• 제목/요약/키워드: Ban-Woll.Shi-Hwa Industrial Complex

검색결과 1건 처리시간 0.014초

DNPH cartridge/LC-MS 방법에 의한 반월.시화산업단지의 폼알데하이드 분석에 관한 연구 (Analysis of formaldehyde using DNPH cartridge/LC-MS in the Ban-Woll.Shi-Hwa Industrial Complex)

  • 조덕희;송일석;김인구;김웅수;김종보;김태현;황선민;남우경
    • 환경위생공학
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    • 제21권1호
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    • pp.35-43
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    • 2006
  • Formaldehyde is important because of their irritant and toxic properties, mutagenicity and carcinogenicity. In this study, liquid chromatography-mass spectrometry (LC-MS) is used for the analysis of formaldehyde after derivatization with 2,4-dinitrophenylhydrazine (DNPH) cartridge. Analytical parameters such as linearity, repeatability and minimum detection limit were evaluated. The linearity ($r^2$) was 0.9997 when analyte concentration ranges from 25 to $200{\mu}g/l$. The relative standard deviation (%RSD) was 1.25 % for concentration of $200{\mu}g/l$. The minimum detection limit (MDL) was 0.73 ppbv. It was shown that LC-MS method has a great potential for formaldehyde analysis. The results of formaldehyde from the survey of Ban-Woll and Shi-Hwa Industrial Complex samples, the highest level was 6.20, 3.93 ppb, respectively. The highest emission level of formaldehyde at chemical plants in the Ban-Woll' Shi-Hwa Industrial Complex was 5421.25 ppb.