• 한국전기전자재료학회논문지
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• 제18권4호
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• pp.297-302
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• 2005

Chemical mechanical polishing(CMP) performances can be optimized by several process parameters such as equipment and consumables (pad, backing film and slurry). Pad properties are important in determining removal rate and planarization ability of a CMP process. It is investigated the performance of oxide CMP process using commercial silica slurry after the pad conditioning temperature was varied. Conditioning process with the high temperature made the slurry be unrestricted to flow and be hold, which made the removal rate of oxide film increase. The pad became softer and flexible as the conditioning temperature increases. Then the softer pad provided the better surface planarity of oxide film without defect.

• 한국초지조사료학회지
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• 제18권3호
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• pp.259-266
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• 1998

A field experiment was carried out to determine the effects of mechanical and chemical drying agents at mowing on the field drying rate and hay quality of orchardgrass dominant pasture plants. The mower conditioner /chemical drying agent ($K_2CO_3$ 2% conditioning, $K_2CO_3$ 2% + conditioning and control) were treated at different harvest stages (late boot, heading and bloom stage) for hastening hay manufacture in 1996. After field dry, four square bales were made by hay baler, and the visual estimation and nutritive value of hay were evaluated after storing two months. The field drying rate of pasture plants was higher with delayed stage of harvest, and mechanical and mechanical + chemical, but chemical alone was very low. In mower conditioning, the duration of field dry was shortened by 0.5 to 1 day compared with $K_2CO_3$ and 1.5 to 2 days compared with control. The dry matter loss of hay was reduced by late harvest and mechanical, and mechanical + chemical, but the score by chemical alone was very low. The visual score (leafiness, green color, odor and softness) of hay after storage was high in mechanical and mechanical + chemical, but the score by chemical alone was very low. Nutritive value (ADF, NDF, digestibility, and relative feed value) of hay was also high with treatment of mechanical and mechanical + chemical, but the quality by chemical alone was similar compared with control. The quality of hay was very low when harvested at bloom stage. In conclusion, mower conditioning can enhance the field drying rate of orchardgrass dominant pasture plants, however the drying efficiency of chemical drying agent was very low. Harvesting at early heading to heading stage was recommened for manufacture of high quality hay.

• KIEE International Transactions on Electrophysics and Applications
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• 제2C권5호
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• pp.262-267
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• 2002

In this paper, we first studied the factors affecting the motor current (MC) signal, which was strongly affected by the systematic hardware noises depending on polishing such as pad conditioning and arm oscillation of platen and recipe, head motor. Next, we studied the end point detection (EPD) for the chemical mechanical polishing (CMP) process of shallow trench isolation (STI) with reverse moat structure. The MC signal showed a high amplitude peak in the fore part caused by the reverse meal. pattern. We also found that the EP could not be detected properly and reproducibly due to the pad conditioning effect, especially when conventional low selectivity slurry was used. Even when there was no pad conditioning effect, the EPD method could not be applied, since the measured end points were always the same due to the characteristics of the reverse moat structure with an open nitride layer.

• 한국초지조사료학회지
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• 제18권4호
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• pp.323-328
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• 1998

본 시험은 속성건조에 의한 가을연맥의 건초 조제 가능성을 알아보고자 조생계통인 Swan을 공시하여 8월 24일 파종한 다음, 건초 조제시기(수잉후기, 출수기, 개화기)와 건조방법(건조제, Conditioning, 건조제 + Conditioning 및 대조구)을 달리하여 1996년 가을 축산기술연구소에서 수행되었다. 화학제인 건조제는 $K_2CO_3$ 2%를 수확 직전 기계 분무하였으며, 물리적인 Conditioning은 모델 GMR 2800 Mower Conditioner(trail type)를 사용하였고, 포장건조 후 각형 곤포를 조제하였으며, 건초의 건물손실과 외관평가는 2개월간 보관저장 후 조사하였다. 수잉후기, 출수기, 개화기로 수확이 늦어질수록 연맥의 건물수량은 증가하고 건물률은 높아진 반면 사료가치는 크게 낮아졌다. 건조속도는 건초 조제시기에 관계없이 5일간의 포장건조에도 불구하고 수분 함량이 높아 건초 조제 적기에 도달하지 못하였으며, 특히 개화기에서는 수분감소가 거의 없었다. 건조방법별 건조효과는 전반적으로 건조효과가 낮았으나 Conditioning구에서 대조구에 비해 2일정도 포장 건조기간을 단축시킬 수 있었으며 건조제 처리효과는 없었다. 건초의 건물손실은 수잉 후기에서 51.4%로 매우 높았으며, 출수기도 21.1%로 높았고, 건조방법별로는 Conditioning구와 건조제 + Conditioning 처리구에서 손실이 적은 경향이었다. 건초의 외관평가에서 수잉 후기로 조제시기가 빠를 때에는 수분 함량이 너무 높아 품질은 크게 불량하였으며, 출수기의 Conditioning구와 건조제 + Conditioning 처리구에서 80점으로 양호할 뿐 전반적으로 가을연맥 건초의 외관평점은 매우 낮았다. 이상의 결과로서 포장에서의 건조기간 단축과 건초의 품질향상을 위한 건조제 처리효과는 인정되지 않았으며 Conditioner 사용이 추천되었으나, 우리 나라에서 가을연맥의 건초 조제는 실용화하기 매우 어려운 것으로 판단되었다.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2003년도 춘계학술대회
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• pp.1296-1301
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• 2003

The chemical mechanical polishing(CMP) is necessarily applied to manufacturing the dielectric layer and metal line in the semiconductor device. The conditioning of polishing pad in CMP process additionally operates for maintaining the removal rate, within wafer non-uniformity, and wafer to wafer non-uniformity. But the fixed abrasive pad(FAP) using the hydrophilic polymer with abrasive that has the swelling characteristic by water owns the self-conditioning advantage as compared with the general CMP. FAP also takes advantage of planarity, resulting from decreasing pattern selectivity and defects such as dishing due to the reduction of abrasive concentration. This paper introduces the manufacturing technique of FAP. And the tungsten CMP using FAP achieved the good conclusion in point of the removal rate, non-uniformity, surface roughness, material selectivity, micro-scratch free contemporary with the pad life-time.

• 대한화장품학회지
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• 제14권1호
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• pp.16-37
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• 1988

A new quaternary ammonium compound, hydrolyzed ginseng-sapoin quaternary (HGSQ), from hydrolyzed Korean ginseng-saponin and 2, 3-epoxypropyltrimethyl ammonium chloride has been developed as a conditioning agent for hair care products. This structure has the hydrophilic group from the introduced cationic and the hydrophobic group from the aglycone of ginseng saponin. Its properties: surface tension, conductivity, critical micelle concentration, eye irritation, sorption onto hair, force reduction (%) for 20% extension and moisture retention effect comparing with the commercial standards. Also half-head tests of HGSQ-containing shampoo were carried out to compare the conditioning effects in shampoos.

• Tribology and Lubricants
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• 제40권2호
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• pp.67-70
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• 2024

Chemical mechanical planarization (CMP) is an essential process for ensuring high integration when manufacturing semiconductor devices. CMP mainly requires the use of polyurethane-based polishing pads as an ultraprecise process to achieve mechanical material removal and the required chemical reactions. A diamond disk performs pad conditioning to remove processing residues on the pad surface and maintain sufficient surface roughness during CMP. However, the diamond grits attached to the disk cause uneven wear of the pad, leading to the poor uniformity of material removal during CMP. This study investigates the pad wear rate profile according to the swing motion of the conditioner during swing-arm-type CMP conditioning using deep learning. During conditioning, the motion of the swing arm is independently controlled in eight zones of the same pad radius. The experiment includes six swingmotion conditions to obtain actual data on the pad wear rate profile, and deep learning learns the pad wear rate profile obtained in the experiment. The absolute average error rate between the experimental values and learning results is 0.01%. This finding confirms that the experimental results can be well represented by learning. Pad wear rate profile prediction using the learning results reveals good agreement between the predicted and experimental values.

• 대한설비공학회지:설비저널
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• 제26권3호
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• pp.183-192
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• 1997

• 한국물환경학회지
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• 제26권2호
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• pp.349-355
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• 2010

Electroflotation (EF) was conducted for activated sludge thickening to investigate the effects of sludge SVI (sludge volume index) and chemical conditioning. Return sludge samples were used for the experiment, which were collected from municipal wastewater treatment plants. The performance of sludge thickening was significantly dependent on sludge SVI. For the sludges with SVI values in a range from 50 to about 150 mL/g, the maximum float content decreased rapidly from 8.4 to 3.5% and flotation compressibility followed the same pattern. In cases of sludges with SVI higher than 150 mL/g, those results showed low content levels without large changes. Gas/solids ratio tended to increase with an increase in SVI. When polyelectrolyte was added into sludges for the conditioning, compressibility increased up to 75% and gas/solids ratio was reduced up to about 35% under the condition of microbubble production rate of 530 mL/h, however, there was no consistent effect of chemical conditioning on the maximum float solids content; some cases were positive but the others negative. It was expected that the optimum dose of electrolyte depends on sludge SVI and an excessive chemical dose causes a performance deterioration of flotation thickening.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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• pp.358-359
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• 2005

Chemical mechanical polishing(CMP) process depends on a variety of variables. Especially, surface roughness of pad plays a key role in material removal in CMP in terms of transportation ability of pores and real contact area. The surface roughness is deteriorated with polishing time by applied pressure and relative velocity. In this reason, diamond conditioner has been used to maintain the roughness on the pad. The authors try to investigate the correlation between pad roughness and frictional behavior by comparing ex-situ conditioning with in-situ conditioning.