Simulation of electromigration behavior on ULSI′s interconnect under pulsed DC stress : frequency, duty factor, temperature effect (Pulsed DC 조건에서 반도체 배선의 electromigration 시뮬레이션 : 주파수, duty factor, 온도효과)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2002.07a
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- pp.40-42
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- 2002