• 한국결정성장학회지
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• 제5권3호
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• pp.250-260
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• 1995

일반적으로 floating zone법에 의한 결정성장시에는 소결봉이 원료로서 사용되며 이러한 원료봉의 소결조건에 의해 결정성장시 안정성이 영향을 받게 된다. 그 원인은 FZ법에 의한 결정성장시 소결조건에 따른 원료봉의 미세구조의 변화가 소결봉과 융액사이의 계면형태를 변화시키기 때문이다. 본 연구에서 FZ법에 의해 $TiO_2$(rutile)과 ruby 단결정을 성장하였으며 이를 통해 소결봉의 미세구조가 FZ법에 의한 결정성장시에 용융대의 안정서에 미치는 영향을 분석하였다.$TiO_2$(rutile)과 ruby의 결정성장에 사용되는 원료봉의 소결시 소결온도가 높아지고 소결시간이 길어질수록 원료봉 중앙부와 바깥ㅂ분의 입자크기의 차이가 커져서 결국에는 그로 인하여 원료봉의 용융양상이 바뀌어졌다. FZ법에 의한 결정성장시 원료봉의 최적소결 조건은 입자의 크기가 소결봉 전영역에 걸쳐 균일하게 분포되는 것이었다. 반면 일반 적으로 중요하다고 여기는 소결봉의 porosity는 FZ법에 의한 결정성장시 영향력 있는 인자가 아니라는 점을 소결하지 않은 원료봉을 사용해 결정성장 실험을 행하여 봄으로써 확인할 수 있었다.

• 한국결정성장학회지
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• 제15권4호
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• pp.141-144
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• 2005

[ $(Y_{0.5}Sm_{0.25}Nd_{0.25})Ba_2Cu_3O_y$ ] [(YSN)-123] high $T_c$ composite superconductors with $CeO_2$ addition were systematically investigated by top seeded melt growth (TSMG) process in air atmosphere. A melt textured $NdBa_2Cu_3O_y$ (Nd-123) single crystal was used as a seed for achieving the c-axis alignment large grains perpendicular to the surface of (YSN)-123 composite oxides. The size of $(Y_{0.5}Sm_{0.25}Nd_{0.25})_2BaCuO_5$ [(YSN)211] nonsuperconducting inclusions of the melt textured (YSN)-123 samples with $CeO_2$ addition were remarkably reduced and uniformly distributed within the (YSN)123 superconducting matrix except in the region very close to the Nd-123 seed crystal. The sample showed a sharp superconducting transition of 91 K.

• 한국재료학회지
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• 제33권4호
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• pp.135-141
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• 2023

The volatilization of alkali ions in (K,Na)NbO₃ (KNN) ceramics was inhibited by doping them with alkaline earth metal ions. In addition, the grain growth behavior changed significantly as the sintering duration (t_s) increased. At 1,100 ℃, the volatilization of alkali ions in KNN ceramics was more suppressed when doped with alkaline earth metal ions with smaller ionic size. A Ca²⁺-doped KNN specimen with the least alkali ion volatilization exhibited a microstructure in which grain growth was completely suppressed, even under long-term sintering for t_s = 30 h. The grain growth in Sr²⁺-doped and Ba²⁺-doped KNN specimens was suppressed until t_s = 10 h. However, at t_s = 30 h, a heterogeneous microstructure with abnormal grains and small-sized matrix grains was observed. The size and number of abnormal grains and size distribution of matrix grains were considerably different between the Sr²⁺-doped and Ba²⁺-doped specimens. This microstructural diversity in KNN ceramics could be explained in terms of the crystal growth driving force required for two-dimensional nucleation, which was directly related to the number of vacancies in the material.

• 한국결정성장학회지
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• 제12권3호
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• pp.120-125
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• 2002

Si-wafers for solar cells were cast in a size of $50{\times}46{\times}0.5{\textrm}{mm}^3$ by vacuum casting method. The graphite mold coated by BN powder, which was to prevent the reaction of carbon with the molten silicon, was used. Without coating, the wetting and reaction of Si melt to graphite mold was very severe. In the case of BN coating, SiC was formed in the shape of tiny islands at the surface of Si wafer by the reaction between Si-melt and carbon of the graphite mold on the high temperature. The grain size was about 1 mm. The efficiency of Si solar cell was lower than that of Si solar cell fabricated on commercial single and poly crystalline Si wafer. The reason of low efficiency was discussed.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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• pp.911-914
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• 2007

We developed the laser annealing system using green laser of 261W(5kHz) and 75.5mJ/pulse(2kHz). We confirmed that this system makes it possible to form two kinds(large or uniformed grain) of poly-Si by changing its polarized directions. By using ${\mu}-crystal-Si$ as irradiated films, grain size uniformity is better than that using a-Si.

• 한국결정성장학회지
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• 제9권5호
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• pp.486-492
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• 1999

본 실험에서는 D.C magnetron sputtering을 사용하여 Mn-Ir/Ni-Fe/buffer/Si 다층박막의 교환결합 자계와 보자력에 영향을 주는 인자를 미세구조의 관점에서 분석하였다. (111) 우선방위에 상관없이 모든 시편에서 155 Oe 이상의 교환결합 자계가 발생하였다. Mn-Ir/Ni-Fe 의 계면에서 Mn-Ir의 결정립 크기와 게면 거칠기가 Mn-Ir/Ni-Fe 다층박막의 교환결합 자계와 보자력에 가장 많은 영향을 주는 것을 알 수 있었다. Mn-Ir/Ni-Fe/Cu/Ni-Fe/buffer/Si spin-valve 다층박막에서 각 층의 두께와 하지층에 따른 자기저항비와 coulping field을 분석하였다. Mn-Ir(10 nm)/Ni-Fe(7.5 nm)/Cu(2 nm)Ni-Fe(6 nm)/Ta (5 nm)/Si에서 최대 자기저항비가 발생하였다. 강자성체의 결정립 크기가 거대자기저항비에 영향을 주는 것을 알 수 있었다. 그리고 계면 거칠기와 강자성체의 결정립 크기가 coulping field 에 많은 영향을 주는 것을 알 수 있었다.

• 한국결정성장학회지
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• 제11권3호
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• pp.127-131
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• 2001

산화물계의 액상소결시 액상량을 변수로 하여 입자형성이 입자성장 거동에 미치는 영향을 고찰하였다. 산화물계 모델로 구형입자의 경우는 MgO$CaMgSiO_{4}$계를 선택하였으며, 각진입자의 경우는 $Al_{2}O_{3}$/ $CaAl_{2}Si_{2}O_{8}$계를 선택하였다. 구형입자인 MgO의 경우 액상량 증가에 따라 입자크기가 감소하였으나,각진입자인 $Al_{2}O_{3}$ 입자의 경우는 계면지배과정에 의해 성장하는 반면, 거친 고상/액상계면을 지닐 것으로 예상되는 구형 MgO입자의 경우는 확산지배과정에 의해 성장하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.243.2-243.2
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• 2016

Tungsten (W) is recently gaining attention as a potential candidate to replace Cu in semiconductor metallization due to its expected improvement in material reliability and reduced resistivity size effect. In this study, the impact of electron scattering at grain boundaries in a polycrystalline W thin film was investigated. Two nominally 300 nm-thick films, a (110)-oriented single crystal film and a (110)-textured polycrystalline W film, were prepared onto (11-20) Al2O3 substrate and thermally oxidized Si substrate, respectively in identical fabrication conditions. The lateral grain size for the polycrystalline film was determined to be $119{\pm}7nm$ by TEM-based orientation mapping technique. The film thickness was chosen to significantly exceed the electron mean free path in W (16.1 and 77.7 nm at 293 and 4.2 K, respectively), which allows the impact of surface scattering on film resistivity to be negligible. Then, the difference in the resistivity of the two films can be attributed to grain boundary scattering. quantitative analyses were performed by employing the Mayadas-Shatzkes (MS) model, where the grain boundary reflection coefficient was determined to be $0.42{\pm}0.02$ and $0.40{\pm}0.02$ at 293 K and 4.2 K, respectively.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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• pp.59.1-59.1
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• 2010

Aluminum-induced crystallization (AIC) of amorphous silicon (a-Si) is studied with the structure of a glass/Al/$SiO_2$/a-Si, in which the $SiO_2$ layer has micron-sized laser holes in the stack. An oxide layer between aluminum and a-Si thin films plays a significant role in the metal-induced crystallization (MIC) process determining the properties such as grain size and preferential orientation. In our case, the crystallization of a-Si is carried out only through the key hole because the $SiO_2$ layer is substantially thick enough to prevent a-Si from contacting aluminum. The crystal growth is successfully realized toward the only vertical direction, resulting a crystalline silicon grain with a size of $3{\sim}4{\mu}m$ under the hole. Lateral growth seems to be not occurred. For the AIC experiment, the glass/Al/$SiO_2$/a-Si stacks were prepared where an Al layer was deposited on glass substrate by DC sputter, $SiO_2$ and a-Si films by PECVD method, respectively. Prior to the a-Si deposition, a $30{\times}30$ micron-sized hole array with a diameter of $1{\sim}2{\mu}m$ was fabricated utilizing the femtosecond laser pulses to induce the AIC process through the key holes and the prepared workpieces were annealed in a thermal chamber for 2 hours. After heat treatment, the surface morphology, grain size, and crystal orientation of the polycrystalline silicon (pc-Si) film were evaluated by scanning electron microscope, transmission electron microscope, and energy dispersive spectrometer. In conclusion, we observed that the vertical crystal growth was occurred in the case of the crystallization of a-Si with aluminum by the MIC process in a small area. The pc-Si grain grew under the key hole up to a size of $3{\sim}4{\mu}m$ with the workpiece.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2007년도 추계학술발표대회 및
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• pp.73.2-73.2
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• 2007