• Proceedings of the Korean Society of Laser Processing Conference
• /
• 2000.11a
• /
• pp.23-26
• /
• 2000

This paper introduces a cleaning process for removing submicron-sized particles from NiP hard disk substrates by the liquid-assisted laser cleaning technique. Measurements of cleaning performance and time-resolved optical diagnostics are performed to analyze the physical mechanism of contaminant removal. The results reveal that nanosecond laser pulses are effective for removing the contaminants regardless of the wavelength and that a thermal mechanism involving explosive vaporization of liquid dominates the cleaning process.

• Journal of Korean Society of Occupational and Environmental Hygiene
• /
• v.25 no.4
• /
• pp.542-553
• /
• 2015

Objectives: Many types of dust collector are used for industrial ventilation, with the most common types being the cylinder bag filter system, rectangular bag filter system and cylinder type cartridge filter system. The cylinder type cartridge bag filter, which has more filtering area than other types of bag filter, can increase the pulse time and extend the useful life of the filter. This can save operational costs and installation area. Materials: This study used cylinder type cartridge bag filter equipment and tested the impact of vibration level and filter pressure with different pulse jet cleaning conditions. The final, cleaning efficiency was calculated through input dust mass and cleaning dust mass Conclusions: Two optimum cleaning condition groups were found. The first condition group was $3kgf/cm^2$ pulse pressure, 15 cm pulse distance, 0.2 s pulse time with an H-10 type nozzle. The second condition group was $3kgf/cm^2$ pulse pressure, 15 cm pulse distance, 0.3 s pulse time with an H-10 type nozzle.

• Journal of the Korean Society for Precision Engineering
• /
• v.26 no.7
• /
• pp.73-80
• /
• 2009

This paper describes a path planning algorithm, which is the minimal turning path based on the shape and size of the cell to clean up the whole area with two cleaning robots. Our method divides the whole cleaning area with each cell by cellular decomposition, and then provides some path plans among of the robots to reduce the rate of energy consumption and cleaning time of it. In addition we suggest how to plan between the robots especially when they are cleaning in the same cell. Finally simulation results demonstrate the effectiveness of the algorithm in an unknown area with multiple robots. And then we compare the performance index of two algorithms such as total of turn, total of time.

• Journal of the Korean institute of surface engineering
• /
• v.28 no.1
• /
• pp.23-33
• /
• 1995

AISI 304 stainless steel has high resistance to corrosion due to the presence of a self-healing chromium oxide film on the surface, which also accounts for the difficulty in plating. Surface cleaning of this alloy is of fundamental importance in gold plating since its effectiveness puts an upper limit on the quality of the final coating. The cleaning of AISI 304 stainless steel was investigated with elimination of artificial passive oxide film and degreasing of remaining buffing wax as stearic acid. The familiar cleaning methods i.e. ultrasonic cleaning, electro-cleaning and activation treatment were fabricated in this study. Activation treatment showed best cleaning efficiency for elimination of passive oxide film among these methods, which was also confirmed by AES (Auger electron spectrometer) analysis. However, the best condition of cleaning was obtained by combining these methods. Electrocleaning time, for degreasing the stearic acid layer, was decreased with increasing amount of added KCN.

• Korean Membrane Journal
• /
• v.2 no.1
• /
• pp.60-63
• /
• 2000

The effect of Candida rugosa and steapsin lipase cleaning was investigated for ultrafiltration polyethersulphone membrane (30,000 dalton MWCO) fouled with the semi-synthetic type cutting oil. The experimental by the water circulator. The enzyme cleaning effect was measured with respect to temperature, cleaning time and enzyme concentration. The optimum cleaning condition for the system was 25$^{\circ}C$ and 2 hour cleaning with 1,000 unites/mL steapsin solution. The pure water flux improvement by the steapsin solution cleaning was about 17% at the optimum cleaning condition.

• Journal of Power System Engineering
• /
• v.18 no.1
• /
• pp.38-44
• /
• 2014

The objectives of this study are to measure the ball recovery rate of cleaning apparatus for plate heat exchanger. Ceramic ball is used for plate heat exchanger cleaning. The main components of cleaning apparatus are comprised of ball collector, ball trap, ejector, pump and plate heat exchanger. The ball recovery rate are obtained with change in recovery time and velocity of water. The results show that the ball recovery rate is slightly increased with increase in the recovery time and the velocity of water over 0.4 m/s in the straight flow. In the case of reverse flow, the ball recovery rate more increased than straight flow. The maximum ball recovery rate of the straight flow and reverse flow reach 83.97% and 86.61%, respectively, when the velocity and cleaning time are 0.5 m/s and 15min.

• Plant Journal
• /
• v.12 no.1
• /
• pp.24-28
• /
• 2016

In desulfurization facilities of oil-fired power plant, gypsum scale is attached in the absorber inner surface as the operating time increases. For this reason, the maximum possible load of the power generation is set down, resulting in further generation stop. Cleaning of absorber for scale removal can be determined at the time of setting down of the maximum possible load. In this study, 6 weeks before the maximum possible load of the power generation was down set, at the same time and desulfurization facilities outlet $SO_2$ concentration value was more than 130ppm, absorber differential pressure exceeded $380mmH_2O$, it was confirmed to be the time that has elapsed 44 weeks after the previous absorber cleaning. Cleaning time of the absorber was predicted to be a time which has elapsed 50 weeks from the previous cleaning time.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.02a
• /
• pp.183-183
• /
• 2012

In the era of 45 nm or beyond technology, conventional etch mask using photoresist showed its limitation of etch mask pattern collapse as well as pattern erosion, thus hard mask in etching became necessary for precise control of etch pattern geometry. Currently available hard mask materials are amorphous carbon and polymetric materials spin-on containing carbon or silicon. Amorphous carbon layer (ACL) deposited by PECVD for etch hard mask has appeared in manufacturing, but spin-on carbon (SOC) was also suggested to alleviate concerns of particle, throughput, and cost of ownership (COO) [1]. SOC provides some benefits of reduced process steps, but it also faced with wiggling on a sidewall profile. Diamond like carbon (DLC) was also evaluated for substituting ACL, but etching selectivity of ACL was better than DLC although DLC has superior optical property [2]. Developing a novel material for pattern hard mask is very important in material research, but it is also worthwhile eliminating a potential issue to continuously develop currently existing technology. In this paper, we investigated in-situ dry-cleaning (ISD) monitoring of ACL coated process chamber. End time detection of chamber cleaning not only provides a confidence that the process chamber is being cleaned, but also contributes to minimize wait time waste (WOW). Employing Challenger 300ST, a 300mm ACL PECVD manufactured by TES, a series of experimental chamber cleaning runs was performed after several deposition processes in the deposited film thickness of $2000{\AA}$ and $5000{\AA}$. Ar Actinometry and principle component analysis (PCA) were applied to derive integrated and intuitive trace signal, and the result showed that previously operated cleaning run time can be reduced by more than 20% by employing real-time monitoring in ISD process.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.11 no.1
• /
• pp.33-40
• /
• 1998

The composite SiO$_2$/Si$_3$N$_4$/SiO$_2$(ONO) film formed by oxidation on nitride film has been widely studied as DRAM stacked capacitor multi-dielectric films. Load lock(L/L) LPCVD system by HF cleaning is used to improve electrical capacitance and to scale down of effective thickness for memory device, but is brings a new problem. Nitride film deposited using HF cleaning shows selective deposition on poly silicon and oxide regions of capacitor. This problem is avoidable by carpeting chemical oxide using $H_2O$$_2$cleaning before nitride deposition. In this paper, we study the limit of nitride thickness for abnormal oxidation and the initial deposition time for nitride deposition dependent on underlayer materials. We proposed an advanced fabrication process for stacked capacitor in order to avoid selective deposition problem and show the usefulness of nitride deposition using L/L LPCVD system by $H_2O$$_2$cleaning. The natural oxide thickness on polysilicon monitor after HF and $H_2O$$_2$cleaning are measured 3~4$\AA$, respectively. Two substrate materials have the different initial nitride deposition times. The initial deposition time for polysilicon is nearly zero, but initial deposition time for oxide is about 60seconds. However the deposition rate is constant after initial deposition time. The limit of nitride thickness for abnormal oxidation under the HF and $H_2O$$_2$cleaning method are 60$\AA$, 48$\AA$, respectively. The results obtained in this study are useful for developing ultra thin nitride fabrication of ONO scaling and for avoiding abnormal oxidation in stacked capacitor application.

• Journal of Korean Society of Occupational and Environmental Hygiene
• /
• v.33 no.1
• /
• pp.3-5
• /
• 2023

Objective: This study introduces exposure concentrations of time-weighted average standard (TWA) evaluation and short-time exposure standard (STEL) evaluation for trichloroethylene in the cleaning process. Methods: Trichloroethylene measurement was conducted according to the KOSHA Guide (A-24-2019) method. It was carried out twice. Results: As a result of the first measurement, TWA concentration exceeded 4 times the exposure standard and STEL concentration exceeded 16 times, but the inaccuracy and breakthrough of the collection time could not be considered, so the second measurement was conducted. The second measurement result was lower than the first measurement result, but exceeded the exposure standards (TWA, STEL). Conclusions: We were able to confirm that the exposure level of workers in the cleaning process using trichloroethylene exceeded the exposure standard. And it is also considered necessary to grasp the approximate concentration using a detector tube in the preliminary survey.