• Title/Summary/Keyword: Cr-free passivation

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Characteristics of Zr-base Passivation Layers of Tinplate (전기주석도금강판의 Zr계 화학처리 피막 특성)

  • Bae D.C.;Kim T.Y.;Cho K.
    • Journal of the Korean institute of surface engineering
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    • v.36 no.3
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    • pp.251-255
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    • 2003
  • With increasing environmental demands in surface treatment of steel sheets, the passivation layers containing hexavalent chromium $(Cr^{+6})$ are being replaced by non-chromium or trivalent chromium compounds. After review on the various types of inorganic compounds, the zirconates was chosen as the candidate for alternative to sodium dichromate in the aspect of its barrier properties with excellent adhesion to organics. The ammonium zirconium carbonate (AZC) and sodium hexafluorozirconate (SFZ) could be reach $70-80\%$ level of CDC (cathodic dichromate) treatment by their single applications. But high porosity in the AZC layer and poor electrical conductivity of SFZ solution limit the single application of zirconate. Mixed composition of zirconates to compensate their inferiorities or incorporation of organic compounds to seal the porosity seems to be inevitable to match up the target level of Cr-free passivation of tinplate.

The Electrochemical Behavior of Ni-base Metallic Glasses Containing Cr in H2SO4 Solutions

  • Arab, Sanaa.T.;Emran, Khadijah.M.;Al-Turaif, Hamad A.
    • Journal of the Korean Chemical Society
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    • v.56 no.4
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    • pp.448-458
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    • 2012
  • In order to develop alloy resistance in aggressive sulphat ion, the corrosion behavior of metallic glasses $Ni_{92{\cdot}3}Si_{4.5}B_{32}$, $Ni_{82,3}Cr_7Fe_3Si_{4.5}B_{3.2}$ and $Ni_{75.5}Cr_{13}Fe_{4.2}Si_{4.5}B_{2.8}$ (at %) at different concentrations of $H_2SO_4$ solutions was examined by electrochemical methods and Scanning Electron Microscope (SEM) and X-ray Photoelectron Microscopy (XPS) analyses. The corrosion kinetics and passivation behavior was studied. A direct proportion was observed between the corrosion rate and acid concentration in the case of $Ni_{92{\cdot}3}Si_{4.5}B_{32}$ and $Ni_{75.5}Cr_{13}Fe_{4.2}Si_{4.5}B_{2.8}$ alloys. Critical concentration was observed in the case of $Ni_{82,3}Cr_7Fe_3Si_{4.5}B_{3.2}$ alloy. The influence of the alloying element is reflected in the increasing resistance of the protective film. XPS analysis confirms that the protection film on the $Ni_{92{\cdot}3}Si_{4.5}B_{32}$ alloy was NiS which is less protective than that formed on Cr containing alloys. The corrosion rate of $Ni_{82,3}Cr_7Fe_3Si_{4.5}B_{3.2}$ and $Ni_{75.5}Cr_{13}Fe_{4.2}Si_{4.5}B_{2.8}$. alloys containing 7% and 13% Cr are $7.90-26.1{\times}10^{-3}$ mm/y which is lower about 43-54 times of the alloy $Ni_{92{\cdot}3}Si_{4.5}B_{32}$ (free of Cr). The high resistance of $Ni_{75.5}Cr_{13}Fe_{4.2}Si_{4.5}B_{2.8}$ alloy at the very aggressive media may due to thicker passive film of $Cr_2O_3$ which hydrated to hydrated chromium oxyhydroxide.

Localized Electro-chemical Micro Drilling Using Ultra Short Pulses (초단펄스 전해 국부화를 이용한 미세구멍 가공)

  • 안세현;류시형;최덕기;주종남
    • Journal of the Korean Society for Precision Engineering
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    • v.20 no.8
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    • pp.213-220
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    • 2003
  • By the localization of electro-chemical dissolution region, we succeeded in a few micrometer size hole drilling on stainless steel with the radial machining gap of about 1 ${\mu}{\textrm}{m}$. Tens of nanosecond duration voltage pulses were applied between WC micro-shaft and stainless steel in the 0.1 M $H_2SO_4$ solution. Pt balance electrode was used to drill the high aspect ratio micro-hole without generation of Cr oxide layer on the machined surface. The effects of applied voltage, pulse duration, and pulse period on localization distance were investigated according to machining time. We suggested the taper reduction technique especially brought up on blind-hole machining. High quality micro-holes with 8 ${\mu}m$ diameter with 20 ${\mu}m$ depth and 12 ${\mu}m$ diameter with 100 ${\mu}m$ depth were drilled on 304 stainless steel foil. The various hole shapes were also produced including stepped holes and taper free holes.