• Title/Summary/Keyword: Chemical etching

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Texturing Multi-crystalline Silicon for Solar Cell (태양전지용 다결정실리콘 웨이퍼의 표면 처리용 텍스쳐링제)

  • Ihm, DaeWoo;Lee, Chang Joon;Suh, SangHyuk
    • Applied Chemistry for Engineering
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    • v.24 no.1
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    • pp.31-37
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    • 2013
  • Lowering surface reflectance of Si wafers by texturization is one of the most important processes for improving the efficiency of Si solar cells. This paper presents the results on the effect of texturing using acidic solution mixtures containing the catalytic agents to moderate etching rates on the surface morphology of mc-Si wafer as well as on the performance parameters of solar cell. It was found that the treatment of contaminated crystalline silicon wafer with $HNO_3-H_2O_2-H_2O$ solution before the texturing helps the removal of organic contaminants due to its oxidizing properties and thereby allows the formation of nucleation centers for texturing. This treatment combined with the use of a catalytic agent such as phosphoric acid improved the effects of the texturing effects. This reduced the reflectance of the surface, thereby increased the short circuit current and the conversion efficiency of the solar cell. Employing this technique, we were able to fabricate mc-Si solar cell of 16.4% conversion efficiency with anti-reflective (AR) coating of silicon nitride film using plasma-enhanced chemical vapor deposition (PECVD) and Si wafers can be texturized in a short time.

Surface Modification of Matrix and filler for Ultra High Density Elastomeric Material (초 고비중 탄성체 개발을 위한 매트릭스 탄성체 표면개질 및 충전제 제어기술 기초연구)

  • Chung, K.;Lee, D.;Yang, K.;Lee, W.;Hong, C.
    • Elastomers and Composites
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    • v.40 no.2
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    • pp.93-103
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    • 2005
  • In this study, surface treatment of the elastomeric matrix was investigated to develop a substituting material for steel dynamic damper of automobile. The key technology is to get ultra high density elastomeric compound in order to substitute steel dynamic damper. The optimum matrix material(chloroprene rubber) and filler(metal powder) were selected for this. The several properties of elastomeric compound were examined. According to the results, the $t_{s2}$ of filled elastomeric compound was decreased with increasing the filler loading whereas the $t_{90}$ was increased. Also, tensile strength and rebound resilience were decreased with filler loading. To solve the problem of high filler loading, the photo grafting technique was employed on elastomeric matrix. The degree of grafting was determined by FTIR-ATR. Also, the filler surface was modified by chemical etching and the surface morphology was examine by SEM. After chemical treatment of filler, the particle size analyzer was used to examined the particle size, size distribution, and morphology of the modified filler.

Removal of Hydrogen Fluoride from Waterjet Plasma Wastewater by Electrocoagulation (전해응집법에 의한 불화수소 함유 워터젯 플라즈마 폐수처리)

  • Lee, Chae Hong;Chun, Young Nam
    • Journal of Korean Society of Environmental Engineers
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    • v.34 no.10
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    • pp.702-708
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    • 2012
  • Tetrafluoromethane ($CF_4$) has been used as etching and Chemical Vapor Deposition (CVD) gases for semiconductor manufacturing processes. These gases need to be removed efficiently because of their strong absorption of infrared radiation and long atmospheric lifetimes which cause the global warming effect. Also, the wastewater including the fluorine is caused by of the ground water pollution. Long-term consumption of water containing excessive fluoride can lead to fluorosis of the teeth and bones. The wastewater including the fluorine among the by-product which is generated by using the waterjet plasma after destroying $CF_4$ by HF is generated. The system which can remove the hydrogen fluoride among the wastewater by using the electrocoagulation using this wastewater the aluminum electrode was developed. The operating condition such as initial pH, electrocoagulation time, wastewater flow rate, current density were investigated experimentally using a electrocoagulation. Through the parametric studies, the highest hydrogen fluoride destruction of 85% was achieved at 3.5 initial pH, 10 min electrocoagulation time, 10 mL/min wastewater flow rate and $159A/m^2$ current density.

Fabrication of a periodically poled MgO : $LiNbO_3$ ridge waveguide for a green laser generation (녹색 광 발진을 위한 주기적 분극 반전된 MgO : $LiNbO_3$ ridge waveguide 제작)

  • Yang, W.S.;Kwon, S.W.;Song, M.K.;Lee, H.M.;Kim, W.K.;Koo, K.H.;Yoon, D.H.;Lee, H.Y.
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.17 no.4
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    • pp.151-155
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    • 2007
  • Quasi-phase-matched (QPM) second harmonic generation (SHG) waveguide devices for a green light generation were fabricated by a periodically patterned electrode on the +Z crystal surface and homogeneous LiCl solution using a 5 mol% MgO doped congruent z-cut lithium niobate crystals. Using selective chemical etching, we confirmed the periodic (${\sim}6.8{\mu}m$) domain inverted structure and measured SHG properties of fabricated periodically poled MgO : $LiNbO_3$ ridge-type waveguides.

Decomposition Characteristics of PFCs for Various Plasma Discharge Methods in Dielectric Barrier Discharge (DBD 반응기에서 플라즈마 방전형태에 따른 PFCs 가스의 분해 특성)

  • Kim, Kwan-Tae;Kim, Yong-Ho;Cha, Min-Suk;Song, Young-Hoon;Kim, Seock-Joon;Ryu, Jeong-In
    • Journal of Korean Society for Atmospheric Environment
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    • v.20 no.5
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    • pp.625-632
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    • 2004
  • Perfluorocompounds ($PFC_s$), such as tetrafluoromethane ($CF_4$) and hexafluoroethane ($C_2F_6$), have been widely used as plasma etching and chemical vapor deposition (CVD) gases for semiconductor manufacturing processes. Since these $PFC_s$ are known to cause a greenhouse effect intensively, there has been a growing interest in reducing $PFC_s$ emissions. Among various $CF_4$ decomposing techniques, a dielectric barrier discharge (DBD) is considered as one of a promising candidate because it has been successfully used for generating ozone ($O_3$) and decomposing nitrogen oxide (NO). Firstly, optimal concentration of oxygen for $CF_4$ decomposition was found to figure out how many primary and secondary reactions are associated with DBD process. Secondary, to find effective discharge method for $CF_4$ decomposition, a streamer and a glow mode in DBD are experimentally compared, which includes (i) coaxialcylinder DBD, (ii) DBD reactor packed with glass beads. and (iii) a glow mode operation with a helium gas. The test results showed that optimal concentration of oxygen was ranged 500 ppm~1% for treating 500 ppm of $CF_4$ and helium glow discharge was the most efficient one to decompose $CF_4$.

The retrospective study of survival rate of implants with maxillary sinus floor elevation (상악동 거상술을 동반한 임플란트 식립 후 생존율에 대한 후향적 연구)

  • Yu, Jeoung-A;Lee, Sang-Min;Yoo, Mi-Kyung;Jung, Ui-Won;Kim, Chang-Sung;Choi, Seong-Ho;Park, Pil-Kyoo;Cho, Kyoo-Sung
    • Journal of Periodontal and Implant Science
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    • v.39 no.3
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    • pp.293-301
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    • 2009
  • Purpose: The purpose of this study is to show the total survival rate of implants with maxillary sinus floor elevation and the effects that reach the survival rate by classifying types of graft materials, implant surface, operation method, bone height. Methods: In a total of 131 patients, 251 implants with sinus floor elevation were installed simultaneously or after regular healing. Various bone grafts (autograft, xonograft, allograft, alloplast) and implant surface (MTX-HA implant, chemical etching implant, Titanium oxide surface implant, resorbable blasting media implant, resorbable blast texturing implant, HA-coated implant) were used. All implants were investigated clinically and radiographically, being with 1 to 5 years follow-up period after installation. Results: The survival rate of 251 implants with maxillary sinus floor elevation was 94%. The types of implant, surface, graft material, bone height have no statistically signi-ficant differencies. Conclusions: It can be suggested that maxillary sinus floor elevation may have predictable result with various bone graft materials and implant surface.

A Study for The X-ray Image Acquisition Experiment Using by Gas Electron Multipliers (기체전자증폭기를 이용한 X-선 영상획득실험에 관한 연구)

  • 강상묵;한상효;조효성;남상희
    • Journal of Biomedical Engineering Research
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    • v.24 no.2
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    • pp.83-89
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    • 2003
  • The gas electron multiplier placed in the drift volume of conventional gas detectors, is a conceptually simple device for producing a large gas gain by concentrating the drift electric field over a very short distance to the point that electron avalanching occurs(〉 10$^4$ V/cm), greatly increasing the number of drifting electrons. This device consists of a thin insulating foil of several tens of urn in thickness. covered on each side with a thin metal layer(Cu), with tiny holes, usually 100 ${\mu}{\textrm}{m}$ or less in diameter. and with a spacing of 100-200 ${\mu}{\textrm}{m}$ through the entire foil. perforated by using chemical etching or high-powered laser beam technique In this study, we have investigated its operating properties with various experimental conditions, and demonstrated the possibility of using this device as a digital X-ray imaging sensor, by acquiring X-ray images based on the scintillation properties of the gas electron multiplier with standard CCD camera.

Periodically domain inversion and optical properties of low-loss Ti : $LiNbO_3$ waveguides (저손실 Ti : $LiNbO_3$ 광도파로의 주기적 분극 반전과 광학특성)

  • Yang, W.S.;Kwon, S.W.;Lee, H.M.;Kim, W.K.;Yoon, D.H.;Lee, H.Y.
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.16 no.2
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    • pp.49-52
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    • 2006
  • Periodic electric field assisted poling low loss (${\sim}0.1dB/cm$) single-mode Ti-diffused waveguides in $LiNbO_3$ has been achieved using a periodically patterned electrode on the +Z surface of Ti : $LiNbO_3$ crystal and homogeneous LiCl solution. Using selective chemical etching, we confirmed the periodic (${\sim}16{\mu}m$) domain inverted structure and measured SH (second harmonic) properties of fabricated periodically poled Ti : $LiNbO_3$ waveguides.

Surface Modification Effect and Mechanical Property of para-aramid Fiber by Low-temperature Plasma Treatment (저온 플라즈마 처리를 이용한 파라 아라미드 섬유의 표면 개질 효과 및 역학적 특성(2))

  • Park, Sung-Min;Son, Hyun-Sik;Sim, Ji-Hyun;Kim, Joo-Young;Kim, Taekyeong;Bae, Jin-Seok
    • Textile Coloration and Finishing
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    • v.27 no.1
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    • pp.18-26
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    • 2015
  • para-aramid fibers were treated by atmosphere air plasma to improve the interfacial adhesion. The wettability of plasma-treated aramid fiber was observed by means of dynamic contact angle surface free energy measurement. Surface roughness were investigated with the help of scanning electron microscopy and atomic force microscopy. The tensile test of aramid fiber roving was carried out to determine the effect of plasma surface treatments on the mechanical properties of the fibers. A pull-out force test was carried out to observe the interfacial adhesion effect with matrix material. It was found that surface modification and a chemical component ratio of the aramid fibers improved wettability and adhesion characterization. After oxygen plasma, it was indicated that modified the surface roughness of aramid fiber increased mechanical interlocking between the fiber surface and vinylester resin. Consequently the oxygen plasma treatment is able to improve fiber-matrix adhesion through excited functional group and etching effect on fiber surface.

A variation of elastic modulus of very thin diamond-like carbon films with deposition condition (증착조건에 따른 극미세 다이아몬드상 카본 박막의 탄성률 변화거동)

  • 정진원;이광렬;은광용;고대홍
    • Journal of the Korean Vacuum Society
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    • v.10 no.4
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    • pp.387-395
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    • 2001
  • The elastic modulus and the structural evolution were examined with the film thickness in polymeric, hard, graphitic diamond-like carbon (DLC) films. The DLC films used in the present study were prepared by radio frequency plasma assisted chemical vapor deposition (r.f.-PACVD) from $C_6H_6\;and\;CH_4$ gas. Elastic modulus of very thin DLC film was measured by free overhang method. This method has an advantage over the other methods. Because the substrate was removed by etching technique, the measured value is not affected by the mechanical property of the substrate. The structural evolution was investigated by the G-peak position of the Raman spectrum. The polymeric and graphitic films exhibited the decreased elastic modulus with decreasing film thickness. In polymeric films, the reason was that more polymeric film had been deposited in the initial stage of the film growth and in graphitic film more graphic films which had been deposited in the initial stage decreased the elastic modulus. The G-peak position of the Raman spectrum confirmed this result. On the other hand, the hard film showed the constant elastic modulus regardless to the film thickness. The structural change was not observed in this range of the film thickness.

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