• 제목/요약/키워드: Band GAp Energy

검색결과 705건 처리시간 0.023초

TiO2 전극 표면의 전자상태 계산 (Calculation on Surface Electronic State of $TiO_2$ Electrode)

  • 이동윤;이원재;송재성
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.259-262
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    • 2003
  • The surface electronic state of rutile $TiO_2$, which is an oxide semiconductor and has a wide band gap of 3.1 $\sim$ 3.5 eV, was calculated by DV-$X_{\alpha}$ method, which is a sort of the first principle molecular orbital method and uses Hartre-Fock-Slater approximation. The $[Ti_{15}O_{56}]^{-52}$ cluster model was used for the calculation of bulk state and the $[OTi_{11}O_{34}]^{-24}$ model for the surface state calculation. After calculations, the energy level diagrams and the deformation electron density distribution map were compared in both models. As results, it was identified that the surface energy levels are found between the valence and conduction band of bulk $TiO_2$ on the surface area. The energy values of these surface-induced levels are lower than conduction band of bulk $TiO_2$ by 0.1 $\sim$ 1 eV. From this fact, it is expected that the surface energy levels act as donar levels in n-type semiconductor.

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B 이온을 주입시킨 GaAs의 Photoreflectance에 관한 연구 (A study on the photoreflectance of B ion implanted GaAs)

  • 최현태;배인호
    • E2M - 전기 전자와 첨단 소재
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    • 제9권4호
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    • pp.372-378
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    • 1996
  • The phtoreflectance(PR) spectra of B ion implanted semi-insulating(SI) GaAs were studied. Ion implantation was performed by 150keV implantation energy and 1*10/aup 12/-10$^{15}$ ions/c $m^{2}$ doses. Electronic band structure was damaged by ion implantation with above 1*10$^{13}$ ions/c $m^{2}$ dose. When samples were annealed, " peak was observed at 30-40meV below band gap( $E_{g}$). It should be noted that this energy is close to the ionization energies of S $i_{As}$ , and GeAs in G $a_{As}$ which are also found as impurities in LEC GaAs, it is therefore possible that this feature is related to S $i_{As}$ , or G $e_{As}$ and B ions by implanted defect associated with them. From PR spectra of etched samples which is as-implanted by 1*10$^{14}$ and 1*10$^{15}$ ions/c $m^{2}$ dose, the depth of destroyed electronic band structure was from surface to 0.2.mu.m below surface.nic band structure was from surface to 0.2.mu.m below surface.

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OPTICAL PROPERTIES OF AMORPHOUS CN FILMS

  • Park, Sung-Jin;Lee, Soon-Il;Oh, Soo-Ghee;Bae, J.H.;Kim, W.M.;Cheong, B.;Kim, S.G.
    • 한국표면공학회지
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    • 제29권5호
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    • pp.556-562
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    • 1996
  • Carbon nitride (CN) films were synthesized on silicon substrates by a combined ion-beam and laser-ablation method under various conditions; ion-beam energy and ion-beam current were varied. Raman spectroscopy and spectroscopic ellipsometry (SE) were employed to characterize respectively the structural and the optical properties of the CN films. Raman spectra show that all the CN films are amorphous independent of the ion-beam current and the ion-beam energy. Refractive indices, extinction coefficients and optical band gaps which were determined from the measured SE spectra exhibit a significant dependence on the synthesis conditions. Especially, the decrease of the refractive indices and the shrinkage of the optical band gap is noticeable as the ion-beam current and/or the ion-beam energy increase.

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전자빔 증착기로 증착된 $CuInS_2$ 박막의 전기적 구조적 특성 (Electrical and Structural Properties of $CuInS_2$ thin films fabricated by EBE(Electronic Beam Evaporator) Method)

  • 양현훈;김영준;정운조;박계춘
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2006년도 춘계학술대회
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    • pp.170-173
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    • 2006
  • [ $CuInS_2$ ] filims were appeared from 0.84 to 1.27 of Cu/In composition ratio and sulfur composition ratios of $CuInS_2$ thin films fabricated, Also when Cu/In composition ratio was 1.03, $CuInS_2$ thin film with chalcopyrite structure had the highest XRD peak (112). And lattice constant (a) of and grain size of the film tin s ambient were appeared a little larger than those in only Vacuum The films in S ambient were p-type with resistive of around $10^{-1}{\Omega}cm$ and optical energy band gaps of the films in S ambient were appeared a little larger than those in only Vacuum. Analysis of the optical energy band gap of $CuInS_2$ thin films a value of 1.53eV.

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Co-sputtering법으로 제작한 ZnTe 태양전지의 특성 (Characteristics of the ZnTe solar cell by the co-sputtering methods)

  • 장유진;김성우;최혁환;이명교;권태하
    • 한국정보통신학회논문지
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    • 제8권2호
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    • pp.440-448
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    • 2004
  • 본 논문에서는 II-Vl족의 ZnTe 화합물반도체 태양전지를 제작하기 위하여 투명전극(AZO) 및 Buffer layer(ZnO)의 특성과 태양전지의 효율에 가장 큰 영향을 미치는 광흡수층의 에너지밴드갭을 줄이는 연구를 하였다. ZnTe박막은 Zn(Zinc)과 Te(Tellurium)를 co-sputtering법을 이용하여 증착하였다. ZnTe 박막은 Zn과 Te의 RF power를 각각 50W, 30W로 하여 10mTorr의 Ae 분위기에서 20$0^{\circ}C$의 기판온도로 제작되었으며, 이때의 에너지밴드갭은 1.73eV였다. 이렇게 제작된 박막을 진공상태에서 $400^{\circ}C$의 온도로 10초간 열처리하여 1.67eV의 에너지밴드갭을 얻을 수 있었고, 이때의 Zn과 Te의 비율은 32%:68%였다. 최적의 조건에서 태양전지는 6.85% (Voc:0.69V, Jsc:21.408㎃/$cm^2$, Fill Factor (FF):0.46)의 효율을 얻을 수 있었다.

Si이 고농도로 첨가된 GaAs의 photoreflectance에 관한 연구 (A Study on Photoreflectance of Heavily Si Doped GaAs)

  • 배인호;이정열;김인수;이철욱;최현태;이상윤;한병국
    • 한국재료학회지
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    • 제4권6호
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    • pp.723-729
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    • 1994
  • Si이 고농도로 첨가된 n-GaAs(100)의 Photoreflectance(PR)에 대하여 조사하였다. PR 응답은 변조빔 세기, 변조 주파수 및 온도에 의존함음 알았다. 관측된 Frantz-Keldysh oscillation(FKO)으로 부터, 띠간격 에너지($E_o$)와 표면전장(($E_s$)을 결정하였다. 온도가 상온에서 77K로 감소시킴에 따라, 띠간격 에너지는 증가하는 반면에 , 표면전장은 감소한다. 결정성은 $500^{\circ}C$에서 5분간 열처리후 크게 향상되었다.

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기판온도에 따른 CuInSe2 박막의 특성 (Properties of CuInSe2 Thin Film with Various Substrate Temperatures)

  • 박정철;추순남
    • 한국전기전자재료학회논문지
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    • 제23권11호
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    • pp.911-914
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    • 2010
  • In this paper, the $CuInSe_2$ thin film was prepared by using co-evaporation method in four different substrate temperatures $100^{\circ}C$, $200^{\circ}C$, $300^{\circ}C$ and $400^{\circ}C$. When the substrate temperature was at $200^{\circ}C$ and $300^{\circ}C$, the single-phase $CuInSe_2$ was crystallized. As the temperature increased, it was shown that the thickness of the thin film was decreased with increment of the hall coefficient. When the sample was prepared at $200^{\circ}C$ of the subsrate temperature, the values of band gap energy (Eg), sheet resister and resistivity were measured 0.99 eV, $89.82\;{\Omega}/{\square}$ and $103{\times}10^{-4}\;{\Omega}{\cdot}cm$, respectively.

$TiO_{2}$ 단결정의 비선형광학 특성 (Nonlinear optical properties of $TiO_{2}$ single crystal)

  • 신재혁;오근호
    • 한국결정성장학회지
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    • 제5권3호
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    • pp.240-249
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    • 1995
  • 무색투명하고 순수한 단결정을 얻기 위하여 $TiO_{2}$(rutile) 단결정을 floating zone법으로 성장하였다. 성장된 결정을 c축에 수직 및 수평하게 절단하여 500~1000 nm 범위의 파장에서 선형 굴절율을 측정하였으며 흡수스펙트롬으로부터 optical energy band gap이 2.99 eV임을 알 수 있었다. $TiO_{2}$(rutile) 단결정의 $\chi^{(3)}$ 값을 반경험적인 모델을 기반으로 하여 $SiO_{2}$ quartz 단결정의 $\chi^{(3)}$ 값과 비교하여 분석하였다. 또한 제 3 비선형광학 특성에 있어서의 Ti$\^{4+}$의 영향을 해석하기 위해 second hyperpolarizability, ${\gamma}$(Ti$\^{4+}$)를 계산하였다.

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Hot Wall Epitaxy(HWE)법에 의해 성장된 $AgGaS_2$ 단결정 박막의 특성 (Characterization for $AgGaS_2$ single crystal thin film grown by hot wall epitaxy)

  • 이관교;홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.101-102
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    • 2006
  • A stoichiometric mixture of evaporating materials for $AgGaS_2$ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films. $AgGaS_2$ mixed crystal was deposited on thoroughly etched semi-Insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $590^{\circ}C$ and $440^{\circ}C$, respectively. The temperature dependence of the energy band gap of the $AgGaS_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=2.7284 eV-(8.695{\times}10^{-4} eV/K)T^2/(T+332 K)$. After the as-grown $AgGaS_2$ single crystal thin films was annealed in Ag-, S-, and Ga-atmospheres, the origin of point defects of $AgGaS_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K.

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