• Title/Summary/Keyword: Chucked-wafer flatness

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A Study on the Flatness Evaluation Method of the Dicing Chuck using Chucked-wafer (웨이퍼 장착을 이용한 다이싱 척의 평탄도 평가 방법에 관한 연구)

  • Yook, In-Soo;Lee, Ho-Cheol
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.17 no.3
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    • pp.53-58
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    • 2008
  • This study was conducted to evaluate the flatness of the porous type of dicing chuck. Two measurement systems for a vacuum chuck with a porous type of ceramic plate were prepared using a digital indicator and a laser interferometer. 6 inch of silicon and glass wafer were also used. Vacuum pressure from 100mmHg to 700mmHg by 100mmHg was increased. From experiments, chucked-wafer flatness was converged to the dicing chuck flatness itself even though the repeatability of contact method using indicator was unstable. Finally, the chuck flatness was estimated below $2{\mu}m$ with peak-to valley value.