• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.100-103
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• 2001

In order to investigate the magnetic properties of CoCr-based bilayered thin films on kind of underlayer, we introduced amorphous Si layer to Co-Cr(-Ta) magnetic layer as underlayer. With the thickness of CoCr, CoCrTa single layer, crystalline orientation and perpendicular coercivity was improved. It was revealed that by introducing the Si underlayer, the c-axis orientation of CoCr, CoCrTa magnetic layer was improved largely. However, with increasing Si film thickness, perpendicular coercivity and saturation magnetization of Cocr/si, CoCrTa/Si bilayered thin films was decreased. Grain size of bilayered thin films became larger.

• Journal of Magnetics
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• v.4 no.2
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• pp.69-72
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• 1999

Magnetic properties and crystallographic structure of e-beam evaporated Co/Cr and Co/Mo multilayer thin films were investigated using VSM and XRD. Co/Cr and Co/Mo multilayer thin films are confirmed as an alternating layered structure. The structure of films with thicker Co layers than Cr and Mo layers are found to be a hcp structure with the c-axis perpendicular to the film plane. The direction of the film plane is the easy magnetization one. There is a no significant difference in shape of hysteresis loops between Co/Cr and Co/Mo multilayer films. It is found that Mo layer is more effective than Cr for preparing Co layer with c-axis normal to the film plane.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1998.06a
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• pp.375-377
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• 1998

The magneto-optical properties of Co/Co$_2$TiSn two-phase magnet films were studied. These films show that relatively large Kerr rotations which are -0.4 deg. at the wavelength of 400 nm, compared to that of pure Co. It is conceivable that the magneto-optical effects may be due to both contributions of ferromagnetic Co matrix and ferromagnetic Co$_2$TiSn Heusler alloy precipitate. The perpendicular magnetization curve domonstrates a typical bubble domain hysteresis loop. the saturation magnetization change of the annealed film is less sensitive to temperature in the low temperature region and the Curie temperature of Co$_2$TiSn Heusler alloy precipitate is a little higher in the annealed film. These can be explained by the increase of the number of Co-Co exchange interaction in Heusler alloy structure resulting from the change of chemical ordering by annealing.

• Journal of Magnetics
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• v.11 no.4
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• pp.167-169
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• 2006

Nanocrystalline CoFeHfO thin films have been fabricated by RF sputtering method. It is shown that the CoFeHfO thin films possess not only high electrical resistivity but also large saturation magnetization and anisotropy field. Among the composition investigated, $Co_{53}FE_{22}Hf_{10}O_{15}$ thin film is observed to exhibit good soft magnetic properties: coercivity ($H_{c}$) of 0.18 Oe; anisotropy fild ($H_{k}$) of 49.92 Oe; saturation magnetization ($4{\Pi}M_{s}$) of 15.5 kG. The frequency response of permeability of the film is excellent. The excellent magnetic properties of this film in addition of an extremely high electrical resistivity (r) of $185\;{\mu}cm$ make it ideal for uses in high-frequency applications of micromagnetic devices. It is the formation of a peculiar microstructure that resulted in the superior properties of this film.

• Journal of the Society of Naval Architects of Korea
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• v.49 no.5
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• pp.433-439
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• 2012

Anticorrosive paint is the most widely used in shipbuilding and the dry film thickness is very important in terms of productivity and assurance of anticorrosive performance. However, it is difficult to achieve the recommended target film thickness because the dry film thickness depends on labor's skill in practice and is affected by a number of parameters, such as spray pressure, paint flow rate, tip size, spray distance, SVR(Solid Volume Ratio), etc. Present paper derives an empirical equation through the correlation analysis of parameters selected by spray experiments of anti corrosive painting in order to predict the coated status. Comparing the calculated results with practical data, we show that the empirical equation can successfully expect DFT(Dry Film Thickness).

• Journal of the Korean Ceramic Society
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• v.43 no.11 s.294
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• pp.746-750
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• 2006

NiO films and Ru co-sputtered NiO films were deposited by reactive magnetron sputtering for micro-solid oxide fuel cell anode applications. The deposited films were reduced to form porous films. The reduction kinetics of the Ru doped NiO film was more sluggish than that of the NiO film, and the resulting microstructure of the former exhibited finer pore networks. The possibility of using the films for the anodes of single chamber micro-SOFCs was investigated using an air/fuel mixed environment. It was found that the abrupt increase in the resistance is suppressed in the Ru co-sputtered film, as compared to undoped film.

• Proceedings of the KIEE Conference
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• 1987.07a
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• pp.561-564
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• 1987

The deposition and reflow properties or BPSG film deposited by APCVD was characterized by variation of each process parameter. As deposition temperature is increased higher, deposition rate is decreased. Maximum deposition rate of BPSG film is obtained in higher 02/Hyride ratio than CVD Oxide or PSG. BPSG film shows stable dielectric properties and we obtained good planarization effect at lower reflow temperature in case of BPSG film than PSG film.

• Proceedings of the KIEE Conference
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• 2001.10a
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• pp.104-106
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• 2001

In this paper, it is object of design of high efficiency slotless BLDC motor using film coil. Slotless BLDC motor is able to have high efficiency property and low cogging torque, due to magnetization of stator core have constant contribution by slotless core. But it is difficult to make coil winding of slotless BLDC motor. So we make amateur of slotless BLDC motor using film coil. Film coil is fabricated by drilling, electro-plating and etching of copper/insulator/copper plate. In this paper, after design of slotless BLDC motor for moving axial blower, it is fabricated by NdFeB permanent magnet type rotor and film coil.

• Journal of the Korean institute of surface engineering
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• v.31 no.5
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• pp.261-265
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• 1998

We investigated compositional separation of Co-23%Cr magnetic alloy thin films with varying film thicknesses. Saturation magnetization and magnetic microstructures were investigated using vibrating sample magnetometer (VSM) and scanning probe microscope (SPM), respectively. Saturation magnetization was as 700 emu/cc for films below 50 nm-thick, and changed to 430 emu/cc for the ones above 2000 nm-thick. This may be due to increment of molar volume of Cr-enriched phase as film thickness increases. The surface grain size in AFM (atomic force microscope) measurement becomes larger as film thickness increases. The MFM (magnetic force microscope) reveals that magnetic microstructure is changed from the fine spherical domains to the maze type domains as film thickness increases. We conclude that employing thickness of Co-22%Cr films below 50 nm is favorable for high density recording in order to enhance perpendicular saturation magnetization and SNR (signal to noise ratio).

• Korean Journal of Materials Research
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• v.4 no.1
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• pp.81-89
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• 1994

Ti film of lOnm thickness and Co film of 18nm thickness were sequentially e-heam evaporated onto Si (100) substrates. Metal deposited samples were rapidly thermal-annt.aled(KTA) in thr N1 en vironment a t $900^{\circ}C$ for 20 sec. to induce the reversal of metal bilayer, so that $CoSi_{2}$ thin films could be formed. The sheet resistance measured by the 4-point probe was 3.9 $\Omega /\square$This valur was maintained with increase in annealing time upto 150 seconds, showing high thermal stab~lity. Thc XRII spectra idrn tified the silicide film formed on the Si substrate as a $CoSi_{2}$ epitaxial layer. The SKM microgr;iphs showed smooth surface, and the cross-sectional TKM pictures revealed that the layer formed on the Si substrate were composed of two Co-Ti-Si alloy layers and 70nm thick $CoSi_{2}$ epl-layer. The AES analysis indicated that the native oxide on Si subs~rate was removed by TI ar the beginning of the RTA, and Ihcn that Co diffused to clean surface of Si substrate so that epitaxial $CoSi_{2}$ film could bt, formed. In thc rasp of KTA at $700^{\circ}C$. 20sec. followed by $900^{\circ}C$, 20sec., the thin film showed lower sheet resistance, but rough surface and interface owing to $CoSi_{2}$ crystal growth. The application scheme of this $CoSi_{2}$ epilayer to VLSI devices and the thermodynarnic/kinetic mechan~sms of the $CoSi_{2}$ epi-layer formation through the reversal of Co/Ti bdayer were discussed.