highly investigated wafering technology. This technology, featured as the higher productivity, lower wear of the wire, and easier recycling of the coolant, is expected to become the mainstream technique for slicing the silicon crystals. However, the saw marks on the wafer surface have to be investigated and improved. This paper discusses the removal of saw marks on diamond wire-sawn single crystalline silicon wafer. With a pretreatment step using tetramethyl ammonium hydroxide ($(CH_3)_4NOH$, TMAH) and conventional texturing process with KOH solution (1 % KOH, 8 % IPA, and DI water), the saw marks on the surface of the diamond wire-sawn silicon wafers can be effectively removed and they are invisible to naked eyes completely.

The influence of mechanical damage on the formation of the structural defects on the silicon surface during oxidation (규소 결정 표면의 구조 결함의 형성에 미치는 기계적 손상의 영향)

  • Kim, Dae-Il;Kim, Jong-Bum;Kim, Young-Kwan
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.15 no.2
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    • pp.45-50
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    • 2005
  • During oxidation process, several type of defects are formed on the surface of the silicon crystal which was damaged mechanically before oxidation. As the size of abrasive particle increases multiple dislocation loops are produced favorably over oxidation-induced stacking faults, which are dominantly produced when ground with finer abrasive particle. These defects are not related with the crystal growth process like Czochralski or directional solidification. During directional solidification process, twins and stacking faults are the two major defects observed in the bulk of the silicon crystal. On the other hand, slip dislocations produced by the thermal stress are not observed. Thus, not only in single crystalline silicon crystal but also in multi-crystalline silicon, extrinsic gettering process with programmed production of surface defects might be highly applicable to silicon wafers for purification.

Characterizations of lithium niobate single crystals grown from melt with $K_2O$ ($K_2O$를 첨가한 융액으로부터 성장시킨 Lithium Niobate 단결정의 특성)

  • 김상수
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.8 no.4
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    • pp.525-531
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    • 1998
  • A series of $LiNbO_3$ single crystals were grown by the Czochralski method from a congruent melt, a congruent melt with 0.05 mol% $Fe_2O_3$, a congruent melt with 6 wt.% $K_2O$ and a congruent melt with 6 wt.% $K_2O$ and 0.05 mol% $Fe_2O_3$ respectively. The growth of $LiNbO_3$ crystal from a congruent melt 6 wt.% $K_2O$ leads to nearly stoichiometric specimens. This is established by studying the following properties; XRD patterns, temperature dependences of the phase transition temperature, energy of the fundamental absorption edge, the shape of the absorption band of the $OH^-$vibration and linewidths of the ESR of $Fe_{Li}^{3+}$.

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TL Characteristics of CsI Single Crystal Scintillators and their Growth Conditions (CsI 단결정 섬광체의 열형광특성과 육성조건)

  • Doh, S.H.;Lee, W.G.;Hong, S.Y.;Bang, S.W.;Kang, K.J.;Kim, D.S.;Kim, W.;Kang, H.D.
    • Journal of Sensor Science and Technology
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    • v.7 no.4
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    • pp.234-242
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    • 1998
  • Changes in transmission and thermoluminescent characteristics were used in order to find out the optimum growth condition of CsI single crystal scintillators which were made relatively defect-free using Czochralski method. Impurity distribution in the crystals and the intensity and number of thermoluminescent glow peaks decreased as the process of crystallization was repeated. The direction of crystal growth turned out to be (110), the crystal structure of grown CsI was bee, and its lattice constant was found to be $4.568{\AA}$. The activation energy (trap depths) of CsI:3rd was 0.45 eV and its frequency factor was $5.18{\times}10^5\;sec^{-1}$.

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