• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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• pp.99-102
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• 1999

A mixture which was made from organic gel, glass powder and ceramic powder was masklessly etched for fabrication of barrier rib of PDP(Plasma Display Panel) by focused Ar$^{+}$ laser( λ =514 nm) and Nd:YAG(λ =532, 266 nm) laser irradiation at the atmosphere. The depth of the etched grooves increases with increasing a laser fluence and decreasing a scan speed. Using second harmonic of Nd:YAG laser, the threshold laser fluence was 6.5 mJ/$\textrm{cm}^2$ for the sample of PDP barrier rib softened at 12$0^{\circ}C$. The thickness of 130 ${\mu}{\textrm}{m}$ of the sample on the glass was clearly removed without any damage on the glass substrate by fluence of 19.5 J/$\textrm{cm}^2$....

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.725-727
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• 2009

Lowering the dielectric constant is one of the important issues for the efficiency and the power consumption in the plasma display panel (PDP) industry. This study examined the effect of the addition of ceramic filler (up to 10% of crystalline and amorphous silica, respectively) to a $B_2O_3$-ZnO- $P_2O_5$ glass matrix on the dielectric, coefficient of thermal expansion, etching behaviors and residual stress for the barrier ribs in plasma display panels. The dielectric constant of barrier ribs is affected by containing two types of $SiO_2$ filler for the barrier rib composition in PDP.

• 한국정밀공학회지
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• 제29권12호
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• pp.1272-1278
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• 2012

The micro barrier rip array structures have been applied in a variety of areas including as privacy films, micro heat sinks, touch panel and optical waveguide. The increased aspect ratio (AR) of barrier rip array structures is required in order to increase the efficiency and performance of these products. There are several problems such as burr, defect of surface roughness and deformation and breakage of barrier rip structure with machining high-aspect ratio micro barrier rip array structure using orthogonal cutting method. It is essential to develop technological methods to solve these problems. The optimum machining conditions for machining micro barrier rip array structures having high-aspect ratio were determined according to lengths ($200{\mu}m$ and $600{\mu}m$) and shape angles ($2.89^{\circ}$ and $0^{\circ}$) of diamond tool, overlapped cutting depths ($5{\mu}m$ and $10{\mu}m$), feed rates (100 mm/s) and three machining processes. Based on the optimum machining conditions, micro barrier rib array structures having aspect ratio 30 was machined in this study.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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• pp.55-58
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• 2004

High Xe-content PDP characteristics are discussed. A high efficacy, up to 5 lm/W for a 50% Xe in Ne gas mixture, is realized in 4-inch color PDP test panel designs with low cost stripe-type barrier rib structures, that are powder blasted in soda lime glass. Furthermore, for a high Xe-content a high luminance can be obtained with a relatively small electrode area. Therefore the inter cell gap and the driving margin can be increased in a stripe-type barrier rib structure. Finally, for a high Xe-content the panel lifetime increases, due to increasing luminance and firing voltage stability. Clearly, these findings may direct the design development for next generation PDPs towards a high Xe-content

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.125-125
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• 2006

We present a low temperature thermal process for the transparent dielectric layer, barrier rib, and white back dielectric layer on the soda-lime glass substrate of the PDP by the $TruNano^{TM}$ processor in combination with a compositional modification to the conventional dielectric pastes. By this method the firing temperature can be lowered by more than $100^{\circ}C$.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.21-23
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• 2006

A newly designed micro-plasma device using SU-8 photoresist as a barrier rib has been successfully fabricated and characterized. Operating in neon gas at pressures from 300 to 800 Torr and having hexagonal structure, $5{\times}5$ arrays of micro-plasma device have been investigated. The driving voltage is lower than 250 V.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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• pp.313-315
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• 2007

3M has developed a Precision Replication Process for the production of PDP Barrier Ribs and other display devices. This process, is fast, clean and capable of producing very high resolution (FHD and beyond), high aperture ratio and fine cell structures. Recent advances in materials and process features will be discussed.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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• pp.989-992
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• 2008

X-ray lithography is one of the most powerful processes in the fabrication of nano/micro structures with a high aspect ratio. This process enables the fabrication of ultra-thin barrier ribs for PDP using X-ray sensitive paste. In this paper, organic material including photo-monomers, photo-oligomers, binder polymer and additives as well as inorganic powders with different size were optimized to fabricate high aspect ratio barrier rib pattern for PDP.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.910-912
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• 2006

Barrier ribs in plasma display panels (PDPs) function to maintain the discharge space between the glass plates as well as to prevent optical cross-talking. The barrier ribs currently employed are typically $300{\mu}m$ pitch, $110{\sim}120{\mu}m$ in height, with upper and lower widths of $50{\mu}m$ and $80{\mu}m$, respectively. It has been reported that barrier ribs can be fabricated by screen-printing, sand blasting, etching and photolithographic processes. In this study, photosensitive barrier rib pastes were formulated and systematically evaluated in terms of photolithographic process variables such as printing, drying, UV exposure, development and sintering. It was found that the use of UV absorbent, polymerization inhibitor and surfactant were very effective in controlling the width uniformity of barrier ribs in the photolithographic method of barrier rib patterning.

• Journal of KIEE
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• 제11권1호
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• pp.41-45
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• 2001

The addressing time should be reduced by modifying cell structure and/or driving method in order to replace the dual scan system by single scan and increase the luminance in large ac plasma display panel(PDP). In this paper, the effects of the dielectric layer thickness and the barrier rib height on the addressing time of ac PDP are investigated. It is found out that the addressing time was decreased with decreasing thickness of dielectric layer on the front glass and thickness of white dielectric layer on the rear glass. The decreasing rate were 160ns/10${\mu}{\textrm}{m}$ and 270nsd/10${\mu}{\textrm}{m}$, respectively. Also in case of decreasing the height of barrier rib, addressing time was decreased at the rate of 550ns/10${\mu}m$.