• 제목/요약/키워드: Ceramic deposition

검색결과 735건 처리시간 0.028초

세라믹 溶射皮膜의 强度向上에 관한 硏究

  • 김영식;배차헌;김영식
    • Journal of Welding and Joining
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    • 제9권3호
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    • pp.18-25
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    • 1991
  • The purpose of this paper was to investigate the effect of deposition configuration on the mechanical properties of the flame sprayed titania ceramic coating. The sprayed deposition configuration was made in different five types with titania ceramic and Ni-base alloy on the mild steel substrate. The composite coating exhibited superior mechanical properties such as hardness, adhesive strength, thermal shock resistance and corrosion resistance, whereas the mixed coating proved to be more resistant to erosion. Especially graded coating, which consist of Ni-base alloy undercost, intermediate grade coat and titania ceramic overcost, showed excellent mechanical properties.

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화학증착 탄화규소에 의한 흑연의 표면개질 연구 -수평형 화학증착반응관에서 탄화규소 성장특성- (A Study on the Surface Modification of Graphite by CVD SiC -Growth Characteristics of SiC in a Horizontal CVD Reactor-)

  • 김동주;최두진;김영욱;박상환
    • 한국세라믹학회지
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    • 제32권4호
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    • pp.419-428
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    • 1995
  • Polycrystalline silicon carbide (SiC) thick films were depostied by low pressure chemical vapor deposition (LPCVD) using CH3SiCl3 (MTS) and H2 gaseous mixture onto isotropic graphite substrate. Effects of deposition variables on the SiC film were investigated. Deposition rate had been found to be surface-reaction controlled below reactor temperature of 120$0^{\circ}C$ and mass-transport controlled over 125$0^{\circ}C$. Apparent activation energy value decreased below 120$0^{\circ}C$ and deposition rate decreased above 125$0^{\circ}C$ by depletion effect of the reactant gas in the direction of flow in a horizontal hot wall reactor. Microstructure of the as-deposited SiC films was strongly influenced by deposition temperature and position. Microstructural change occurred greater in the mass transport controlled region than surface reaction controlled region. The as-deposited SiC layers in this experiment showed stoichiometric composition and there were no polytype except for $\beta$-SiC. The preferred orientation plane of the polycrystalline SiC layers was (220) plane at a high reactant gas concentration in the mass transfer controlled region. As depletion effect of reactant concentration was increased, SiC films preferentially grow as (111) plane.

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증착변수들이 SnO2 화학증착에 미치는 영향에 관한 연구 (The Effects of Deposition Variables on the Chemical Vapor Deposition of SnO2)

  • 김광호;천성순
    • 한국세라믹학회지
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    • 제24권6호
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    • pp.543-552
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    • 1987
  • The effects of deposition variables on SnO2 CVD were investigated for SnCl4+O2 reaction at 300∼700$^{\circ}C$, Psncl4=1${\times}$10-5∼1${\times}$10-3 atm, and Po2=5${\times}$10-4∼1 atm. A thermodynamic equilibrium study on Sn-Cl-O system has been performed with the computer calculation. The calculation indicates that major species participating the reaction in SnCl4 and not intermediate species, SnCl2. Good uniformity of the film thickness was obtained at the flow rate of 11cm/sec, which resulted from the stable gas flow in our cold wall reactor. The experimental results showed that apparent activation energy of the deposition was about 13.5Kcal/mole below the temperature of 500$^{\circ}C$ and the deposition mechanism was controlled by surface reation. The behavior of deposition rate on the reactant partial pressures could be explained with the Langmuri-Hinshelwood mechanism. X-ray study demonstrated that SnO2 film deposited at temperatures above 400$^{\circ}C$ were polycrystalline with tetragonal rutile structure and grew with (211) and (301) preferred orientations.

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저압화학기상증착법을 이용한 ZrC 성장에 잔류시간이 미치는 영향 (Residence Time Effect on the Growth of ZrC by Low Pressure Chemical Vapor Deposition)

  • 박종훈;정충환;김도진;박지연
    • 한국세라믹학회지
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    • 제45권5호
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    • pp.280-284
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    • 2008
  • In order to investigate residence time effect on the growth of ZrC film, the ZrC films grew with various system total pressure (P) and total flow rate (Q) by low pressure chemical vapor deposition because residence time is function of system total pressure and total flow rate. Thermodynamic calculations predict that the decomposition of source gases ($ZrCl_4$ and $CH_4$) would be low as increasing the residence time. Thermodynamic calculations results were proved by investigating deposition rate with various residence time. Deposition rate decreased with residence time of source gas increased. Besides, depletion effect accelerated diminution of deposition rate at high residence time. On the other hands, the deposition rated was increased as decreasing the residence time because fast moving of intermediate gas species decrease the depletion effect. The crystal structure was not changed with residence time. However, the largest size of faceted grain showed up to specific residence time and the size of grain was decreased whether residence time increase or not.

PLD(Pulsed Laser Deposition)를 이용한 청색 박막 형광체의 제조 및 특성분석 (Preparation and Characterization of Blue Thin Film Phosphors by Pulsed Laser Deposition)

  • 조상호;정유선;곽종호;손기선
    • 한국세라믹학회지
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    • 제43권12호
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    • pp.852-858
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    • 2006
  • It is well known that $BaMgAl_{10}O_{17}:Eu^{2+}$ (BAM) and $CaMgSi_2O_6:Eu^{2+}$ (CMS) are a highly efficient blue phosphor. However, these phosphors in the form of thin films have not yet been realized clue to technical difficulties. We prepared thin film type BAM and CMS phosphors on quartz glass substrate using a pulsed laser deposition technique. The luminescent and structural properties of thin film phosphors were monitored as a function of key processing parameters such as oxygen partial pressure inside the deposition chamber, deposition time, laser energy density and the type of post-deposition treatments used. Even though we could not obtain single homogenous phases, thin films with large homogenous areas and a high photoluminescence could be produced by optimizing these processing parameters.

Diethylzinc를 Source로 사용하는 화학증착법(MOCVD)에 의한 ZnO 박막의 제조 및 물성에 관한 연구 (Preparation and Properties of ZnO Thin Films by Metal-Organic Chemical Vapor Deposition Using Diethylzinc Source)

  • 김경준;김광호
    • 한국세라믹학회지
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    • 제28권8호
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    • pp.585-592
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    • 1991
  • ZnO films were deposited onto Corning glass 7059 substrate in the temperature range from $200^{\circ}C$ to $450^{\circ}C$ by chemical vapor deposition technique using the hydrolysis of Diet ylzinc (DEZ). As the deposition temperature increased from $200^{\circ}C$ to $350^{\circ}C$, the deposition rate increased with the apparent activation energy of ∼23kJ/mole. Further increase of the deposition temperature above $400^{\circ}C$, however, resulted in a reduction of the rate. It was found that ZnO film grew with a strong C-axis preferred orientation at the temperature of $400^{\circ}C$. As the deposition temperature increased, the film resistivity decreased down to ∼0.2 $\Omega$cm at $450^{\circ}C$. The electrical resistivity was governed more likely by electron concentration rather than by electron mobility. Average optical transmission of the films in the optical wavelength range of 400 nm to 900 nm was over 90% and the optical energy band gap of 3.28∼3.32 eV was obtained from the direct transition.

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서스펜션 플라즈마 스프레이 코팅법으로 제조된 Ytterbium Silicate 환경차폐코팅의 상형성 및 구조에 미치는 증착인자 및 원료혼합 공정의 영향 (Effect of Deposition Parameter and Mixing Process of Raw Materials on the Phase and Structure of Ytterbium Silicate Environmental Barrier Coatings by Suspension Plasma Spray Method)

  • 류호림;최선아;이성민;한윤수;최균;남산;오윤석
    • 한국분말재료학회지
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    • 제24권6호
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    • pp.437-443
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    • 2017
  • SiC-based composite materials with light weight, high durability, and high-temperature stability have been actively studied for use in aerospace and defense applications. Moreover, environmental barrier coating (EBC) technologies using oxide-based ceramic materials have been studied to prevent chemical deterioration at a high temperature of $1300^{\circ}C$ or higher. In this study, an ytterbium silicate material, which has recently been actively studied as an environmental barrier coating because of its high-temperature chemical stability, is fabricated on a sintered SiC substrate. $Yb_2O_3$ and $SiO_2$ are used as the raw starting materials to form ytterbium disilicate ($Yb_2Si_2O_7$). Suspension plasma spraying is applied as the coating method. The effect of the mixing method on the particle size and distribution, which affect the coating formation behavior, is investigated using a scanning electron microscope (SEM), an energy dispersive spectrometer (EDS), and X-ray diffraction (XRD) analysis. It is found that the originally designed compounds are not effectively formed because of the refinement and vaporization of the raw material particles, i.e., $SiO_2$, and the formation of a porous coating structure. By changing the coating parameters such as the deposition distance, it is found that a denser coating structure can be formed at a closer deposition distance.