• 한국전자파학회논문지
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• 제21권2호
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• pp.143-151
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• 2010

본 논문에서는 Metamaterial CRLH 구조 기반의 0차 공진현상이 발생되는 새로운 직각 패치 안테나가 제안된다. 일반 마이크로스트립 패치 구조의 기본 공진 모드인 반파장 공진이나 반파장 공진의 양의 정수배가 아닌 구조 전체에 전계가 같은 위상을 갖게 하면서, 기존에 발표된 다수의 금속 쎌들이 일렬 연결된 1차원 0차 공진 안테나의 구조와 달리 금속 패치 주위에 하나의 용량성 결합 직각 링만을 부착하는 구조를 제안하는 것이다. 2.4 GHz에서 0차 공진 특성을 갖도록 설계된 등가회로에 따른 물리 구조의 치수들이 입력된 3차원 전자장 분석기에서 안테나의 성능에 대한 모의시험을 수행한다. 설계 결과 2.4 GHz에서 공진점을, 그리고 이득과 효율은 각각 5 dB와 98%를 얻었다. 또한 본 논문이 제안하는 안테나가 마이크로스트립 패치 안테나의 장점인 low-profile과 모노폴 안테나의 장점인 전방향 패턴을 동시에 가지는 특징이 논의된다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2009년도 춘계학술대회 논문집
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• pp.250-251
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• 2009

For the fabrication of a multilevel resist (MLR) based on a very thin amorphous carbon (a-C) layer an $Si_{3}N_{4}$ hard-mask layer, the selective etching of the $Si_{3}N_{4}$ layer using physical-vapor-deposited (PVD) a-C mask was investigated in a dual-frequency superimposed capacitively coupled plasma etcher by varying the following process parameters in $CH_{2}F_{2}/H_{2}/Ar$ plasmas : HF/LF powr ratio ($P_{HF}/P_{LF}$), and $CH_{2}F_{2}$ and $H_2$ flow rates. It was found that infinitely high etch selectivities of the $Si_{3}N_{4}$ layers to the PVD a-C on both the blanket and patterned wafers could be obtained for certain gas flow conditions. The $H_2$ and $CH_{2}F_{2}$ flow ratio was found to play a critical role in determining the process window for infinite $Si_{3}N_{4}$/PVDa-C etch selectivity, due to the change in the degree of polymerization. Etching of ArF PR/BARC/$SiO_x$/PVDa-C/$Si_{3}N_{4}$ MLR structure supported the possibility of using a very thin PVD a-C layer as an etch-mask layer for the $Si_{3}N_{4}$ layer.

• 한국표면공학회지
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• 제39권3호
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• pp.137-141
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• 2006

Process window for infinite etch selectivity of silicon nitride $(Si_3N_4)$ layers to ArF photoresist (PR) was investigated in dual frequency superimposed capacitive coupled plasma (DFS-CCP) by varying the process parameters such as low frequency power $(P_{LF})$, $CH_2F_2$ and $H_2$ flow rate in $CH_2F_2/H_2/Ar$ plasma. It was found that infinite etch selectivities of $Si_3N_4$ layers to the ArF PR on both blanket and patterned wafers can be obtained for certain gas flow conditions. The etch selectivity was increased to the infinite values as the $CH_2F_2$ flow rate increases, while it was decreased from the infinite etch selectivity as the $H_2$ flow rate increased. The preferential chemical reaction of the hydrogen with the carbon in the polymer film and the nitrogen on the $Si_3N_4$ surface leading to the formation of HCN etch by-products results in a thinner steady-state polymer and, in turn, to continuous $Si_3N_4$ etching, due to enhanced $SiF_4$ formation, while the polymer was deposited on the ArF photoresist surface.

• 대한의용생체공학회:의공학회지
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• 제35권4호
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• pp.87-94
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• 2014

Recent technological advances have increased interest in personal health monitoring. Electrocardiogram(ECG) monitoring is a basic healthcare activity and can provide decisive information regarding cardiovascular system status. In this study, we developed a capacitive ECG measurement system that can be included within a cloth mattress pad. The device permits ECG data to be obtained during sleep by using capacitive electrodes. However, it is difficult to detect R-wave peaks automatically because signals obtained from the system can include a high level of noise from various sources. Because R-peak detection is important in ECG applications, we developed an algorithm that can reduce noise and improve detection accuracy under noisy conditions. Algorithm reliability was evaluated by determining its sensitivity(Se), positive predictivity(+P), and error rate(Er) by using data from the MIT-BIH Polysomnographic Database and from our capacitive ECG system. The results showed that Se = 99.75%, +P = 99.77%, and Er = 0.47% for MIT-BIH Polysomnographic Database while Se = 96.47%, +P = 99.32%, and Er = 4.34% for our capacitive ECG system. Based on those results, we conclude that our R-peak detection method is capable of providing useful ECG information, even under noisy signal conditions.

• 한국진공학회지
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• 제6권3호
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• pp.213-219
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• 1997

본 연구에서는 내전극 정전결합 유동가스형 반응장치를 이용하여 플라즈마 중합 스 티렌 박막을 제작하고 적외선분광스펙트럼, 열분해가tm크로마토그래피, 시차주사열량계 및 겔투과성 크로마토그래피의 분석을 통하여 중합조건이 분자구조 및 분자량 분포에 미치는 영향을 조사하였다. 위의 결과로부터 개시 모노머의 화학적 특성과는 다른 고도로 가교된 박막이 생성되었으며, 방전압력, 방전전력 및 가스의 유량 등의 중합조건 조절에 의해 분자 구조, 가교도, 분자량 분포 등의 제어가 가능함이 판명되었다. 따라서 내전극 정전결합 유동 가스형 반응장치에 의해 수행된 플라즈마중합법은 중합조건의 조절에 의해 센서의 감지막, 광도전성 소자 및 포토 레지스트 등에 응용가능한 기능성 유기박막의 제작에 좋은 특성을 나타내는 것을 알 수 있었다.

• Journal of Electrical Engineering and Technology
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• 제10권1호
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• pp.331-337
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• 2015

A novel fully-printed microstrip antenna with negative first resonance and dual polarization is proposed. The radiator is printed on the 1-layer substrate instead of multilayers. The -1st resonance results from a composite right- and left-handed(CRLH) structure that has a circumferentially interlocked gap capacitively coupling a patch with a shorted-ring. This compact antenna is provided with a dual-polarization capability by creating two orthogonal linear polarizations in one body with coaxial feeds. The design is carried out by doing full-wave EM field simulation which is compared with the measurement of the fabricated antenna prototype. The measured results give the gain of 5 dBi and the efficiency of 78% at the -1st resonance mode as the center frequency of a downlink channel of the bandwidth over 20 MHz with 29 dB polarization isolation for mobile communication.

• IEIE Transactions on Smart Processing and Computing
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• 제4권3호
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• pp.149-151
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• 2015

Coupling with a ring of capacitors introduces in-phase coupling current in multi-stage LC oscillators, increasing coupling strength and phase spacing accuracy. Capacitive coupling is effective at high-frequency applications because it increases coupling strength with the operating frequency. However, capacitive loading from the ring lowers operating frequency and reduces the tuning range. Mathematical expressions of phase noise and phase spacing accuracy with capacitive coupling are examined here, and transistor-level simulations confirm the effectiveness of the capacitive coupling.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 춘계학술대회 논문집 센서 박막재료연구회 및 광주 전남지부
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• pp.22-26
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• 2008

In this paper, we developed a hybrid simulation model of carbon laser ablation under the Ar plasmas consisted of fluid and particle methods. Three kinds of carbon particles, which are carbon atom, ion and electron emitted by laser ablation, are considered in the computation. In the present simulation, we adopt capacitively coupled plasma with asymmetrical electrodes. As a result, in Ar plasmas, carbon ion motions were suppressed by a strong electric field and were captured in Ar plasmas. Therefore, a low number density of carbon ions were deposited upon substrate. In addition, the plume motions in Ar gas atmosphere was also discussed.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1992년도 하계학술대회 논문집 B
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• pp.875-878
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• 1992

In this study, We made use of inter-electrode capacitively coupled type plasma polymerization apparatus in order to make the organic optical thin films. We adopted in Benzen. Vinyl-Pyridine and Styrene, which have optical function in the organic world and manufactured double later. It is examined optics properties by it respectively. At the middle wave length as 550[nm], the transmittance is double layer smaller than one of single layer. The refractive index with wave length is various from 1.55 to 1.65. Then, it is known that measured results are valid because the extinction coefficient(K) is about $10^{-4}$ for variation of refractive index.

• 한국진공학회지
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• 제3권2호
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• pp.179-185
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• 1994

음극에 DLC 필름이 놓여져 있는 용량결합형의 RF 플라즈마 장치에서 Ar가스에 의한 방전에서 발생된 입자의 분포를 레이져 산란에 의하여 관측하였다. 발생된 입자들은 플라즈마와 sheath의 경계면 에서 높은 밀도의 구름을 이루었으며 시간에 따라 주기적인 분포의 변화가 반복되었다, 입자 구름의 발 생은 플라즈마 물성의 변화를 야기하였으며 그 결과로 심한 self-bias 전위의 감소현상이 관측되었다. 입자 구름분포의 시간에 따른 변화와 같은 주기의 self-bias 플라즈마전위의 진동현상이 가열된 fast-scanning langmuir 탐침에 의하여 관측되었다. 이결과는 입자 표면에로의 음전하 누적에 따른 전체 음전하의 이동도 감소에 의한 것으로 해석된다. 또한 방출 분광법에 의하여 입자오염상태의 Ar 플라즈 마와 정상상태의 Ar 플라즈마의 방출 선세기의 변화를 관측하였는데 입자구름 오염시의 2차전자 차폐 현상에 의해 높은 문턱 에너지를 가진 Ar II 선의 세기 감소현상이 나타났다.