• Carbon letters
• /
• v.6 no.1
• /
• pp.25-30
• /
• 2005

The electrosorption of U(VI) from waste water was carried out by using an activated carbon fiber (ACF) felt electrode in a continuous electrosorption cell. In order to enhance the electrosorption capacity at a lower potential, the ACF was electrochemically modified in an acidic and a basic solution. Pore structure and functional groups of the electrochemically modified ACF were examined, and the effects of the modification conditions were studied for the adsorption of U(VI). Specific surface area of all the ACFs was decreased by this modification. The amount of the acidic functional groups decreased with a basic modification, while the amount increased a lot with an acidic modification. The electrosorption capacity of U(VI) decreased on the acid modified electrode due to the shielding effect of the acidic functional groups. The base modified electrode enhanced the capacity due to a reduction of the acidic functional groups. The electrosorption amount of U(VI) on the base modified electrode at .0.3 V corresponds to that of the as-received ACF electrode at .0.9 V. Such a good adsorption capacity was due to a reduction of the shielding effect and an increase of the hydroxyl ions in the electric double layer on the ACF surface by the application of negative potential.

• Proceedings of the Korean Nuclear Society Conference
• /
• 2004.10a
• /
• pp.1047-1048
• /
• 2004

Simulation Coated layers of a nuclear fuel particle were evaluated by field emission scanning electron microscopy and nano-indentation method to give basic data to estimate 'Amoeba effect' and give an optimum fabrication condition and high quality control. Coated layers on the fuel kernel are in the order of buffer pyrolytic carbon, inner pyrolytic carbon, silicon carbide and outer pyrolytic carbon layers, which average thicknesses are 95, 25, 30 and 28 ${\mu}m$, respectively. Their densities and hardnesses are 1.08, 1.15, 3.18, 1.82 $g/cm^3$ and 0.522, 0.874, 9.641, and 2.726 GPa, respectively. Comparing theoretical density of pyrolytic carbon of 2.22 $g/cm^3$, the relative amount of porosity in each layer is about 52% for buffer, 48% for inner PyC and 18% for outer PyC.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
• /
• 2003.05a
• /
• pp.106-111
• /
• 2003

Tantalum nitride(TaN) films were deposited by atomic layer deposition(ALD) and plasma assisted atomic layer deposition(PAALD). The deposition of the TaN thin film has been performed using pentakis (ethylmethlyamino) tantalum (PEMAT) and ammonia($NH_3$) as precursors at temperature of $250^{\circ}C$, where the temperature was proven to be ALD window for TaN deposition from our previous experiments. The PAALD deposited TaN film shows better physical properties than thermal ALD deposited TaN film, due to its higher density$(~11.59 g/\textrm{cm}^3$) and lower carbon(~ 3 atomic %) and oxygen(~ 4 atomic %) concentration of impurities.

• Journal of Powder Materials
• /
• v.17 no.4
• /
• pp.295-301
• /
• 2010

Multi shell graphite coated Ag nano particles with core/shell structure were successfully synthesized by pulsed wire evaporation (PWE) method. Ar and $CH_4$ (10 vol.%) gases were mixed in chamber, which played a role of carrier gas and reaction gas, respectively. Graphite layers on the surface of silver nano particles were coated indiscretely. However, the graphite layers are detached, when the particles are heated up to $250^{\circ}C$ in the air atmosphere. In contrast, the graphite coated layer was stable under Ar and $N_2$ atmosphere, though the core/shell structured particles were heated up to $800^{\circ}C$. The presence of graphite coated layer prevent agglomeration of nanoparticles during heat treatment. The dispersion stability of the carbon coated Ag nanoparticles was higher than those of pure Ag nanoparticles.

• Journal of the Semiconductor & Display Technology
• /
• v.2 no.2
• /
• pp.5-8
• /
• 2003

In this study, as Cu diffusion barrier, tantalum nitrides were successfully deposited on Si(100) substrate and $SiO_2$ by plasma assisted atomic layer deposition(PAALD) and thermal ALD, using pentakis (ethylmethlyamino) tantalum (PEMAT) and NH$_3$ as precursors. The TaN films were deposited at $250^{\circ}C$ by both method. The growth rates of TaN films were 0.8${\AA}$/cycle for PAALD and 0.75${\AA}$/cycle for thermal ALD. TaN films by PAALD showed good surface morphology and excellent step coverage for the trench with an aspect ratio of h/w -1.8:0.12 mm but TaN films by thermal ALD showed bad step coverage for the same trench. The density for PAALD TaN was 11g/cmand one for thermal ALD TaN was 8.3g/$cm^3$. TaN films had 3 atomic % carbon impurity and 4 atomic % oxygen impurity for PAALD and 12 atomic % carbon impurity and 9 atomic % oxygen impurity for thermal ALD. The barrier failure for Cu(200 nm)/TaN(10 nm)/$SiO_2$(85 nm)/ Si structure was shown at temperature above $700^{\circ}C$ by XRD, Cu etch pit analysis.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
• /
• 2002.11a
• /
• pp.14-19
• /
• 2002

In this study, as Cu diffusion barrier, tantalum nitrides were successfully deposited on Si(100) substrate and SiO2 by plasma assisted atomic layer deposition(PAALD) and thermal ALD, using pentakis (ethylmethlyamino) tantalum (PEMAT) and $NH_3$ as precursors. The TaN films were deposited on $250^{\circ}$C by both method. The growth rates of TaN films were $0.8{\AA}$/cycle for PAALD and $0.75{\AA}$/cycle for thermal ALD. TaN films by PAALD showed good surface morphology and excellent step coverage for the trench with an aspect ratio of h/w - $1.8 : 0.12 \mu\textrm{m}$ but TaN films by thermal ALD showed bad step coverage for the same trench. The density for PAALD TaN was $11g/\textrm{cm}^3$ and one for thermal ALD TaN was $8.3g/\textrm{cm}^3$. TaN films had 3 atomic % carbon impurity and 4 atomic % oxygen impurity for PAALD and 12 atomic % carbon impurity and 9 atomic % oxygen impurity for thermal ALD. The barrier failure for Cu(200nm)/TaN(l0nm)/$SiO_2(85nm)$/Si structure was shown at temperature above $700^{\circ}$C by XRD, Cu etch pit analysis.

• Journal of Mechanical Science and Technology
• /
• v.18 no.10
• /
• pp.1772-1781
• /
• 2004

The mechanical as well as tribological characteristics of coating films as thin as a few nm become more crucial as applications in micro-systems grow. Especially, the amorphous carbon film has a potential to be used as a protective layer for micro-systems. In this work, quantitative evaluation of nano-indentation, scratching, and wear tests were performed on the 7nm thick amorphous carbon film using an Atomic Force Microscope (AFM). It was shown that AFM-based nano-indentation using a diamond coated tip can be feasibly utilized for mechanical characterization of ultra-thin films. Also, it was found that the critical load where the failure of the carbon film occurred was about 18${\mu}$N by the ramp load scratch test. Finally, the wear experimental results showed that the quantitative wear rate of the carbon film ranged 10$\^$-9/～10$\^$-8/ ㎣ /N cycle. These experimental methods can be effectively utilized for a better understanding the mechanical and tribological characteristics at the nano-scale.

• Maxillofacial Plastic and Reconstructive Surgery
• /
• v.37
• /
• pp.34.1-34.14
• /
• 2015

Background: Over the past 30-40 years, various carbon implant materials have become more interesting, because they are well accepted by the biological environment. The traditional carbon-based polymers give rise to many complications. The polymer complication may be eliminated through carbon fibres bound by pyrocarbon (carbon/carbon). The aim of this study is to present the long-term clinical results of carbon/carbon implants, and the results of the scanning electron microscope and energy dispersive spectrometer investigation of an implant retrieved from the human body after 8 years. Methods: Mandibular reconstruction (8-10 years ago) was performed with pure (99.99 %) carbon implants in 16 patients (10 malignant tumours, 4 large cystic lesions and 2 augmentative processes). The long-term effect of the human body on the carbon/carbon implant was investigated by comparing the structure, the surface morphology and the composition of an implant retrieved after 8 years to a sterilized, but not implanted one. Results: Of the 16 patients, the implants had to be removed earlier in 5 patients because of the defect that arose on the oral mucosa above the carbon plates. During the long-term follow-up, plate fracture, loosening of the screws, infection or inflammations around the carbon/carbon implants were not observed. The thickness of the carbon fibres constituting the implants did not change during the 8-year period, the surface of the implant retrieved was covered with a thin surface layer not present on the unimplanted implant. The composition of this layer is identical to the composition of the underlying carbon fibres. Residual soft tissue penetrating the bulk material between the carbon fibre bunches was found on the retrieved implant indicating the importance of the surface morphology in tissue growth and adhering implants. Conclusions: The surface morphology and the structure were not changed after 8 years. The two main components of the implant retrieved from the human body are still carbon and oxygen, but the amount of oxygen is 3-4 times higher than on the surface of the reference implant, which can be attributed to the oxidative effect of the human body, consequently in the integration and biocompatibility of the implant. The clinical conclusion is that if the soft part cover is appropriate, the carbon implants are cosmetically and functionally more suitable than titanium plates.

• 한국전산유체공학회:학술대회논문집
• /
• 2008.03b
• /
• pp.538-541
• /
• 2008

The carbon laden suspensions in water with no surfactants have poor stability caused by the hydrophobic layer of particles. In this study, the water-based carbon nano colloide(CNC) was successfully produced using electro-chemical one-step method without agent. The properties of CNC were characterized by using various techniques such as particle size analyzer, TEM, FT-IR, turbidity meter, viscometer, and transient hot-wire method. The average size of the suspended in the CNC was 15 nm in diameter. The thermal conductivity of CNC compared with water was increased up to 14% with 4.2wt% concentration. The CNC was stable over 600hr. The enhanced colloidal stability of CNC may be caused by the chemical structures, such as, hydroxide and carboxyl groups formed in outer atomic layer of carbon, which (i) made the carbon nanofparticles hydrophilic and (ii) prevented the aggregation among nanoparticles.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.02a
• /
• pp.441-441
• /
• 2011

$TiO_2$ nanoparticles were grown on carbon fiber by atomic later deposition (ALD) with TTIP $(Ti(OCH(CH_3)_2)_4$ and $H_2O$ precusors. After sampe surfaces were treated by electron beam (1 MeV, 5 KGy), an improvement in the photocatalytic reacitivity of $TiO_2$ nanoparticles on carbon fiber was observed. An increase in the population of hydroxyl group on $TiO_2$ particles and the oxidation of carbon fiber were found upon e-beam exposure, whereas there was no noticeable changes of their morphology. It implies that those changes in O and C 1s state of $TiO_2$ particles/carbon fiber induced by e-beam treatment could be related to the enhancement of the photocatalytic activity. In contrast, when carbon fiber fully covered with $TiO_2$ thick films was treated with high-energy electron beam under same conditions, the improvement of photocatalytic activity as well as any changes in XPS spectra (Ti 2p, O 1s and C 1s) could not be found.