• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.144-144
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• 2008

Blue light emitting diode structures consisting of the InGaN/GaN multiple quantum wells were grown by metalorganic chemical vapor deposition at different growth temperatures for the p-GaN contact layers and the influence of growth temperature on the emission and microstructural properties was investigated. The I-V and electroluminescence measurements showed that the sample with a p-GaN layer grown at $1084^{\circ}C$ had a lower electrical turn-on voltage and series resistance, andenhanced output power despite the low photoluminescence intensity. Transmission electron microscopy (TEM) revealed that the intense electro luminescence was due to the formation of a p-GaN layer with an even distribution of Mg dopants, which was confirmed by TEM image contrast and strain evaluations. These results suggest that the growth temperature should be optimized carefully to ensurethe homogeneous distribution of Mg as well as the total Mg contents in the growth of the p-type layer.

• 한국세라믹학회지
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• 제44권5호
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• pp.155-159
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• 2007

Blue light-emitting phosphors having the excitation spectrum range of the medium-long ultraviolet ($280nm{\sim}400nm$) have been prepared by solid state reaction method. As a starting material the natural alkaline feldspar powder produced from the domestic mine field in Buyeo, Chungnam-do. The photoluminescence characteristics and crystal structures have been analyzed for the phosphor samples. The powder mixture of the natural alkaline feldspar and the rare-earth oxide was calcined at $800{\sim}1000^{\circ}C\;for\;3{\sim}4h$ in air. The calcined samples we fully ground at room temperature and then heat-treated in the mild reducing gas atmosphere of $5%H_2-95%N_2$ mixture at $1100{\sim}1150^{\circ}C\;for\;3{\sim}4h$. The natural alkaline feldspar material consists of the monoclinic orthoclase ($KAlSi_3O_8$) and the triclinic albite ($NaAlSi_3O_8$) phases. At the $0.5wt%Eu_2O_3$ addition the PL spectrum showed the maximum intensity and with further increase of $Eu_2O_3$ the PL intensity decreased. The albite phase disappeared in the $Eu_2O_3$ doped phosphors. The effect of the co-doped activator on the PL characteristics have been also discussed.

• 한국재료학회지
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• 제26권6호
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• pp.347-352
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• 2016

ZnO with wurtzite structure has a wide band gap of 3.37 eV. Because ZnO has a direct band gap and a large exciton binding energy, it has higher optical efficiency and thermal stability than the GaN material of blue light emitting devices. To fabricate ZnO devices with optical and thermal advantages, n-type and p-type doping are needed. Many research groups have devoted themselves to fabricating stable p-type ZnO. In this study, $As^+$ ion was implanted using an ion implanter to fabricate p-type ZnO. After the ion implant, rapid thermal annealing (RTA) was conducted to activate the arsenic dopants. First, the structural and optical properties of the ZnO thin films were investigated for as-grown, as-implanted, and annealed ZnO using FE-SEM, XRD, and PL, respectively. Then, the structural, optical, and electrical properties of the ZnO thin films, depending on the As ion dose variation and the RTA temperatures, were analyzed using the same methods. In our experiment, p-type ZnO thin films with a hole concentration of $1.263{\times}10^{18}cm^{-3}$ were obtained when the dose of $5{\times}10^{14}$ As $ions/cm^2$ was implanted and the RTA was conducted at $850^{\circ}C$ for 1 min.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.204.2-204.2
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• 2013

Wide band gap II-VI semiconductors have attracted the interest of many research groups during the past few years due to the possibility of their applications in light-emitting diodes and laser diodes. Among the II-VI semiconductors, ZnO is an important optoelectronic device material for use in the violet and blue regions because of its wide direct band gap (Eg ~3.37 eV) and large exciton binding energy (60 meV). F-doped ZnO (FZO) and undoped ZnO thin films were grown onto quartz substrate by the sol-gel spin-coating method. The doping level in the solution, designated by F/Zn atomic ratio of was varied from 0 to 5 in 1 steps. To investigate the effects of the structure and optical properties of FZO thin films were investigated using X-ray diffraction (XRD), UV-visible spectroscopy, and photoluminescence (PL). In the XRD, the residual stress, FWHM, bond length, and average grain size were changed with increasing the doping concentration. For the PL spectra, the high INBE/IDLE ratio of the FZO thin films doping concentration at 1 at.% than the other samples.

• 한국재료학회지
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• 제31권3호
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• pp.132-138
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• 2021

Electrochromic devices (ECDs) have been drawing great attention due to their high color contrast, low power consumption, and memory effect, and can be used in smart windows, automatic dimming mirrors, and information display devices. As with other electronic devices such as LEDs (light emitting diodes), solar cells, and transistors, the mechanical flexibility of ECDs is one of the most important issue for their potential applications. In this paper, we report on flexible ECDs (f-ECDs) fabricated using an all-in-one EC gel, which is a mixture of electrolyte and EC material. The f-ECDs are compared with rigid ECDs (r-ECDs) on ITO glass substrate in terms of color contrast, coloration efficiency, and switching speed. It is confirmed that the f-ECDs embedding all-in-one gel show strong blue absorption and have competitive EC performance. Repetitive bending tests show a degradation of electrochromic performance, which must be improved using an optimized device fabrication process.

• ETRI Journal
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• 제46권2호
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• pp.347-359
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• 2024

A simultaneous transfer and bonding (SITRAB) process using areal laser irradiation is introduced for high-yield and cost-effective production of mini- or micro-light-emitting diode (LED) display panels. SITRAB materials are special epoxy-based solvent-free pastes. Three types of pot life are studied to obtain a convenient SITRAB process: Room temperature pot life (RPL), stage pot life (SPL), and laser pot life (LPL). In this study, the RPL was found to be 1.2 times the starting viscosity at 25℃, and the SPL was defined as the time the solder can be wetted by the SITRAB paste at given stage temperatures of 80℃, 90℃, and 100℃. The LPL, on the other hand, was referred to as the number of areal laser irradiations for the tiling process for red, green, and blue LEDs at the given stage temperatures. The process windows of SPL and LPL were identified based on their critical time and conversion requirements for good solder wetting. The measured RPL and SPL at the stage temperature of 80℃ were 6 days and 8 h, respectively, and the LPL was more than six at these stage temperatures.

• 대한화학회지
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• 제50권3호
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• pp.237-242
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• 2006

LED는 고휘도 청색 칩의 개발로 인해 단순표시소자로만 이용되던 것이 다양한 분야의 발광소자로 적용되기 시작하였다. 특히, 최근에 InGaN 칩과 황색 형광체(YAG:Ce3+)를 이용한 방법이 많이 연구되어지고 있다. 하지만 이 방법은 2 파장을 이용한 것으로 색연지수가 낮은 단점을 지니며, 황색의 YAG:Ce3+ 형광체 이외에 450~470 nm의 여기 영역에서 효율적으로 발광하는 형광체가 거의 없다. 따라서 본 연구에서는 장파장 영역의 여기 특징을 지닌 thiogallate 형광체의 합성을 시도하였다. 그 중에 가장 잘 알려진 SrGa2S4:Eu2+ 형광체의 모체를 변화시켜 Sr2Ga2S5:Eu2+ 형광체를 합성하였으며, 발광특성을 조사하였다. 그리고 무해성과 제조 공정의 단순화를 위하여, 황화물질과 5 % H2/95 % N2 혼합 기체를 CS2와 H2S 가스 대신에 사용하였다. 이렇게 합성되어진 형광체는 550 nm의 발광 중심을 가지는 황색 형광체로서 300~500 nm에 이르는 넓은 여기원을 통한 발광이 가능하다. 그리고 YAG:Ce3+ 형광체와 비교해 볼 때 강도 면에서 110 % 이상을 보이며, UV 영역의 여기적 특성을 이용해 UV LED에도 응용이 가능하다.

• 전기화학회지
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• 제2권1호
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• pp.17-22
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• 1999

다공질 실리콘을 이용한 마이크로센서와 마이크로액츄에이터의 연구는 현재 초기단계에 있기 때문에, 지금까지 발광 다이오드나 화학 센서 등과 같은 몇몇 응용 소자가 발표된 수준에 머물러 있다. 본 논문에서는 화학 센서와 광소자를 중심으로 다공질 실리콘 센서 및 액추에이터 연구현황을 고찰 보고하고자 한다. 정전용량형 다공질 실리콘 습도센서의 감습 특성은 비선형이였으며, 저습보다는 $40\%RH$ 이상의 고습영역에서 더 높은 감도를 나타내었다. 다공질 실리콘 $n^+-p-n^+$ 소자는 에탄올에 노출되었을 때 소자 전류가 급격히 증가하였다. 다공질 실리콘 다이어프램에 제작된 $p^+-PSi-n^+$ 다이오드는 광 스위칭 현상을 나타내어 광센서 또는 광스위치로써의 응용 가능성을 보여주었다. 다공질 실리콘에 365nm를 조사해서 얻어진 광루미네센스(PL)는 넓은 스펙트럼을 보였으며, 피크 파장은 610 nm이었다. ITO/PSi/In LED의 전계발광(EL)스펙트럼은 PL에 비해 약간 더 넓은 영역에 걸쳐 나타났으며, 피크 에너지가 단파장(535nm)으로 이동하였다.