• Title/Summary/Keyword: Co-sputtering

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Effects of Sputtering Parameters on the Properties of Co/Pd Multilayered Films

  • Shin, J. N.;Hong, D. H.;Lee, T. D.
    • Journal of Magnetics
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    • v.8 no.4
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    • pp.146-148
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    • 2003
  • Multilayered films of Co/Pd have been studied as a candidate material for a high density perpendicular recording medium due to higher anisotropy energy. However, high exchange coupling among grains results in large transition noise. To reduce the exchange coupling and grain size, addition of 3rd elements and physical separation of grains have been attempted. In the present paper, effects of sputtering pressure, Co sublayer thickness and Pd underlayer thickness on magnetic properties and microstructures were studied. It was found that by increasing sputtering pressure from 5 mTorr to 25 mTorr, Ms decreased to one half and coercivity increased more than 5000 Oe. The increase of the coercivity is associated with physical separation of grains by high pressure sputtering. Ms per volume of Co for Co/Pd multilayered film deposited at 25 mTorr shows continuous decrease with increasing Co sublayer thickness. This was related to void formation and intermixing of Co/Pd interface. Also, effect of Pd underlayer thickness on magnetic properties will be discussed.

Fabrication and Electrical Properties of High Reliability Ceramic Capacitor by RF Sputtering (RF Sputtering을 이용한 고신뢰성 Ceramic Capacitor의 제조 및 전기적 특성)

  • Lee, Chang-Bae;Yoon, Jung-Rag;Lee, Kyong-Min
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.300-300
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    • 2010
  • Ceramic capacitor의 에너지내량을 향상시켜 제품의 신뢰성을 높이고자 RF Sputtering을 이용하여 외부전극을 형성하였다. 본 연구에서는 Target의 종류, 증착 시간 및 열처리 유/무에 따른 Ceramic capacitor의 전기적 특성 및 미세구조를 분석하여 최적조건을 확립하였으며, 최적 증착 조건으로 제작한 Ceramic capacitor의 에너지내량을 측정하였다. Target은 Ni target과 Cu target을 사용하였으며, Sputtering 시간은 10, 30, 60분으로 하였다. Sputtering 시간에 따른 Ceramic capacitor의 용량 특성과 손실은 큰 차이가 없었지만, Wire 연결시 Sputtering 시간에 따라 납땜성의 차이가 나타났으며, 증착 시간과 열처리 유/무에 따른 에너지내량의 변화를 확인하였다.

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Sputtering Pressures Dependence on Magnetic Switching Volumes of CoSm/Cr Magnetic Thin Films (스퍼터링 압력에 따른 CoSm/Cr자성 박막의 Magnetic Switching Volumes)

  • 정순영;김성봉
    • Journal of the Korean Magnetics Society
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    • v.10 no.5
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    • pp.232-236
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    • 2000
  • CoSm thin films with a Cr underlayer have received continuous attention as a potential material for a high density longitudinal magnetic recording media. In this study the Ax gas sputtering pressure effects on the magnetic properties of CoSm thin films, which were fabricated by using a dc magnetron sputtering machine, were investigated. The magnetic switching volume is especially important parameter to understand the thermal stability of the written information, magnetization reversal process and media noise. Therefore, in this paper the effects of sputtering pressure on the magnetic switching volume of CoSm thin films grown on Cr underlayer with the same sputtering conditions was studied. As the Ar sputtering pressure during sputtering of the CoSm magnetic layer increases from 5 to 30 mTorr, the measured switching volumes decreased from 9.0 to 5.2$\times$10$^{-18}$ cm$^3$. The calculated diameter of switching unit from V* was less than 22 nm, which satisfies the Sharrock's requirement on the thermal stability of the high density longitudinal magnetic recording media.

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Magnetic Properties and Microstructure of Co Thin Films by RF-diode Sputtering Method (RF-diode Sputtering법으로 제작한 Co박막의 자기특성과 미세구조)

  • Han, Chang-Suk;Kim, Sang-Wook
    • Korean Journal of Materials Research
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    • v.28 no.3
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    • pp.159-165
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    • 2018
  • In order to increase the efficiency of the sputtering method widely used in thin film fabrication, a dc sputtering apparatus which supplies both high frequency and magnetic field from the outside was fabricated, and cobalt thin film was fabricated using this apparatus. The apparatus can independently control the applied voltage, the target-substrate distance, and the target current, which are important parameters in the sputtering method, so that a stable glow discharge is obtained even at a low gas pressure of $10^{-3}$ Torr. The fabrication conditions using the sputtering method were mainly performed in $Ar+O_2$ mixed gas containing about 0.6 % oxygen gas under various Ar gas pressures of 1 to 30 mTorr. The microstructure of Co thin films deposited using this apparatus was examined by electron diffraction pattern and X-ray techniques. The magnetic properties were investigated by measuring the magnetization curves. The microstructure and magnetic properties of Co thin films depend on the discharge gas pressure. The thin film fabricated at high gas pressure showed a columnar structure containing a large amount of the third phase in the boundary region and the thin film formed at low gas pressure showed little or no columnar structure. The coercivity in the plane was slightly larger than that in the latter case.

Magnetic characteristics of Pt/Co modualted films (Pt/Co 인공격자다층막의 자기특성에 관한 연구)

  • Kim, Chan-Wook;Onishi, Atushi
    • Korean Journal of Materials Research
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    • v.4 no.2
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    • pp.233-240
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    • 1994
  • We have investigated how the magneto-optical and recording properties of Pt/Co modulated films vary with sample preparation conditions : sputtering at various gas pressures, sputtering with Xe instead of Ar, and etching the buffer layers, etc. The magneto-optical characteristics of Pt/Co multilayers was comparable with those of currently prevailing rare-earth transition-metal alloys(Tb-Fe-Co amorphous films). On a disk of $12{\times}[Pt10.7\;{\AA}/Co2.8{\;}{\AA}]$ multilayer enhanced with 70nm silicon nitride, we have achieved a CNR of 36dB with a reading laser(${\lambda}\;=\;780nm$) power of 2.5-4.5mW for 720KHz carrier at 1.4m/s and the enhanced kerr rotation angle of $1.23^{\circ}$ at 780nm. It is suggested that Pt/Co modulated films clearly are very promising magneto-optical materials for a commercially use.

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