• 열처리공학회지
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• 제13권4호
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• pp.246-252
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• 2000

Stellite 12 alloy-powder was overlaid on 410 stainless steel valve seat using plasma transferred arc(PTA) process. Variation of characteristic of microstructure and hardness of deposit with current(90~150 A) and preheat temperature(R.T.~$400^{\circ}C$) was investigated. Important conclusion obtained are as follows; All welding conditions used produced a sound deposit layer with no defect in single pass welding. The maximum deposit had 4.0~4.8 mm in thickness and its bead width was increased with increase of current and preheat temperature. The deposit showed hypoeutectic microstruture, which was consisting of primary cobalt dendrite and networked $M_7C_3$ type eutectic carbides. The amount of eutectic carbides was decreased and its dendritic secondary arm spacing was increased with increase of current. Hardness of the deposit was decreased with increase of current. Preheat temperature up to $400^{\circ}C$, however, showed little influence on the hardness and microstructure. The hardness was also influenced by diluted Fe content near the interface in addition to microstructure and dendritic secondary arm spacing. Hot hardness at $500^{\circ}C$ showed higher than 300 HV.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1996년도 하계학술대회 논문집 A
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• pp.588-590
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• 1996

An AC induction motor or constant speed characteristics has been widely used as power source because of simple structure and low maintenance cost in industrial field. The variable frequency AC source with a conventional inverter which is composed or power semi-conductors and drive systems contains much noises in sine wave current due to high speed switching or direct current. In this paper, the low pass LC filter for a variable speed induction motor driven by a full bridge inverter is introduced to solve EMI problem originated by much noise current. The modified LC filter based on the 3rd order Butterworth LC filter is used for the computer simulations and real experiments. The characteristics or proposed LC filter are investigated through FET analysis.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 제37회 하계학술대회 논문집 D
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• pp.2183-2184
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• 2006

전력계통의 과도현상 분석용으로 개발된 수치계산 프로그램인 EMTP ( Electromagnetic Transient Program)를 사용하여 건물내에 낙뢰에 의한 뇌서지가 침입했을 때 건물 전체에 surge current가 어떻게 확산되어 가는지를 분석해 본다. 이러한 현상을 분석하기 위해서 건물의 등가회로를 ${\pi}$-회로로 구현하고, ANSI 규격에 맞는 뇌서지를 건물에 유입시켜서 그에 따른 건물 내부의 current 분포를 알아본다. 그리고, 건물 체적을 변화시켜 가면서 뇌 서지가 건물 내부의 전기기기에 미치는 영향을 해석해 본다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 제37회 하계학술대회 논문집 A
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• pp.551-552
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• 2006

전력계통의 과도현상 분석용으로 개발된 수치계산 프로그램인 EMTP(Electromagnetic Transient Program)를 사용하여 건물내에 낙뢰에 의한 뇌서지가 침입했을 때 건물 전체에 surge current가 어떻게 확산되어 가는지를 분석해 본다. 이러한 현상을 분석하기 위해서 건물의 등가회로를 ${\pi}$-회로로 구현하고, ANSl 규격에 맞는 뇌서지를 건물에 유입시켜서 그에 따른 건물 내부의 current 분포를 알아본다. 그리고, 건물 체적을 변화시켜 가면서 뇌 서지가 건물 내부의 전기기기에 미치는 영향을 해석해 본다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 제37회 하계학술대회 논문집 B
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• pp.1217-1218
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• 2006

전력계통의 과도현상 분석용으로 개발된 수치계산 프로그램인 EMTP(Electromagnetic Transient Program)를 사용하여 건물내에 낙뢰에 의한 뇌서지가 침입했을 때 건물 전체에 surge current가 어떻게 확산되어 가는지를 분석해 본다. 이러한 현상을 분석하기 위해서 건물의 등가회로를 $\pi$-회로로 구현하고 ANSI 규격에 맞는 뇌서지를 건물에 유입시켜서 그에 따른 건물 내부의 current 분포를 알아본다. 그리고, 건물 체적을 변화시켜가면서 뇌 서지가 건물 내부의 전기기기에 미치는 영향을 해석해 본다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2007년도 제38회 하계학술대회
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• pp.1888-1889
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• 2007

The power source of inverter welder stable power of low voltage and high current. Because if shouldn't be, it is caused to spark between the parent metal and the peak. So that, we designed to be base on high frequency transformer and reactor of DC part. Then, we optimized control of PWM, current rising slant, voltage, current, pulse current and 인버터 out-put voltage. Also we designed PCB for EMI and noises.

• ETRI Journal
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• 제30권6호
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• pp.833-843
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• 2008

The effect of forward and reverse electrostatic discharge (ESD) on the electro-optical characteristics of oxide vertical-cavity surface-emitting lasers is investigated using a human body model for the purpose of understanding degradation behavior. Forward ESD-induced degradation is complicated, showing three degradation phases depending on ESD voltage, while reverse ESD-induced degradation is relatively simple, exhibiting two phases of degradation divided by a sudden distinctive change in electro-optical characteristics. We demonstrate that the increase in the threshold current is mainly due to the increase in leakage current, nonradiative recombination current, and optical loss. The decrease in the slope efficiency is mainly due to the increase in optical loss.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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• pp.901-904
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• 2005

A novel active matrix organic light diodes (AMOLEDs) voltage-programming pixel structure with current-correction method is proposed for largesize and high-resolution poly-Si AMOLED panel applications. The HSPICE simulation results shows that the maximum error of emission current in proposed pixel is 1.536%, 2.45%, and 2.97% with the ${\pm}12.5%$ mobility variation and ${\pm}0.3V$ threshold voltage variation for 30-, 40-, and 50-inch HDTV panels, respectively.

• 한국표면공학회지
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• 제29권5호
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• pp.556-562
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• 1996

Carbon nitride (CN) films were synthesized on silicon substrates by a combined ion-beam and laser-ablation method under various conditions; ion-beam energy and ion-beam current were varied. Raman spectroscopy and spectroscopic ellipsometry (SE) were employed to characterize respectively the structural and the optical properties of the CN films. Raman spectra show that all the CN films are amorphous independent of the ion-beam current and the ion-beam energy. Refractive indices, extinction coefficients and optical band gaps which were determined from the measured SE spectra exhibit a significant dependence on the synthesis conditions. Especially, the decrease of the refractive indices and the shrinkage of the optical band gap is noticeable as the ion-beam current and/or the ion-beam energy increase.

• 한국자기학회지
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• 제5권5호
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• pp.538-542
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• 1995

The etching characteristics of magnetic thin films of permalloy and Fe-based alloys are investigated. The thin films are fabricated by rf magnetron sputtering and the substrates used are silicon and glass. Etching is done by ion beam technique and the main process parameters investigated are beam voltage, beam current and accelerating voltage. The etch rate of the magnetic films is proportional to the beam current, but it is not directly related to the accelerating voltage and beam voltage. The dependence of etch rate on the process parameters can be explained by ion current density. It is found that the ion beam etching is effective in obtaining well-developed micro-patterns on the permalloy and Fe- based magnetic thin films.