• Title/Summary/Keyword: Chemical density

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A New Model and Equation Derived From Surface Tension and Cohesive Energy Density of Coagulation Bath Solvents for Effective Precipitation Polymerization of Acrylonitrile

  • Zhou, You;Xue, Liwei;Yi, Kai;Zhang, Li;Ryu, Seung Kon;Jin, Ri Guang
    • Carbon letters
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    • v.13 no.3
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    • pp.182-186
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    • 2012
  • A new model and resultant equation for the coagulation of acrylonitrile monomers in precipitation polymerization are suggested in consideration of the surface tension (${\gamma}$) and cohesive energy density ($E_{CED}$). The equation was proven to be quite favorable by considering figure fittings from known surface tensions and cohesive energy densities of certain organic solvents. The relationship between scale value of surface tension (${\gamma}$/M) and cohesive energy density of monomers can be obtained by changing the coagulation bath component for effective precipitation polymerization of acrylonitrile in wet spinning.

A Study on Chemical Mechanical Polishing using Pattern Density based Modeling (패턴 밀도를 고려한 Chemical Mechanical Polishing에 관한 연구)

  • 이재경;문원하;황호정
    • Proceedings of the IEEK Conference
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    • 2002.06b
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    • pp.221-224
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    • 2002
  • Recently, simulation of Chemical Mechanical Polis hing is becoming more important because Process parameters on the material removal rate are complicated. And pattern-depent effects are a key concern in CMP processes. In this paper, we have been studied the changes of pattern density vs. oxide thickness with Stine's simulation model. We also have estimated the effective density using optimal window size with density mask, and have made a study of the change of oxide thickness as a function of polishing time.

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Optimization of Cure System for the ESBR Silica WMB and BR Silica DMB Blend Compounds

  • Yu, Eunho;Kim, Woong;Ryu, Gyeongchan;Ahn, Byungkyu;Mun, Hyunsung;Hwang, Kiwon;Kim, Donghyuk;Kim, Wonho
    • Elastomers and Composites
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    • v.54 no.2
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    • pp.97-104
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    • 2019
  • Emulsion styrene-butadiene rubber silica wet masterbatch (ESBR silica WMB) technology was studied to develop highly filled and highly dispersed silica compounds, involving the preparation of a composite by co-coagulating the modified silica and the rubber latex in a liquid phase. Previous studies have shown that when manufacturing ESBR silica WMB/Butadiene silica dry masterbatch (BR silica DMB) blend compounds, preparing BR silica dry masterbatch and mixing it with ESBR silica WMB gave excellent results. However, WMB still has the problem of lower crosslink density due to residual surfactants. Therefore, in this study, tetrabenzylthiuram disulfide (TBzTD) was added instead of diphenyl guanidine (DPG) in the ESBR silica WMB/BR silica DMB blend compounds and sulfur/CBS contents were increased to evaluate their cure characteristics, crosslink densities, mechanical properties, and dynamic viscoelastic properties. TBzTD was found to be more effective in increasing the crosslink density and to produce superior properties compared to DPG. In addition, with increasing sulfur/CBS contents, mechanical properties and rolling resistance were enhanced due to high crosslink density, but the abrasion resistance was not significantly changed because of the toughness.

A Study on the Effect of Pattern Density and it`s Modeling for ILD CMP (패턴 웨이퍼의 화학기계적 연마시 패턴 밀도의 영향과 모델링에 관한 연구)

  • Hong, Gi-Sik;Kim, Hyung-Jae;Jeong, Hae-Do
    • Journal of the Korean Society for Precision Engineering
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    • v.19 no.1
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    • pp.196-203
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    • 2002
  • Generally, non-uniformity and removal rate are important factors on measurements of both wafer and die scale. In this study, we verify the effects of the pressure and relative velocity on the results of the chemical mechanical polishing and the effect of pattern density on inter layer dielectric chemical mechanical polishing of patterned wafer. We suggest an appropriate modeling equation, transformed from Preston\`s equations which was used in glass polishing, and simulate the removal rate of patterned wafer in chemical mechanical polishing. Results indicate that the pressure and relative velocity are dominant factors for the chemical mechanical polishing and pattern density effects on removal rate of pattern wafers in die scale. The modeling is well agreed to middle and low density structures of the die. Actually, the die used in Fab. was designed to have an appropriate density, therefore the modeling will be suitable for estimating the results of ILD CMP.

The effect of backing layer for pro membranes and modules (PRO 분리막 및 모듈성능에 지지체가 미치는 영향)

  • Han, Man Jae;Jeon, Eun Joo;Sim, Yeon-Ju;Lee, Jong Hwa
    • Journal of Korean Society of Water and Wastewater
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    • v.30 no.5
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    • pp.553-559
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    • 2016
  • There has been increasing global interest in the environmental pollution problems produced by fossil fuel consumption and greenhouse gas emissions. In order to tackle these issues, new renewable energy such as solar, wind, bio gas, fuel cell and pressure retarded osmosis(PRO) have been developed extensively. Among these energy sources, PRO is one of the salinity gradient power generation methods. In PRO, energy is obtained by the osmotic pressure generated from the concentration difference between high and low concentration solutions separated by a semipermeable membrane. The development for high power density PRO membranes is imperative with the purpose of commercialization. This study investigates development of thin film composite PRO membrane and spiral wound module for high power density. Also, the influence of membrane backing layer on power density was identified, and the characteristic factors of PRO membranes was determined. Different backing layers were used to improve power density. As expected, the PRO membrane with more porous backing layer showed higher power density.

Geochemical Investigations of Contaminated River Waters Part II-Chemical Oxygen Demand of River Water and Industrial Waste Water in Seoul (汚濁河川水의 地球化學的인 硏究 (第 II 報) 서울市內 河川水 및 工場排水의 化學的 酸素要求量)

  • Lee, Yong-Keun
    • Journal of the Korean Chemical Society
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    • v.14 no.1
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    • pp.5-12
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    • 1970
  • River water and industrial waste water in Seoul were studied by means of chemical oxygen demand(COD) as an indicator for water pollution, from August 1967 to July 1968. Rivers flowing through residential and industrial areas are badly contaminated and COD of water in Han River increases as it progresses to downstream. Seasonal variation of COD showed that higher value of COD was observed in spring and lower in autumn. It is clear that the seasonal variation of COD is influenced by the precipitation. Close relationship was found between COD and population density. The lowest COD curve obtained by plotting COD values against population density and show that the curve slopes upward. The discontinuation of the curve was shown at the population density of 14,000/km$^2$; an increase in COD was acute over the population density of 14,000/km$^2$.

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