• Title/Summary/Keyword: Blue-shift

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Analysis of FTIR Spectra in Organic Inorganic Hybrid Type SiOC Films (유무기 하이브리드 SiOC 박막의 화학적 이동에 대한 FTIR 스펙트라 분석)

  • Oh Teresa
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.42 no.6 s.336
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    • pp.17-22
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    • 2005
  • Organic-inorganic hybrid type thin films are the next generation candidates as low-k materials. SiOC films are analyzed the bonding structure by the red and blue chemical shift using the fourier transform infraredspectra. Conventional chemical shift of organic chemistry is a red shift, but hybrid type SiOC films were observed the red and blue shift. The chemical shift originates from the interaction between the C-H bond and high electronegative atoms, and the blue shift in SiOC films is caused by the porosity due to the increase of the electron rich group such as much methyl radicals. The bonding structures of SiOC films are also divided into the Si-O-C cross-link structure and the Si-O-C cage-link structure due to the chemical shifts. The Si-O-C cross-link structure progressed the adhesion attributed to the C-H bond elongation in the reason of the red shift, and the dielectric constant also decreases.

Hypsochromic Shifts in Retinochrome Absorption Spectra in the Presence of Nitrate

  • Takemori, Nobuaki;Mizukami, Taku;Tsujimoto, Kazuo
    • Journal of Photoscience
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    • v.9 no.2
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    • pp.264-266
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    • 2002
  • The absorption wavelength of the protonated retinal Schiff base can be controlled by the surrounding environment. An external anion is related to fine adjustment of the absorption wavelength. The addition of anion to retinochrome solution caused blue shift in spectra. The increase of the shift was dependent on the ion concentration. The large shift value was obtained as 20 nm at the saturated concentration of nitrate. The shift intensity for the nitrate addition exceeded that of chloride. Seemingly, it depends on the ionic strength or lyotropic character of the anion. However, neither of sulphate nor gluconate ion showed remarkable blue shift. These phenomena were accounted for with (1) delocalization of the positive charge in the conjugated polyene system, (2) ionic bonding strength between the counter ion (glutamate) and the proton, and/or (3) interaction of the added anion with the proton on Schiff base.

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Analysis of the Temperature Dependence of Phosphor Conversion Efficiency in White Light-Emitting Diodes

  • Ryu, Guen-Hwan;Ryu, Han-Youl
    • Journal of the Optical Society of Korea
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    • v.19 no.3
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    • pp.311-316
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    • 2015
  • We investigate the temperature dependence of the phosphor conversion efficiency (PCE) of the phosphor material used in a white light-emitting diode (LED) consisting of a blue LED chip and yellow phosphor. The temperature dependence of the wall-plug efficiency (WPE) of the blue LED chip and the PCE of phosphor are separately determined by analyzing the measured spectrum of the white LED sample. As the ambient temperature increases from 20 to $80^{\circ}C$, WPE and PCE decrease by about 4.5% and 6%, respectively, which means that the contribution of the phosphor to the thermal characteristics of white LEDs can be more important than that of the blue LED chip. When PCE is decomposed into the Stokes-shift efficiency and the phosphor quantum efficiency (QE), it is found that the Stokes-shift efficiency is only weakly dependent on temperature, while the QE decreases rapidly with temperature. From 20 to $80^{\circ}C$ the phosphor QE decreases by about 7% while the Stokes-shift efficiency changes by less than 1%.

Relationships between Shift Work and Occupational Accidents in a Steel Company (철강회사에 있어서 교대작업과 산업재해의 관련성)

  • Seo, Yoo-Jin;Kazuya, Matsumoto;Moon, Se-Keun;Jung, Min-Sang;Kim, Myung-Il
    • Journal of the Korean Society of Safety
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    • v.20 no.3 s.71
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    • pp.188-196
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    • 2005
  • Accident reports from 1991 to 2000 of a steel company were used to analyze which factors induce industrial accidents. The subjects were 8,311 blue-collar workers, who sustained 114 occupational injuries and work on a continuous full-day 3-team 3-shift system of backward rotation(mornings to afternoons to nights). With respect to marital status, the occupational injury rate(OIR) on the married workers was significantly higher compared to unmarried workers. With respect to no, the OIR of those in their early 20s was significantly higher when compared to other age groups. The OIR of highly educated workers showed a reduction when compared with lower educated workers. The OIR of shift workers were significantly higher compared with the daytime workers. The OIR of type of work decreased across the steel manufacturing process, rolling process, machine maintenance section forwarding products section to the field management section. With respect to the block of shift work(morning, afternoon, and night shifts) by the type of work, the OIR of the night shift was higher than those of the morning shift in the steel manufacturing process or forwarding products section. The OIR of the machine maintenance section was slightly higher in the morning shift than those of the night shift. The OIR of the time of day of the shift workers reached a peak between 09:00 and 11:00. The OIR of a slight injury to shift workers decreased across the night, afternoon, to morning shifts whereas the OIR of a serious injury tended to decrease across the night, morning, to afternoon shift. The body parts most commonly injured were the arm and the crus.

Dielectric cap quantum well disordering for band gap tuning of InGaAs/InGaAsP quantum well structure using various combinations of semiconductor-dielectric capping layers (다양한 반도체-유전체 덮개층 조합을 이용한 InGaAs/InGaAsP 양자우물의 무질서화)

  • 조재원;이희택;최원준;우덕하;김선호;강광남
    • Journal of the Korean Vacuum Society
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    • v.11 no.4
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    • pp.207-211
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    • 2002
  • Band gap tuning by quantum well disordering in $In_{0.53}Ga_{0.47}As/InGaAsP(Q1.25)$ quantum well structure has been investigated using photoluminescence. The threshold temperature for the blue shift was about $750^{\circ}C$ , and the blue shift became larger as the annealing temperature increased. $SiO_2$ showed saturation as the annealing temperature increased. $SiN_x$caused larger blue shift than $SiO_2$, which is considered to be related to the low growth temperature of $SiN_x$. The diffusion of P and Ga are thought to be responsible for the blue shift of the $SiN_x$ and $SiO_2$capped quantum well disordering , respectively.

On the study of two luminescence band structfue from ambient air aged porous silicon (대기중에서 aged된 다공성 실리콘의 2가지 발광 band에 관한 연구)

  • Sung-Sik Chang;Akira Sakai
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.6 no.4
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    • pp.564-570
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    • 1996
  • We have observed the red and blue luminescence from porous silicon (PS) without any rapid thermal oxidation. Aged porous silicon specimens prepared in dilute HF concentration, especially for the short duration of etching, display the increase of the blue band. The measured luminescence decay time at room temperature exhibits a decay time of about 100 ps and shows appreciably faster decay time than that of 20 K. No photoluminescence (PL) peak maximum shift is observed for the blue PL band at 77 K. However, the red PL band shows the blue shift and displays yellow luminescence at 77 K. The origin of red luminescence has some properties related to Si crystallites, whereas blue luminescence seems to be associated other than Si crystallites.

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Temperature dependence of photoluminescence for blue and green light emitting porous Ge and spark processed Ge (청색 및 녹색 발광 다공성 Ge 및 스파크 제조된 Ge의 광발광의 온도의존성)

  • 장성식
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.8 no.3
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    • pp.442-447
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    • 1998
  • Visible photoluminescence (PL) has been observed generally in the blue and green spectral region from anodically etched porous Ge as well as spark processed Ge. Porous Ge which is prepared by anodic etching without UV light illumination displays the PL peak max of 52 nm (2.38 eV), while porous Ge with UV light illumination exhibits PL peak blue shift to a 470 nm (2.63 eV). Spark processed Ge shows a PL peak max of 520 nm with shoulder peaks at 420 nm and 610nm. The values of energy shift as a function of decreasing temperature between 300 K and 20 K is 0.53 and $1.89\;meVK^{-1}$ for anodic etched Ge without UV illumination and with UV illumination, respectively. On the contrary, no continuous blue shift of PL peak as a function of decreasing temperature is observed for the green luminescing spark processed Ge. From the results of PL as a function of temperature the origin of blue and green luminescing anodically etched Ge as well as spark processed Ge is discussed.

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Cage Link and the Effect of Cross-Link Breakdown (Cross-Link Breakdown 효과와 Cage Link)

  • Oh, Teresa;Kim, Kyung-Sik
    • Proceedings of the IEEK Conference
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    • 2004.06b
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    • pp.517-520
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    • 2004
  • Organosilicate films are promising porous low-dielectric materials, which can replace the silicon dioxide films. It was researched that organosilicate films have two different chemical shifts according to the increase of the flow rate ratio. There are the red shift due to the electron deficient substitution group, and the blue shift of the electron rich substitution group. Among these chemical shifts, the blue shift from $1000 cm^{-1}$ to $1250 cm^{-1}$ was related with the formation of pores. The methyl radicals of the electron-rich substitution group terminate easily the Si-O-Si cross-link, and the Si-O-C cage-link near $1057 cm^{-1}$ is originated from the cross-link breakdown due to much methyl radicals.

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Physical Properties of Thin Films Generated by Two Kinds of Different Function (2가지 서로 다른 기능에 의해 생성된 박막의 물리적인 특성의 기원)

  • Oh, Teresa
    • Proceedings of the IEEK Conference
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    • 2008.06a
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    • pp.487-488
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    • 2008
  • SiOC films containing alkyl groups have a low dielectric constant because of the interaction between the C-H hydrogen bonds and the oxygen of high electro-negative atom. The Si-$CH_3$ in a void is broken by the $O_2$, therefore the strength of CH bond in Si-O-O-$CH_3$ bond increases. The Si-O-O-$CH_3$ bond is broken by nucleophilic attack due to Si atom, again. The elongation of C-H bond causes the red shift, and the compression of C-H bond causes the blue shift. Among these chemical shifts, the blue shift from $1000\;cm^{-1}$ to $1250\;cm^{-1}$ was related with the formation of pores. If the oxygen is deficient condition, the methylradicals of the electron-rich substitution group terminate easily the Si-O-Si cross-link, and the pore is originated from the cross-link breakdown due to much methyl radicals of Si-$CH_3$. The dielectric constant of the films decreases due to pore generation.

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Large Band Gap Attenuation of CdS Nanoclusters after H2S Exposure

  • Han, Seung-Woo;Park, Eun-Hye;Kang, Kwang-Sun
    • Current Photovoltaic Research
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    • v.7 no.2
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    • pp.29-32
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    • 2019
  • Large band gap attenuation of CdS nanoclusters in hybrid sol gel matrix comprised of 3-(trimethoxysilyl)propyl methacrylate (TMSPM), 15 wt. % zirconium, and various amounts of cadmium acetate was observed after $H_2S$ exposure. Hybrid sol gel matrixes were prepared by hydrolysis and condensation reactions. The sol gels contained with various amount of cadmium acetate were spin coated to glass substrates and exposed to $H_2S$ gas. The UV-visible absorption peaks were shifted toward blue with increasing the amount of CdS nanoclusters and were shifted to the red after thermal process. Significant amount of -OH absorption peaks were reduced after thermal process. Strong room temperature photoluminescence (PL) of CdS nanoclusters was observed after exposing to $H_2S$ gas. The PL intensity increased for several minutes and slowly decreased thereafter. The luminescence peaks were continuously shifted toward blue as the time passed. Extraordinary Stokes shift (approximately 160 nm) was observed.