• Title/Summary/Keyword: Crystal grain size

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Effects of microstructures of the sintered rod on the single crystal grown by the floating zone method (Floating zone법에 의한 결정성장시 소결봉의 미세구조에 의한 영향)

  • 신재혁;오근호
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.5 no.3
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    • pp.250-260
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    • 1995
  • In general, a sintered rod is used as a feed in the growth of crystals by the floating zone(FZ) method. The sintering condition of the feed rod affected the stability of molten zone because it influenced the interface shape between the feed and the melt during the crystal growth. In this study, rutile and ruby crystals were chosen as samples to analyze the effect of the microstructures of the feed rods. In sintering of the feed rod for the growth of rutile and ruby single crystals, the difference of grain size between the inner and the outer region of the feed rod increased with the sintering temperature and dwelling time. As a result, it altered melting behavior of the feed. The uniform grain size of the sintered rod was necessary for the optimum growing condition of crystals. The effect of pores in the feed rod was not a dominant factor to grow crystals by the FZ method, which was confirmed by growing crystals with nonsinterd rods as feeds.

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Grain growth and superconducting properties of melt-processed (Y-Sm-Nd)-Ba-Cu-O composite oxides

  • Kim, So-Jung
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.15 no.4
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    • pp.141-144
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    • 2005
  • [ $(Y_{0.5}Sm_{0.25}Nd_{0.25})Ba_2Cu_3O_y$ ] [(YSN)-123] high $T_c$ composite superconductors with $CeO_2$ addition were systematically investigated by top seeded melt growth (TSMG) process in air atmosphere. A melt textured $NdBa_2Cu_3O_y$ (Nd-123) single crystal was used as a seed for achieving the c-axis alignment large grains perpendicular to the surface of (YSN)-123 composite oxides. The size of $(Y_{0.5}Sm_{0.25}Nd_{0.25})_2BaCuO_5$ [(YSN)211] nonsuperconducting inclusions of the melt textured (YSN)-123 samples with $CeO_2$ addition were remarkably reduced and uniformly distributed within the (YSN)123 superconducting matrix except in the region very close to the Nd-123 seed crystal. The sample showed a sharp superconducting transition of 91 K.

Grain Growth Behavior of (K0.5Na0.5)NbO3 Ceramics Doped with Alkaline Earth Metal Ions

  • Il-Ryeol Yoo;Seong-Hui Choi;Kyung-Hoon Cho
    • Korean Journal of Materials Research
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    • v.33 no.4
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    • pp.135-141
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    • 2023
  • The volatilization of alkali ions in (K,Na)NbO3 (KNN) ceramics was inhibited by doping them with alkaline earth metal ions. In addition, the grain growth behavior changed significantly as the sintering duration (ts) increased. At 1,100 ℃, the volatilization of alkali ions in KNN ceramics was more suppressed when doped with alkaline earth metal ions with smaller ionic size. A Ca2+-doped KNN specimen with the least alkali ion volatilization exhibited a microstructure in which grain growth was completely suppressed, even under long-term sintering for ts = 30 h. The grain growth in Sr2+-doped and Ba2+-doped KNN specimens was suppressed until ts = 10 h. However, at ts = 30 h, a heterogeneous microstructure with abnormal grains and small-sized matrix grains was observed. The size and number of abnormal grains and size distribution of matrix grains were considerably different between the Sr2+-doped and Ba2+-doped specimens. This microstructural diversity in KNN ceramics could be explained in terms of the crystal growth driving force required for two-dimensional nucleation, which was directly related to the number of vacancies in the material.

A study on the fabrication of poly crystalline Si wafer by vacuum casting method and the measurement of the efficiency of solar cell

  • Lee, Geun-Hee;Lee, Zin-Hyoung
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.12 no.3
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    • pp.120-125
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    • 2002
  • Si-wafers for solar cells were cast in a size of $50{\times}46{\times}0.5{\textrm}{mm}^3$ by vacuum casting method. The graphite mold coated by BN powder, which was to prevent the reaction of carbon with the molten silicon, was used. Without coating, the wetting and reaction of Si melt to graphite mold was very severe. In the case of BN coating, SiC was formed in the shape of tiny islands at the surface of Si wafer by the reaction between Si-melt and carbon of the graphite mold on the high temperature. The grain size was about 1 mm. The efficiency of Si solar cell was lower than that of Si solar cell fabricated on commercial single and poly crystalline Si wafer. The reason of low efficiency was discussed.

High Performance of Crystallization for LPTS TFTs Using Solid Green Laser

  • Nishida, K.;Kawakami, R.;Izawa, J.;Kawaguchi, N.;Matsuzaka, F.;Masaki, M.;Morita, M.;Yoshinouchi, A.;Kawasaki, Y.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.911-914
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    • 2007
  • We developed the laser annealing system using green laser of 261W(5kHz) and 75.5mJ/pulse(2kHz). We confirmed that this system makes it possible to form two kinds(large or uniformed grain) of poly-Si by changing its polarized directions. By using ${\mu}-crystal-Si$ as irradiated films, grain size uniformity is better than that using a-Si.

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A Study on the exchange anisotropy and the giant magnetoresistance of Mn-Ir/Ni-Fe/buffer/Si with various buffer layers (Mn-Ir/Ni-Fe/buffer/Si 다층박막에서 하지층에 따른 교환이방성 및 거대자기저항에 대한 연구)

  • 윤성용;노재철;전동민;박준혁;서수정;이확주
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.9 no.5
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    • pp.486-492
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    • 1999
  • The purpose of this research was to find out what is the dominant factor determining the $H_{ex}$ and the $H_C$ of Mn-Ir/Ni-Fe multilayers with different buffer layers. Regardless of (111) texture of Mn-Ir layer, all samples showed over the $H_{ex}$ of 155 Oe. We found out the $H_{ex}$ and the $H_C$ of Mn-Ir/Ni-Fe multilayers depend on interface morphology and grain size of Mn-Ir layer at the interface between Mn-Ir and Ni-Fe layers. The dependence of magnetroesistance ratio and coupling field on the thickness of ferromagnetic layer, thickness of Cu layer and different buffer layers have been studied. Maximum magnetoresistance ratio appeared for the sample Ta(5 nm)/Mn-Ir(10 nm)/Ni-Fe(7.5 nm)/Cu(2 nm)/Ni-Fe(6 nm)/Ta(5 nm)/Si. Magnetoresistance ratio may be related to grain of ferromagnetic layer. Coupling field may be related to the roughness and the grain size of ferromagnetic layer in the spin-valve multilayers.

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The effect of grain shape on grain growth behavior of oxide system during liquid phase sintering (산화물계의 액상소결에서 입자 형상이 입자성장 거동에 미치는 영향)

  • 조동희;박상엽
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.11 no.3
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    • pp.127-131
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    • 2001
  • The effect of grain shape on the grain growth behavior of oxide system was investigated as afunction of liquid content during liquid phase sintering. As a model system, the solid grains of $Al_{2}O_{3}$ and MgO were selected during liquid phase sintering, i.e. faceted shape of $Al_{2}O_{3}$ in $CaAl_{2}Si_{2}O_{8}$ liquid phase and spherical shape of MgO in $CaMgSiO_{4}$ liquid phase. The average grain size of MgO with spherical shape was decreased with increasing the liquid phase content, whereas that of $Al_{2}O_{3}$ with faceted shape was independent of liquid phase content. In the case of $Al_{2}O_{3}$ grains with faceted shape, which interfaces are expected to be atomically flat, are likely to grow by the interfacial reaction controled process. Whereas, in the case of MgO grains with spherical shape, which interface are expected to be atomically rough, are likely to grow by the diffusion controlled process.

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Electron Scattering at Grain Boundaries in Tungsten Thin Films

  • Choe, Du-Ho;Kim, Byeong-Jun;Lee, Seung-Hun;Jeong, Seong-Hun;Kim, Do-Geun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.243.2-243.2
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    • 2016
  • Tungsten (W) is recently gaining attention as a potential candidate to replace Cu in semiconductor metallization due to its expected improvement in material reliability and reduced resistivity size effect. In this study, the impact of electron scattering at grain boundaries in a polycrystalline W thin film was investigated. Two nominally 300 nm-thick films, a (110)-oriented single crystal film and a (110)-textured polycrystalline W film, were prepared onto (11-20) Al2O3 substrate and thermally oxidized Si substrate, respectively in identical fabrication conditions. The lateral grain size for the polycrystalline film was determined to be $119{\pm}7nm$ by TEM-based orientation mapping technique. The film thickness was chosen to significantly exceed the electron mean free path in W (16.1 and 77.7 nm at 293 and 4.2 K, respectively), which allows the impact of surface scattering on film resistivity to be negligible. Then, the difference in the resistivity of the two films can be attributed to grain boundary scattering. quantitative analyses were performed by employing the Mayadas-Shatzkes (MS) model, where the grain boundary reflection coefficient was determined to be $0.42{\pm}0.02$ and $0.40{\pm}0.02$ at 293 K and 4.2 K, respectively.

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Characteristics of metal-induced crystallization (MIC) through a micron-sized hole in a glass/Al/$SiO_2$/a-Si structure (Glass/Al/$SiO_2$/a-Si 구조에서 마이크론 크기의 구멍을 통한 금속유도 실리콘 결정화 특성)

  • Oh, Kwang H.;Jeong, Hyejeong;Chi, Eun-Ok;Kim, Ji Chan;Boo, Seongjae
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.59.1-59.1
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    • 2010
  • Aluminum-induced crystallization (AIC) of amorphous silicon (a-Si) is studied with the structure of a glass/Al/$SiO_2$/a-Si, in which the $SiO_2$ layer has micron-sized laser holes in the stack. An oxide layer between aluminum and a-Si thin films plays a significant role in the metal-induced crystallization (MIC) process determining the properties such as grain size and preferential orientation. In our case, the crystallization of a-Si is carried out only through the key hole because the $SiO_2$ layer is substantially thick enough to prevent a-Si from contacting aluminum. The crystal growth is successfully realized toward the only vertical direction, resulting a crystalline silicon grain with a size of $3{\sim}4{\mu}m$ under the hole. Lateral growth seems to be not occurred. For the AIC experiment, the glass/Al/$SiO_2$/a-Si stacks were prepared where an Al layer was deposited on glass substrate by DC sputter, $SiO_2$ and a-Si films by PECVD method, respectively. Prior to the a-Si deposition, a $30{\times}30$ micron-sized hole array with a diameter of $1{\sim}2{\mu}m$ was fabricated utilizing the femtosecond laser pulses to induce the AIC process through the key holes and the prepared workpieces were annealed in a thermal chamber for 2 hours. After heat treatment, the surface morphology, grain size, and crystal orientation of the polycrystalline silicon (pc-Si) film were evaluated by scanning electron microscope, transmission electron microscope, and energy dispersive spectrometer. In conclusion, we observed that the vertical crystal growth was occurred in the case of the crystallization of a-Si with aluminum by the MIC process in a small area. The pc-Si grain grew under the key hole up to a size of $3{\sim}4{\mu}m$ with the workpiece.

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