A Study on the Etching Characateristics of TiW Films using BCl$_3$ /SF6/ gas chemistries
(BCl$_3$ /SF6 gas chemistries에 의한 TiW막의 식각특성 연구)
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- Journal of the Korean Institute of Telematics and Electronics D
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- v.34D no.3
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- pp.1-8
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- 1997