• 제목/요약/키워드: Borosilicate

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Physicochemical Property of Borosilicate Glass for Rare Earth Waste From the PyroGreen Process

  • Young Hwan Hwang;Mi-Hyun Lee;Cheon-Woo Kim
    • 방사성폐기물학회지
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    • 제21권2호
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    • pp.271-281
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    • 2023
  • A study was conducted on the vitrification of the rare earth oxide waste generated from the PyroGreen process. The target rare earth waste consisted of eight elements: Nd, Ce, La, Pr, Sm, Y, Gd, and Eu. The waste loading of the rare earth waste in the developed borosilicate glass system was 20wt%. The fabricated glass, processed at 1,200℃, exhibited uniform and homogeneous surface without any crystallization and precipitation. The viscosity and electrical conductivity of the melted glass at 1,200℃ were 7.2 poise and 1.1 S·cm-1, respectively, that were suitable for the operation of the vitrification facility. The calculated leaching index of Cs, Co, and Sr were 10.4, 10.6, and 9.8, respectively. The evaluated Product Consistency Test (PCT) normalized release of the glass indicated that the glass satisfied the requirements for the disposal acceptance criteria. Furthermore, the pristine, 90 days water immersed, 30 thermal cycled, and 10 MGy gamma ray irradiated glasses exhibited good compressive strength. The results indicated that the fabricated glass containing rare earth waste from the PyroGreen process was acceptable for the disposal in the repository, in terms of chemical durability and mechanical strength.

저가태양전지에 응용을 위한 용액성장법에 의한 Al-Si층이 코팅된 유리기판상의 다결정 실리콘 박막성장에 관한 연구 (Solution growth of polycrystalline silicon on Al-Si coated borosilicate and quartz glass substrates for low cost solar cell application)

  • 이수홍
    • 한국결정성장학회지
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    • 제4권3호
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    • pp.238-244
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    • 1994
  • 보로실리케이트 유리기판과 석영기판을 사용하여 $800^{\circ}C~520^{\circ}C$의 온도 범위에서 용액 성장법에 의한 다결정 실리콘 박막의 성장에 관해 조사 하였다. 기판상에는 용애과의 젖음성을 좋게 해주기 위해 박막의 알루미늄츠오가 실리콘층이 증착되었으며, 용매로는 알루미늄과 실리콘옥사이드와의 반응에 의해서 일어난다. 결정립 크기가 수백 마이크론까지 이르는 실리콘을 얻을 수 있었으며, 석영기 판의 경우에는 보르실리 케이트 유리기판보다 강한 (111) 우선 성장 방향을 보여주고 있다.

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소듐붕규산염 유리의 표면 구조에 대한 분자 동역학 시뮬레이션 연구 (Na Borosilicate Glass Surface Structures: A Classical Molecular Dynamics Simulations Study)

  • 권기덕
    • 한국광물학회지
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    • 제26권2호
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    • pp.119-127
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    • 2013
  • 핵폐기물을 고화시키는 재료로 사용하는 붕규산염(borosilicate) 유리의 용해는 지층 처분장에 처리된 고준위 방사성 폐기물의 생태계 유출을 결정할 수 있는 중요한 화학반응이다. 습식 실험에서 유리의 용해속도(dissolution rate)는 유리 화학조성에 의해 크게 좌우되는 것이 관찰된다. 유리의 bulk 구조를 규명한 분광분석 실험에 의하면 유리의 화학조성과 분자수준(molecular-level) 구조(예: $SiO_4$ 사면체의 연결구조와 B 원소의 배위구조) 사이의 상관관계가 존재한다. 따라서 화학조성에 따른 유리 용해도의 차이는 조성에 따른 bulk 내부구조의 변화로 이해되어 왔다. 그런데 유리 표면은 수용액과 계면을 이루면서 용해 과정에서 가장 직접적으로 반응하는 부분이기 때문에, 화학조성에 따른 표면구조 변화에 대한 지식 또한 필요하다. 본 논문에서는 분자 동역학(molecular dynamics, MD) 시뮬레이션을 사용하여 4가지의 다른 화학조성을 가지는 소듐붕규산염 유리($xNa_2O{\cdot}B_2O_3{\cdot}ySiO_2$ 화학조성)에 대하여 bulk 구조와 실험으로 얻기 어려운 표면(surface) 구조를 연구하였다. MD 시뮬레이션은 유리 표면의 화학조성과 분자수준 구조가 bulk의 것과 매우 상이한 결과를 보여준다. 본 연구의 MD 시뮬레이션 결과는 화학조성에 따른 유리 용해도(특히 초기 용해과정)는 bulk 구조의 변화보다 유리 표면구조의 변화에 의해 크게 좌우될 수 있다는 표면구조에 대한 이해의 중요성을 역설한다.

Borosilicate glass에 따른 glass/ceramics 유전체의 소결 및 유전 특성 (Sintering and dielectric properties of glass/ceramics dielectrics due to the borosilicate glass)

  • 윤상옥;김관수;조태현;김경호;박종국
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.363-364
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    • 2005
  • LTCC(low temperature co-fired ceramics)용 glass/ceramic 복합체를 제조하기 위해 3종류 의 glass를 선정하고 filler로 $Al_2O_3$$TiO_2$를 사용하여 glass frit에 따른 소결 및 유전 특성에 대하여 조사하였다. Glass frit은 lead-borosilicate(PBS), zinc-borosilicate(ZBS), bismuth-borosilicate(BBS) glass 조성을 사용하였고 1100~$1400^{\circ}C$에서 melting시킨 후 quenching하여 frit화하였다. $Al_2O_3$$TiO_2$ filler에 10~50 vol%로 glass frit을 각각 혼합한 후 600~$950^{\circ}C$에서 2시간 동안 소결한 결과 50 vol% glass frit 일 때 $900^{\circ}C$ 이하에서 소성이 가능하였다. 유전특성은 $900^{\circ}C$에서 $Al_2O_3$-50vol%PBS($\varepsilon_{r}$=8.8, $Q{\times}f_o$=4,900, $\tau_f$=-24), $Al_2O_3$-50vol% ZBS($\varepsilon_{r}$=5.7, $Q{\times}f_o$=17,800, $\tau_f$=-21), $Al_2O_3$-50vol%BBS($\varepsilon_{r}$=11.1, $Q{\times}f_o$= 2,080, $\tau_f$=-48), $TiO_2$-50vol%PBS($\varepsilon_{r}$=18.6, $Q{\times}f_o$=3,800, $\tau_f$=+135), $TiO_2$-50vol%ZBS($\varepsilon_{r}$=36.4, $Q{\times}f_o$= 7,500, $\tau_f$=+159), $TiO_2$-50vol%BBS($\varepsilon_{r}$=56.4, $Q{\times}f_o$=520, $\tau_f$=+119)을 나타내었다. 따라서 LTCC용 기판재료 및 마이크로파 유전체로 응용이 가능한 것으로 확인되었다.

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나노스크래치 공정에서 단결정 실리론 및 파이렉스 7740 의 나노변형거동 (Nanodeformation Behaviors of the Single Crystal Silicon and the Pyrex glass 7740 during Nanoscratch)

  • 신용래;윤성원;강충길
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2003년도 추계학술대회논문집
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    • pp.363-366
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    • 2003
  • In nanomachining processes, chemical effects are more dominant factor compared with physical deformation. For example, during the nanoscratch on a silicon surface in the atmosphere, micro protuberances are formed due to the mechanochemical reaction between the diamond tip and the surface. On the contrary, in case of chemically stable materials, such as ceramics or glasse, the surface protuberance are not formed. The purpose of this study is to understand effects of the mechanochemical reaction between tip and surfaces on deformation behaviors of hard-brittle materials. Nanometerscale elasoplastic deformation behavior of single crystal silicon (100) was characterized with the surface protuberance phenomena, and compared with that of borosilicate (Pyrex glass 7740).

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분상된 붕규산유리의 산처리에 관한 연구 (A Study on Acid Treatment of Borosilicate Glass)

  • 박용완;신건철
    • 한국세라믹학회지
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    • 제12권2호
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    • pp.26-30
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    • 1975
  • The experiment has been carried out to clarify the condition of acid treatment for preventing the crack formation caused by swelling and shrinking during acid leaching process. The borosilicate glass contained phosphorous pentoxide was chosen as the sample, which is recognized to be more homogeneous in phase separation. The various effects, such as kind, cocentration and acid temperature, were investigated. The experimental results are summerized as follows. (1) Sulfuric acid is more stable than hydrochrolic acid for preventing the crack. (2) The optimum concentration of acid lies in the range of 0.1~0.3N. (3) Higher temperature of the acid to treat the separated glass was more stable than lower temperature. (4) The rate of crack decreased with the longer period and the higher temperature of the heat treatment.

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솔-젤법에 의한 CuCl 미세결정이 분산된 비선형 광학유리의 제조 및 광특성 (Preparation and Opticaa Properties of CuCl Nanocrystallites Dispersed Nonlinear Optical Glass by Sol-Gel Process)

  • 송석표;한원택;김병호
    • 한국세라믹학회지
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    • 제34권9호
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    • pp.941-948
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    • 1997
  • CuCl nanocrystallites dispersed nonlinear optical silica and borosilicate glasses were fabricated by sol-gel process. CuCl powder was dissolved in TEOS(Si(OC2H5)4) and TMB((CH3O)3B), precursors of silica and borosilicate glasses, with ethanol, water and HCl, and precipitated through the heat treatment in the matrix glass. The optical properties of CuCl doped glasses were measured using the spectrophotometer at room temperature and low temperature(77K); Z1, 2 and Z3 exciton peaks from the absorption spectra, were observed at about 370 nm and 380 nm, respectively. The average radius of nanocrystallites, calculated from the blue shift of Z3 excitons, was measured according to annealing temperature and time. The precipitation temperature of CuCl nanocrystallites was decreased when boron was added to silica glass. Increase of annealing temperature and time made average radius of nanocrystallites saturated about 2 nm.

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소성공정에 의한 유리막과 Glass/Silicon 계면특성 (Glass Film and Glass/Silicon Interface Properties by Firing Profiles)

  • 윤세욱;허창수
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 추계학술대회 논문집 학회본부 C
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    • pp.729-731
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    • 1998
  • Surface passivation using glass powders results in good reliability for high voltage silicon power devices. In this paper, Zinc borosilicate glass was prepared for the purpose of passivating, and a deposition technique of glass films on the silicon surface by electrophoresis in which acetone is used as a suspension medium and a measurement technique of C-V curve has been investigated. Properties were compared using SEM, XRD, C-V Curve as a function of firing condition, temperature and atmosphere were investigated. Under 100V applied, 1 minute, $700^{\circ}C$ firing temperature, and $O_2$ atmosphere, I can get the fine films $5.8{\mu}m$ thickness with Zinc borosilicate glass. As a result of investigation of glass films, it has been found that pre-firing and annealing play an important role to achieve uniform, fine, reliable glass deposition films and Glass/Silicon interlace.

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전기영동법을 이용한 붕규산계 유리의 Passivation막 연구 (A study on the Passivation film by Electrophoretic method using Borosilicate glasses)

  • 허창수;박인배
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1996년도 하계학술대회 논문집 C
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    • pp.1642-1644
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    • 1996
  • Passivation must prevent ionic charge movement on the surface of the junction, thereby minimizing the junction leakage and maximizing the breakdown voltage of the devices. Borosilicate glasses are widely used as surface passivants for such silicon power devices as thyristors, transistor, and diodes. Since these 91asses are electrically stable at high temperatures and in high electric fields, they can readily be applied as a thick film, and they are resistant to humidity and have low ionic mobility. A deposition technique of glass film on the silicon surface by electrophoresis in which acetone is used as a suspension medium has been investigated. The purpose of this paper is to describe electrophoretic deposition method for glass passivation and characteristics of glass films which were compared using DTA, SEM, XRD, as a function of firing temperature.

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보로실리케이트 표면의 나노/마이크로 패터닝을 위한 식각 시간, 하중에 따른 유기 힐록의 성장거동 관찰 (Observation of Growth Behavior of Induced Hillock for Nano/Micro Patterning on Surface of Borosilicate with Etching Time and Load)

  • 조상현;윤성원;강충길
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2005년도 추계학술대회 논문집
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    • pp.182-185
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    • 2005
  • Indentation pattern and line pattern were machined on borosilicate(Pyrex 7740 glass) surface using the combination of mechanical machining by $Nanoi-indenter\circledR$ XP and HF wet etching, and a etch-mask effect of the affected layer of the nano-scratched and indented Pyrex 7740 glass surface was investigated. In this study, effects of indentation and scratch process with etching time on the morphologies of the indented and scratched surfaces after isotropic etching were investigated from an angle of deformation energies.

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