• 마이크로전자및패키징학회지
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• 제28권2호
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• pp.29-37
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• 2021

3 차원 패키징을 위한 저온 Cu-Cu직접 접합부의 계면접착에너지를 향상시키기 위해 Cu박막 표면에 대한 Ar/N₂ 2단계 플라즈마 처리 전, 후 Cu표면 및 접합계면에 대한 화학결합을 X-선 광전자 분광법(X-ray photoelectron spectroscopy)을 통해 정량화한 결과, 2단계 플라즈마 처리로 인해 Cu표면에 Cu₄N이 형성되어 Cu산화를 효과적으로 억제하는 것을 확인하였다. 2단계 플라즈마 처리하지 않은 Cu-Cu시편은 표면 산화막의 영향으로 접합이 제대로 되지 않았으나 2단계 플라즈마 처리한 시편은 효과적인 표면 산화방지효과로 인해 양호한 Cu-Cu접합을 형성하였다. Cu-Cu직접접합 계면의 정량적 계면접착에너지를 double cantilever beam 시험방법 및 4점 굽힘(4-point bending, 4-PB) 시험방법을 통해 비교한 결과, 각각 1.63±0.24, 2.33±0.67 J/m²으로 4-PB 시험의 계면접착에너지가 더 크게 측정되었다. 이는 계면파괴역학의 위상각(phase angle)에 따른 계면접착에너지 증가 거동으로 설명할 수 있는데 즉, 4-PB의 계면균열선단 전단응력성분 증가로 인한 계면거칠기의 효과에 기인한 것으로 판단된다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.431-432
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• 2012

In the era of 20 nm scaled semiconductor volume manufacturing, Microelectronics Manufacturing Engineering Education is presented in this paper. The purpose of microelectronic engineering education is to educate engineers to work in the semiconductor industry; it is therefore should be considered even before than technology development. Three Microelectronics Manufacturing Engineering related courses are introduced, and how undergraduate students acquired hands-on experience on Microelectronics fabrication and manufacturing. Conventionally employed wire bonding was recognized as not only an additional parasitic source in high-frequency mobile applications due to the increased inductance caused from the wiring loop, but also a huddle for minimizing IC packaging footprint. To alleviate the concerns, chip bumping technologies such as flip chip bumping and pillar bumping have been suggested as promising chip assembly methods to provide high-density interconnects and lower signal propagation delay [1,2]. Aluminum as metal interconnecting material over the decades in integrated circuits (ICs) manufacturing has been rapidly replaced with copper in majority IC products. A single copper metal layer with various test patterns of lines and vias and $400{\mu}m$ by $400{\mu}m$ interconnected pads are formed. Mask M1 allows metal interconnection patterns on 4" wafers with AZ1512 positive tone photoresist, and Cu/TiN/Ti layers are wet etched in two steps. We employed WPR, a thick patternable negative photoresist, manufactured by JSR Corp., which is specifically developed as dielectric material for multi- chip packaging (MCP) and package-on-package (PoP). Spin-coating at 1,000 rpm, i-line UV exposure, and 1 hour curing at $110^{\circ}C$ allows about $25{\mu}m$ thick passivation layer before performing wafer level soldering. Conventional Si3N4 passivation between Cu and WPR layer using plasma CVD can be an optional. To practice the board level flip chip assembly, individual students draw their own fan-outs of 40 rectangle pads using Eagle CAD, a free PCB artwork EDA. Individuals then transfer the test circuitry on a blank CCFL board followed by Cu etching and solder mask processes. Negative dry film resist (DFR), Accimage$^{(R)}$, manufactured by Kolon Industries, Inc., was used for solder resist for ball grid array (BGA). We demonstrated how Microelectronics Manufacturing Engineering education has been performed by presenting brief intermediate by-product from undergraduate and graduate students. Microelectronics Manufacturing Engineering, once again, is to educating engineers to actively work in the area of semiconductor manufacturing. Through one semester senior level hands-on laboratory course, participating students will have clearer understanding on microelectronics manufacturing and realized the importance of manufacturing yield in practice.

• 한국환경농학회지
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• 제19권5호
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• pp.401-418
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• 2000

1. Production of the artificial zeolite from coal ash Coal fly ash is mainly composed of several oxides including $SiO_2$ and $Al_2O_3$ derived from inorganic compounds remained after burning. As minor components, $Fe_2O_3$ and oxides of Mg, Ca, P, Ti (trace) are also contained in the ash. These components are presented as glass form resulting from fusion in the process of the combustion of coal. In other word, coal ash may refer to a kind of aluminosilicate glass that is known to easily change to zeolite-like materials by hydrothermal reaction. Lots of hot seawater is disposing near thermal power plants after cooling turbine generator periodically. Using seawater in the hydrothermal reaction caused to produce low price artificial zeolite by reduction of sodium hydroxide consumption, heating energy and water cost. As coal ash were reacted hydrothermally, peaks of quartz and mullite in the ash were weakened and disappeared, and new Na-Pl peaks were appeared strengthily. Si-O-Si bonding of the bituminous coal ash was changed to Si-O-Al (and $Fe^{3+}$) bonding by the reaction. Therefore the produced Na-Pl type zeolite had high CEC of 276.7 $cmol^+{\cdot}kg^{-1}$ and well developed molecular sieve structure with low concentration of heavy metals. 2. Utilization of the artificial zeolite in agro-environment The artificial zeolite(1g) could remove 123.5 mg of zinc, 164.7 mg copper, 184.4 mg cadmium and 350.6 mg lead in the synthetic wastewater. The removability is higher 2.8 times in zinc, 3.3 times in copper, 4.7 times in cadmium and 4.8 times in lead than natural zeolite and charcoal powder. When the heavy metals were treated at the ratio of 150 $kg{\cdot}ha^{-1}$ to the rice plant, various growth inhibition were observed; brownish discoloration and death of leaf sheath, growth inhibition in culm length, number of panicles and grains, grain ripening and rice yield. But these growth inhibition was greatly alleviated by the application of artificial zeolite, therefore, rice yield increased $1.1{\sim}3.2$ times according to the metal kind. In addition, the concentration of heavy metals in the brown rice also lowered by $27{\sim}75%$. Artificial Granular Zeolites (AGZ) was developed for the purification of wastewater. Canon exchange capacity was 126.8 $cmol^+{\cdot}kg^{-1}$. AGZ had Na-Pl peaks mainly with some minor $C_3S$ peaks in X-ray diffractogram. In addition, AGZs had various pore structure that may be adhere the suspended solid and offer microbiological niche to decompose organic pollutants. AGZ could remove ammonium, orthophosphate and heavy metals simultaneously. Mixing ratio of artificial zeolite in AGZs was related positively with removal efficiency of $NH_4\;^+$ and negatively with that of $PO_4\;^{3-}$. Root growth of rice seedling was inhibited severely in the mine wastewater because of strong acidity and high concentration of heavy metals. As AGZ(1 kg) stayed in the wastewater(100L) for 4days, water quality turned into safely for agricultural usage and rice seedlings grew normally.

• Nuclear Engineering and Technology
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• 제55권6호
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• pp.2139-2146
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• 2023

During reactor operation, the divertor must withstand unprecedented simultaneous high heat fluxes and high-energy neutron irradiation. The extremely severe service environment of the divertor imposes a huge challenge to the bonding quality of divertor joints, i.e., the joints must withstand thermal, mechanical and neutron loads, as well as cyclic mode of operation. In this paper, potassium-doped tungsten (KW) is selected as the plasma facing material (PFM), oxygen-free copper (OFC) as the interlayer, oxide dispersion strengthened copper (ODS-Cu) alloy as the heat sink material, and reduced activation ferritic/martensitic (RAFM) steel as the structural material. In this study, a vacuum brazing technology is proposed and optimized to bond Cu and ODS-Cu alloy with the silver-free brazing material CuSnTi. The most appropriate brazing parameters are a brazing temperature of 940 ℃ and a holding time of 15 min. High-quality bonding interfaces have been successfully obtained by vacuum brazing technology, and the average shear strength of the as-obtained KW/Cu and ODS-Cu alloy joints is ~268 MPa. And a fabrication route for manufacturing the flat-type divertor target based on brazing technology is set. For evaluating the reliability of the fabrication technologies under the reactor relevant condition, the high heat flux test at 20 MW/m² for the as-manufactured flat-type KW/Cu/ODS-Cu/RAFM mockup is carried out by using the Electron-beam Material testing Scenario (EMS-60) with water cooling. This paper reports the improved vacuum brazing technology to connect Cu to ODS-Cu alloy and summarizes the production route, high heat flux (HHF) test, the pre and post non-destructive examination, and the surface results of the flat-type KW/Cu/ODS-Cu/RAFM mockup after the HHF test. The test results demonstrate that the mockup manufactured according to the fabrication route still have structural and interfacial integrity under cyclic high heat loads.

• 열처리공학회지
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• 제20권1호
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• pp.17-21
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• 2007

In this study, brazing characteristics of the dissimilar Ti and Cu metals using a Zr-base amorphous filler ($Zr_{41.2}Ti_{13.8}Cu_{12.5}Ni_{10.0}Be_{22.5}$ in at.%) have been investigated for various bonding temperatures. In the sample brazed at $790^{\circ}C$ for 10 min., the Ti-rich phases in the joint were observed, while the Cu-rich phases were obtained in the sample brazed at $825^{\circ}C$ for 10 min.. Such a different microstructure and composition in the joints could be explained by the degree of the dissolution reaction. At $790^{\circ}C$, the reaction between the Zr-rich liquid phase and the Ti base metal was actively occurred to form Ti-rich liquid phase in the joint. As the temperature increased to $825^{\circ}C$, however, the reaction between the Ti-rich liquid phase and the Cu base metal was promoted to form the Cu-rich liquid phase in the joint finally. Such a different interface reaction is attributed to the reactivity or solubility between the Zr as a main element in the filler and the Ti and Cu as a base metal element.

• 대한화학회지
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• 제55권2호
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• pp.199-203
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• 2011

일차원 수소결합형 배위고분자 $[Cu^{II}(C_{13}H_{17}N_3OBr)(C_8H_5O_4)]{\cdot}2H_2O.CH_3OH$을 합성하여 단결정 X-선 회절 연구로 특성을 규명하였다. 단량체 단위는 사각평면의 중심 $Cu^{II}$를 갖고 있다. 네개의 배위자리 중 세자리는 $N_2O$-주개 세트를 갖는 Schiff 염기형 리간드 (4-bromo-2-[(2-piperazin-1-yl-ethylimino)-methyl]-phenol)가 차지하고, 네 번째 자리는 옆에 있는 테레프탈레이트 단위의 산소 원자가 차지한다. 두개의 인접한 중성분자는 분자간 N-H---O 및 O-H---N 수소결합에 의해 연결되어 이합체 쌍을 형성한다. 각 이합체 쌍은 불연속적인 물 및 메탄올 분자에 의해 수소결합으로 다시 연결되어 일차원 초분자 네트워크를 형성한다.

• 한국표면공학회지
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• 제46권5호
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• pp.208-215
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• 2013

The aim of the present study was to improve the radiative heat dissipation of aluminum alloy, Al 1050. Resin/CuO coating and Cu/CuO composite plating were applied on aluminum alloy to improve the radiative heat dissipation. Resin/CuO coating was made using thermosetting silicon resin and Cu/CuO composite plating was made in pyrophosphate copper plating bath. Radiant heat flux($W/m^2$) was measured by self-produced radiant heat measurement device to compare each specimen. The cross section of specimen and chemical bonding of surface were analyzed by FE-SEM, XPS and FT-IR. As a result, radiant heat of Resin/CuO coating was higher than Cu/CuO composite plating due to the adhesion with aluminum plate and the difference in chemical bonding. But, Both of them were higher than aluminum alloy. In order to confirm the result of experiment, aluminum plate, Resin/CuO coating and Cu/CuO composite plating sample were applied LED and measured the LED temperature. As a result, LED temperature of samples were matched previous results and confirmed coated samples were lower about 10 degrees than the aluminum alloy.

• 한국재료학회지
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• 제3권6호
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• pp.668-677
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• 1993

Cu-P계, 4종의 Cu-P-Pn계 및 3종의 Cu-P-Sn-Ag계 용가재를 사용해 Ar분위기 하에서 1003 및 1033K로 1.2Ks동안 노브레이징한 ST304, STS430 및 저탄소강과 동 접합체들을 전단시험 및 조직시험하였다. 계면에서의 미세조직은 제 종류 즉 첫째,균열을 포함하는 반응층 둘째, 분산층 세째, 균열을 포함하는 반응층과 분산층으로 분류된다. 분산층만이 존재할때 40-60MPa 이상의 상대적으로 높은 전단강도가 얻어지며, 동모재파단을 일으킨다. 이 반응층이 형성되었을때는 반드시 균열이 형성되며, 낮은 전단강도를 나타내고 접합부파단을일으킨다. 이 반응층은 Fe-P계의 화합물이다. 이러한 미소조직 및 강도 경향은 용가재내 Sn의 존재 및 모재내 Ni(또한 Cr)의 존재 유무에 따라 변화한다.

• 한국분말재료학회지
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• 제27권1호
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• pp.25-30
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• 2020

Recently, the amount of heat generated in devices has been increasing due to the miniaturization and high performance of electronic devices. Cu-graphite composites are emerging as a heat sink material, but its capability is limited due to the weak interface bonding between the two materials. To overcome these problems, Cu nanoparticles were deposited on a graphite flake surface by electroless plating to increase the interfacial bonds between Cu and graphite, and then composite materials were consolidated by spark plasma sintering. The Cu content was varied from 20 wt.% to 60 wt.% to investigate the effect of the graphite fraction and microstructure on thermal conductivity of the Cu-graphite composites. The highest thermal conductivity of 692 W m^-1K^-1 was achieved for the composite with 40 wt.% Cu. The measured coefficients of thermal expansion of the composites ranged from 5.36 × 10^-6 to 3.06 × 10^-6K^-1. We anticipate that the Cu-graphite composites have remarkable potential for heat dissipation applications in energy storage and electronics owing to their high thermal conductivity and low thermal expansion coefficient.

• Journal of Welding and Joining
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• 제13권3호
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• pp.134-146
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• 1995

Aluminium nitride(AlN) is currently under investigation as potential candidate for replacing alumium oxide(Al$_{2}$ $O_{3}$) as a substrate material for for electronic circuit packaging. Brazing of aluminium nitride(AlN) to Cu with Ag base active alloy containing Ti has been investigated in vacuum. Binary Ag$_{98}$ $Ti_{2}$(AT) and ternary At-1wt.%Al(ATA), AT-1wt.%Ni(ATN), AT-1wt.% Mn(ATM) alloys showed good wettability to AlN and led to the development of strong bond between brate alloy and AlN ceramic. The reaction between AlN and the melted brazing alloys resulted in the formation of continuous TiN layers at the AlN side iterface. This reaction layer was found to increase by increase by increasing brazing time and temperature for all filler metals. The bond strength, measured by 4-point bend test, was increased with bonding temperature and showed maximum value and then decreased with temperature. It might be concluded that optimum thickness of the reaction layer was existed for maximum bond strength. The joint brazed at 900.deg.C for 1800sec using binary AT alloy fractured at the maximum load of 35kgf which is the highest value measured in this work. The failure of this joint was initiated at the interface between AlN and TiN layer and then proceeded alternately through the interior of the reaction layer and AlN ceramic itself.