• Title/Summary/Keyword: Contaminant particle

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Solid-state synthesis of yttrium oxyfluoride powders and their application to plasma spray coating (옥시불화이트륨 분말의 고상합성 및 플라즈마 스프레이 코팅 적용)

  • Lee, Jung-Il;Kim, Young-Ju;Chae, Hui Ra;Kim, Yun Jeong;Park, Seong Ju;Sin, Gyoung Seon;Ha, Tae Bin;Kim, Ji Hyeon;Jeong, Gu Hun;Ryu, Jeong Ho
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.31 no.6
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    • pp.276-281
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    • 2021
  • In order to manufacture a semiconductor circuit, etching, cleaning, and deposition processes are repeated. During these processes, the inside of the processing chamber is exposed to corrosive plasma. Therefore, the coating of the inner wall of the semiconductor equipment with a plasma-resistant material has been attempted to minimize the etching of the coating and particle contaminant generation. In this study, we synthesized yttrium oxyfluoride (YOF) powder by a solid-state reaction using Y2O3 and YF3 as raw materials. Mixing ratio of the Y2O3 and YF3 was varied from 1.0:1.0 to 1.0:1.6. Effects of the mixing ratio on crystal structure and microstructure of the synthesized YOF powder were investigated using XRD and FE-SEM. The synthesized YOF powder was successfully applied to plasma spray coating process on Al substrate.

Effect of AlF3 addition to the plasma resistance behavior of YOF coating deposited by plasma-spraying method (플라즈마-스프레이법에 의해 코팅한 옥시불화이트륨(YOF) 증착층의 플라즈마 내식성에 미치는 불화알루미늄(AlF3) 첨가 효과)

  • Young-Ju Kim;Je Hong Park;Si Beom Yu;Seungwon Jeong;Kang Min Kim;Jeong Ho Ryu
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.33 no.4
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    • pp.153-157
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    • 2023
  • In order to manufacture a semiconductor circuit, etching, cleaning, and deposition processes are repeated. During these processes, the inside of the processing chamber is exposed to corrosive plasma. Therefore, the coating of the inner wall of the semiconductor equipment with a plasma-resistant material has been attempted to minimize the etching of the coating and particle contaminant generation. In this study, we mixed AlF3 powder with the solid-state reacted yttrium oxyfluoride (YOF) in order to increase plasma-etching resistance of the plasma spray coated YOF layer. Effects of the mixing ratio of AlF3 with YOF powder on crystal structure, microstructure and chemical composition were investigated using XRD and FE-SEM. The plasma-etching ratios of the plasma-spray coated layers were calculated and correlation with AlF3 mixing ratio was analyzed.

A Study on the Application of Physical Soil Washing Technology at Lead-contaminated Shooting Range in a Closed Military Shooting Range Area (폐 공용화기사격장 내 납오염 사격장 군부지의 물리적 토양세척정화기술 적용성 연구)

  • Jung, Jaeyun;Jang, Yunyoung
    • Journal of Environmental Impact Assessment
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    • v.28 no.5
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    • pp.492-506
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    • 2019
  • Heavy metal contaminants in the shooting range are mostly present in a warhead circle or a metal fragment present as a particle, these fine metal particles are weathered for a long period of time is very likely that the surface is present as an oxide or carbon oxide. In particular, lead which is a representative contaminant in the shooting range soil, is present as more fine particles because it increases the softness and is stretched well. Therefore, by physical washing experiment, we conducted a degree analysis, concentration of heavy metals by cubic diameter, composition analysis of metallic substances, and assessment of applicability of gravity, magnetism and floating selection. The experimental results FESEM analysis and the measurement results lead to the micro-balance was confirmed thatthe weight goes outless than the soil ofthe same size in a thinly sliced and side-shaped structure according to the dull characteristics it was confirmed that the high specific gravity applicability. In addition, the remediation efficiency evaluation results using a hydrocyclone applied to this showed a cumulative remediation efficiency of 71%,twice 80%, 3 times 91%. On the other hand, magnetic sifting showed a low efficiency of 17%,floating selection -35mesh (0.5mm)target soil showed a relatively high efficiency to 39% -10mesh (2mm) efficiency was only 16%. The target treatment diameter of soil washing should be 2mm to 0.075mm, which is applied to the actual equipment by adding an additional input classification, which would require management as additional installation costs and processes are constructed. As a result, it is found that the soilremediation of shooting range can be separately according to the size of the warhead. The size is larger than the gravel diameter to most 5.56mm, so it is possible to select a specific gravity using a high gravity. However, the contaminants present in the metal fragments were found to be processed by separating using a hydrocyclone of the soil washing according to the weight is less than the soil of the same particle size in a thinly fragmented structure.