• 제목/요약/키워드: Compound semiconductor fabrication

검색결과 40건 처리시간 0.022초

$CuInSe_2$ 3원 화합물 박막의 전기적 구조적 특성 (Structural and Electrical Properties of $CuInSe_2$ Ternary Compound Thin Film)

  • 김영준;양현훈;박중윤;정운조;박계춘
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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    • pp.258-259
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    • 2005
  • [ $CuInSe_2$ ] thin films were fabricated at various fabrication conditions (substrate temperature, sputtering pressure, BC/RF power, vapor deposition, heat treatment). And structural and electrical properties were measured in order to certify optimum conditions for growth of the ternary compound semiconductor $CuInSe_2$ thin films with stoichiometric composition. $CuInSe_2$ thin film was well made at the heat treatment of 500[$^{\circ}C$] of SLG/Cu/In/Se stacked elemental layer which was prepared by sputter and thermal evaporator, and chemical composition of the thin film was analyzed nearly as the proportion of 1 : 1 : 2. At the same time, carrier concentration, hall mobility and resistivity of the thin films was $1.27\sim9.88\times10^{17}[cm^{-3}]$, $49.95\sim185[cm^2/V{\cdot}s]$ and $10^{-1}\sim10^{-2}[\Omega{\cdot}cm]$, respectively

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밀리미터파 Transistors

  • 범진욱;송남진
    • 한국전자파학회지:전자파기술
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    • 제11권2호
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    • pp.2-11
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    • 2000
  • 밀리미터파 회로 제작에 필수적인 능동소자인 고 속 Transistor기술은 반도체 설계 및 공정기술의 발 전으로 급격히 발달하고 있다. 주로 GaAs계나 InP 계 III-V 화합물 반도체를 이용한 고주파 transistor 는 FET기반의 MODFET과 BJT기반의 HBT가 밀 리미터파 대역에서 응용된다. 전통적인 III-V족 반 도체 이외에 SiGe와 GaN 소자 기술 역시 급속한 발전을 이루고 있다. 본 논문에서는 밀리미터파 transistor 기술에 대한 기본적인 내용과 응용 예를 소개한다.

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금속 코팅을 통한 다양한 반도체/금속 나노선 제작 (Fabrication of Various Semiconductor/Metal Structured Nanowires Using Metal Coating)

  • 박병준;김경환;김현석;조경아;김진형;이준우;김상식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.252-255
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    • 2004
  • Various Semiconductor/Metal structured nanowires were synthesized from the simple thermal annealing of ball-milled compound powders and the thermal evaporation of metals. Their structural properties were investigated by Scanning Electron Microscopy(SEM) and Transmission Electron Microscopy(TEM), Energy Dispersive X-ray spectroscopy(EDX). Depending on the type of metals and the material of nanowires, uniform somiconductor/metal nanowires(GaN/Al, GaN/Ag) or isolated metal particles on semiconductor nanowires$(SnO_2/Ti,\;Si/Ti)$ were formed on the surface of nanowires.

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고전압 GaN 쇼트키 장벽 다이오드의 완충층 누설전류 분석 (Analysis for Buffer Leakage Current of High-Voltage GaN Schottky Barrier Diode)

  • 황대원;하민우;노정현;박정호;한철구
    • 대한전자공학회논문지SD
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    • 제48권2호
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    • pp.14-19
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    • 2011
  • 본 논문에서 실리콘 기판 위에 성장된 GaN 에피탁시를 활용하여 고전압 쇼트키 장벽 다이오드를 제작하였으며, 금속-반도체 접합의 열처리 조건에 따른 GaN 완충층 (buffer layer) 누설전류와 제작된 다이오드의 전기적 특성 변화를 연구하였다. Ti/Al/Mo/Au 오믹 접합과 Ni/Au 쇼트키 접합이 제작된 소자에 설계 및 제작되었다. 메사를 관통하는 GaN 완충층의 누설전류를 측정하기 위하여 테스트 구조가 제안되었으며 제작하였다. $700^{\circ}C$에서 열처리한 경우 100 V 전압에서 측정된 완충층의 누설전류는 87 nA이며, 이는 $800^{\circ}C$에서 열처리한 경우의 완충층의 누설전류인 780 nA보다 적었다. GaN 쇼트키 장벽 다이오드의 누설전류 메커니즘을 분석하기 위해서 Auger 전자 분광학 (Auger electron spectroscopy) 측정을 통해 GaN 내부로 확산되는 Au, Ti, Mo, O 성분들이 완충층 누설전류 증가에 기여함을 확인했다. 금속-반도체 접합의 열처리를 통해 GaN 쇼트키장벽 다이오드의 누설전류를 성공적으로 감소시켰으며 높은 항복전압을 구현하였다.

Cu/In 비에 따른 $CuInS_{2}$ 박막의 특성에 관한 연구 (A Study on Properties of $CuInS_{2}$ thin films by Cu/In ratio)

  • 양현훈;김영준;정운조;박계춘
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2007년도 춘계학술대회
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    • pp.326-329
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    • 2007
  • $CuInS_{2}$ thin films were synthesized by sulpurization of Cu/In Stacked elemental layer deposited onto glass Substrates by vacuum furnace annealing at temperature 200[$^{\circ}C$]. And structural and electrical properties were measured in order to certify optimum conditions for growth of the ternary compound semiconductor $CuInS_{2}$ thin films with non-stoichiometry composition. $CuInS_{2}$ thin film was well made at the heat treatment 200[$^{\circ}C$] of SLG/Cu/ln/S stacked elemental layer which was prepared by thermal evaporator, and chemical composition of the thin film was analyzed nearly as the proportion of 1 : 1 : 2. Physical properties of the thin film were investigated at various fabrication conditions substrate temperature, annealing and temperature, annealing time by XRD, FE-SEM and Hall measurement system. At the same time, carrier concentration, hall mobility and resistivity of the thin films was $9.10568{\times}10^{17}$ [$cm^{-3}$], 312.502 [$cm^{2}/V{\cdot}s$] and $2.36{\times}10^{-2}$ [${\Omega}{\cdot}cm$], respectively.

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비진공 방법에 의한 CIGS/CZTS계 박막 태양전지 제조 (Fabrication of CIGS/CZTS Thin Films Solar Cells by Non-vacuum Process)

  • 유다영;이동윤
    • 한국재료학회지
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    • 제28권12호
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    • pp.748-757
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    • 2018
  • Inorganic semiconductor compounds, e.g., CIGS and CZTS, are promising materials for thin film solar cells because of their high light absorption coefficient and stability. Research on thin film solar cells using this compound has made remarkable progress in the last two decades. Vacuum-based processes, e.g., co-evaporation and sputtering, are well established to obtain high-efficiency CIGS and/or CZTS thin film solar cells with over 20 % of power conversion. However, because the vacuum-based processes need high cost equipment, they pose technological barriers to producing low-cost and large area photovoltaic cells. Recently, non-vacuum based processes, for example the solution/nanoparticle precursor process, the electrodeposition method, or the polymer-capped precursors process, have been intensively studied to reduce capital expenditure. Lately, over 17 % of energy conversion efficiency has been reported by solution precursors methods in CIGS solar cells. This article reviews the status of non-vacuum techniques that are used to fabricate CIGS and CZTS thin films solar cells.

진공증착에 의해 제조된 $CuInS_2$ 박막의 제작 및 특성 (Fabrication and Characteristics of $CuInS_2$ thin films produced by Vacuum Evaporation)

  • 앙현훈;정운조;김덕태;박계춘
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 춘계학술대회 논문집 센서 박막재료연구회 및 광주 전남지부
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    • pp.15-17
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    • 2008
  • $CuInS_2$ thin films were synthesized by sulpurization of Cu/In Stacked elemental layer deposited onto glass Substrates by vacuum furance annealing at temperature 200[$^{\circ}C$]. And structural and electrical properties were measured in order to certify optimum conditions for growth of the ternary compound semiconductor $CuInS_2$ thin films with non-stoichiometry composition. $CuInS_2$ thin film was well made at the heat treatment 200[$^{\circ}C$] of SLG/Cu/In/S stacked elemental layer which was prepared by thermal evaporator, and chemical composition of the thin film was analyzed nearly as the proportion of 1 : 1 : 2. Physical properties of the thin film were investigated at various fabrication conditions substrate temperature, annealing and temperature, annealing time by XRD, FE-SEM and hall measurement system. At the same time, carrier concentration, hall mobility and resistivity of the thin films was $9.10568{\times}10^{17}[cm^{-3}]$, 312.502[$cm^2/V{\cdot}s$] and $2.36{\times}10^{-2}[{\Omega}{\cdot}cm]$, respectively.

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진공증착에 의해 제조된 $CuInS_2$ 박막의 제작 및 특성 (Fabrication and Characteristics of $CuInS_2$ thin films produced by Vacuum Evaporation)

  • 양현훈;김영준;소순열;정운조;박계춘;이진;정해덕
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 광주전남지부
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    • pp.68-70
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    • 2006
  • $CuInS_2$ thin films were synthesized by sulpurization of Cu/In Stacked elemental layer deposited onto glass Substrates by vacuum furance annealing at temperature 200[$^{\circ}C$]. And structural and electrical properties were measured in order to certify optimum conditions for growth of the ternary compound semiconductor $CuInS_2$ thin films with non-stoichiometry composition. $CuInS_2$ thin film was well made at the heat treatment 200 [$^{\circ}C$] of SLG/Cu/In/S stacked elemental layer which was prepared by thermal evaporator, and chemical composition of the thin film was analyzed nearly as the proportion of 1:1:2. Physical properties of the thin film were investigated at various fabrication conditions substrate temperature, annealing and temperature, annealing time by XRD, FE-SEM and hall measurement system. At the same time, carrier concentration, hall mobility and resistivity of the thin films was $9.10568{\times}10^{17}[cm^{-3}]$, $312.502[cm^2/V{\cdot}s]$ and $2.36{\times}10^{-2}[{\Omega}{\cdot}cm]$, respectively.

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MOCVD를 이용한 화합물 반도체 Solar Cell의 개발-Field Aided Heteroface 전지 (Design and Fabrication of Compound Semiconductor Solar Cells Grown by MOCVD-Field Aided Heteroface Cell)

  • 창기근;엄우용;임성규
    • 전자공학회논문지A
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    • 제28A권9호
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    • pp.752-760
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    • 1991
  • The computer aided analysis is performed to investigate the influence of physical parameters (thickness and doping concentration, etc.) in the window, emitter, base on the efficiency characteristics of a uniformly doped hetroface cell. A field aided heteroface cell is newly designed on a basis of optimum data obtained from the theoretical analysis. The field aided heteroface cell fabricated using MOCVD exhibits a total/active area conversion efficiency of EFF. (tot) = 18.9% /EFF. (act.) = 21.4% under the natural incident light of 56.2 mW/cm\ulcorner having a low series resistance of Rs = 0.94 \ulcornercm\ulcornerand a high spectral response of S.R. (ext) > 90% in a range of $7700{\AA}$ < $8500{\AA}$.

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액상에피층 성장방법에 의한 AlGaAs/GaAs 이중 헤테로 구조의 성장과 LED의 제작 (Growing of AlGaAs/GaAs Double-Heterostructure by the Liquid Phase Epitaxy Method and Fabrication of the Light Emitting Diode)

  • 이원성;권영세
    • 대한전자공학회논문지
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    • 제21권5호
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    • pp.11-16
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    • 1984
  • 본 논문에서는 III-V족 반도체 소자의 제작에 사용되는 액상 에피층 성장 시스템의 제작 및 이를 이용한 AIGaAs/GaAs 이중 헤테로 구조의 성장 방법에 관하여 고찰하였다. 또한 이 헤테로 구조가 발광 다이오드에 이용될 수 있음을 확인하였다.

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