• Journal of Advanced Marine Engineering and Technology
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• 제40권10호
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• pp.899-905
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• 2016

Wireless access in vehicle environment (WAVE) communication is currently being researched as core wireless communication technologies for cooperative intelligent transport systems (C-ITS). WAVE consists of both vehicle to vehicle (V2V) communication, which refers to communication between vehicles, and vehicle to infrastructure (V2I) communication, which refers to the communication between vehicles and road-side stations. V2I has a longer communication range than V2V, and its communication range and reception rate are heavily influenced by various factors such as structures on the road, the density of vehicles, and topography. Therefore, domestic environments in which there are many non-lines of sight (NLOS), such as mountains and urban areas, require optimized communication channel modeling based on research of V2I propagation characteristics. In the present study, the received signal strength indicator (RSSI) was measured on both an experience road and a test road, and the large-scale characteristics of the WAVE communication were analyzed using the data collected to assess the propagation environment of the WAVE-based V2I that is actually implemented on highways. Based on the results of this analysis, this paper proposes a WAVE communication channel model for domestic public roads by deriving the parameters of a dual-slope logarithmic distance implementing a two-ray ground-reflection model.

• 대한전자공학회논문지SD
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• 제40권1호
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• pp.1-10
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• 2003

본 연구에서는 Metal-Ferroelecric-Semiconductor FET (MFSFET) 소자의 특성을 시뮬레이션 하였다. 시뮬레이션에서는 field-dependent polarization 모델과 square-law FET 모델이 도입되었다. MFSFET 시뮬레이전에서 C-V/sub G/ 곡선은 축적과 공핍 및 반전 영역을 확실하게 나타내었다. 게이트 전압에 따른 캐패시턴스, subthreshold 전류 그리고, 드레인 전류특성에서 강유전체 항전압이 0.5, 1V 일 때, 각각 1, 2V 의 memory window 를 나타내었다. 드레인 전류-드레인 전압 곡선은 증가영역과 포화영역으로 구성되었다. 드레인 전류-드레인 전압 곡선에서 두 부분의 문턱전압에 의해 나타난 포화드레인 전류차이는 게이트 전압이 0, 0.1, 0.2 그리고, 0.3V 일 때, 각각 1.5, 2.7, 4.0 그리고 5.7㎃ 이었다. 시간경과 후의 드레인 전류를 분석하였는데, PLZT(10/30/70) 박막은 10년 후에 약 18%의 포화 전류가 감소하여 우수한 신뢰성을 보였다. 본 모델은 MFSFET 소자의 동작을 예측하는데 중요한 역할을 할 것으로 판단된다.

• 한국전기전자재료학회논문지
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• 제23권12호
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• pp.936-941
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• 2010

In this study, we have investigated the effects of Mn dopant on the bulk trap levels and grain boundary characteristics of $Bi_2O_3$-based ZnO (ZB) varistor using admittance spectroscopy and dielectric functions (such as $Z^*,\;Y^*,\;M^*,\;\varepsilon^*$, and $tan\delta$). Admittance spectra and dielectric functions show two bulk traps of $Zn_i^{..}$ (0.20 eV) and $V^{\bullet}_o$ (0.29~0.33 eV) in ZnO-$Bi_2O_3-Mn_3O_4$ (ZBM). The barrier of grain boundaries in ZBM could be electrochemically single type. However, its thermal stability was slightly disturbed by ambient oxygen because the apparent activation energy of grain boundaries was changed from 0.79 eV at lower temperature to 1.08 eV at higher temperature. The grain boundary capacitance $C_{gb}$ was decreased slightly with temperature as 1.3~1.8 nF but resistance $R_{gb}$ decreased exponentially. The relaxation time distribution can result from the heterogeneity of the barriers constituting the varistor. It is revealed that Mn dopant in ZB reduced the heterogeneity of the barrier in grain boundaries and stabilized the barrier against the ambient temperature.

• 한국환경과학회지
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• 제9권6호
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• pp.475-482
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• 2000

The purpose of this study is to find out the temporal and spatial characteristics of the diurnal wind variation between coastal and inland areas using the hourly wind data of 58 AWS-stations in the South Korea which are collected during the 10 years from 1980. Diurnal variation is investigated by using the Fast Fourier Transform(FFT), and the wind direction in investigated by comparing C(sub)r with C(sub)v represented the constancy of wind. For the scalar wind speed, the maximum wind speed occurs in the daytime 14h to 16h. The maximum diurnal amplitude at coastal areas occurs from 12h to 16h, and is about 2 hours faster than that at inland areas. Vector mean wind speed is strong at coastal areas and Chupungnyong, Kumi, Taegu of inland areas. The diurnal variation ellipses make a right angle with coastline show that the land and sea breezes are prevailing. The constancy of wind is strong at all observations in January. In the relationship between $C_r and C_v, C_v is higher than C_r$.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2003년도 춘계학술발표회 초록집
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• pp.53-53
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• 2003

Plasma polymerized organic thin films were deposited on Si(100) glass and metal substrates using thiophene and ethylcyclohexane precursors by PECVD method. In order to compare electrochemical properties of the as-grown thin films, the effects of the RF plasma power in the range of 30~100 W. AFM showed that the polymer films with smooth surface and sharp interface could be grown under various deposition conditions. Impedance analyzer was utilized for the determination of I-V curve for leakage current density and C-V for dielectric constants, respectively. To obtain C-V curve, we used a MIM structure of metal(Al)-insulator(plasma polymerized thin film)-metal(Pt) structure. Al as the electrode was evaporated on the thiophene films that grew on Pt coated silicon substrates, and the dielectric constants of the as-grown films were then calculated from C- V data measured at 1MHz. From the electrical property measurements such as I-V and C-V characteristics, the minimum dielectric constant and the best leakage current of thiophene thin films were obtained to be about 3.22 and $1{\;}{\times}10^{-11}{\;}A/cm^2$. However, in case of ethylcyclohexane thin films, the minimum dielectric constant and the best leakage current were obtained to be about 3.11 and $5{\;}{\times}10^{-12}{\;}A/cm^2$.

• Journal of Korean Vacuum Science & Technology
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• 제5권1호
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• pp.11-18
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• 2001

Dielectric passivation effects on the EM(electromigration) have been a great interest with recent ULSI and multilevel structure tends in thin film interconnections of a microelectronic device. SiO$_2$, PSG(phosphosilicate glass), and Si$_3$N$_4$ passivation materials effects on the EM resistance were investigated by utilizing widely used Al-1%Si thin film interconnections. A standard photolithography process was applied for the fabrication of 0.7㎛ thick 3㎛ wide, and 200㎛ ~1600㎛ long Al-1%Si EM test patterns. SiO$_2$, PSG, and Si$_3$N$_4$ dielectric passivation with the thickness of 300 nm were singly deposited onto the Al-1%Si thin film interconnections by using an APCVD(atmospheric pressure chemical vapor deposition) and a PECVD(plasma enhanced chemical vapor deposition) in order to investigate the passivation materials effects on the EM characteristics. EM tests were performed at the direct current densities of 3.2 $\times$ 10$\^$6/∼4.5 $\times$ 10$\^$6/ A/cm$^2$ and at the temperatures of 180 $\^{C}$, 210$\^{C}$, 240$\^{C}$, and 270$\^{C}$ for measuring the activation energies(Q) and for accelerated test conditions. Activation energies were calculated from the measured MTF(mean-time-to-failure) values. The calculated activation energies for the electromigration were 0.44 eV, 0.45 eV, and 0.50 eV, and 0.66 eV for the case of nonpassivated-, Si$_3$N$_4$passivated-, PSG passivated-, and SiO$_2$ passivated Al-1%Si thin film interconnections, respectively. Thus SiO$_2$ passivation showed the best characteristics on the EM resistance followed by the order of PSG, Si$_3$N$_4$ and nonpassivation. It is believed that the passivation sequences as well as the passivation materials also influence on the EM characteristics in multilevel passivation structures.

• 한국재료학회지
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• 제26권10호
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• pp.556-560
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• 2016

Using current-voltage (I-V) and capacitance-voltage (C-V) measurements, the electrical properties of Au and Cu Schottky contacts to n-Ge were comparatively investigated. Lower values of barrier height, ideality factor and series resistance were obtained for the Au contact as compared to the Cu contact. The values of capacitance showed strong dependence on the bias voltage and the frequency. The presence of an inversion layer at the interface might reduce the intercept voltage at the voltage axis, lowering the barrier height for C-V measurements, especially at lower frequencies. In addition, a higher interface state density was observed for the Au contact. The generation of sputter deposition-induced defects might occur more severely for the Au contact; these defects affected both the I-V and C-V characteristics.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1998년도 하계학술대회 논문집 E
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• pp.1586-1588
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• 1998

To use the EMTP, in this paper, a arcing horn is simulated by non-linear resistor and inductor element using TACS, a tower by distributed parameter model, and lines as K. C. Lee model. Changing lightning current characteristics, lightning position, and tower footing resistor value, we analysis multi-phase flashover characteristics in 765 kV transmission line.

• 한국미생물·생명공학회지
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• 제23권5호
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• pp.617-623
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• 1995

A new thermotolerant yeast strain was siolated, and its characteristics have been studied. The strain was identified and named Saccharomyces cerevisiae F38-1. This strain could grow not only at high temperature, but also in high concentrations of sugar and ethanol. S. cerevisiae F38-1 could grow in a medium containing 50% glucose. The isolate produced ethanol at 43$\circ$C, but didn't grow at 40$\circ$C in the presence of 8% ethanol. Fermentation studies showed that the isolate ferments 20% glucose to 9.8% (V/V) ethanol at 40$\circ$C in the presence of 0.2%, yeast extract.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.148-148
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• 2010

Measuring the a-IGZO TFTs with various temperatures was found to induce a threshold voltage shift and a change of the subthreshold gate voltage swing. Characteristic change is dependant on a material of the substrate at the temperature from $20^{\circ}C$ to $100^{\circ}C$. The threshold voltage was shifted to the left from -2.7V to -61V on SiO2/galss. But, as the temperature increases form $20^{\circ}C$ to $100^{\circ}C$. the threshold voltage was shifted to the right from 0.85V to 2.45V.