• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.346.2-346.2
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• 2016

The rear side contact recombination in the crystalline silicon solar cell could be reduced by back surface field. We formed polycrystalline silicon as a back surface field through crystallization of amorphous silicon. A thin silicon oxide applied to the passivation layer. We used quasi-steady-state photoconductance measurement to analyze electrical properties with various annealing condition. And, blister formed on surface of wafer during the annealing process. We observed the blister after varied annealing process with wafer of various surface. Shape and density of blister is influenced by various annealing temperature and process time. As the annealing temperature became higher, the average diameter of blister is decreased and total number of blister is increased. The sample with the $600^{\circ}C$ annealing temperature and 1 min annealing time exhibited the highest implied open circuit voltage and lifetime. We predicted that the various shape and density of blister affects the lifetime and implied open circuit voltage.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2009년도 제40회 하계학술대회
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• pp.1221_1222
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• 2009

다결정질 실리콘 웨이퍼의 도핑깊이, 도핑농도, 전면 재결합 속도, 면저항은 태양전지의 효율을 결정하는데 중요한 요소이다. 태양전지의 높은 효율을 얻기 위해 PC1D를 이용하여 태양전지의 에미터 도핑 깊이와 농도, 에미터 면저항, 전면 재결합 속도를 조절해 보았다. 그 결과로 최적화된 요소들은 peak doping $10^{18}cm^{-3}$, depth factor $0.5{\mu}m$, front recombination velocity $10^2cm/s$, sheet resistance $50{\Omega}/{\square}$를 얻을 수 있었다. 최적화 과정을 통하여 우리는 peak doping과 면저항이 높은 효율을 얻기 위한 중요한 요소가 된다는 사실을 알 수 있었다. 본 논문에서는 더 자세한 시뮬레이션 요소값과 그들이 태양전지에 미치는 영향에 대해 알아보고자 한다.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2009년도 춘계학술대회 논문집
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• pp.183-186
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• 2009

The crystalline silicon solar cell was one of the first to be developed and it is still the most widely used type. The photovoltaic cells will exhibit long-term degradation if the temperature exceed a certain limit. The purpose of this study is to investigate the possible of improving the performance of a photovoltaic cooling system. According to the results of the experiment, the thermal degradation of 44.63degrees was observed by cooling on the surface of photovoltaic cells. It is a decrease of 22.215percent of generating power. It is shown that photovoltaic cooling system is effected on improving the effectiveness of a photovoltaic out of power.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.702-702
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• 2013

태양전지에서 SiNX층은 반사방지막 역할과 태양전지 소자 보호 역할 2가지를 동시에 하고 있다. 태양전지에서 반사방지막은 굴절률 1.97, 두께 76 nm가 이론적으로 최적의 상태이다. PECVD장비를 이용하여 SiNx 층을 증착하였다. SiNX층 증착 시에 RF 파워와 혼합 가스를 변화한 후 굴절률을 측정하였다. RF 파워는 100~400 W로 변화시켰고 혼합가스 변화는 SiH4가스와 N2, H2, N2+H2 가스 각각을 같이 넣어 주면서 증착하였다. SiNX 가스 자체에 N2가 80%섞여 있는 가스를 사용하기 때문에 SiH4 가스자체 만으로도 SiNx층을 형성 할 수 있다. RF파워 300 W, SiH4 50 sccm, 기판 온도 $300^{\circ}C$, 공정시간 63초에서 굴절률 1.965, 두께 76 nm를 갖는 SiNx층을 형성 할 수 있었고 개방전압: 0.616 V, 전류밀도: 37.78 mA/$cm^2$, 충실도:76.59%, 효율: 17.82%로 가장 높은 효율을 얻을 수 있었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.232-232
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• 2010

Simulation Program (AFORS-HET 2.4.1) was used, include the basic structure of crystalline silicon thin film as above, under the intrinsic a-Si:H films bonded symmetrical structure (Symmetrical structure) were used. The structure of ITO, a-Si p-type, intrinsic a-Si, c-Si, intrinsic a-Si, a-Si n-type, metal (Al) layer has one of the seven. When thickness for each layer was given the change, the changes of a-Si p-type layer and the intrinsic a-Si layer on top had an impact on efficiency. Efficiency ratio of p-type a-Si:H layer thickness was sensitive to, especially a-Si: H layer thickness is increased in a rapid decrease in Jsc and FF, and efficiency was also decreased.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.366-366
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• 2010

Simulation Program (AFORS-HET 2.4.1) was used, include the basic structure of crystalline silicon thin film as above, below Intrinsic a-Si:H films bonded symmetrical structure (Symmetrical structure) were used. Efficiency with variation of the concentration was grown by the a-Si p-type with increasing concentrations of Na, efficiency with increasing a-Si n-type of Nd Concentrations was not changed, was decreased rapidly when concentrations were decreased. Efficiency was increased when c-Si n-type of Nd concentration was increased, otherwise efficiency was decreased when concentration was decreased.

• 신재생에너지
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• 제5권1호
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• pp.26-31
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• 2009

The surface etching characteristics of single crystalline silicon wafer were investigated using potassium hydroxide (KOH) and tetramethylammonium hydroxide (TMAH). The saw damage layer was removed after 10min by KOH 45wt% solution at $80^{\circ}C$. The wafer etched at high temperature ($90^{\circ}C$) and in low concentration (4wt%) of TMAH solution showed an increased etch rate of silicon wafer and wavy patterns on the surface. Especially, pyramidal textures were formed in 4wt% TMAH solution without alcohol additives.

• 한국주조공학회지
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• 제20권3호
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• pp.188-196
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• 2000

A vacuum casting was proposed as a new fabrication method of Si wafer for solar cell substrate. It was tried to fabricate a Si plate with good properties and to reduce the production cost by direct vacuum casting. By $5{\sim}10$ cmHg of pressure difference Si plate with $50{\times}46{\times}1.5\;mm^3$ was fabricated. For the preventing of the reaction between graphite mold and Si melt, BN powder coating or BN insert were used. The Si wafer was poly crystalline with 100 ${\mu}m{\sim}1$ mm order of grain size. And there were some twins and dislocations in the grains.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.600-600
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• 2012

실리콘 이종접합 태양전지는 diffused dopant를 이용하여 high conductivity의 emitter를 가지는 기존의 crystalline silicon 태양전지와는 다르게 a-Si:H를 이용한 low conductivity emitter 때문에 TCO를 front electrode 및 anti-reflection layer로 사용한다. 하지만 TCO와 emitter사이의 work function mismatch에 의한 band-offset이 발생하고 photo-generation된 carrier의 injection을 막아 효율 상승을 제한하게 된다. 본 연구는 산소 반응성 스퍼터링을 통한 front TCO의 일함수 변경과 이에 따른 TCO와 emitter 계면에 존재하는 band-offset 변화에 대하여 분석하였다. 특히 산소 분압에 따른 front TCO의 일함수 변화에 따라 개방전압 및 단락전류 변화가 두드러지게 나타났으며, 직렬저항 성분 변화에 따른 충진률 변화에 따른 효율상승을 얻을 수 있었다.

• 분석과학
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• 제8권4호
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• pp.637-642
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• 1995

The presence of a porous Si layer(PSL) formed on the surface of crystalline silicon by electrochemical etclling in HF solution is found to enhance the stability of n-Si photoanodes, but porous n-Si thus formed is still liable to corrode upon exposure to excitation light. To improve the stability of the porous n-Si electrodes and to reduce the photo-induced corrosion, we have examined the PEC behavior of porous n-Si modified with polyaniline(PANI) and 3 nm thick layer of Au. Comparisons were made between Au/PSL and PANl/Au/PSL photoelectrodes.