• Title/Summary/Keyword: Carrier density

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Influence of the density of states and overlap integral on impact ionization rate for silicon (상태밀도와 overlap integral이 실리콘내 전자의 임팩트이온화율에 미치는 영향)

  • 정학기;유창관;이종인
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 1999.05a
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    • pp.394-397
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    • 1999
  • Impact ionization, which is a kind of a carrier-carrier interaction process occurring in a semiconductor under the influence of a high electric field, is necessary to analyse carrier transport properties. Since the parabolic or nonparabolic E-k relation is different from real band structure in high energy range, exact model of impart ionization have been presented using full band I-k relation and Fermi's golden rule. We have investigated relation of density of states, energy band structure and overlap integral. We make use of empirical pseudopotential method in order to calculate energy band structure of silicon, tetrahedron method in order to calculate density of states. We know density of states very depends on energy band structure and overlap integral depends on the primary electron energy.

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Study on the Passivation of Si Surface by Incorporation of Nitrogen in Al2O3 Thin Films Grown by Atomic Layer Deposition (원자층 증착법으로 형성된 Al2O3 박막의 질소 도핑에 따른 실리콘 표면의 부동화 특성 연구)

  • Hong, Hee Kyeung;Heo, Jaeyeong
    • Journal of the Microelectronics and Packaging Society
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    • v.22 no.4
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    • pp.111-115
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    • 2015
  • To improve the efficiency of the Si solar cell, high minority carrier life time is required. Therefore, the passivation technology is important to eliminate point defects on the silicon surface, causing the loss of minority carrier recombination. PECVD or post-annealing of thermally-grown $SiO_2$ is commonly used to form the passivation layer, but a high-temperature process and low thermal stability is a critical factor of low minority carrier lifetime. In this study, atomic layer deposition was used to grow the $Al_2O_3$ passivation layer at low temperature process. $Al_2O_3$ was selected as a passivation layer which has a low surface recombination velocity because of the fixed charge density. For the high charge density, an improved minority carrier lifetime, and a low surface recombination, nitrogen was doped in the $Al_2O_3$ thin film and the improvement of passivation was studied.

Single Carrier Spectroscopy of Bisolitons on Si(001) Surfaces

  • Lyo, In-Whan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.13-13
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    • 2010
  • Switching an elementary excitation by injecting a single carrier would offer the exciting opportunity for the ultra-high data storage technologies. However, there has been no methodology available to investigate the interaction of low energy discrete carriers with nano-structures. In order to map out the spatial dependency of such single carrier level interactions, we developed a pulse-and-probe algorithm, combining with low temperature scanning tunneling microscopy. The new tool, which we call single carrier spectroscopy, allows us to track the interaction with the target macrostructure with tunneling carriers on a single carrier basis. Using this tool, we demonstrate that it is possible not only to locally write and erase individual bi-solitons, reliably and reversibly, but also to track of creation yields of single and multiple bi-solitons. Bi-solitons are pairs of solitons that are elementary out-of-phase excitations on anti-ferromagnetically ordered pseudo-spin system of Si dimers on Si(001)-c(42) surfaces. We found that at low energy tunneling the single bisoliton creation mechanism is not correlated with the number of carriers tunneling, but with the production of a potential hole under the tip. An electric field at the surface determines the density of the local charge density under the tip, and band-bending. However a rapid, dynamic change of a field produces a potential hole that can be filled by energetic carriers, and the amount of energy released during filling process is responsible for the creation of bi-solitons. Our model based on the field-induced local hole gives excellent explanation for bi-soliton yield behaviors. Scanning tunneling spectroscopy data supports the existence of such a potential hole. The mechanism also explains the site-dependency of bi-soliton yields, which is highest at the trough, not on the dimer rows. Our study demonstrates that we can manipulate not just single atoms and molecules, but also single pseudo-spin excitations as well.

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A Study for the Improvement of Safety of Bulk Carriers (발크캐리어의 안전성 향상에 관한 연구)

  • 김태우;박진수
    • Journal of the Korean Institute of Navigation
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    • v.23 no.3
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    • pp.17-28
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    • 1999
  • Concerns related to the safety of bulk carriers we, most of all, the increasing number of bulk carrier accidents which amount to 425 during last 20 years; half of them are totally lost. A number of bulk tarriers are still missing. Bulk carrier safety has become an international issue since 1995. The International Maritime Organization (IMO) embarked on the legislation as a countermeasure to the increasing number of the bulk carrier accidents. The IMO discussed in the safety of bulk carriers including the strength of transverse watertight bulkheads, especially when the ship carries high density cargoes and the damage stability of bulk carriers in the flooded condition. In this study, statistics and causes of accidents of bulk carriers are analyzed in order to identify special features of bulk carrier accident and causes of the casualty. This study examines certain cases of hull collapses and severence which resulted in sinking to infer possible causes of missing ships.

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Relationships between Carrier Lifetime and Surface Roughness in Silicon Wafer by Mechanical Damage (기계적 손상에 의한 실리콘 웨이퍼의 반송자 수명과 표면 거칠기와의 관계)

  • 최치영;조상희
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.12 no.1
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    • pp.27-34
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    • 1999
  • We investigated the effect of mechanical back side damage in viewpoint of electrical and surface morphological characteristics in Czochralski silicon wafer. The intensity of mechanical damage was evaluated by minority carrier recombination lifetime by laser excitation/microwave reflection photoconductance decay technique, atomic force microscope, optical microscope, wet oxidation/preferential etching methods. The data indicate that the higher the mechanical damage degree, the lower the minority carrier lifetime, and surface roughness, damage depth and density of oxidation induced stacking fault increased proportionally.

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Effects of Carrier Leakage on Photoluminescence Properties of GaN-based Light-emitting Diodes at Room Temperature

  • Kim, Jongseok;Kim, Seungtaek;Kim, HyungTae;Choi, Won-Jin;Jung, Hyundon
    • Current Optics and Photonics
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    • v.3 no.2
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    • pp.164-171
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    • 2019
  • Photoluminescence (PL) properties of GaN-based light-emitting diodes (LEDs) were analyzed to study the effects of carrier leakage on the luminescence properties at room temperature. The electrical leakage and PL properties were compared for LEDs showing leakages at forward bias and an LED with an intentional leakage path formed by connecting a parallel resistance of various values. The leakages at the forward bias, which could be observed from the current-voltage characteristics, resulted in an increase in the excitation laser power density for the maximum PL efficiency (ratio of PL intensity to excitation power) as well as a reduction in the PL intensity. The effect of carrier leakages on PL properties was similar to the change in PL properties owing to a reduction of the photovoltage by a reverse current since the direction of the carrier movement under photoexcitation is identical to that of the reverse current. Valid relations between PL properties and electrical properties were observed as the PL properties deteriorated with an increase in the carrier leakage. The results imply that the PL properties of LED chips can be an indicator of the electrical properties of LEDs.

Effects of rhBMP-2 with various carriers on bone regeneration in rat calvarial defect (백서 두개골 결손에서 rhBMP-2와 다양한 carrier의 골재생 유도효과)

  • Lee, Seo-Kyoung;Kim, Ji-Sun;Kang, Eun-Jung;Eum, Tae-Kwan;Kim, Chang-Sung;Cho, Kyoo-Sung;Chai, Jung-Kiu;Kim, Chong-Kwan;Choi, Seong-Ho
    • Journal of Periodontal and Implant Science
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    • v.38 no.2
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    • pp.125-134
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    • 2008
  • Purpose: Bone morphogenetic protein (BMP) is a potent differentiating agent for cells of the osteoblastic lineage. It has been used in the oral cavity under a variety of indications and with different carriers. However, the optimal carrier for each indication is not known. This study evaluated the bone regenerative effect of rhBMP-2 delivered with different carrier systems. Materials and Methods: 8 mm critical-sized rat calvarial defects were used in 60 male Sprague-Dawley rats. The animals were divided into 6 groups containing 10 animals each. Two groups were controls that had no treatment and absorbable collagen membrane only. 4 groups were experimentals that contained rhBMP-2 only and applied with absorbable collagen sponge($Collatape^{(R)}$), $MBCP^{(R)}$, Bio-$Oss^{(R)}$ each. The histological and histometric parameters were used to evaluate the defects after 2- or 8-week healing period. The shape and total augmented area were stable in all groups over the healing time. Results: New bone formation was significantly greater in the rhBMP-2 with carrier group than control group. rhBMP-2/ACS was the highest in bone density but gained less new bone area than rhBMP-2/$MBCP^{(R)}$ and rhBMP-2/Bio-$Oss^{(R)}$. The bone density after 8 weeks was greater than that after 2 weeks in all groups. However, rhBMP-2 alone failed to show the statistically significant difference in new bone area and bone density compared to control group. Also $MBCP^{(R)}$ and Bio-$Oss^{(R)}$ particles remained after 8 weeks healing period. Conclusion: These results suggest that rhBMP-2 with carrier system is an excellent inductive agent for bone formation and we can use it as the predictable bone tissue engieering technique. Future study will likely focus on the kinetics of BMP release and development of carriers that is ideal for it.

Estimation of mechanical damage by minority carrier recombination lifetime and near surface micro defect in silicon wafer (실리콘 웨이퍼에서 소수 반송자 재결합 수명과 표면 부위 미세 결함에 의한 기계적 손상 평가)

  • 최치영;조상희
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.9 no.2
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    • pp.157-161
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    • 1999
  • We investigated the effect of mechanical back side damage in Czochralski silicon wafer. The intensity of mechanical damage was evaluated by minority carrier recombination lifetime by laser excitation/microwave reflection photoconductance decay ($\mu$-PCD) technique, wet oxidation/preferential etching methods, near surface micro defect (NSMD) analysis, and X-ray section topography. The data indicate that the higher the mechanical damage intensity, the lower the minority carrier lifetime, and NSMD density increased proportionally, also correlated to the oxidation induced stacking fault (OISF) density. Thus, NSMD technique can be used separately from conventional etching method in OISF measurement.

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A study on the analysis of carrier properties and trap energy depth in the low-density polythylene electrets (저밀도 폴리에틸렌 일렉트렉트에 있어서 케리어의 성질과 Trap 깊이 해석에 대한 연구)

  • 이준웅
    • 전기의세계
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    • v.29 no.8
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    • pp.511-518
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    • 1980
  • The thermostimulated discharge currents of low-density polyethylene electrets were measured versus the principal experimental variables. Several electrode types were used for the charging and discharging procedures. The results led to know the experimental conditions for the heterocharge and homocharge accumulating and decreasing. The electronic structure parameters of polyethylene such as trap level, density of traps, hopping length, mobility, trap time constants were deduced. A method for evaluating the local electric field inside the electret is proposed.

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Variations of the hole injection efficiency with IGBT's collector structure (IGBT의 콜렉터 구조에 따른 홀 주입효율의 변화)

  • Choi, Byung-Sung;Chung, Sang-Koo
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1956-1958
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    • 1999
  • The analysis of hole injection efficiency at the p+/n-drift layer junction in non-punchthrough IGBT structure is presented. This analysis takes into account carrier concentration variations by conductivity modulation. Good agreement between this analysis and simulation is found over a wide range of carrier lifetime and current density. The proposed analytical model of the hole injection efficiency as a function of collector width, collector concentration has been verified by device simulator, ATLAS.

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