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http://dx.doi.org/10.5012/jkcs.2012.56.4.448

The Electrochemical Behavior of Ni-base Metallic Glasses Containing Cr in H2SO4 Solutions  

Arab, Sanaa.T. (Department of Chemistry, Girls' College of Education, King Abdulaziz University)
Emran, Khadijah.M. (Applied Chemistry Department, College of Applied Science, Taibaj University)
Al-Turaif, Hamad A. (Department of Chemical and Materials Engineering, King Abdulaziz University Jeddah)
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Abstract
In order to develop alloy resistance in aggressive sulphat ion, the corrosion behavior of metallic glasses $Ni_{92{\cdot}3}Si_{4.5}B_{32}$, $Ni_{82,3}Cr_7Fe_3Si_{4.5}B_{3.2}$ and $Ni_{75.5}Cr_{13}Fe_{4.2}Si_{4.5}B_{2.8}$ (at %) at different concentrations of $H_2SO_4$ solutions was examined by electrochemical methods and Scanning Electron Microscope (SEM) and X-ray Photoelectron Microscopy (XPS) analyses. The corrosion kinetics and passivation behavior was studied. A direct proportion was observed between the corrosion rate and acid concentration in the case of $Ni_{92{\cdot}3}Si_{4.5}B_{32}$ and $Ni_{75.5}Cr_{13}Fe_{4.2}Si_{4.5}B_{2.8}$ alloys. Critical concentration was observed in the case of $Ni_{82,3}Cr_7Fe_3Si_{4.5}B_{3.2}$ alloy. The influence of the alloying element is reflected in the increasing resistance of the protective film. XPS analysis confirms that the protection film on the $Ni_{92{\cdot}3}Si_{4.5}B_{32}$ alloy was NiS which is less protective than that formed on Cr containing alloys. The corrosion rate of $Ni_{82,3}Cr_7Fe_3Si_{4.5}B_{3.2}$ and $Ni_{75.5}Cr_{13}Fe_{4.2}Si_{4.5}B_{2.8}$. alloys containing 7% and 13% Cr are $7.90-26.1{\times}10^{-3}$ mm/y which is lower about 43-54 times of the alloy $Ni_{92{\cdot}3}Si_{4.5}B_{32}$ (free of Cr). The high resistance of $Ni_{75.5}Cr_{13}Fe_{4.2}Si_{4.5}B_{2.8}$ alloy at the very aggressive media may due to thicker passive film of $Cr_2O_3$ which hydrated to hydrated chromium oxyhydroxide.
Keywords
Nickel base alloys; Metallic glasses; Passivity; Role of chromium; Corrosion;
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  • Reference
1 Pourbaix, M. Atlas of Electrochemical Equilibria in Aqueous Solutions; Pergamon Press Inc.; New York, 1966.
2 Diggle, J. W.; Downic, T. C.; Gouding, C. W. Chem. Rev. 1969, 65, 365.
3 Abd El Aal, M. S.; Osman, A. H. Corrosion 1980, 36, 591.   DOI
4 Chaudhary, R. S.; Singh, A. Br. Corros. J. 1993, 28, 277.
5 Bojinov, M.; Fabricius, G.; Kinnunen, P.; Laitinen, T.; Makela, K.; Saario, T.; Sundholm, G. Electrochim. Acta 2000, 45, 2791.   DOI
6 Bojinov, M.; Tzvetkoff, T. J. Phys. Chem. 2003, 107, 5101.   DOI   ScienceOn
7 Hashimoto, K. Passivity of Metals and Semiconductors, Proc. 5th Int. Symp. Passivity. M. Froment, Ed.; Elsevier: Amsterdam, 1983, p 235.
8 Moffat, T. P.; Latanision, R. M. J. Electrchem. Soc. 1992, 139, 1869.   DOI
9 Macdonald, D. D.; Sun, A.; Priyantha, N.; Jayaweera, P. J. Electroanal. Chem. 2004, 572, 421.   DOI
10 Gray, J. J.; El Dasher, B. S.; Orme, C. A. Surf. Sci. 2006, 600, 2488.   DOI
11 Ogihara, H.; Udagawa, K.; Saji, T. Surf. Coat. Technol. 2012, 206, 2933.   DOI   ScienceOn
12 Zhang, B. P.; Habazaki, H.; Kawashima, A.; Asami, K.; Hashimoto, K. Corros. Sci. 1992, 33(10), 1519.   DOI
13 Zhang, B. P.; Habazaki, H.; Kawashima, A.; Asami, K.; Hashimoto, K. Corros. Sci. 1992, 33(5), 667.   DOI   ScienceOn
14 Tjong, S. C.; Chu, P. K. Surf. Coat. Technol. 2007, 201, 6781.   DOI
15 Pang, S.; Zhang, T.; Asami, K.; Inoue, A. Mater. Sci. Eng. 2004, 375, 368.   DOI
16 Pang, S.; Shek, C. H.; Asami, K.; Inoue, A.; Zhang, T. J. Alloys Compd. 2007, 434-435, 240.   DOI
17 Arab, S. T. Orient. J. Chem. 2007, 23, 777.
18 Arab, S. T.; Emran, K. M.; Al-Turaif, H. A. J. Saudi Chem. Soc., in Press. accepted Manuscript, available online 12 June 2011. http://www.sciencedirect.com/science/article/pii/ S1319610311001190
19 Boukamp, B. A. Equivalent Circuits (User Manual); University of Twente: The Netherlands, 1989.
20 Hukovic, M. M.; Omanvic, S. J. Electroanal. Chem. 1998, 455, 181.   DOI
21 Girault, P.; Grosseau-Poussard, J. L.; Dinhut, J. F.; Marechal, L. Nucl. Instrum. Methods Phys. Res., Sect. B 2001, 174, 439.   DOI
22 Martini, E. M. A.; Amaral, S. T.; Muller, I. L. Corros. Sci. 2004, 46, 2097.   DOI
23 Perez, F. J.; Martinez, L.; Hierro, M. P.; Gomez, C.; Portela, A. L.; Pucci, G. N.; Duday, D. J. Lecomte - Beckers; J. Greday, Y. Corros. Sci. 2006, 48, 472.   DOI
24 Arab, S. T.; Emran, K. M. Influence of Cr addition on the electrochemical behavior of Ni-base metallic glasses in HCl. accepted in Physical and Chemical News.
25 Le Canut, J. M.; Maximovitch, S.; Dalard, F. J. Nucl. Mater. 2004, 334, 13.   DOI
26 Goncalves, R. S.; Azambuja, D. S.; Lucho, A. M. S. Corros. Sci. 2002, 44, 467.   DOI
27 Fontana, M. G. Corrosion Engineering, 3th ed.; Mc Graw-Hill; New York, 1987.
28 Singh, V. B.; Gupta, A. Mater. Chem. Phys. 2004, 85, 12.   DOI
29 West, J. M. Electrodeposition and Corrosion Processes; Van Nostrand Reinhold Company: New York, 1970.
30 Lee, H. J.; Akiyama, E.; Habazaki, H.; Kawashima, A.; Asami, K.; Hashimoto, K. Corros. Sci. 1995, 37, 1313.   DOI
31 Lee, H. J.; Akiyama, E.; Habazaki, H.; Kawashima, A.; Asami, K.; Hashimoto, K. Corros. Sci. 1997, 39, 321.   DOI
32 Habazaki, H.; Sato, T.; Kawashima, A.; Asami, K.; Hashimoto, K. Mater. Sci. Eng. 2001, 304-306, 696.   DOI
33 Pardo, A.; Otero, E.; Merino, M. C.; Lopez, M. D.; Vazquez, M.; Agudo, P. Corros. Sci. 2002, 44, 1193.   DOI
34 Zhang, T.; Pang, S.; Asami, K.; Inoue, A. Mater. Trans. 2003, 44, 2322.   DOI
35 Hashimoto, K.; Asami, K.; Kawashima, A.; Habazaki, H.; Akiyama, E. Corros. Sci. 2007, 49, 42.   DOI
36 Matsuura, M.; Fujita, T.; Kawashima, A.; Yuqiao, Z.; Kimura, H.; Guan, P.; Chen, M.; Inoue, A., Konno, K.; Asada, K.; J. Alloys Compd. 2010, 496, 135.   DOI
37 Rife, G.; Chan, P. C. C.; Aust, K.T.; Waseda, Y. Mater. Sci. Eng. 1981, 48, 73.   DOI
38 Mitsuhashi, A.; Asami, K.; Kawashima, A.; Hashimoto, K. Corros. Sci. 1987, 27, 957.   DOI
39 Lian, K.; Thorpe, S. J.; Kirk, D. W. Electrochim. Acta 1992, 37, 169.   DOI
40 Gassa, L. M.; Vilche, J. R.; Barbosa, M. R. Mater. Sci. Forum 1995, 192, 825.
41 Lee, H. J.; Akiyama, E.; Habazaki, H.; Kawashima, A.; Asami, K.; Hashimoto, K. Corros. Sci. 1996, 38, 469.   DOI
42 Pang, S.; Shek, C. H.; Zhang, T.; Asami, K.; Ineue, A. Corros. Sci. 2006, 48, 625.   DOI
43 Katagiri, H.; Meguro, S.; Yamasaki, M.; Habazaki, H.;Sato, T.; Kawashima, A.; Asami, K.; Hashimoto, K. Corros. Sci. 2001, 43, 183.   DOI
44 Pang, S.; Zhang, T.; Asami, K.; Inoue, A. Mater. Trans. 2002, 43, 1771.   DOI
45 Naka, M.; Hashimoto, K.; Masumoto, T. J. Non-Cryst. Solids 1979, 34, 257.   DOI
46 Hashimoto, K. Passivity of Metals and Semiconductors, Proc. 5th Int. Symp. Passivity. Froment M., Ed.; Elsevier: Amsterdam, 1983, p 247.
47 Scully, C. Passivity of Metals and semiconductors, Proc. 5th Int. Symp. Passivity. Froment M., Ed.; Elsevier: Amsterdam, 1983, p 253.