• Title/Summary/Keyword: Azo

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Structural, Optical and Electrical Properties of AI Doped ZnO Thin Films Prepared by Nd:YAG-PLD Technology (Nd:YAG-PLD법에 의해 제작된 ZnO:AI 박막의 구조적, 광학적, 전기적 특성)

  • No, Im-Jun;Lim, Jae-Sung;Lee, Cheon;Shin, Paik-Kyun
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.56 no.9
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    • pp.1596-1601
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    • 2007
  • Aluminum doped zinc oxide (AZO) thin films were deposited on coming glass substrates using an Nd:YAG pulsed laser deposition technology. The AZO thin films were deposited with various growth conditions such as the substrate temperature and oxygen partial pressure. In this work, we used various measurement technologies in order to investigate the electrical, structural, and optical properties of the AZO thin films. Among the AZO thin films, the one prepared at the substrate temperature of $300^{\circ}C$ and oxygen partial pressure of 5 mTorr showed the best properties of an electrical resistivity of $4.63{\times}10^{-4}{\Omega}{\cdot}cm$, a carrier concentration of $9.25{\times}10^{20}cm^{-3}$, and a carrier mobility of $31.33cm^2/V{\cdot}s$. All the AZO thin films showed an high average optical transmittance over 90 % in visible region.

Charaterization of structural, electrical, and optical properties of AZO thin film as a function of annealing temperature (열처리 온도에 따른 AZO 박막의 구조적, 전기적, 광학적 특성 분석)

  • Ko, Ki-Han;Seo, Jae-Keun;Lee, Sang-Joon;Hwang, Chae-Young;Bae, Eun-Kyung;Lim, Moo-Kil;Choi, Won-Seok
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1343_1344
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    • 2009
  • In this work, transparent conducting Al-doped zinc oxide (AZO) films were prepared on Corning glass substrate by RF magnetron sputtering using an Al-doped ZnO target (Al: 2 wt.%) at room temperature and all films were deposited with athickness of 150 nm. We investigated the effects of the post-annealing temperature and the annealing ambient on structural, electrical and optical properties of AZO films. The films were annealed at temperatures ranging from 300 to $500^{\circ}C$ in steps of $100^{\circ}C$ using rapid thermal annealing equipment in oxygen. The thickness of the film was observed by field emission scanning electron microscopy (FE-SEM) and grain size was calculated from the XRD spectra using the Scherrer equation and their electrical properties were investigated using a hole measurement and the reflectance of AZO films was investigated by UV-VIS spectrometry.

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Thermal Decomposition Characteristics of Azo compounds (아조(Azo)화합물 열분해특성)

  • Kim, Kwan-Eung
    • Journal of the Korean Society of Safety
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    • v.17 no.2
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    • pp.39-44
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    • 2002
  • This study was investigated the thermal decomposition characteristics of azo type sponge blowing agent azodicarbonamide(ADCA) using differential scanning calorimeter(DSC). The experimental results showed that the exothermic onset $temperatures(T_{o})$ for ADCA were about $201{\sim}206^{\circ}C$ and evolution heats(Q) were about $144{\sim}150cal/g$. The exothermic onset $temperatures(T_{o})$, exothermic maximum $temperature(T_{m})$ and exothermic final $temperature(T_{f})$ were decreased by decreasing particle size of ADCA and evolution heats(Q) were increased with it. $T_{o}$ and Q for $6.1{\sim}7.2{\mu}m$ ADCA were increased by increasing heating rate at constant sample weight and activation energy was about 37.29kcal/mol. A positive gas pressure was employed in the elucidation of the decomposition behavior of ADCA because it sublimes during linear heating at atmospheric pressure. $T_{o}$ and Q of ADCA tended to increase with a pressure in air or nitrogen. In the case of azo dye, experimental results showed that $T_{o}$ were about $280{\sim}420^{\circ}C$ and Q were about $2{\sim}30cal/g$.

CharacteristicProperties of Low-k Thin Film Deposited by Sputtering (스퍼터링에 의한 Low-k 박막의 특성)

  • Oh, Teresa
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.13 no.7
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    • pp.3160-3164
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    • 2012
  • To obtain available process at low temperature, SiOC thin film was prepared with various flow rates by using the rf magnetron sputtering, and AZO thin film was also deposited on SiOC film by rf magnetron sputtering system. The optical electrical properties of the SiOC film and SiOC/AZO were analyzed by the uv visible spectrometer and PL spectra. SiOC film on n type Si showed various type emission according to the deposition condition. The SiOC film showed the blue shift with increasing the thickness in PL spectra. AZO/SiOC/Si film had a broad emission characteristic, which is enhanced the efficiency in solar cell.

Properties of ZnO:Al thin film on variation of substrate temperature for display application

  • Keum, M.J.;Kim, H.W.;Cho, B.J.;Son, I.H.;Choi, M.G.;Lee, W.J.;Jang, K.W.;Kim, K.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1474-1476
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    • 2005
  • ZnO:Al(AZO) has been investigated for the photovoltaic cell or TCO(Transparent Conductive Oxide) of the display, because it has good electrical and optical properties. In this study, the ZnO:Al(AZO) thin film prepared on variation of substrate temperature by FTS(Facing Targets Sputtering) system. In case of TCO, because resistivity and roughness values affect the lighting of the OLED, their factors are very important. Therefore, in this paper, the electrical and optical properties of the AZO thin film were investigated with the deposition conditions and its roughness was investigated on variation of the substrate temperature. In results, AZO thin film deposited with the transmittance over 80% and the resistivity was reduced from $1.36{\times}10^{-3}$ [O-cm] to $4{\times}10^{-4}$ [O-cm] with increasing the substrate temperature from R.T to $200[^{\circ}C]$. Especially, we could obtain the resistivity $4{\times}10^{-4}$ [O-cm] of AZO thin film prepared at working pressure 1[mTorr], input current 0.4[A] and substrate temperature $200[^{\circ}C]$.

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Studies on the Oxidative Structural Change of Azo Dye Acid Red 27 by Ozone (O3에 의한 아조염료 Acid Red 27의 산화분해시 구조 변화에 관한 연구)

  • Baek, Mi-Hwa;Kim, Dong-Su
    • Journal of Korean Society on Water Environment
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    • v.21 no.6
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    • pp.564-568
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    • 2005
  • The structural change of azo dye (Acid Red 27) by oxidation with ozone has been investigated using FT-IR and $^1H$ NMR. The solution pH was observed to decrease during oxidation reaction, which was considered to be due to the generation of several organic and inorganic acids as the result of the decomposition of azo compound. The FT-IR analysis showed that changes of specific absorption bands of Acid Red 27 were observed after ozonation. When azo dye was oxidized by ozone, several new peaks were shown to appear by $^1H$ NMR analysis and the peaks were generally shifted to the direction of up field. This was presumably due to the breakage of benzene ring contained in the molecular structure of Acid Red 27 by the oxidation and the shape of peaks was shown to change according to the reaction time.

Synthesis of Terephthalate Intercalated Zn-Al Layered Double Hydroxides Using AZO Thin Film (AZO박막을 이용한 Terephthalate가 삽입된 Zn-Al 층상 이중 수산화물의 합성)

  • Park, Ki-Tae;Yoon, Soon-Gil
    • Korean Journal of Materials Research
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    • v.27 no.3
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    • pp.161-165
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    • 2017
  • In this paper, synthesis of terephthalate intercalated Zn-Al: Layered double hydroxides (LDHs) was studied. We designed freestanding Zn-Al: carbonate LDH nanosheets for a facile exchange technique. The as-prepared Zn-Al carbonate LDHs were converted to terephthalate intercalated Zn-Al:LDHs by ion exchange method. Initially, Al-doped ZnO (AZO) thin films were deposited on p-Si (001) by facing target sputtering. For synthesis of free standing carbonate Zn-Al:LDH, we dipped the AZO thin film in naturally carbonated water for 3 hours. Further, Zn-Al: carbonate LDH nanosheets were immersed in terepthalic acid (TA) solution. The ion exchange phenomena in the terephthalate assisted Zn-Al:LDH were confirmed using FT-IR analysis. The crystal structure of terephthalate intercalated Zn-Al:LDH was investigated by XRD pattern analysis with different mole concentrations of TA solution and reaction times. The optimal conditions for intercalation of terephthalate from carbonated Zn-Al LDH were established using 0.3 M aqueous solution of TA for 24 hours.

A Study on the Properties of AZO Films Surface-annealed by RF Magnetron Sputtering and Electron Beam Radiation (전자빔 조사에 의해 표면열처리된 AZO 박막의 물성변화에 관한 연구)

  • Shin, Chang-Ho;Jeong, Cheol-Woo;Kim, Yu-Sung;Chae, Ju-Hyun;Kim, Daeil
    • Journal of the Korean Society for Heat Treatment
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    • v.23 no.4
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    • pp.205-209
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    • 2010
  • Transparent and conductive AZO films were deposited on the glass by using radio frequency (RF) magnetron sputtering with intense electron radiation, simultaneously. After deposition, the effect of electron radiation energy on the optical and electrical properties of AZO was investigated. In XRD measurements, the films irradiated with intense electron beam show the larger grain size than that of the films prepared without electron radiation. Sheet resistance was also dependent on the electron radiation energy, while the optical transmittance in visible wavelength region was not affected seriously by electron radiation. X-.ray diffraction, UV-Vis spectrophotometer and four point probes were used to observe the crystallization, optical transmittance and sheet resistance, respectively.

The Optical Properties of Si3N4/SnZnO/AZO/Ag/Ti/ITO Multi-layer Thin Films with Laminating Times (Si3N4/SnZnO/AZO/Ag/Ti/ITO 다층 박막의 적층 횟수에 따른 광학적 특성)

  • Lee, Sang-Yun;Jang, Gun-Eik
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.28 no.1
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    • pp.7-11
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    • 2015
  • In this study, $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film were prepared on glass substrate by DC/RF magnetron sputtering method. To prevent interfacial reaction between Ag and ITO layer, Ti buffer layer was inserted. Optical properties and sheet resistance were studied depending on laminating times of each multi-layered film especially in visible ray. The simulation program, EMP (essential macleod program), was adopted and compared with experimental data to expect the experimental result. It was found out that the transmittance of the first stacked $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film was more than 90%. However, with increasing stacking times, the optical properties of $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film get worse. Consequently, Ti layer is good for oxidation barrier, but too many uses of this layer may have an adverse effect to optical properties of TCO film.

Electrical and Optical Properties of Al-doped ZnO Thin Films (Al-doped ZnO 투명 전도성 박막(TCO)의 전기적 광학적 특성)

  • Hong, Youn-Jeong;Lee, Kyu-Mann;Kim, In-Woo
    • Journal of the Semiconductor & Display Technology
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    • v.6 no.3
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    • pp.35-39
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    • 2007
  • ITO(Indium Tin Oxide) is the most attractive TCO(Transparent Conducting Oxide) materials for LCD, PDP, OLEDs and solar cell, because of their high optical transparency and electrical conductivity. However due to the shortage of indium resource, hard processing at low temperature, and decrease of optical property during hydrogen plasma treatment, their applications to the display industries are limited. Thus, recently the Al-doped ZnO(AZO) has been studied to substitute ITO. In this study, we have investigated the effect of different substrate temperature(RT, $150^{\circ}C$, $225^{\circ}C$, $300^{\circ}C$) and working pressure(10 mTorr, 20 mTorr, 30 mTorr, 80 mTorr) on the characteristics of AZO(2 wt.% Al, 98 wt.% ZnO) films deposited by RF-magnetron sputtering. We have obtained AZO thin films deposited at low temperature and all the deposited AZO thin films are grown as colunmar. The average transmittance in the visible wavelength region is over 80% for all the films and transmittance improved with increasing substrate temperature. Electrical properties of the AZO films improved with increasing substrate temperature.

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