• 제목/요약/키워드: Contact Pattern

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Overlay correction in sub-0.18${\mu}{\textrm}{m}$ metal layer photolithography process (0.18${\mu}{\textrm}{m}$이하 metal layer 사진공정에서의 overlay 보정)

  • 이미영;이홍주
    • Proceedings of the KAIS Fall Conference
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    • 2002.05a
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    • pp.106-108
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    • 2002
  • 반도체 physical layout design rule이 작아짐에 따라 Proximity effect와 overlay가 Pattern 구현에 크게 영향을 미치고 있다. Metal layer와 contact의 부족한 overlay margin으로 overlay 불량이 발생하고, 감소한 space margin으로 인해 bridge와 같은 문제가 나타난다. 따라서, resolution을 향상시키고, 최소한의 overlay margin을 확보함으로써 미세 pattern의 구현을 가능하게 한다. 이를 위해 OPC와 attPSM 같은 분해능향상기술이 사용된다. 그러나 attPSM의 사용은 원하지 않는 pattern이 생성되는 sidelobe와 같은 문제가 발생한다. 따라서 serial image simulation올 통해 추출한 rule을 rule-based correction에 적용하여 sidelobe현상을 방지한다. 그리고 overlay margin 부족으로 나타나는 문제는 metal layer와 contact overlap되는 영역의 line edge를 확장하고, rule checking을 통해 최소한의 space margin을 확보하여 해결한다 따라서 overlay error를 rule-based correction을 사용하여 효과적으로 방지한다.

Measurement and Analysis of in-plane deformation by laser interferometry (레이저 간섭법을 이용한 면내 변형 측정 및 해석)

  • 노경완;유원재;김동우
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1997.04a
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    • pp.91-95
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    • 1997
  • ESPI(Electronic Speckle Pattern Interferometry) is new optical measuring method to be able to measure the surface deformations of engineering components and materials in industrial areas. Conventional measuring method of surface deformation such as the strain gauge have many demerits because it is contact and point-to-point measuring one. But ESPI that is non-contact, whole field measuring method can overcome previous disadvantages. The speckle pattern to be formed with interference phenomena of scattering light from rough surfaces illuminated by laser light have phase information of surface In this study we used this interference phenomena and the phase shifting method to measure the in- plane deformation, together with the use of digital equipment to process the information contained in the speckle pattern and to display consequent inter ferograms. Finally we obtained good agreement between the experimenta results and those of FEM..

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Analysis of Montage Pattern of e-book as a Film Language (영상 언어로써 이북(e-book)의 몽타주 패턴)

  • Shin, Seungyun
    • Journal of Korea Multimedia Society
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    • v.19 no.7
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    • pp.1216-1224
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    • 2016
  • This study analyzed the montage pattern of e-book in a bid to include e-book in the film language system. To this end, this study targeted three pieces of e-books which reproduced the animation for theater use of Disney Company. This study did research on characteristics of montage in films, and kinds of film vectors, and defined it as 'Montage of Experience' according to media characteristics of e-book. This study deducted the montage pattern of 3 sorts of classification, and 10 sorts of detailed classification by doing research on the analysis object. This study has a significance in that it pioneers a new perspective in e-book research which has been biased towards a functional perspective. Analysis of the point of contact where the existing visual media, and new media meet with each other could be a driving force promoting the growth of the relevant industry, and this study thinks that the analysis of the point of contact is the research which is helpful to working out qualitative improvement of e-book contents.

Study on the Phases and Testing Standard of Standing to Squatting Position (쭈그려 앉기의 단계화와 표준화된 검사에 대한 연구)

  • Chung, Hyung-Kuk
    • The Journal of Korean Physical Therapy
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    • v.19 no.6
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    • pp.11-15
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    • 2007
  • Purpose: This study examined the various patterns of standing to squatting activities, and reports the testing standard and phases for examining the standing to squatting position. Methods: One thousand, normal college students (500 males, 500 females) volunteered for this study. The patterns are performed by naked eye analysis with two video cameras. Results: The patterns from the standing to squatting position are as follows 1. parallel with the heel on the pattern: 2. parallel with the heel off the pattern: 3. closed with the heel on the pattern: 4. closed with the heel on the pattern: 5. open with the heel on the patternand 6. open with the heel on the pattern. Conclusion: The phases of the standing to squatting position are as follows: phase I from standing to the anterior parts of the knees reaching the anterior limit of the BOS, phase II from phase I until the height of the hip and knee joints are the same, phase III from phase II until there was no full squatting and the heels broke contact with the floor and phase IV from phase III full squatting on the heels in contact with the floor.

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A Study on the Effects of Chewing Side Preference on the Pattern of Occlusal Contacts (저작습관에 따른 교합접촉의 변화양태에 관한 연구)

  • Sun-Oh Kwon;Kyung-Soo Han
    • Journal of Oral Medicine and Pain
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    • v.15 no.1
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    • pp.117-124
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    • 1991
  • The purpose of his study was to investigate the variations of occlusal contact pattern according to chewing side preference. The author selected 59 dental students (mean age 23.6 years) who had no signs and symptoms of masticatory disorders and divided into two groups, that is, bilateral chewing side group and unilateral chewing side group, respectively. For recording, T-Scan System(Teksan Inc., USA) was used and the recorded occlusal contacts were examined as to the number of occlusal contacts, points distribution in dental arch, time sequence and force snapshot. The obtained results were as follow s: 1. Total number of occlusal contacts were more in unilateral chewing side group and there were significant difference in number between right and left side or between chewing and less-chewing side in all two groups. 2. All items related to time sequence showed no statistical significant difference between two groups in any case. 3. Unilateral chewing side group had more occlusal contact force than bilateral group, especially in chewing side. From the above finding, the author considered that there was occlusal unbalance in unilateral chewing side group. 4. Chewing side preference would possibly have more effects on the occurrence rate of anterior tooth contact that the rate of prolonged their contact but proved.

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Local Back Contact Formed by Screen Printing and Atomic Layer Deposited Al2O3 for Silicon Solar Cell

  • Jo, Yeong-Jun;Jang, Hyo-Sik
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.687-687
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    • 2013
  • In rearpoint contact solar cell and the PERC (passivated emitter rear contact) type cell, surfaces were passivated by SiO2 or Al2O3 to increase solar cell efficiency. Therefore, we have investigated the effect of surface passivation for crystalline silicon solarcell using mass-production atomic layer deposited (ALD) Al2O3. The patttern which consists of cylinders with 100um diameter and 5um height was formed by PR patterning on Si (100) substrate and then Al2O3 of about 10nm and 20nm thickness was deposited by ALD. The pattern in 10 nm Al2O3 film was removed by dipping in aceton solution for about 10 min but the pattern in 20 nm Al2O3 film was not. The influences of process temperature and heat treatment were investigated using microwave photoconductance decay (PCD) and Quasi-Steady-State photoconductance (QSSPC). The solar cell process used in this work combines the advantage of using the applicability of a selective deposition associated with a ALD passivation and the use of low-cost screen print for the contacts formation.

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Selective Contact Hole Filling by electroless Ni Plating (무전해 Ni 도금에 의한 선택적 CONTACT HOLE 충전)

  • 우찬희;권용환;김영기;박종완;이원해
    • Journal of the Korean institute of surface engineering
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    • v.25 no.4
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    • pp.189-206
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    • 1992
  • The effect of activation and electroless nickel plating conditions on contact properties was investi-gated for selective electroless nickel plating of Si wafers in order to obtain an optimum condition of con-tact hole filling. According to RCA prosess, p-type silicon (100) surface was cleaned out and activated. The effects of temperature, DMAB concentration, time, and strirring were investigated for activation of p-type Si(100) surface. The optimal activation condition was 0.2M HF, 1mM PdCl2, 2mM EDTA,$ 70^{\circ}C$, and 90sec under ultrasonic vibration. In electroless nickel plating, the effect of temperature, DMAB concentra-tion, pH, and plating time were studied. The optimal plating condition found was 0.10M NiSO4.H2O, 0.11M Citrate, pH 6.8, $60^{\circ}C$, 30minutes. The contact resistance of films was comparatively low. It took 30minutes to obtain 1$\mu\textrm{m}$ thick film with 8mM DMAB concentration. The film surface roughness was improved with decreasing temperature and decreasing pH of the plating solution. The best quality of the film was obtained at the condition of temperature $60^{\circ}C$ and pH 6.0. The micro-vickers hardness of film was about 800Hv. Plating rate of nickel on the hole pattern was slower than that of nickel on the line pattern.

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Study on Scoring of Hypoid Gear Set in Bus with Retarder (리타더 장착 버스 하이포이드 기어의 스코링에 관한 연구)

  • Yang, J.H.;Kim, Y.J.
    • Journal of Power System Engineering
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    • v.13 no.6
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    • pp.102-109
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    • 2009
  • A retarder, as a supplementary brake system that is not friction-based, is frequently used in heavy-duty vehicles generally to slow the vehicles down on inclines. The electric retarder mainly used in a heavy-duty bus is generally placed between the transmission and the axle. The rotor inside the retarder system is attached to the axle. The operation of the retarder within a driven vehicle generates reverse torque due to coast driving force on hypoid gears in the differential gear system. By the reverse torque, scoring or scuffing on the hypoid gear teeth may directly occur. The scoring may be generated due to excessive contact stresses on the tooth surface. In this study, tooth contact stresses and contact patterns were analysed in order to investigate on the tooth scoring phenomenon using a finite element analysis program T900 in which the Hertzian contact stress formula was taken. Backlash, wear and surface finish were considered in the finite element simulation on the scoring.

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원자층 식각방법을 이용한, Contact Hole 내의 Damage Layer 제거 방법에 대한 연구

  • Kim, Jong-Gyu;Jo, Seong-Il;Lee, Seong-Ho;Kim, Chan-Gyu;Gang, Seung-Hyeon;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.244.2-244.2
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    • 2013
  • Contact Pattern을 Plasma Etching을 통해 Pattering 공정을 진행함에 있어서 Plasma 내에 존재하는 High Energy Ion 들의 Bombardment 에 의해, Contact Bottom 의 Silicon Lattice Atom 들은 Physical 한 Damage를 받아 Electron 의 흐름을 방해하게 되어, Resistance를 증가시키게 된다. 또한 Etchant 로 사용되는 Fluorine 과 Chlorine Atom 들은, Contact Bottom 에 Contamination 으로 작용하게 되어, 후속 Contact 공정을 진행하면서 증착되는 Ti 나 Co Layer 와 Si 이 반응하는 것을 방해하여 Ohmic Contact을 형성하기 위한 Silicide Layer를 형성하지 못하도록 만든다. High Aspect Ratio Contact (HARC) Etching 을 진행하면서 Contact Profile을 Vertical 하게 형성하기 위하여 Bias Power를 증가하여 사용하게 되는데, 이로부터 Contact Bottom에서 발생하는 Etchant 로 인한 Damage 는 더욱 더 증가하게 된다. 이 Damage Layer를 추가적인 Secondary Damage 없이 제거하기 위하여 본 연구에서는 원자층 식각방법(Atomic Layer Etching Technique)을 사용하였다. 실험에 사용된 원자층 식각방법을 이용하여, Damage 가 발생한 Si Layer를 Secondary Damage 없이 효과적으로 Control 하여 제거할 수 있음을 확인하였으며, 30 nm Deep Contact Bottom 에서 Damage 가 제거될 수 있음을 확인하였다. XPS 와 Depth SIMS Data를 이용하여 상기 실험 결과를 확인하였으며, SEM Profile 분석을 통하여, Damage 제거 결과 및 Profile 변화 여부를 확인하였으며, 4 Point Prove 결과를 통하여 결과적으로 Resistance 가 개선되는 결과를 얻을 수 있었다.

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백목련의 가지 생장 유형

  • 최형선
    • The Korean Journal of Ecology
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    • v.16 no.4
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    • pp.417-428
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    • 1993
  • Branching growth pattern of Mugnolza denuduta is likely to be originated from two growth strategies: environment overcoming strategy and life maintenance strategy, which coexist in a tree. Growth rate of branches was strongly correlated with relative light intensity (P<0.001) and physical contact (P<0.01), however there is no significant correlation between growth rate and direction of branch. When relative light intensity is less than 1%, the growth was restricted by physical contact with the surrounding branches. In contrast, the growth was rarely restricted by physical contact when relative light intensitiy was 10% or more. The branching rate was significantly affected by the presence or absence of physical contact (P<0.05), but it was not significantly affected by relative light intensity nor by the direction of branch. In the beginning stage of the growth, the ratio of the material allocation from main branch to subbranch was large and varied with the influence of surrounding environment. These various growth rates, which implicate a variety of material allocation ratios (0.16~0.98), affect branch growth pattern through the optimum growth strategies. The growth and arrangement of branches of Magnolia denudata display the solar collectors to maximize the total amount of energy absorbed and to overcome the restriction of the environment.

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