• Title/Summary/Keyword: CCl₄

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Antioxidant Effects of Sagunja-Tang (Sijunzi-Tang) (사군자탕(四君子湯)의 항산화(抗酸化) 효과(效果))

  • Lee Yong-Tae;Cho Su-In;Kim Young-Kyun
    • Journal of Society of Preventive Korean Medicine
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    • v.4 no.2
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    • pp.170-192
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    • 2000
  • Objectives : This study was carried out to research antioxidant effects of Sagunja-Tang(SA) through in vitro and vivo experiments, and tried to investigate the relation between oxidation of tissues and deficiency of Qi. Methods and results : HPLC analysis of glycyrrhizine - known to be the main compound of Radix Glycyrrhizae - was done to certify the quality of SA. Chemiluminescence was initiated by adding tort-butyl hydroperoxide (t-BHP) to rabbit polymorphonuclear leukocytes (neutrophils), and generated reactive oxygen species (superoxide anion) decreased significantly by SA as dose dependent manner. Cell injury during 60 minutes tissue incubation was initiated by adding t-BHP, a hydrophobic hydroperoxide and $H_2O_2$, an water soluble oxidant to rat renal cortical and liver slices. Percentage cell death and lipid peroxidation were estimated by measuring lactate dehydrogenase (LDH) and malondialdehyde (MDA), a product of lipid peroxidation. t-BHP induced % cell death of renal cortical slices and lipid peroxidation of renal cortical and liver slices were decreased significantly by SA. SA decreased significantly % cell death and lipid peroxidation of renal cortical and liver slices induced by $H_2O_2$, too. Acute renal and liver injury induced by $HgCl_2\;and\;CCl_4$, which initiated from free radical, were applied to mice and metabolic data were obtained. Data showed protective effects of SA on acute renal injury caused by decrease of glomerular filtration. SA protected acute liver injury too. Conclusions Through this study, we found that SA have antioxidant effects and tissue oxidation was similar to deficiency of Qi. And further studies have to be followed to certify the mechanisms.

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Statistical Analysis on Process Variables in Linear Roll-CMP (선형 Roll-CMP에서 공정변수에 관한 통계적 분석)

  • Wang, Han;Lee, Hyunseop;Jeong, Haedo
    • Tribology and Lubricants
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    • v.30 no.3
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    • pp.139-145
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    • 2014
  • Nowadays, most micro-patterns are manufactured during flow line production. However, a conventional rotary chemical mechanical polishing (CMP) system has a limited throughput for the fabrication of large and flexible electronics. To overcome this problem, we propose a novel linear roll-CMP system for the planarization of large-area electronics. In this paper, we present a statistical analysis on the linear roll-CMP process of copper-clad laminate (CCL) to determine the impacts of process parameters on the material removal rate (MRR) and its non-uniformity (NU). In the linear roll-CMP process, process parameters such as the slurry flow rate, roll speed, table feed rate, and down force affect the MRR and NU. To determine the polishing characteristics of roll-CMP, we use Taguchi's orthogonal array L16 (44) for the experimental design and F-values obtained by the analysis of variance (ANOVA). We investigate the signal-to-noise (S/N) ratio to identify the prominent control parameters. The "higher is better" for the MRR and "lower is better" for the NU were selected for obtaining optimum CMP performance characteristics. The experimental and statistical results indicate that the down force and roll speed mainly affect the MRR and the down force and table feed rate determine the NU in the linear roll-CMP process. However, over 186.3 N of down force deteriorates the NU because of the bending of substrate. Roll speed has little relationship to the NU and the table feed rate does not impact on the MRR. This study provides information on the design parameter of roll-CMP machine and process optimization.

The Effect of Additives in Final Rinse Water on Soiling and the Removal of Soil. (세탁후 최종처리액의 조성이 직물의 오염 및 세척성에 미치는 영향)

  • Cho Sung Kyo;Kim Sang Reon
    • Journal of the Korean Society of Clothing and Textiles
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    • v.2 no.1
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    • pp.167-176
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    • 1978
  • The effect of additives in final rinse water during laundering on soiling, soil removal and some properties of fabrics has been studied with various fabrics. The additives examined were fabric softener (Sta-Puf), cationic surfactant (Apole PS), sizing materials such as CMC, PYA, cornstarch and mixture of CMC and cationic surfactant. The results obtained may be summerized as follows. L Addition of additives except PVA in final rinse water generally reduce the deposition of carbon-$CCl_4$ soil and it seems to be rather independant of the concentration of additives. The effect of additives on soil resistant is found to increase in the following order. cotton; Apole

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Inhibition of Tumor Necrosis $Factor-{\alpha}$ mRMA Expression by a Limited Series of Tetrahydroisoquinolines in Mouse Peritoneal Macrophages

  • Jung, Tae-Ho;Lee, Young-Soo;Kang, Young-Jin;Lee, Bog-Kyu;Ko, Young-Shin;Seo, Han-Geuk;Chung, Soo-Youn;Lee, Duck-Hyung;Yun-Choi, Hye-Sook;Chang, Ki-Churl
    • The Korean Journal of Physiology and Pharmacology
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    • v.4 no.4
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    • pp.325-331
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    • 2000
  • Tumor necrosis $factor-{\alpha}\;(TNF-{\alpha})$ plays important roles in inflammatory responses. Some of tetrahydroisoquinoline (THI) compounds exhibited to inhibit iNOS expression in animal studies and RAW 264.7 cells, but the action of THI on inflammatory reaction was not fully investigated. In the present study, we examined a limited series of THIs (higenamine, YS-51 and THI-52) on the $TNF-{\alpha}$ mRNA expression in mouse peritoneal macrophages by Northern analysis. When thioglycollate-stimulated peritoneal macrophages were incubated with LPS (100 ng/ml), expression of $TNF-{\alpha}$ mRNA was evident and reached its maximum at 2.5 h, which was reduced concentration-dependently by treatment with THIs. When the $TNF-{\alpha}$ activity of macrophage-conditioned media was measured using a TNF-sensitive L929 fibroblast cell line, CCL 1, all THIs increased the cell viability in a concentration dependent manner. The concentrations of THIs used are not cytotoxic by itself when analysed by MTT. Furthermore, nitrite/nitrate level was significantly reduced by the presence of THIs in cells treated with $LPS+interferon-{\gamma}\;(IFN-{\gamma}).$ It is concluded, thus, that these results strongly indicated that THIs can suppress the $TNF-{\alpha}$ expression and reduce NO, which may be useful for the inflammatory disorders.

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Microarray Study of Genes Differentially Modulated in Response to Nitric Oxide in Macrophages

  • Nan, Xuehua;Maeng, Oky;Shin, Hyo-Jung;An, Hyun-Jung;Yeom, Young-Il;Lee, Hay-Young;Paik, Sang-Gi
    • Animal cells and systems
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    • v.12 no.1
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    • pp.15-21
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    • 2008
  • Nitric oxide(NO) has been known to play important roles in numerous physiologic processes including neurotransmission, vasorelaxation, and cellular apoptosis. Using a mouse cDNA gene chip, we examined expression patterns and time course of NO-dependent genes in mouse macrophage RAW264.7 cells. Genes shown to be upregulated more than two fold or at least at two serial time points were further selected and validated by RT-PCR. Finally, 81 selected genes were classified by function as signaling, apoptosis, inflammation, transcription, translation, ionic homeostasis and metabolism. Among those, genes related with signaling, apoptosis and inflammation, such as guanylate cyclase 1, soluble, alpha3(Gucy1a3); protein kinase C, alpha($Pkc{\alpha}$); lymphocyte protein tyrosine kinase(Lck); BCL2/adenovirus E1B 19 kDa-interacting protein(Bnip3); apoptotic protease activating factor 1(Apaf1); X-linked inhibitor of apoptosis(Xiap); cyclin G1(Ccng1); chemokine(C-C motif) ligand 4(Ccl4); B cell translocation gene 2, anti-proliferative(Btg2); lysozyme 2(Lyz2); secreted phosphoprotein 1(Spp1); heme oxygenase(decycling) 1(Hmox1); CD14 antigen(Cd14); and granulin(Grn) may play important roles in NO-dependent responses in murine macrophages.

A Study on Etching Characteristics of PZT thin films in $CF_4/Cl_2/Ar$ High Density Plasma ($CF_4/Cl_2/Ar$ 고밀도 플라즈마를 이용한 PZT 박막의 식각 특성에 관한 연구)

  • Kang, Myoung-Gu;Kim, Kyoung-Tae;Kim, Tae-Hyung;Kim, Chang-Il
    • Proceedings of the KIEE Conference
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    • 2001.07c
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    • pp.1512-1514
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    • 2001
  • In this work, PZT thin films were etched as a function of $Cl_2$/Ar and additive $CF_4$ into $Cl_2$(80%)/Ar(20%). The etch rates of PZT films were 1600 $\AA$/min at $Cl_2$(80%)/Ar(20%) gas mixing ratio and 1973 $\AA$/min at 30% additive $CF_4$ into $Cl_2$(80%)/Ar(20%). Therefore the etch rate of PZT in $CF_4/Cl_2/Ar$ plasma is faster than in $Cl_2$/Ar. From XPS and SIMS analysis, metal halides and C-O, FCI and $CClF_2$ were detected. The etching of PZT films in Cl-based plasma is primarily chemically assisted ion etching and the remove of nonvolatile etch byproducts is the dominant step. Consequently, we suggest that the increase of Cl radicals and the volatile oxy-compound such as $CO_y$ are made by adding $CF_4$ into $Cl_2$/Ar plasma. Therefore, the etch rate of PZT in $CF_4/Cl_2/Ar$ plasma is faster than in $Cl_2$/Ar. The etched profile of PZT films was obtained above 70$^{\circ}$ by the SEM micrograph.

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Study on the Compositions of Photosensitive Resistor Paste Using Epoxy Acrylate Oligomers and Conductive Carbonblack (에폭시 아크릴레이트 올리고머와 전도성 카본블랙을 이용한 감광성 저항 페이스트 조성 연구)

  • Park, Seong-Dae;Kang, Nam-Kee;Lim, Jin-Kyu;Kim, Dong-Kook
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.421-421
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    • 2008
  • Generally, the polymer thick-film resistors for embedded organic or hybrid substrate are patterned by screen printing so that the accuracy of resistor pattern is not good and the tolerance of resistance is too high(${\pm}$20~30%). To reform these demerits, a method using Fodel$^{(R)}$ technology, which is the patterning method using a photosensitive resin to be developable by aqueous alkali-solution as a base polymer for thick-film pastes, was recently incorporated for the patterning of thermosetting thick-film resistor paste. Alkali-solution developable photosensitive resin system has a merit that the precise patterns can be obtained by UV exposure and aqueous development, so the essential point is to get the composition similar to PSR(photo solder resist) used for PCB process. In present research, we made the photopatternable resistor pastes using 8 kinds of epoxy acrylates and a conductive carbonblack (CDX-7055 Ultra), evaluated their developing performance, and then measured the resistance after final curing. To become developable by alkali-solution, epoxy acrylate oligomers with carboxyl group were prepared. Test coupons were fabricated by patterning copper foil on FR-4 CCL board, plating Ni/Au on the patterned copper electrode, applying the resistor paste on the board, exposing the applied paste to UV through Cr mask with resistor patterns, developing the exposed paste with aqueous alkali-solution (1wt% $Na_2CO_3$), drying the patterned paste at $80^{\circ}C$ oven, and then curing it at $200^{\circ}C$ during 1 hour. As a result, some test compositions couldn't be developed according to the kind of oligomer and, in the developed compositions, the measured resistance showed different results depending on the paste compositions though they had the same amount of carbonblack.

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Conductive line manufacturing method and evaluation using a metal jet (메탈젯을 이용한 전도성 배선 형성 방법과 평가)

  • Kim, Tae-Hoon;Lee, Young-Il;Seo, Young-Kwuan;Jeon, Byung-Ho;Lee, Kwi-Jong;Kim, Dong-Hoon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.391-392
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    • 2008
  • 최근 나노 금속의 대량 생산에 대한 기술이 확보됨에 따라, 메탈젯을 이용한 연구가 활발히 진행되고 있다. 메탈젯의 연구 범위는 RFID, PCB, MLCC 전극, 태양전지전극, PDP 전극, EMC용재료 등 그 응용 범위를 넓혀 가고 있다. 이러한 응용 기술 대표적인 배선형성 기술인 PCB 제조에 대한 연구는 40um 이하의 고해상도 기판 개발을 요구하고 있다. 선폭은 40um 이하를 유지하면서, 두께는 10um 이상으로 CCL을 대체 하기 위한 기판 형성 기술은 응용기술은 가장 어려운 난이도의 기술이다. 메탈젯 기술은 매우 복합적인 연구분야로 나노 재료의 개발, 인쇄공정의 개발, 기재 표면처리 기술, 헤드 기술의 개발을 동시에 만족할 때 가능하다. 배선 형성을 위하여 나노 잉크를 이용하여 직접 인쇄를 진행하고, 소결하여 전도성을 얻게 된다. 본 연구에서는 미세노즐에 토출 가능한 잉크젯용 잉크 조성을 결정하고, 기판과의 신뢰성을 확보하기 위하여 접착력의 평가, 전도도의 평가, 건조 시간 조절을 통한 Crack 문제 해결, 미세 선폭의 균일성 조절에 관한 실험을 진행하였다.

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A Case Study of Broadcasting Contents Using One Source Multi Use Strategy (사례 분석을 통한 방송콘텐츠 OSMU의 고찰 - OSMU 이론적 정립 및 비즈니스분류를 중심으로 -)

  • Cho, Seong-Ryong;Shin, Ho;Jang, Yei-Beech;Lee, Seong-Eob;Han, Min-Woo;Koo, Bon-Cheol
    • Journal of Broadcast Engineering
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    • v.12 no.5
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    • pp.423-434
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    • 2007
  • In this study, we investigated broadcasting industry in Korea and in U.S. to find out what mostly makes the broadcasting industry competitive for the near future. One source multi use(from now on OSMU) marketing strategy is important when discussing profits of broadcasting contents. To develop a theoretical and academic framework of OSMU, 14 experts participated in focus group interview. A new meaning of OSMU is defined and 4 types of OSMU business models are developed in the study. Also, two successful examples of broadcasting contents, each from Korea and U.S., were analyzed with the models that we have developed. Lastly, we discussed how to enhance the competitiveness of broadcasting contents and industry by using the benefit-maximizing-strategies of OSMU.

The House dust Mite Allergen, Dermatophagoides pteronyssinus Regulates the Constitutive Apoptosis and Cytokine Secretion of Human Eosinophils

  • Kang, Bo Kyeong;Kim, A Min;Park, Sun Hwa;Lee, Eun Ji;Kim, Jung Seok;Kim, Eun Jeong;Baek, Seung Yeop;Kim, In Sik
    • Biomedical Science Letters
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    • v.20 no.1
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    • pp.39-42
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    • 2014
  • Asthma is an allergic inflammation and house dust mite (HDM) is a major allergen to induce asthma pathogenesis. Regulation of eosinophil apoptosis is an essential immune process and its dysregulation is implicated in asthma. In the present study, we examined the effects of HDM on spontaneous apoptosis of asthmatic eosinophils and on cytokine secretion in eosinophils of normal subjects including non-atopic and atopic normal. Extract of Dermatophagoides pteronissinus (DP) inhibited eosinophil apoptosis in a time-dependent manner. DP increased the secretion of G-CSF, GM-SCF, and IL-4, which is involved in suppression of eosinophil apoptosis, but IL-5 expression was not altered after DP stimulation. DP also elevated the release of IL-6, IL-8, tumor necrosis factor-${\alpha}$ (TNF-${\alpha}$) and CCL2, which are anti-apoptotic or survival factors. The secretion of G-CSF, GM-CSF, IL-6, IL-8, and TNF-${\alpha}$ due to DP is higher in atopic normal than that in non-atopic normal. In conclusion, DP increases the survival of eosinophils and its mechanism may be associated with cytokine release. These findings may enable elucidation of asthma pathogenesis induced by HDM.