Micro-Plasma Device Utilizing SU-8 Photoresist as a Barrier Rib

  • Jhuo, Long-Cai (Laboratory for Nanosystem and Plasma, Department of Photonics, Institute of Electro-Optical Engineering, National Chiao Tung University) ;
  • Kim, Sung-O (Laboratory for Nanosystem and Plasma, Department of Photonics, Display Institute, National Chiao Tung University)
  • Published : 2006.08.22

Abstract

A newly designed micro-plasma device using SU-8 photoresist as a barrier rib has been successfully fabricated and characterized. Operating in neon gas at pressures from 300 to 800 Torr and having hexagonal structure, $5{\times}5$ arrays of micro-plasma device have been investigated. The driving voltage is lower than 250 V.

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