• 대한전자공학회논문지
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• 제20권1호
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• pp.50-54
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• 1983

민생용 전자기기에서 가장 많이 사용되고 있는 부품중의 하나인 탄소 피막 가변 저항기에서 접동자 이동시 발생하는 접촉 저항 변화의 원인을 분석하여 이에 대한 감소, 즉 접동 잡음 감소를 위한 몇 가지 방법을 착안하여 실험 검토하고 그 결과을 정리하여 본 결과 균일한 크기를 가진 탄소 분말 입자로서 고루게 배합된 저항액을 사용하고 접동자의 접촉점과 압력을 증가하면 접촉 저항 및 접촉 저항 변화. 즉 잠동 잡음을 감소시킬 수 있다.

• 지구물리와물리탐사
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• 제18권1호
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• pp.9-13
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• 2015

전기비저항 탐사 자료는 다양한 잡음을 포함하고 있다. 즉 전기비저항 자료는 높은 접촉저항, 장비의 측정 오차 및 주변의 불규칙한 전기적 잡음에 의해 영향을 받는다. 전기비저항 탐사 자료의 올바른 해석을 위해서는 이들 잡음의 정확한 추정이 요구된다. 이 연구에서는 상반성 시험을 통하여 추정된 잡음을 역산시 자료 가중에 반영하는 방법론을 제안하였다. 또한 역산시 현장 자료와 이론 자료 사이의 적합 오차와 상반성 오차를 분석하고, 상반성 오차와 적합 오차를 모두 이용하는 자료 가중법을 제안하였다. 현장 자료에 제안된 자료 가중법을 적용한 결과 통상적인 역산 결과에 비하여 국지적 이상대의 출현 빈도가 감소하는 것을 확인할 수 있었다.

• 한국전기전자재료학회논문지
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• 제11권3호
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• pp.174-180
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• 1998

In this work, the properties of FRP, which is applied recently in the composite insulating materials, by thermal treatment were investigated. The specimens were epoxy glass laminates fabricated by thermal press method and had the volume content of 46[%] cutted $45^{\circ}C$ in the fiber direction and 1.0[mm] thickness. The experimental results showed that the amount of weight loss, wettability, surface potential, and surface resistivity increased up to 200[$^{\circ}C$] as a function of temperature. Usually, most degradations caused the hydrophilic to decrease the contact angle. But, in this work on thermal-degradated FRP, we can confirm the introduction of hydrophobic properties by cross-linking and the ablation of polar small-molecules rather than chain scission and oxidation. Finally, weight loss and contact angle increased. These phenomena show the existence of hydrophobic surface. With the change to the hydrophobic surface and the electrical potential and resistivity on FRP surface increased. But, the dielectric properties and tensile stength are decreased.

• 통합자연과학논문집
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• 제4권4호
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• pp.294-297
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• 2011

Quality of PEDOT electrode thin film vapor phase-polymerized on 3-aminopropyltriethoxysilane (APS) self-assembled monolayer (SAM) is very crucial for making an ohmic contact between electrode and semiconductor layer of an organic transistor. In order to improve the quality of PEDOT film, the quality of APS-SAM laying underneath the film must be in the best condition. In this study, in order to improve the quality of APS-SAM, the monolayer was self-assembled on $SiO_2$ surface by a dip-coating method under strictly controlled relative humidity (< 18%RH). The quality of APS-SAM and PEDOT thin film were investigated with a contact angle analyzer, AFM, FE-SEM, and four-point probe. The investigation showed that a PEDOT film grown on the humidity-controlled SAM is very smooth and compact (sheet resistivity = 20.2 Ohm/sq) while a film grown under the uncontrolled condition is nearly amorphous and contains quite many pores (sheet resistivity = 200 Ohm/sq). Therefore, this study clearly proves that a highly improved quality of APSSAM can offer a highly conductive PEDOT electrode thin film on it.

• 신재생에너지
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• 제4권2호
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• pp.74-80
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• 2008

To improve the blue responses of screen-printed single crystalline silicon solar cells, we investigated an emitter etch-back technique to obtain high emitter sheet resistances, where the defective dead layer on the emitter surface was etched and became thinner as the etch-back time increased, resulting in the monotonous increase of short circuit current and open circuit voltage. We found that an optimal etch-back time should be determined to achieve the maximal performance enhancement because of fill factor decrease due to a series resistance increment mainly affected by contact and lateral resistance in this case. To elucidate the reason for the fill factor decrease, we studied the resistance analysis by potential mapping to determine the contact and the lateral series resistance. As a result, we found that the fill factor decrease was attributed to the relatively fast increase of contact resistance due to the dead layer thinning down with the lowest contact resistivity when the emitter was contacted with screen-printed silver electrode.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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• pp.91.2-91.2
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• 2010

The use of plated front contact for metallization of silicon solar cell may alternative technologies as a screen printed and silver paste contact. This technologies should allow the formation of contact with low contact resistivity a high line conductivity and also reduction of shading losses. The better performance of Ni/Cu contacts is attributed to the reduced series resistance due to better contact conductivity of Ni with Si and subsequent electroplating of Cu on Ni. The ability to pattern narrower grid lines for reduced light shading combined with the lower resistance of a metal silicide contact and improved conductivity of plated deposit. This improves the FF as the series resistance is deduced. This is very much required in the case of low concentrator solar cells in which the series resistance is one of the important and dominant parameter that affect the cell performance. A selective emitter structure with highly dopes regions underneath the metal contacts, is widely known to be one of the most promising high-efficiency solution in solar cell processing. This paper using selective emitter structure technique, fabricated Ni/Cu plating metallization cell with a cell efficiency of 17.19%.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.444-445
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• 2009

The metallic contact system of silicon solar cell must have several properties, such as low contact resistance, easy application and good adhesion. Ni is shown to be a suitable barrier to Cu diffusion as well as desirable contact metal to silicon. Nickel monosilicide(NiSi) has been suggested as a suitable silicide due to its lower resistivity, lower sintering temperature and lower layer stress than $TiSi_2$. Copper and Silver can be plated by electro & light-induced plating method. Light-induced plating makes use the photovoltaic effect of solar cell to deposit the metal on the front contact. The cell is immersed into the electrolytic plating bath and irradiated at the front side by light source, which leads to a current density in the front side grid. Electroless plated Ni/ Electro&light-induced plated Cu/ Light-induced plated Ag contact solar cells result in an energy conversion efficiency of 16.446 % on $0.2\sim0.6\;{\Omega}{\cdot}cm$, $20\;\times\;20\;mm^2$, CZ(Czochralski) wafer.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2008년도 춘계학술대회 논문집
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• pp.390-393
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• 2008

To improve the blue responses of screen-printed single crystalline silicon solar cells, we investigated an emitter etch-back technique to obtain high emitter sheet resistances, where the defective dead layer on the emitter surface was etched and became thinner as the etch-back time increased, resulting in the monotonous increase of short circuit current and open circuit voltage. We found that an optimal etch-back time should be determined to achieve the maximal performance enhancement because of fill factor decrease due to a series resistance increment mainly affected by contact and lateral resistance in this case. To elucidate the reason for the fill factor decrease, we studied the resistance analysis by potential mapping to determine the contact and the lateral series resistance. As a result, we found that the fill factor decrease was attributed to the relatively fast increase of contact resistance due to the dead layer thinning down with the lowest contact resistivity when the emitter was contacted with screen-printed silver electrode.

• 한국진공학회지
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• 제11권1호
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• pp.43-49
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• 2002

N형 InGaAs에 대한 Pd/Ge/Pd/Ti/Au 오믹 접촉의 급속 열처리 조건에 따른 오믹 특성을 조사하였다. $450^{\circ}C$까지의 열처리에 의해 우수한 오믹 특성을 나타내어 $400^{\circ}C$/10초의 급속 열처리 후에 최저 $1.1\times10^{-6}\Omega\textrm{cm}^2$의 접촉 비저항을 나타내었다. $425^{\circ}C$ 이상의 열처리 후에 접촉 비저항이 점점 증가하여 $450^{\circ}C$에서는 오믹 재료와 InGaAs의 반응에 의해 오믹 특성의 열화가 나타났다. 그러나 high-$10^{-6}\Omega\textrm{cm}^2$ 정도의 비교적 우수한 오믹 특성을 유지하였고, 양호한 표면 및 계면이 얻어져 화합물 반도체 소자에의 응용 가능성이 충분한 것으로 판단된다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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• pp.834-837
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• 2003

In this study, Ohmic contacts make on 3C-SiC using TiN. Ohmic contact resistivity of TiN/3C-SiC was evaluated. Specific contact resistance was calculated by Circular-TLM(transmission line model) method and physics properties were measured using XRD, SEM, respectively. TiN contact is stable at high temperatures and a good diffusion barrier material. The TiN/3C-SiC contacts are thermally stable to annealing temperatures up to $1000^{\circ}C$. The TiN thin-film depostied on 3C-SiC substraes have good electrical properties. Therefore, the TiN/3C-SiC contact can be usefully applied for high-temperature MEMS applications over $500^{\circ}C$.