• Title/Summary/Keyword: Combined BJT

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A BJT Structure with High-Matching Property Fabricated Using CMOS Technology (CMOS 기술을 기반으로 제작된 정합 특성이 우수한 BJT 구조)

  • Jung, Yi-Jung;Kwon, Hyuk-Min;Kwon, Sung-Kyu;Jang, Jae-Hyung;Kwak, Ho-Young;Lee, Hi-Deok
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.49 no.5
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    • pp.16-21
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    • 2012
  • For CMOS based bipolar junction transistor (BJT), a novel BJT structure which has higher matching property than conventional BJT structure was proposed and analyzed. The proposed structure shows a slight decrease of collector current density, $J_C$ about 0.361% and an increase of current gain, ${\beta}$ about 0.166% compared with the conventional structure. However, the proposed structure shows a decrease of area about 10% the improvement of matching characteristics of collector current ($A_{IC}$) and current gain ($A_{\beta}$) about 45.74% and 38.73% respectively. The improved matching characteristic of proposed structure is believed to be mainly due to the decreased distance between two emitters of pair BJTs, which results in the decreased effect of deep n-well of which resistance has the higher standard deviation than the other resistances.