• Bulletin of the Korean Chemical Society
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• v.12 no.6
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• pp.635-643
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• 1991

The adsorption of methanethiol on a Ag(100) surface has been studied with Extended Huckel calculation in the cluster approximation of the substrate. Since it has been known that methanethiol is chemisorbed dissociatively on silver surface by rupture of S-H bond, the methanethiolate radical is taken as adsorbate. Of the various adsorption sites, the 4-fold hollow site is preferred. The methanethiolate radical is mainly adsorbed via its 2e orbital. The charge transfer from metal to this level leads to the C-S bond weakening, which is consistent with the red shift of C-S stretching mode in surface enhanced Raman (SER) spectrum.

• Bulletin of the Korean Chemical Society
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• v.8 no.4
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• pp.291-296
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• 1987

Vibrational spectroscopy has been applied to the benzenethiol molecule adsorbed on the silver surface. The results of infrared and Raman spectral studies have led to the conclusion that benzenethiol is chemisorbed dissociatively on the silver surface by rupture of S-H bond and the benzenethiolate formed upon adsorption is bound to silver via its sulfur atom. It seemed more likely that benzenethiol is adsorbed as being inclined to the silver surface. On contact with oxygen, the geometry of the adsorbed species appeared to bear a resemblance to that of silver benzenethiolate salt. The infrared bands of adsorbed species remained with little decrease of intensity even after the prolonged evacuation at 673 K, indicating that benzenethiol is very strongly chemisorbred to the silver surface.

• Archives of Metallurgy and Materials
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• v.65 no.4
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• pp.1345-1350
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• 2020

Stable dispersion of antimony-doped tin oxide nano-powder was prepared by wet attrition process by comminuting aggregated ATO nano-powder using the titanate coupling agent as a dispersant to form the chemisorbed layer on the particle surface. The feed solution of the ATO dispersion and PVP was prepared for electro-spun fibers on the glass substrate. The surface resistance of the fibrous ATO film after electrospinning for 30 minutes was in the order of 10⁵ Ω/□, which is sufficient for anti-static coating. The optical transmittance of ATO fibers was confirmed by measuring the visible light transmittance.

• Applied Chemistry for Engineering
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• v.31 no.4
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• pp.368-376
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• 2020

In this study, an analysis on the reaction characteristics of a catalyst using platinum (Pt) as an active oxidation metal catalyst for controlling SO₂ was performed. Pt/TiO₂ catalyst was prepared by using Pt as various precursor forms on a titania (TiO₂) support, and used for the experiment. There was no difference in performance of SO₂ oxidation according to Pt valence states such as Pt²⁺ or Pt⁴⁺ on Pt/TiO₂, and Pt chloride species such as PtCl_x reduces SO₂ oxidation performance. In addition, as a result of analyzing the valence state of the catalyst before and after the SO₂ oxidation reaction by XPS analysis, a decrease in lattice oxygen and an increase in surface chemisorbed oxygen after the SO₂ oxidation reaction were confirmed. Therefore it can be suggested that the oxidation reaction of SO₂ when using the Pt/TiO₂ catalyst is the major one following the Mar-Van Krevelen mechanism where the reaction of lattice oxygen corresponding to PtOx and the oxidation-reduction reaction by oxygen vacancy occur. Overall, it can be confirmed that the oxygen species of PtOx (Pt²⁺ or Pt⁴⁺) present on the catalyst acts as a major active site.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.219-219
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• 2012

The formation and thermal desorption behaviors of octanethiol (OT) SAMs on single crystalline Au (111) and polycrystalline Au, Ag, and Cu substrates were examined by X-ray photoelectron microscopy (XPS), thermal desorption spectroscopy (TDS), and contact angle (CA) measurements. XPS and CA measurements revealed that the adsorption of octanethiol (OT) molecules on these metals led to the formation of chemisorbed self-assembled monolayers (SAMs). Three main desorption fragments for dioctyl disulfide (C8SSC8+, dimer), octanethiolate (C8S+), and octanethiol (C8SH+) were monitored using TDS to understand the effects of surface morphology and the nature of metal substrates on the thermal desorption behavior of alkanethiols. TDS measurements showed that a sharp dimer peak with a very strong intensity on single crystalline Au (111) surface was dominantly observed at 370 K, whereas a broad peak on the polycrystalline Au surface was observed at 405 K. On the other hand, desorption behaviors of octanethiolates and octanethiols were quite similar. We concluded that substrate morphology strongly affects the dimerization process of alkanethiolates on Au surfaces. We also found that desorption intensity of the dimer is in the order of Au＞＞Ag＞Cu, suggesting that the dimerization process occurs efficiently when the sulfur-metal bond has a more covalent character (Au) rather than an ionic character (Ag and Cu).

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.125.2-125.2
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• 2016

Semiconductor nanowires are essential building blocks for various nanotechnologies including energy conversion, optoelectronics, and thermoelectric devices. Bottom-up synthetic approach utilizing metal catalyst and vapor phase precursor molecules (i.e., vapor - liquid - solid (VLS) method) is widely employed to grow semiconductor nanowires. Al has received attention as growth catalyst since it is free from contamination issue of Si nanowire leading to the deterioration of electrical properties. Al-catalyzed Si nanowire growth, however, unlike Au-Si system, has relatively narrow window for stable growth, showing highly tapered sidewall structure at high temperature condition. Although surface chemistry is generally known for its role on the crystal growth, it is still unclear how surface adsorbates such as hydrogen atoms and the nanowire sidewall morphology interrelate in VLS growth. Here, we use real-time in situ infrared spectroscopy to confirm the presence of surface hydrogen atoms chemisorbed on Si nanowire sidewalls grown from Al catalyst and demonstrate they are necessary to prevent unwanted tapering of nanowire. We analyze the surface coverage of hydrogen atoms quantitatively via comparison of Si-H vibration modes measured during growth with those obtained from postgrowth measurement. Our findings suggest that the surface adsorbed hydrogen plays a critical role in preventing nanowire sidewall tapering and provide new insights for the role of surface chemistry in VLS growth.

• Journal of the Korean Ceramic Society
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• v.52 no.1
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• pp.28-32
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• 2015

In this article, the influence of a hydrolyzed wheat protein retarder on the hydration process, ion concentration in liquid phase, degree of supersaturation, and crystal morphology of plaster was investigated. Furthermore, the retarding mechanism and the strength loss of gypsum were also studied by scanning electron microscopy (SEM). The results indicate that the use of the hydrolyzed wheat protein retarder for plaster achieved a better retarding effect and lower strength loss. The combination of gypsum plaster with the retarder not only decreased the plaster's early hydration rate and prolonged its setting time efficiently, but also militated against the crystal morphology of dihydrate gypsum. For example, the crystal dimensions changed little, but the proportion of needle-shaped crystals decreased. Combination with calcium ions on the surface of dihydrate gypsum crystal nuclei may form a chemisorbed layer, reduce the surface energy of the crystal nuclei, and inhibit the growth of the crystal nuclei of dihydrate gypsum. Consequently, the hydration process of building gypsum becomes greatly extended and is slowed down significantly.

• Journal of the Microelectronics and Packaging Society
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• v.11 no.4 s.33
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• pp.29-35
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• 2004

We have deposited the W-N diffusion barrier on Si substrate with $NH_3$ pulse plasma enhanced atomic layer deposition (PPALD) method by using $WF_6$ and $NH_3$ gases. The $WF_6$ gas reacts with Si that the surface corrosion occurs severely, but the $NH_3$ gas incorporated with pulse plasma and $WF_6$ gas are easily deposited W-N thin film without Si surface corrosion. Because the $NH_3$ with pulse plasma can be active species dissociated and chemisorbed on Si. Thus the Si surface are covered and saturated with nitrogen, which are able to deposit the W-N thin film. We also examine the deposition mechanism and the effect of $NH_3$ pulse plasma treatment.

• Transactions of the Korean Society of Mechanical Engineers
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• v.18 no.10
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• pp.2597-2605
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• 1994

The wear behavior of two types of $Si_3N_4$ exposed to high and low humidity was examined at various sliding speeds, using bearing steel as disk material under pin-on-disk type sliding conditions. Higher wear rates were obtained at a high humidity than at a low humidity. As the sliding speed was increased, the wear rates were decreased and the effect of humidity on the wear rates of $Si_3N_4$ was reduced. The result that the $Si_3N_4$ pin showed higher wear rate under the high humidity condition was explained by the decrease in microhardness of $Si_3N_4$ due to the chemisorbed moisture on the pin and plowing action by the hard particles of $Fe_2O_3$ from the disk. An increase in the sliding speed is supposed to reduce the effect of humidity on the wear rate of $Si_3N_4$ by raising the average temperature of the disk surface and the local temperature at pin-disk contact point.

• Journal of the Korean Chemical Society
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• v.28 no.2
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• pp.109-113
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• 1984

The effects of various supports on the activity and the selectivity for the ethylene oxidation was investigated over$ Ag/{\alpha}-Al_2O_3$ and $Ag/SnO_2$ by Auger, EPR spectroscopy and reaction studies. The results indicate that over $Ag/SnO_2$ catalyst O- chemisorbed on $SnO_2 $participates in the complete oxidation of ethylene lowering the selectivity for the formation of ethylene oxide.